JPS5747875A - Resist composition - Google Patents
Resist compositionInfo
- Publication number
- JPS5747875A JPS5747875A JP12190380A JP12190380A JPS5747875A JP S5747875 A JPS5747875 A JP S5747875A JP 12190380 A JP12190380 A JP 12190380A JP 12190380 A JP12190380 A JP 12190380A JP S5747875 A JPS5747875 A JP S5747875A
- Authority
- JP
- Japan
- Prior art keywords
- resist
- naphthylamine
- benzotriazole
- tertiary
- hydroxy
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- ing And Chemical Polishing (AREA)
Abstract
PURPOSE: To obtain a resist composition with superior dry etching resistance by adding an amine compound or a hosphorus compound to a resist.
CONSTITUTION: To a negative type rubber resist, a positive type phenol-novolak resin resist or a positive type polymethyl methacrylate resist is added ≥1 kind of compound selected from phenyl-β-naphthylamine, α-naphthylamine, N,N'-di-secondary-butyl-p-phenylenediamine, 2(2'-hydroxy-3',5'-di-tertiary-butylphenyl)benzotriazole, 2(2'-hydroxy-3'-tertiary-butyl-5'-methylphenyl)benzotriazole, triphenyl phosphite and 2-mercaptobenzimidazole.
COPYRIGHT: (C)1982,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12190380A JPS5747875A (en) | 1980-09-02 | 1980-09-02 | Resist composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12190380A JPS5747875A (en) | 1980-09-02 | 1980-09-02 | Resist composition |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5747875A true JPS5747875A (en) | 1982-03-18 |
JPS6362593B2 JPS6362593B2 (en) | 1988-12-02 |
Family
ID=14822754
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12190380A Granted JPS5747875A (en) | 1980-09-02 | 1980-09-02 | Resist composition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5747875A (en) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58182633A (en) * | 1982-04-19 | 1983-10-25 | Tokyo Ohka Kogyo Co Ltd | Positive type photosensitive composition |
JPS61130947A (en) * | 1984-11-30 | 1986-06-18 | Japan Synthetic Rubber Co Ltd | Positive type resist composition |
JPS61219951A (en) * | 1985-03-27 | 1986-09-30 | Japan Synthetic Rubber Co Ltd | Positive type radiation sensitive composition |
JPS63237053A (en) * | 1987-03-26 | 1988-10-03 | Japan Synthetic Rubber Co Ltd | Positive type radiation sensitive resin composition |
EP0349411A2 (en) * | 1988-06-28 | 1990-01-03 | The University Of North Carolina | Photoresists resistant to oxygen plasmas |
US5114827A (en) * | 1988-06-28 | 1992-05-19 | Microelectronics Center Of N.C. | Photoresists resistant to oxygen plasmas |
US7537974B2 (en) | 2005-02-03 | 2009-05-26 | Samsung Electronics Co., Ltd. | Photoresist composition, method for forming film pattern using the same, and method for manufacturing thin film transistor array panel using the same |
-
1980
- 1980-09-02 JP JP12190380A patent/JPS5747875A/en active Granted
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58182633A (en) * | 1982-04-19 | 1983-10-25 | Tokyo Ohka Kogyo Co Ltd | Positive type photosensitive composition |
JPH0128935B2 (en) * | 1982-04-19 | 1989-06-06 | Tokyo Ohka Kogyo Co Ltd | |
JPS61130947A (en) * | 1984-11-30 | 1986-06-18 | Japan Synthetic Rubber Co Ltd | Positive type resist composition |
JPH04260B2 (en) * | 1984-11-30 | 1992-01-06 | Japan Synthetic Rubber Co Ltd | |
JPS61219951A (en) * | 1985-03-27 | 1986-09-30 | Japan Synthetic Rubber Co Ltd | Positive type radiation sensitive composition |
JPH0588466B2 (en) * | 1985-03-27 | 1993-12-22 | Japan Synthetic Rubber Co Ltd | |
JPS63237053A (en) * | 1987-03-26 | 1988-10-03 | Japan Synthetic Rubber Co Ltd | Positive type radiation sensitive resin composition |
EP0349411A2 (en) * | 1988-06-28 | 1990-01-03 | The University Of North Carolina | Photoresists resistant to oxygen plasmas |
US4968582A (en) * | 1988-06-28 | 1990-11-06 | Mcnc And University Of Nc At Charlotte | Photoresists resistant to oxygen plasmas |
US5114827A (en) * | 1988-06-28 | 1992-05-19 | Microelectronics Center Of N.C. | Photoresists resistant to oxygen plasmas |
US7537974B2 (en) | 2005-02-03 | 2009-05-26 | Samsung Electronics Co., Ltd. | Photoresist composition, method for forming film pattern using the same, and method for manufacturing thin film transistor array panel using the same |
Also Published As
Publication number | Publication date |
---|---|
JPS6362593B2 (en) | 1988-12-02 |
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