JP4016071B2 - 冷却手段を備えた装置及び冷却方法 - Google Patents

冷却手段を備えた装置及び冷却方法 Download PDF

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Publication number
JP4016071B2
JP4016071B2 JP2004144538A JP2004144538A JP4016071B2 JP 4016071 B2 JP4016071 B2 JP 4016071B2 JP 2004144538 A JP2004144538 A JP 2004144538A JP 2004144538 A JP2004144538 A JP 2004144538A JP 4016071 B2 JP4016071 B2 JP 4016071B2
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JP
Japan
Prior art keywords
refrigerant
vacuum apparatus
vacuum
cooling
path
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2004144538A
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English (en)
Japanese (ja)
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JP2005325410A5 (https=
JP2005325410A (ja
Inventor
昌行 瀧本
豊 布施
辰弥 阿部
弘之 小室
一仁 青名端
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Showa Shinku Co Ltd
Original Assignee
Showa Shinku Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Showa Shinku Co Ltd filed Critical Showa Shinku Co Ltd
Priority to JP2004144538A priority Critical patent/JP4016071B2/ja
Priority to KR1020067022051A priority patent/KR100884161B1/ko
Priority to PCT/JP2005/000849 priority patent/WO2005111258A1/ja
Priority to CN2005800130682A priority patent/CN1946871B/zh
Publication of JP2005325410A publication Critical patent/JP2005325410A/ja
Publication of JP2005325410A5 publication Critical patent/JP2005325410A5/ja
Application granted granted Critical
Publication of JP4016071B2 publication Critical patent/JP4016071B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25D—REFRIGERATORS; COLD ROOMS; ICE-BOXES; COOLING OR FREEZING APPARATUS NOT OTHERWISE PROVIDED FOR
    • F25D23/00—General constructional features
    • F25D23/06—Walls
    • F25D23/061—Walls with conduit means

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Combustion & Propulsion (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • General Engineering & Computer Science (AREA)
  • Physical Vapour Deposition (AREA)
JP2004144538A 2004-05-14 2004-05-14 冷却手段を備えた装置及び冷却方法 Expired - Fee Related JP4016071B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2004144538A JP4016071B2 (ja) 2004-05-14 2004-05-14 冷却手段を備えた装置及び冷却方法
KR1020067022051A KR100884161B1 (ko) 2004-05-14 2005-01-24 냉각 수단을 구비한 진공 장치
PCT/JP2005/000849 WO2005111258A1 (ja) 2004-05-14 2005-01-24 冷却手段を備えた装置及び冷却方法
CN2005800130682A CN1946871B (zh) 2004-05-14 2005-01-24 具有冷却装置的装置及冷却方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004144538A JP4016071B2 (ja) 2004-05-14 2004-05-14 冷却手段を備えた装置及び冷却方法

Publications (3)

Publication Number Publication Date
JP2005325410A JP2005325410A (ja) 2005-11-24
JP2005325410A5 JP2005325410A5 (https=) 2007-02-08
JP4016071B2 true JP4016071B2 (ja) 2007-12-05

Family

ID=35394172

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004144538A Expired - Fee Related JP4016071B2 (ja) 2004-05-14 2004-05-14 冷却手段を備えた装置及び冷却方法

Country Status (4)

Country Link
JP (1) JP4016071B2 (https=)
KR (1) KR100884161B1 (https=)
CN (1) CN1946871B (https=)
WO (1) WO2005111258A1 (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2234463A1 (en) * 2007-12-27 2010-09-29 Sharp Kabushiki Kaisha Plasma treatment apparatus, heating device for the plasma treatment apparatus, and plasma treatment method
CN103132027A (zh) * 2011-11-28 2013-06-05 鸿富锦精密工业（深圳）有限公司 真空镀膜设备
CN108385065A (zh) * 2018-05-23 2018-08-10 北京铂阳顶荣光伏科技有限公司 一种带有蒸发源的设备及安全控制方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03179742A (ja) * 1989-12-07 1991-08-05 Toshiba Corp 酸化珪素成膜方法
KR100297003B1 (ko) * 1998-02-10 2001-08-07 서성기 박막증착장치
JP2000310694A (ja) * 1999-04-27 2000-11-07 Ishikawajima Harima Heavy Ind Co Ltd 原子炉圧力容器アクセスホールカバーの吊り耳切断用放電加工電極
KR20020086761A (ko) * 2001-05-10 2002-11-20 주식회사 엘지이아이 냉각수단을 구비한 고분자막 연속증착장비
DE10256038A1 (de) * 2002-11-30 2004-06-17 Applied Films Gmbh & Co. Kg Bedampfungsvorrichtung

Also Published As

Publication number Publication date
KR100884161B1 (ko) 2009-02-17
WO2005111258A1 (ja) 2005-11-24
KR20070012424A (ko) 2007-01-25
CN1946871A (zh) 2007-04-11
CN1946871B (zh) 2012-06-20
JP2005325410A (ja) 2005-11-24

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