KR100800613B1 - 웨이퍼 엔진 - Google Patents

웨이퍼 엔진 Download PDF

Info

Publication number
KR100800613B1
KR100800613B1 KR1020047003086A KR20047003086A KR100800613B1 KR 100800613 B1 KR100800613 B1 KR 100800613B1 KR 1020047003086 A KR1020047003086 A KR 1020047003086A KR 20047003086 A KR20047003086 A KR 20047003086A KR 100800613 B1 KR100800613 B1 KR 100800613B1
Authority
KR
South Korea
Prior art keywords
workpiece
wafer
engine
slider
axis
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
KR1020047003086A
Other languages
English (en)
Korean (ko)
Other versions
KR20040041157A (ko
Inventor
안소니 씨. 보노라
리차드 에이치. 고울드
로저 지. 하인
마이클 크로락
제리 스피즐
Original Assignee
어사이스트 테크놀로지스, 인코포레이티드
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 어사이스트 테크놀로지스, 인코포레이티드 filed Critical 어사이스트 테크놀로지스, 인코포레이티드
Publication of KR20040041157A publication Critical patent/KR20040041157A/ko
Application granted granted Critical
Publication of KR100800613B1 publication Critical patent/KR100800613B1/ko
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Images

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67763Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
    • H01L21/67778Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading involving loading and unloading of wafers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67763Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
    • H01L21/67766Mechanical parts of transfer devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67763Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
    • H01L21/67775Docking arrangements
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68707Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a robot blade, or gripped by a gripper for conveyance
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00Material or article handling
    • Y10S414/135Associated with semiconductor wafer handling
    • Y10S414/137Associated with semiconductor wafer handling including means for charging or discharging wafer cassette

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Robotics (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
KR1020047003086A 2001-08-31 2002-08-30 웨이퍼 엔진 Expired - Lifetime KR100800613B1 (ko)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US31672201P 2001-08-31 2001-08-31
US60/316,722 2001-08-31
US10/087,400 2002-03-01
US10/087,400 US7066707B1 (en) 2001-08-31 2002-03-01 Wafer engine
PCT/US2002/027909 WO2003021645A2 (en) 2001-08-31 2002-08-30 Wafer engine

Publications (2)

Publication Number Publication Date
KR20040041157A KR20040041157A (ko) 2004-05-14
KR100800613B1 true KR100800613B1 (ko) 2008-02-05

Family

ID=26776942

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020047003086A Expired - Lifetime KR100800613B1 (ko) 2001-08-31 2002-08-30 웨이퍼 엔진

Country Status (7)

Country Link
US (2) US7066707B1 (enExample)
JP (1) JP4287271B2 (enExample)
KR (1) KR100800613B1 (enExample)
CN (1) CN1329948C (enExample)
DE (1) DE10297171T5 (enExample)
TW (1) TW579538B (enExample)
WO (1) WO2003021645A2 (enExample)

Families Citing this family (69)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6918731B2 (en) 2001-07-02 2005-07-19 Brooks Automation, Incorporated Fast swap dual substrate transport for load lock
JP4137711B2 (ja) * 2003-06-16 2008-08-20 東京エレクトロン株式会社 基板処理装置及び基板搬送手段の位置合わせ方法
US7236853B2 (en) * 2003-10-01 2007-06-26 Varian Semiconductor Equipment Associates, Inc. Automated robot alignment system and method using kinematic pins and end effector sensor
US7607879B2 (en) * 2004-06-15 2009-10-27 Brooks Automation, Inc. Substrate processing apparatus with removable component module
US20060216137A1 (en) * 2004-07-02 2006-09-28 Katsunori Sakata Carrying apparatus and carrying control method for sheet-like substrate
US7578650B2 (en) * 2004-07-29 2009-08-25 Kla-Tencor Technologies Corporation Quick swap load port
US20060154385A1 (en) * 2005-01-07 2006-07-13 Ravinder Aggarwal Fabrication pathway integrated metrology device
US7410340B2 (en) * 2005-02-24 2008-08-12 Asyst Technologies, Inc. Direct tool loading
US7771151B2 (en) * 2005-05-16 2010-08-10 Muratec Automation Co., Ltd. Interface between conveyor and semiconductor process tool load port
US9457442B2 (en) * 2005-06-18 2016-10-04 Futrfab, Inc. Method and apparatus to support process tool modules in a cleanspace fabricator
US7604449B1 (en) * 2005-06-27 2009-10-20 Kla-Tencor Technologies Corporation Equipment front end module
US8821099B2 (en) 2005-07-11 2014-09-02 Brooks Automation, Inc. Load port module
KR100818044B1 (ko) * 2006-05-04 2008-03-31 위순임 기판 지지대와 기판 반송 장치 및 이를 이용한 기판 처리시스템
KR100909494B1 (ko) * 2006-05-11 2009-07-27 도쿄엘렉트론가부시키가이샤 처리장치
KR100832772B1 (ko) * 2006-05-22 2008-05-27 주식회사 나온테크 반도체이송장비
JP4606388B2 (ja) * 2006-06-12 2011-01-05 川崎重工業株式会社 基板移載装置の搬送系ユニット
JP2008032335A (ja) * 2006-07-31 2008-02-14 Hitachi High-Technologies Corp ミニエンバイロメント装置、検査装置、製造装置、及び空間の清浄化方法
US9117859B2 (en) 2006-08-31 2015-08-25 Brooks Automation, Inc. Compact processing apparatus
TWI475627B (zh) 2007-05-17 2015-03-01 Brooks Automation Inc 基板運送機、基板處理裝置和系統、於基板處理期間降低基板之微粒污染的方法,及使運送機與處理機結合之方法
KR20100020968A (ko) * 2007-05-17 2010-02-23 브룩스 오토메이션 인코퍼레이티드 측면 개방형 기판 캐리어 및 로드 포트
TWD126122S1 (zh) * 2007-06-06 2008-11-21 東京威力科創股份有限公司 晶圓保持具
TWD126123S1 (zh) * 2007-06-06 2008-11-21 東京威力科創股份有限公司 晶圓保持具
US7976263B2 (en) * 2007-09-22 2011-07-12 David Barker Integrated wafer transfer mechanism
US8277165B2 (en) * 2007-09-22 2012-10-02 Dynamic Micro System Semiconductor Equipment GmbH Transfer mechanism with multiple wafer handling capability
WO2009066573A1 (ja) * 2007-11-21 2009-05-28 Kabushiki Kaisha Yaskawa Denki 搬送ロボット、それを備えた局所クリーン化された筐体、及びそれを備えた半導体製造装置
KR100916538B1 (ko) * 2007-12-12 2009-09-11 코리아테크노(주) 멀티 소터의 웨이퍼 핸들링장치
JP4909919B2 (ja) * 2008-02-20 2012-04-04 株式会社日立ハイテクコントロールシステムズ ウェーハ搬送装置
US8757026B2 (en) 2008-04-15 2014-06-24 Dynamic Micro Systems, Semiconductor Equipment Gmbh Clean transfer robot
WO2009130793A1 (ja) * 2008-04-25 2009-10-29 株式会社アドバンテスト 試験システムおよびプローブ装置
US8287648B2 (en) * 2009-02-09 2012-10-16 Asm America, Inc. Method and apparatus for minimizing contamination in semiconductor processing chamber
US8882433B2 (en) 2009-05-18 2014-11-11 Brooks Automation, Inc. Integrated systems for interfacing with substrate container storage systems
JP2011003864A (ja) * 2009-06-22 2011-01-06 Tokyo Electron Ltd 基板搬送装置、基板搬送方法、塗布、現像装置及び記憶媒体
TWD143036S1 (zh) * 2010-06-01 2011-10-01 日立國際電氣股份有限公司 半導體製造機
USD652395S1 (en) * 2010-06-01 2012-01-17 Hitachi Kokusai Electric Inc. Semiconductor manufacturing equipment
US20120136472A1 (en) * 2010-11-25 2012-05-31 Li Yan-Ze Dual-arm type robotic arm and its method of transporting panels
US9431282B2 (en) * 2011-12-27 2016-08-30 Rudolph Technologies, Inc. Wafer inversion mechanism
JP5920626B2 (ja) * 2012-08-20 2016-05-18 Tdk株式会社 ロードポート装置
JP5920627B2 (ja) * 2012-08-29 2016-05-18 Tdk株式会社 ロードポート装置
US9335347B2 (en) * 2012-09-10 2016-05-10 Advantest Corporation Method and apparatus for massively parallel multi-wafer test
US9545724B2 (en) 2013-03-14 2017-01-17 Brooks Automation, Inc. Tray engine with slide attached to an end effector base
CN103496590A (zh) * 2013-10-14 2014-01-08 吴江市博众精工科技有限公司 一种吸料机构
JP6190692B2 (ja) * 2013-10-22 2017-08-30 日本電産サンキョー株式会社 産業用ロボット
JP6349750B2 (ja) * 2014-01-31 2018-07-04 シンフォニアテクノロジー株式会社 Efem
KR20230104993A (ko) * 2014-01-17 2023-07-11 브룩스 오토메이션 인코퍼레이티드 기판 이송 장치
US9505245B2 (en) * 2014-06-17 2016-11-29 Kateeva, Inc. Printing system assemblies and methods
US12251946B2 (en) 2014-06-17 2025-03-18 Kateeva, Inc. Printing system assemblies and methods
JP6215785B2 (ja) * 2014-06-30 2017-10-18 ファナック株式会社 ワーク搬送システム
JP6451453B2 (ja) * 2015-03-31 2019-01-16 Tdk株式会社 ガスパージ装置、ロードポート装置、パージ対象容器の設置台およびガスパージ方法
KR102587203B1 (ko) 2015-07-13 2023-10-10 브룩스 오토메이션 인코퍼레이티드 온 더 플라이 자동 웨이퍼 센터링 방법 및 장치
US10748799B2 (en) 2015-07-13 2020-08-18 Brooks Automation, Inc. Substrate transport apparatus with interchangeable motor modules
US9961782B2 (en) 2016-07-08 2018-05-01 Kateeva, Inc. Transport path correction techniques and related systems, methods and devices
US10607879B2 (en) 2016-09-08 2020-03-31 Brooks Automation, Inc. Substrate processing apparatus
US10541165B2 (en) 2016-11-10 2020-01-21 Applied Materials, Inc. Systems, apparatus, and methods for an improved load port backplane
CN118538644A (zh) * 2017-03-15 2024-08-23 朗姆研究公司 采用线性真空传送模块减少占用面积平台架构
US10566216B2 (en) * 2017-06-09 2020-02-18 Lam Research Corporation Equipment front end module gas recirculation
US10903107B2 (en) 2017-07-11 2021-01-26 Brooks Automation, Inc. Semiconductor process transport apparatus comprising an adapter pendant
US10861723B2 (en) 2017-08-08 2020-12-08 Taiwan Semiconductor Manufacturing Co., Ltd. EFEM robot auto teaching methodology
DE102018100003B4 (de) 2017-08-08 2020-03-12 Taiwan Semiconductor Manufacturing Co., Ltd. Methodologie zum automatischen Anlernen eines EFEM-Roboters
US11088004B2 (en) 2018-01-30 2021-08-10 Brooks Automation, Inc. Automatic wafer centering method and apparatus
TWI815869B (zh) 2018-03-16 2023-09-21 美商布魯克斯自動機械美國公司 基板輸送裝置及用於基板輸送裝置之方法
US11194259B2 (en) * 2018-08-30 2021-12-07 Taiwan Semiconductor Manufacturing Co., Ltd. Equipment module with enhanced protection from airborne contaminants, and method of operation
CN111375558B (zh) * 2018-12-29 2024-01-09 乐山希尔电子股份有限公司 一种耐压测试装置
US11276593B2 (en) 2019-07-22 2022-03-15 Rorze Automation, Inc. Systems and methods for horizontal wafer packaging
JP7719781B2 (ja) * 2020-01-23 2025-08-06 ラム リサーチ コーポレーション 自動回転プリアライメントを用いたエッジリング搬送
JP7579657B2 (ja) * 2020-09-07 2024-11-08 株式会社Screenホールディングス 基板搬送装置および基板搬送方法
TW202249142A (zh) * 2021-02-25 2022-12-16 日商東京威力科創股份有限公司 基板搬送機構及基板搬送方法
US11735455B2 (en) 2021-03-12 2023-08-22 Taiwan Semiconductor Manufacturing Company, Ltd. Systems, devices, and methods for air flow optimization including adjacent a FOUP
TWI871032B (zh) * 2022-09-30 2025-01-21 日商芝浦機械電子裝置股份有限公司 卡盤機構及成膜裝置
US20250069926A1 (en) * 2023-08-22 2025-02-27 Applied Materials, Inc. Integrated substrate processing system with advanced substrate handling robot

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20010013423A (ko) * 1997-06-04 2001-02-26 조셉 제이. 스위니 원형콘베이어의 웨이퍼 이송 시스템
KR20010029808A (ko) * 1999-06-16 2001-04-16 히가시 데쓰로 성막방법 및 막 형성 시스템

Family Cites Families (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4770590A (en) * 1986-05-16 1988-09-13 Silicon Valley Group, Inc. Method and apparatus for transferring wafers between cassettes and a boat
JP2839265B2 (ja) * 1988-08-11 1998-12-16 ファナック 株式会社 水平関節形ロボット
US5135349A (en) * 1990-05-17 1992-08-04 Cybeq Systems, Inc. Robotic handling system
JP2867194B2 (ja) 1992-02-05 1999-03-08 東京エレクトロン株式会社 処理装置及び処理方法
JP3030160B2 (ja) 1992-04-28 2000-04-10 東京エレクトロン株式会社 真空処理装置
KR940006241A (ko) 1992-06-05 1994-03-23 이노우에 아키라 기판이재장치 및 이재방법
JP2913439B2 (ja) * 1993-03-18 1999-06-28 東京エレクトロン株式会社 移載装置及び移載方法
US5849602A (en) * 1995-01-13 1998-12-15 Tokyo Electron Limited Resist processing process
US5667353A (en) * 1995-03-31 1997-09-16 Inspex Inc. Robot system
US5794487A (en) * 1995-07-10 1998-08-18 Smart Machines Drive system for a robotic arm
TW317644B (enExample) * 1996-01-26 1997-10-11 Tokyo Electron Co Ltd
US6091498A (en) 1996-07-15 2000-07-18 Semitool, Inc. Semiconductor processing apparatus having lift and tilt mechanism
US6099643A (en) * 1996-12-26 2000-08-08 Dainippon Screen Mfg. Co., Ltd. Apparatus for processing a substrate providing an efficient arrangement and atmospheric isolation of chemical treatment section
US6138721A (en) 1997-09-03 2000-10-31 Asyst Technologies, Inc. Tilt and go load port interface alignment system
US6002840A (en) * 1997-09-30 1999-12-14 Brooks Automation Inc. Substrate transport apparatus
WO1999028952A2 (en) 1997-11-28 1999-06-10 Fortrend Engineering Corporation Wafer-mapping load port interface
JPH11220001A (ja) 1998-01-30 1999-08-10 Hitachi Ltd 半導体基板処理装置におけるロードポート及びロードポート搬送台車
US6155768A (en) 1998-01-30 2000-12-05 Kensington Laboratories, Inc. Multiple link robot arm system implemented with offset end effectors to provide extended reach and enhanced throughput
FR2778496B1 (fr) 1998-05-05 2002-04-19 Recif Sa Procede et dispositif de changement de position d'une plaque de semi-conducteur
US6142722A (en) 1998-06-17 2000-11-07 Genmark Automation, Inc. Automated opening and closing of ultra clean storage containers
US6220808B1 (en) 1998-07-13 2001-04-24 Asyst Technologies, Inc. Ergonomic, variable size, bottom opening system compatible with a vertical interface
US6281516B1 (en) 1998-07-13 2001-08-28 Newport Corporation FIMS transport box load interface
US6261044B1 (en) 1998-08-06 2001-07-17 Asyst Technologies, Inc. Pod to port door retention and evacuation system
US6188323B1 (en) 1998-10-15 2001-02-13 Asyst Technologies, Inc. Wafer mapping system
JP2001031211A (ja) 1999-07-26 2001-02-06 Murata Mach Ltd 搬送システム
JP4248695B2 (ja) * 1999-07-26 2009-04-02 東京エレクトロン株式会社 ウェハ移載装置の緊急停止装置
WO2001010756A1 (en) 1999-08-11 2001-02-15 Multilevel Metals, Inc. Load lock system for foups
US6305500B1 (en) 1999-08-25 2001-10-23 Maxtor Corporation Material delivery system for clean room-like environments
US7147424B2 (en) * 2000-07-07 2006-12-12 Applied Materials, Inc. Automatic door opener
US6327517B1 (en) * 2000-07-27 2001-12-04 Applied Materials, Inc. Apparatus for on-the-fly center finding and notch aligning for wafer handling robots
US20030031538A1 (en) * 2001-06-30 2003-02-13 Applied Materials, Inc. Datum plate for use in installations of substrate handling systems

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20010013423A (ko) * 1997-06-04 2001-02-26 조셉 제이. 스위니 원형콘베이어의 웨이퍼 이송 시스템
KR20010029808A (ko) * 1999-06-16 2001-04-16 히가시 데쓰로 성막방법 및 막 형성 시스템

Also Published As

Publication number Publication date
DE10297171T5 (de) 2004-07-29
KR20040041157A (ko) 2004-05-14
JP2005527966A (ja) 2005-09-15
CN1329948C (zh) 2007-08-01
US20060120833A1 (en) 2006-06-08
US7648327B2 (en) 2010-01-19
TW579538B (en) 2004-03-11
CN1561536A (zh) 2005-01-05
JP4287271B2 (ja) 2009-07-01
WO2003021645A2 (en) 2003-03-13
WO2003021645A3 (en) 2003-07-24
US7066707B1 (en) 2006-06-27

Similar Documents

Publication Publication Date Title
KR100800613B1 (ko) 웨이퍼 엔진
KR100800612B1 (ko) 반도체 재료 처리 시스템
KR100809107B1 (ko) 반도체 재료 처리 시스템용 통합 프레임
CN1996552B (zh) 晶片机
US7419346B2 (en) Integrated system for tool front-end workpiece handling
KR100562542B1 (ko) 모듈형 선별기
US9943969B2 (en) Clean transfer robot
JP5758628B2 (ja) 一体化されたウェハ受渡し機構
JP2005510055A (ja) マイクロエレクトロニクス基板の自動処理用の低減フットプリントツール
TW579564B (en) Unified frame, system for transferring semiconductor wafers and related substrate objects, and system for transporting wafers

Legal Events

Date Code Title Description
PA0105 International application

Patent event date: 20040228

Patent event code: PA01051R01D

Comment text: International Patent Application

PG1501 Laying open of application
A201 Request for examination
PA0201 Request for examination

Patent event code: PA02012R01D

Patent event date: 20061226

Comment text: Request for Examination of Application

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

Patent event code: PE07011S01D

Comment text: Decision to Grant Registration

Patent event date: 20071121

GRNT Written decision to grant
PR0701 Registration of establishment

Comment text: Registration of Establishment

Patent event date: 20080128

Patent event code: PR07011E01D

PR1002 Payment of registration fee

Payment date: 20080129

End annual number: 3

Start annual number: 1

PG1601 Publication of registration
PR1001 Payment of annual fee

Payment date: 20101229

Start annual number: 4

End annual number: 4

PR1001 Payment of annual fee

Payment date: 20111228

Start annual number: 5

End annual number: 5

FPAY Annual fee payment

Payment date: 20121227

Year of fee payment: 6

PR1001 Payment of annual fee

Payment date: 20121227

Start annual number: 6

End annual number: 6

FPAY Annual fee payment

Payment date: 20131125

Year of fee payment: 7

PR1001 Payment of annual fee

Payment date: 20131125

Start annual number: 7

End annual number: 7

FPAY Annual fee payment

Payment date: 20141127

Year of fee payment: 8

PR1001 Payment of annual fee

Payment date: 20141127

Start annual number: 8

End annual number: 8

FPAY Annual fee payment

Payment date: 20151217

Year of fee payment: 9

PR1001 Payment of annual fee

Payment date: 20151217

Start annual number: 9

End annual number: 9

FPAY Annual fee payment

Payment date: 20161125

Year of fee payment: 10

PR1001 Payment of annual fee

Payment date: 20161125

Start annual number: 10

End annual number: 10

FPAY Annual fee payment

Payment date: 20171222

Year of fee payment: 11

PR1001 Payment of annual fee

Payment date: 20171222

Start annual number: 11

End annual number: 11

FPAY Annual fee payment

Payment date: 20181218

Year of fee payment: 12

PR1001 Payment of annual fee

Payment date: 20181218

Start annual number: 12

End annual number: 12

FPAY Annual fee payment

Payment date: 20191210

Year of fee payment: 13

PR1001 Payment of annual fee

Payment date: 20191210

Start annual number: 13

End annual number: 13

PR1001 Payment of annual fee

Payment date: 20201208

Start annual number: 14

End annual number: 14

PR1001 Payment of annual fee

Payment date: 20211209

Start annual number: 15

End annual number: 15

PC1801 Expiration of term

Termination date: 20230227

Termination category: Expiration of duration