JPS57172337A - Photosensitive resin composition - Google Patents
Photosensitive resin compositionInfo
- Publication number
- JPS57172337A JPS57172337A JP5693581A JP5693581A JPS57172337A JP S57172337 A JPS57172337 A JP S57172337A JP 5693581 A JP5693581 A JP 5693581A JP 5693581 A JP5693581 A JP 5693581A JP S57172337 A JPS57172337 A JP S57172337A
- Authority
- JP
- Japan
- Prior art keywords
- photosensitive resin
- formula
- photosensitive
- resin composition
- aliphatic hydrocarbon
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Phenolic Resins Or Amino Resins (AREA)
Abstract
PURPOSE:To obtain a photosensitive resin composition for use in a positive image type photomechanical process, high in sensitivity and superior in chemical resistance, oleophilicness, and mechanical strength, by adding a specified photosensitive resin having quinone-diazidesulfonyl groups. CONSTITUTION:A photosensitive resion composition contains a photosensitive resin represented by the formula in which each of R1, R2, R3 is H, an aliphatic hydrocarbon group, phenyl, or lower alkoxy; n>=2; and D is o-benzoquinonediazidesulfonyl. As said aliphatic hydrocarbon in the formula, methyl, ethyl, propyl, butyl, amyl, C15H25 or the like group are desirable. The resin represented by the formula can be used as it is, but an alkali-soluble resin or another photosensitive material can be added to this.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5693581A JPS57172337A (en) | 1981-04-17 | 1981-04-17 | Photosensitive resin composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5693581A JPS57172337A (en) | 1981-04-17 | 1981-04-17 | Photosensitive resin composition |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57172337A true JPS57172337A (en) | 1982-10-23 |
JPH0337174B2 JPH0337174B2 (en) | 1991-06-04 |
Family
ID=13041372
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5693581A Granted JPS57172337A (en) | 1981-04-17 | 1981-04-17 | Photosensitive resin composition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57172337A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61217034A (en) * | 1985-03-22 | 1986-09-26 | Fuji Photo Film Co Ltd | Photosensitive composition and photosensitive material |
JPS61218616A (en) * | 1985-03-02 | 1986-09-29 | チバ‐ガイギー アクチエンゲゼルシヤフト | Denatured phenol resin product, manufacture and image formning method thereby |
JPS61228439A (en) * | 1985-04-01 | 1986-10-11 | Fuji Photo Film Co Ltd | Photosensitive composition and photosensitive material |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5271224A (en) * | 1975-12-11 | 1977-06-14 | Toshiba Corp | Positive type light sensitive composition |
JPS5359504A (en) * | 1976-11-05 | 1978-05-29 | Tokyo Shibaura Electric Co | Positive photoresist material |
-
1981
- 1981-04-17 JP JP5693581A patent/JPS57172337A/en active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5271224A (en) * | 1975-12-11 | 1977-06-14 | Toshiba Corp | Positive type light sensitive composition |
JPS5359504A (en) * | 1976-11-05 | 1978-05-29 | Tokyo Shibaura Electric Co | Positive photoresist material |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61218616A (en) * | 1985-03-02 | 1986-09-29 | チバ‐ガイギー アクチエンゲゼルシヤフト | Denatured phenol resin product, manufacture and image formning method thereby |
JPS61217034A (en) * | 1985-03-22 | 1986-09-26 | Fuji Photo Film Co Ltd | Photosensitive composition and photosensitive material |
JPS61228439A (en) * | 1985-04-01 | 1986-10-11 | Fuji Photo Film Co Ltd | Photosensitive composition and photosensitive material |
Also Published As
Publication number | Publication date |
---|---|
JPH0337174B2 (en) | 1991-06-04 |
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