KR100777468B1 - 유전체, 압전 부재, 잉크 제트 헤드, 잉크 제트 기록 장치 및 유전체의 제조 방법 - Google Patents

유전체, 압전 부재, 잉크 제트 헤드, 잉크 제트 기록 장치 및 유전체의 제조 방법 Download PDF

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KR100777468B1
KR100777468B1 KR20050025275A KR20050025275A KR100777468B1 KR 100777468 B1 KR100777468 B1 KR 100777468B1 KR 20050025275 A KR20050025275 A KR 20050025275A KR 20050025275 A KR20050025275 A KR 20050025275A KR 100777468 B1 KR100777468 B1 KR 100777468B1
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South Korea
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layer
dielectric
substrate
forming
ink jet
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Expired - Fee Related
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Korean (ko)
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KR20060044810A (ko
Inventor
겐이찌 다께다
도시히로 이후꾸
데쯔로오 후꾸이
히로시 후나꾸보
쇼오지 오까모또
Original Assignee
캐논 가부시끼가이샤
히로시 후나꾸보
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00—Piezoelectric or electrostrictive devices
    • H10N30/80—Constructional details
    • H10N30/87—Electrodes or interconnections, e.g. leads or terminals
    • H10N30/877—Conductive materials
    • H10N30/878—Conductive materials the principal material being non-metallic, e.g. oxide or carbon based
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00—Piezoelectric or electrostrictive devices
    • H10N30/01—Manufacture or treatment
    • H10N30/06—Forming electrodes or interconnections, e.g. leads or terminals
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00—Piezoelectric or electrostrictive devices
    • H10N30/01—Manufacture or treatment
    • H10N30/07—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base
    • H10N30/074—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base by depositing piezoelectric or electrostrictive layers, e.g. aerosol or screen printing
    • H10N30/076—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base by depositing piezoelectric or electrostrictive layers, e.g. aerosol or screen printing by vapour phase deposition
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00—Piezoelectric or electrostrictive devices
    • H10N30/80—Constructional details
    • H10N30/85—Piezoelectric or electrostrictive active materials
    • H10N30/853—Ceramic compositions
    • H10N30/8548—Lead-based oxides
    • H10N30/8554—Lead-zirconium titanate [PZT] based
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00—Piezoelectric or electrostrictive devices
    • H10N30/20—Piezoelectric or electrostrictive devices with electrical input and mechanical output, e.g. functioning as actuators or vibrators
    • H10N30/204—Piezoelectric or electrostrictive devices with electrical input and mechanical output, e.g. functioning as actuators or vibrators using bending displacement, e.g. unimorph, bimorph or multimorph cantilever or membrane benders
    • H10N30/2047—Membrane type

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Particle Formation And Scattering Control In Inkjet Printers (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
  • Ceramic Capacitors (AREA)
  • Semiconductor Memories (AREA)
KR20050025275A 2004-03-29 2005-03-28 유전체, 압전 부재, 잉크 제트 헤드, 잉크 제트 기록 장치 및 유전체의 제조 방법 Expired - Fee Related KR100777468B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2004-00094597 2004-03-29
JP2004094597 2004-03-29

Publications (2)

Publication Number Publication Date
KR20060044810A KR20060044810A (ko) 2006-05-16
KR100777468B1 true KR100777468B1 (ko) 2007-11-20

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KR20050025275A Expired - Fee Related KR100777468B1 (ko) 2004-03-29 2005-03-28 유전체, 압전 부재, 잉크 제트 헤드, 잉크 제트 기록 장치 및 유전체의 제조 방법

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Country Link
US (1) US7265483B2 (enExample)
EP (1) EP1585180B1 (enExample)
JP (2) JP2005313628A (enExample)
KR (1) KR100777468B1 (enExample)
CN (1) CN100418768C (enExample)
DE (1) DE602005024208D1 (enExample)
TW (1) TWI253392B (enExample)

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JP5743059B2 (ja) * 2011-01-19 2015-07-01 セイコーエプソン株式会社 液体噴射ヘッド、液体噴射装置、圧電素子、超音波センサー及び赤外線センサー
JP5743060B2 (ja) * 2011-01-19 2015-07-01 セイコーエプソン株式会社 液体噴射ヘッド、液体噴射装置、圧電素子、超音波センサー及び赤外線センサー
JP6020784B2 (ja) * 2011-01-19 2016-11-02 セイコーエプソン株式会社 圧電素子、液体噴射ヘッド、液体噴射装置、超音波デバイス及びセンサー
CN102136315B (zh) * 2011-03-21 2012-08-15 四川师范大学 多层陶瓷全面积LNO/Ag/LNO复合电极及制备方法
WO2013018603A1 (ja) * 2011-07-29 2013-02-07 株式会社村田製作所 弾性波デバイスの製造方法
JP5836754B2 (ja) * 2011-10-04 2015-12-24 富士フイルム株式会社 圧電体素子及びその製造方法
US8866367B2 (en) 2011-10-17 2014-10-21 The United States Of America As Represented By The Secretary Of The Army Thermally oxidized seed layers for the production of {001} textured electrodes and PZT devices and method of making
US9761785B2 (en) 2011-10-17 2017-09-12 The United States Of America As Represented By The Secretary Of The Army Stylo-epitaxial piezoelectric and ferroelectric devices and method of manufacturing
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TW200602195A (en) 2006-01-16
JP2011192975A (ja) 2011-09-29
EP1585180A2 (en) 2005-10-12
US20050213020A1 (en) 2005-09-29
JP2005313628A (ja) 2005-11-10
CN100418768C (zh) 2008-09-17
EP1585180B1 (en) 2010-10-20
KR20060044810A (ko) 2006-05-16
TWI253392B (en) 2006-04-21
EP1585180A3 (en) 2007-10-03
CN1676331A (zh) 2005-10-05
DE602005024208D1 (de) 2010-12-02
US7265483B2 (en) 2007-09-04

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