TW200826213A - Discharging apparatus, discharging method, and program recording medium - Google Patents

Discharging apparatus, discharging method, and program recording medium Download PDF

Info

Publication number
TW200826213A
TW200826213A TW096140984A TW96140984A TW200826213A TW 200826213 A TW200826213 A TW 200826213A TW 096140984 A TW096140984 A TW 096140984A TW 96140984 A TW96140984 A TW 96140984A TW 200826213 A TW200826213 A TW 200826213A
Authority
TW
Taiwan
Prior art keywords
inspected
mounting table
wafer
probe card
probe
Prior art date
Application number
TW096140984A
Other languages
English (en)
Chinese (zh)
Other versions
TWI362712B (enrdf_load_stackoverflow
Inventor
Eiichi Shinohara
Kazuki Hanawa
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of TW200826213A publication Critical patent/TW200826213A/zh
Application granted granted Critical
Publication of TWI362712B publication Critical patent/TWI362712B/zh

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R1/00—Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
    • G01R1/02—General constructional details
    • G01R1/06—Measuring leads; Measuring probes
    • G01R1/067—Measuring probes
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R1/00—Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
    • G01R1/02—General constructional details
    • G01R1/06—Measuring leads; Measuring probes
    • G01R1/067—Measuring probes
    • G01R1/073—Multiple probes
    • G01R1/07307—Multiple probes with individual probe elements, e.g. needles, cantilever beams or bump contacts, fixed in relation to each other, e.g. bed of nails fixture or probe card
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R1/00—Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
    • G01R1/20—Modifications of basic electric elements for use in electric measuring instruments; Structural combinations of such elements with such instruments
    • G01R1/206—Switches for connection of measuring instruments or electric motors to measuring loads
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/26—Testing of individual semiconductor devices
    • G01R31/2601—Apparatus or methods therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Testing Of Individual Semiconductor Devices (AREA)
TW096140984A 2006-11-01 2007-10-31 Discharging apparatus, discharging method, and program recording medium TW200826213A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2006297979 2006-11-01
JP2007063310A JP4068127B2 (ja) 2006-11-01 2007-03-13 除電装置及び除電方法並びにプログラム記録媒体

Publications (2)

Publication Number Publication Date
TW200826213A true TW200826213A (en) 2008-06-16
TWI362712B TWI362712B (enrdf_load_stackoverflow) 2012-04-21

Family

ID=38305365

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096140984A TW200826213A (en) 2006-11-01 2007-10-31 Discharging apparatus, discharging method, and program recording medium

Country Status (4)

Country Link
JP (1) JP4068127B2 (enrdf_load_stackoverflow)
KR (1) KR100834176B1 (enrdf_load_stackoverflow)
CN (1) CN101175362B (enrdf_load_stackoverflow)
TW (1) TW200826213A (enrdf_load_stackoverflow)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101604075B (zh) * 2008-06-13 2013-04-10 统宝光电股份有限公司 液晶显示面板的点灯测试静电防护装置与方法
JP5377915B2 (ja) * 2008-09-30 2013-12-25 東京エレクトロン株式会社 検査装置及び検査方法
JP5356769B2 (ja) * 2008-10-15 2013-12-04 東京エレクトロン株式会社 載置台
JP2011054762A (ja) * 2009-09-02 2011-03-17 Tokyo Electron Ltd 除電装置の監視装置、除電装置の監視方法及び除電装置の監視用プログラム
KR101999720B1 (ko) * 2012-11-20 2019-07-16 삼성디스플레이 주식회사 기판 정전기 검사 장치 및 기판 제조 방법
JP6227262B2 (ja) 2013-03-06 2017-11-08 株式会社荏原製作所 表面電位測定装置および表面電位測定方法
KR101515719B1 (ko) * 2013-12-23 2015-04-27 세메스 주식회사 프로브 스테이션
CN105530750A (zh) * 2014-09-29 2016-04-27 盛美半导体设备（上海）有限公司 晶圆导静电装置
CN107976576A (zh) * 2016-10-24 2018-05-01 精工爱普生株式会社 电子元器件传送装置以及电子元器件检查装置
JP7153181B2 (ja) * 2018-03-29 2022-10-14 株式会社東京精密 導通検査装置、プローバ
CN111257714B (zh) * 2020-01-17 2022-11-29 上海华力集成电路制造有限公司 静电测量设备及静电测量方法
CN119355311B (zh) * 2024-10-22 2025-04-29 上海矽弼半导体科技有限公司 一种探针台用的具有耐高压低漏电功能的载物台

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN2076241U (zh) * 1990-09-30 1991-05-01 朱少武 防爆接地控制器
CN2303378Y (zh) * 1997-07-29 1999-01-06 马思正 电器自动接地消幅器
US6346428B1 (en) 1998-08-17 2002-02-12 Tegal Corporation Method and apparatus for minimizing semiconductor wafer arcing during semiconductor wafer processing
JP2003100821A (ja) 2001-09-27 2003-04-04 Sony Corp ウェハーの検査システムおよび検査方法
JP4048412B2 (ja) * 2002-01-23 2008-02-20 東京エレクトロン株式会社 載置台の除電機構及び検査装置
KR20050018063A (ko) * 2003-08-13 2005-02-23 삼성전자주식회사 반도체 제조장치의 기판 척킹/디척킹 장치 및 그의 방법
CN100381883C (zh) * 2004-05-24 2008-04-16 统宝光电股份有限公司 静电消除装置及其机台

Also Published As

Publication number Publication date
JP2007180580A (ja) 2007-07-12
KR100834176B1 (ko) 2008-05-30
CN101175362A (zh) 2008-05-07
TWI362712B (enrdf_load_stackoverflow) 2012-04-21
KR20080039784A (ko) 2008-05-07
JP4068127B2 (ja) 2008-03-26
CN101175362B (zh) 2011-12-14

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