JPS5558211A - Positive type radiation-sensitive composition and its solution - Google Patents
Positive type radiation-sensitive composition and its solutionInfo
- Publication number
- JPS5558211A JPS5558211A JP13202878A JP13202878A JPS5558211A JP S5558211 A JPS5558211 A JP S5558211A JP 13202878 A JP13202878 A JP 13202878A JP 13202878 A JP13202878 A JP 13202878A JP S5558211 A JPS5558211 A JP S5558211A
- Authority
- JP
- Japan
- Prior art keywords
- copolymer
- sensitive
- resolving power
- radiation
- butyl acrylate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE: A high molecular material for radiation-sensitive and positive-type resist that is composed of a copolymer from isopropyl methacrylate and a specific α- substituted butyl acrylate, thus having extremely high sensibility and resolving power.
CONSTITUTION: A copolymer from isopropyl methacrylate as the main ingredient and 1W45mol%, based on the total composition, of an α-substituted butyl acrylate of the formula (R1 is methyl, ethyl, propyl, cyanomethyl, halogenomethyl or cyano group, or halogen atom; R2 is iso-,secondary- or tertiary butyl group) with a molecular weight of 100,000 to several millions is so high sensitive that it can form sufficiently clear positive images with 1W10% radiation compared to existing material. Further, it has the same levels of resolving power, heat resistance, etching resistance, as those of existing PMMA resist and thus is suitably used for the mask for making semiconductor elements and material for recording information.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13202878A JPS5558211A (en) | 1978-10-25 | 1978-10-25 | Positive type radiation-sensitive composition and its solution |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13202878A JPS5558211A (en) | 1978-10-25 | 1978-10-25 | Positive type radiation-sensitive composition and its solution |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5558211A true JPS5558211A (en) | 1980-04-30 |
Family
ID=15071803
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13202878A Pending JPS5558211A (en) | 1978-10-25 | 1978-10-25 | Positive type radiation-sensitive composition and its solution |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5558211A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2001074916A1 (en) * | 2000-04-04 | 2001-10-11 | Daikin Industries, Ltd. | Novel fluoropolymer having acid-reactive group and chemical amplification type photoresist composition containing the same |
| KR100416916B1 (en) * | 2001-05-11 | 2004-02-05 | 학교법인 한양학원 | Silicon-containing polymer and resist composition using the same |
-
1978
- 1978-10-25 JP JP13202878A patent/JPS5558211A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2001074916A1 (en) * | 2000-04-04 | 2001-10-11 | Daikin Industries, Ltd. | Novel fluoropolymer having acid-reactive group and chemical amplification type photoresist composition containing the same |
| US6908724B2 (en) | 2000-04-04 | 2005-06-21 | Daikin Industries, Ltd. | Fluorine-containing polymer having acid-reactive group and chemically amplifying type photoresist composition prepared from same |
| KR100416916B1 (en) * | 2001-05-11 | 2004-02-05 | 학교법인 한양학원 | Silicon-containing polymer and resist composition using the same |
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