KR100834176B1 - 제전 장치 및 제전 방법과 프로그램 기록 매체 - Google Patents

제전 장치 및 제전 방법과 프로그램 기록 매체 Download PDF

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KR100834176B1
KR100834176B1 KR1020070094236A KR20070094236A KR100834176B1 KR 100834176 B1 KR100834176 B1 KR 100834176B1 KR 1020070094236 A KR1020070094236 A KR 1020070094236A KR 20070094236 A KR20070094236 A KR 20070094236A KR 100834176 B1 KR100834176 B1 KR 100834176B1
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South Korea
Prior art keywords
wafer
probe card
relay switch
test
inspected object
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KR1020070094236A
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English (en)
Korean (ko)
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KR20080039784A (ko
Inventor
에이이치 시노하라
가즈키 하나와
Original Assignee
도쿄엘렉트론가부시키가이샤
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Priority to US11/861,905 priority Critical patent/US7859279B2/en
Publication of KR20080039784A publication Critical patent/KR20080039784A/ko
Application granted granted Critical
Publication of KR100834176B1 publication Critical patent/KR100834176B1/ko
Priority to US12/842,756 priority patent/US8085052B2/en
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R1/00—Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
    • G01R1/02—General constructional details
    • G01R1/06—Measuring leads; Measuring probes
    • G01R1/067—Measuring probes
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R1/00—Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
    • G01R1/02—General constructional details
    • G01R1/06—Measuring leads; Measuring probes
    • G01R1/067—Measuring probes
    • G01R1/073—Multiple probes
    • G01R1/07307—Multiple probes with individual probe elements, e.g. needles, cantilever beams or bump contacts, fixed in relation to each other, e.g. bed of nails fixture or probe card
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R1/00—Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
    • G01R1/20—Modifications of basic electric elements for use in electric measuring instruments; Structural combinations of such elements with such instruments
    • G01R1/206—Switches for connection of measuring instruments or electric motors to measuring loads
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/26—Testing of individual semiconductor devices
    • G01R31/2601—Apparatus or methods therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Testing Of Individual Semiconductor Devices (AREA)
KR1020070094236A 2006-11-01 2007-09-17 제전 장치 및 제전 방법과 프로그램 기록 매체 Active KR100834176B1 (ko)

Priority Applications (2)

Application Number Priority Date Filing Date Title
US11/861,905 US7859279B2 (en) 2006-11-01 2007-09-26 Charge eliminating apparatus and method, and program storage medium
US12/842,756 US8085052B2 (en) 2006-11-01 2010-07-23 Charge eliminating apparatus and method, and program storage medium for removing static electricity from a target object such as a wafer

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2006297979 2006-11-01
JPJP-P-2006-00297979 2006-11-01
JPJP-P-2007-00063310 2007-03-13
JP2007063310A JP4068127B2 (ja) 2006-11-01 2007-03-13 除電装置及び除電方法並びにプログラム記録媒体

Publications (2)

Publication Number Publication Date
KR20080039784A KR20080039784A (ko) 2008-05-07
KR100834176B1 true KR100834176B1 (ko) 2008-05-30

Family

ID=38305365

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020070094236A Active KR100834176B1 (ko) 2006-11-01 2007-09-17 제전 장치 및 제전 방법과 프로그램 기록 매체

Country Status (4)

Country Link
JP (1) JP4068127B2 (enrdf_load_stackoverflow)
KR (1) KR100834176B1 (enrdf_load_stackoverflow)
CN (1) CN101175362B (enrdf_load_stackoverflow)
TW (1) TW200826213A (enrdf_load_stackoverflow)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101604075B (zh) * 2008-06-13 2013-04-10 统宝光电股份有限公司 液晶显示面板的点灯测试静电防护装置与方法
JP5377915B2 (ja) * 2008-09-30 2013-12-25 東京エレクトロン株式会社 検査装置及び検査方法
JP5356769B2 (ja) * 2008-10-15 2013-12-04 東京エレクトロン株式会社 載置台
JP2011054762A (ja) * 2009-09-02 2011-03-17 Tokyo Electron Ltd 除電装置の監視装置、除電装置の監視方法及び除電装置の監視用プログラム
KR101999720B1 (ko) * 2012-11-20 2019-07-16 삼성디스플레이 주식회사 기판 정전기 검사 장치 및 기판 제조 방법
JP6227262B2 (ja) 2013-03-06 2017-11-08 株式会社荏原製作所 表面電位測定装置および表面電位測定方法
KR101515719B1 (ko) * 2013-12-23 2015-04-27 세메스 주식회사 프로브 스테이션
CN105530750A (zh) * 2014-09-29 2016-04-27 盛美半导体设备（上海）有限公司 晶圆导静电装置
CN107976576A (zh) * 2016-10-24 2018-05-01 精工爱普生株式会社 电子元器件传送装置以及电子元器件检查装置
JP7153181B2 (ja) * 2018-03-29 2022-10-14 株式会社東京精密 導通検査装置、プローバ
CN111257714B (zh) * 2020-01-17 2022-11-29 上海华力集成电路制造有限公司 静电测量设备及静电测量方法
CN119355311B (zh) * 2024-10-22 2025-04-29 上海矽弼半导体科技有限公司 一种探针台用的具有耐高压低漏电功能的载物台

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6406925B1 (en) 1998-08-17 2002-06-18 Tegal Corporation Method and apparatus for minimizing semiconductor wafer arcing during semiconductor wafer processing
JP2003100821A (ja) 2001-09-27 2003-04-04 Sony Corp ウェハーの検査システムおよび検査方法
JP2003218175A (ja) * 2002-01-23 2003-07-31 Tokyo Electron Ltd 載置台の除電機構及び検査装置
KR20050018063A (ko) * 2003-08-13 2005-02-23 삼성전자주식회사 반도체 제조장치의 기판 척킹/디척킹 장치 및 그의 방법

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN2076241U (zh) * 1990-09-30 1991-05-01 朱少武 防爆接地控制器
CN2303378Y (zh) * 1997-07-29 1999-01-06 马思正 电器自动接地消幅器
CN100381883C (zh) * 2004-05-24 2008-04-16 统宝光电股份有限公司 静电消除装置及其机台

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6406925B1 (en) 1998-08-17 2002-06-18 Tegal Corporation Method and apparatus for minimizing semiconductor wafer arcing during semiconductor wafer processing
JP2003100821A (ja) 2001-09-27 2003-04-04 Sony Corp ウェハーの検査システムおよび検査方法
JP2003218175A (ja) * 2002-01-23 2003-07-31 Tokyo Electron Ltd 載置台の除電機構及び検査装置
KR20050018063A (ko) * 2003-08-13 2005-02-23 삼성전자주식회사 반도체 제조장치의 기판 척킹/디척킹 장치 및 그의 방법

Also Published As

Publication number Publication date
JP2007180580A (ja) 2007-07-12
TW200826213A (en) 2008-06-16
CN101175362A (zh) 2008-05-07
KR20080039784A (ko) 2008-05-07
JP4068127B2 (ja) 2008-03-26
TWI362712B (enrdf_load_stackoverflow) 2012-04-21
CN101175362B (zh) 2011-12-14

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