KR100884161B1 - 냉각 수단을 구비한 진공 장치 - Google Patents

냉각 수단을 구비한 진공 장치 Download PDF

Info

Publication number
KR100884161B1
KR100884161B1 KR1020067022051A KR20067022051A KR100884161B1 KR 100884161 B1 KR100884161 B1 KR 100884161B1 KR 1020067022051 A KR1020067022051 A KR 1020067022051A KR 20067022051 A KR20067022051 A KR 20067022051A KR 100884161 B1 KR100884161 B1 KR 100884161B1
Authority
KR
South Korea
Prior art keywords
refrigerant
path
coolant
cooling
vacuum chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1020067022051A
Other languages
English (en)
Korean (ko)
Other versions
KR20070012424A (ko
Inventor
마사유키 타키모토
유타카 후세
타츠미 아베
히로유키 코무로
카즈히토 아오나하타
Original Assignee
가부시키가이샤 쇼와 신쿠
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 가부시키가이샤 쇼와 신쿠 filed Critical 가부시키가이샤 쇼와 신쿠
Publication of KR20070012424A publication Critical patent/KR20070012424A/ko
Application granted granted Critical
Publication of KR100884161B1 publication Critical patent/KR100884161B1/ko
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25D—REFRIGERATORS; COLD ROOMS; ICE-BOXES; COOLING OR FREEZING APPARATUS NOT OTHERWISE PROVIDED FOR
    • F25D23/00—General constructional features
    • F25D23/06—Walls
    • F25D23/061—Walls with conduit means

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Combustion & Propulsion (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • General Engineering & Computer Science (AREA)
  • Physical Vapour Deposition (AREA)
KR1020067022051A 2004-05-14 2005-01-24 냉각 수단을 구비한 진공 장치 Expired - Fee Related KR100884161B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2004-00144538 2004-05-14
JP2004144538A JP4016071B2 (ja) 2004-05-14 2004-05-14 冷却手段を備えた装置及び冷却方法

Publications (2)

Publication Number Publication Date
KR20070012424A KR20070012424A (ko) 2007-01-25
KR100884161B1 true KR100884161B1 (ko) 2009-02-17

Family

ID=35394172

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020067022051A Expired - Fee Related KR100884161B1 (ko) 2004-05-14 2005-01-24 냉각 수단을 구비한 진공 장치

Country Status (4)

Country Link
JP (1) JP4016071B2 (https=)
KR (1) KR100884161B1 (https=)
CN (1) CN1946871B (https=)
WO (1) WO2005111258A1 (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2234463A1 (en) * 2007-12-27 2010-09-29 Sharp Kabushiki Kaisha Plasma treatment apparatus, heating device for the plasma treatment apparatus, and plasma treatment method
CN103132027A (zh) * 2011-11-28 2013-06-05 鸿富锦精密工业（深圳）有限公司 真空镀膜设备
CN108385065A (zh) * 2018-05-23 2018-08-10 北京铂阳顶荣光伏科技有限公司 一种带有蒸发源的设备及安全控制方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03179742A (ja) * 1989-12-07 1991-08-05 Toshiba Corp 酸化珪素成膜方法
KR19990069535A (ko) * 1998-02-10 1999-09-06 서성기 박막 증착 장치
JP2000310694A (ja) * 1999-04-27 2000-11-07 Ishikawajima Harima Heavy Ind Co Ltd 原子炉圧力容器アクセスホールカバーの吊り耳切断用放電加工電極
KR20020086761A (ko) * 2001-05-10 2002-11-20 주식회사 엘지이아이 냉각수단을 구비한 고분자막 연속증착장비

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10256038A1 (de) * 2002-11-30 2004-06-17 Applied Films Gmbh & Co. Kg Bedampfungsvorrichtung

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03179742A (ja) * 1989-12-07 1991-08-05 Toshiba Corp 酸化珪素成膜方法
KR19990069535A (ko) * 1998-02-10 1999-09-06 서성기 박막 증착 장치
JP2000310694A (ja) * 1999-04-27 2000-11-07 Ishikawajima Harima Heavy Ind Co Ltd 原子炉圧力容器アクセスホールカバーの吊り耳切断用放電加工電極
KR20020086761A (ko) * 2001-05-10 2002-11-20 주식회사 엘지이아이 냉각수단을 구비한 고분자막 연속증착장비

Also Published As

Publication number Publication date
WO2005111258A1 (ja) 2005-11-24
KR20070012424A (ko) 2007-01-25
CN1946871A (zh) 2007-04-11
CN1946871B (zh) 2012-06-20
JP2005325410A (ja) 2005-11-24
JP4016071B2 (ja) 2007-12-05

Similar Documents

Publication Publication Date Title
US10054368B2 (en) Laminated header, heat exchanger, air-conditioning apparatus, and method of joining a plate-like unit of a laminated header and a pipe to each other
KR101917013B1 (ko) 냉매 분배 장치 및 냉각 장치
TW201211482A (en) A panel cooled with a fluid for metallurgic furnaces, a cooling system for metallurgic furnaces comprising such a panel and metallurgic furnace incorporating them
US11892178B2 (en) Heat exchanger unit and air conditioner using the same
US20160076800A1 (en) Low leakage seal for low pressure system
KR100884161B1 (ko) 냉각 수단을 구비한 진공 장치
JP2022524763A (ja) ヒートポンプ用室外ユニット
JP6753517B2 (ja) 熱交換システム
CN209138031U (zh) 一种油扩散泵双层梅花形冷阱
KR102028908B1 (ko) 전기히터 내장 구조의 열교환기
JP2008075988A (ja) 複合放熱部材、冷却ユニット、冷却装置、及び冷却装置集合体
JP2016176642A (ja) 空気調和装置
WO2015072128A1 (ja) 配管構造、それを用いた冷却装置、および冷媒蒸気輸送方法
CN211462147U (zh) 冷阱装置以及扩散炉设备
KR101893846B1 (ko) 복합 대공화기 냉방용 실외기 장치
KR20090128123A (ko) 석션파이프 연결 어셈블리 및 그의 제조방법
CN222108426U (zh) 矩阵式均匀散热系统
CN223896306U (zh) 一种热泵机组
KR101204899B1 (ko) 냉각기 및 이를 구비하는 압축 시스템
CN223633439U (zh) 真空镀膜设备及冷凝盘管
CN222279016U (zh) 一种双通道冷却加热系统
JP2013234828A (ja) ディストリビュータ、室外機及び冷凍サイクル装置
CN218993788U (zh) 一种超低温化霜装置
KR200461393Y1 (ko) 기판 처리 장치의 냉각장치
CN207856366U (zh) 一种集成式冷凝装置

Legal Events

Date Code Title Description
E13-X000 Pre-grant limitation requested

St.27 status event code: A-2-3-E10-E13-lim-X000

PA0105 International application

St.27 status event code: A-0-1-A10-A15-nap-PA0105

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

A201 Request for examination
P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

E13-X000 Pre-grant limitation requested

St.27 status event code: A-2-3-E10-E13-lim-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

E90F Notification of reason for final refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

St.27 status event code: A-1-2-D10-D22-exm-PE0701

PR1002 Payment of registration fee

St.27 status event code: A-2-2-U10-U12-oth-PR1002

Fee payment year number: 1

GRNT Written decision to grant
PR0701 Registration of establishment

St.27 status event code: A-2-4-F10-F11-exm-PR0701

PG1601 Publication of registration

St.27 status event code: A-4-4-Q10-Q13-nap-PG1601

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 4

FPAY Annual fee payment

Payment date: 20130201

Year of fee payment: 5

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 5

FPAY Annual fee payment

Payment date: 20140203

Year of fee payment: 6

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 6

FPAY Annual fee payment

Payment date: 20150130

Year of fee payment: 7

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 7

LAPS Lapse due to unpaid annual fee
PC1903 Unpaid annual fee

St.27 status event code: A-4-4-U10-U13-oth-PC1903

Not in force date: 20160211

Payment event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

PC1903 Unpaid annual fee

St.27 status event code: N-4-6-H10-H13-oth-PC1903

Ip right cessation event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

Not in force date: 20160211

R18-X000 Changes to party contact information recorded

St.27 status event code: A-5-5-R10-R18-oth-X000