JPS5687046A - Sensitizer for organic photosensitive material - Google Patents

Sensitizer for organic photosensitive material

Info

Publication number
JPS5687046A
JPS5687046A JP16357079A JP16357079A JPS5687046A JP S5687046 A JPS5687046 A JP S5687046A JP 16357079 A JP16357079 A JP 16357079A JP 16357079 A JP16357079 A JP 16357079A JP S5687046 A JPS5687046 A JP S5687046A
Authority
JP
Japan
Prior art keywords
sensitizer
distyrylbenzene
photosensitive material
org
organic photosensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16357079A
Other languages
Japanese (ja)
Other versions
JPS6248224B2 (en
Inventor
Hiroshi Kawahara
Iwahiro Otsuka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AGC Inc
Original Assignee
Asahi Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd
Priority to JP16357079A priority Critical patent/JPS5687046A/en
Publication of JPS5687046A publication Critical patent/JPS5687046A/en
Publication of JPS6248224B2 publication Critical patent/JPS6248224B2/ja
Granted legal-status Critical Current

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Landscapes

  • Photoreceptors In Electrophotography (AREA)

Abstract

PURPOSE: To enhance the photosensitive of an org. photosensitive material while maintaining the high light transmission by using a tri- or tetranitro deriv. of distyrylbenzene as a sensitizer.
CONSTITUTION: A tri- or tetranitro deriv. of distyrylbenzene represented by the formula (where the distyrylbenzene may be either p-distyrylbenzene or m-distyrylbenzene, m+n+q=3 or 4,0≤m,n,q≤2) is used as a sensitizer for an org. photosensitive material, preferably a material based on an org. photoconductive polymer material, typically poly-9-vinylcarbazole. The amount of the sensitizer added is preferably about 1W30wt% to the amount of the photoconductive material.
COPYRIGHT: (C)1981,JPO&Japio
JP16357079A 1979-12-18 1979-12-18 Sensitizer for organic photosensitive material Granted JPS5687046A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16357079A JPS5687046A (en) 1979-12-18 1979-12-18 Sensitizer for organic photosensitive material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16357079A JPS5687046A (en) 1979-12-18 1979-12-18 Sensitizer for organic photosensitive material

Publications (2)

Publication Number Publication Date
JPS5687046A true JPS5687046A (en) 1981-07-15
JPS6248224B2 JPS6248224B2 (en) 1987-10-13

Family

ID=15776413

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16357079A Granted JPS5687046A (en) 1979-12-18 1979-12-18 Sensitizer for organic photosensitive material

Country Status (1)

Country Link
JP (1) JPS5687046A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013041102A (en) * 2011-08-15 2013-02-28 Ricoh Co Ltd Electrophotographic photoconductor, method for manufacturing the same, image forming method, image forming apparatus, and process cartridge
CN103936593A (en) * 2014-05-16 2014-07-23 南京理工大学 2, 4, 6-trinitro-1, 3-bis (2', 4'-dinitrobenzene vinyl) benzene as well as preparation method and application thereof
CN103936592A (en) * 2014-04-03 2014-07-23 南京理工大学 2,4,6-trinitro-1,3-bis(3'-nitrostyryl)benzene as well as preparation and application thereof
CN104016868A (en) * 2014-04-03 2014-09-03 南京理工大学 Chlorinated 2, 4, 6-trinitro-1, 3- distyryl benzene derivatives as well as preparation method and application thereof
CN104016869A (en) * 2014-05-16 2014-09-03 南京理工大学 2,4,6-trinitro-1,3-di(2',4',6'-trinitro-3'-hydroxystyryl)benzene, synthetic method and applciation

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013041102A (en) * 2011-08-15 2013-02-28 Ricoh Co Ltd Electrophotographic photoconductor, method for manufacturing the same, image forming method, image forming apparatus, and process cartridge
CN103936592A (en) * 2014-04-03 2014-07-23 南京理工大学 2,4,6-trinitro-1,3-bis(3'-nitrostyryl)benzene as well as preparation and application thereof
CN104016868A (en) * 2014-04-03 2014-09-03 南京理工大学 Chlorinated 2, 4, 6-trinitro-1, 3- distyryl benzene derivatives as well as preparation method and application thereof
CN103936593A (en) * 2014-05-16 2014-07-23 南京理工大学 2, 4, 6-trinitro-1, 3-bis (2', 4'-dinitrobenzene vinyl) benzene as well as preparation method and application thereof
CN104016869A (en) * 2014-05-16 2014-09-03 南京理工大学 2,4,6-trinitro-1,3-di(2',4',6'-trinitro-3'-hydroxystyryl)benzene, synthetic method and applciation

Also Published As

Publication number Publication date
JPS6248224B2 (en) 1987-10-13

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