KR100726016B1 - 기판 회전 장치 - Google Patents

기판 회전 장치 Download PDF

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Publication number
KR100726016B1
KR100726016B1 KR1020000041397A KR20000041397A KR100726016B1 KR 100726016 B1 KR100726016 B1 KR 100726016B1 KR 1020000041397 A KR1020000041397 A KR 1020000041397A KR 20000041397 A KR20000041397 A KR 20000041397A KR 100726016 B1 KR100726016 B1 KR 100726016B1
Authority
KR
South Korea
Prior art keywords
rotor
magnetic bearing
stator side
side component
magnetic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1020000041397A
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English (en)
Korean (ko)
Other versions
KR20010029971A (ko
Inventor
시노자키히로유키
Original Assignee
가부시키가이샤 에바라 세이사꾸쇼
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 가부시키가이샤 에바라 세이사꾸쇼 filed Critical 가부시키가이샤 에바라 세이사꾸쇼
Publication of KR20010029971A publication Critical patent/KR20010029971A/ko
Application granted granted Critical
Publication of KR100726016B1 publication Critical patent/KR100726016B1/ko
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/76—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches
    • H10P72/7604—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches the wafers being placed on a susceptor, stage or support
    • H10P72/7626—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches the wafers being placed on a susceptor, stage or support characterised by the construction of the shaft
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C32/00—Bearings not otherwise provided for
    • F16C32/04—Bearings not otherwise provided for using magnetic or electric supporting means
    • F16C32/0406—Magnetic bearings
    • F16C32/044—Active magnetic bearings
    • F16C32/047—Details of housings; Mounting of active magnetic bearings
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C2300/00—Application independent of particular apparatuses
    • F16C2300/40—Application independent of particular apparatuses related to environment, i.e. operating conditions
    • F16C2300/42—Application independent of particular apparatuses related to environment, i.e. operating conditions corrosive, i.e. with aggressive media or harsh conditions
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C2300/00—Application independent of particular apparatuses
    • F16C2300/40—Application independent of particular apparatuses related to environment, i.e. operating conditions
    • F16C2300/62—Application independent of particular apparatuses related to environment, i.e. operating conditions low pressure, e.g. elements operating under vacuum conditions

Landscapes

  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Magnetic Bearings And Hydrostatic Bearings (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
KR1020000041397A 1999-07-19 2000-07-19 기판 회전 장치 Expired - Fee Related KR100726016B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP11-205374 1999-07-19
JP20537499 1999-07-19
JP11-369558 1999-12-27
JP36955899A JP3923696B2 (ja) 1999-07-19 1999-12-27 基板回転装置

Publications (2)

Publication Number Publication Date
KR20010029971A KR20010029971A (ko) 2001-04-16
KR100726016B1 true KR100726016B1 (ko) 2007-06-08

Family

ID=26515036

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020000041397A Expired - Fee Related KR100726016B1 (ko) 1999-07-19 2000-07-19 기판 회전 장치

Country Status (6)

Country Link
US (1) US6373159B1 (https=)
EP (1) EP1071118B1 (https=)
JP (1) JP3923696B2 (https=)
KR (1) KR100726016B1 (https=)
DE (1) DE60040320D1 (https=)
TW (1) TW517277B (https=)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101831375B1 (ko) 2013-07-17 2018-02-22 어플라이드 머티어리얼스, 인코포레이티드 기판 이동을 위한 위치 설정 장치
WO2023113262A1 (ko) * 2021-12-16 2023-06-22 에이피시스템 주식회사 자기부상 회전 장치 및 자기부상 회전 방법

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001182746A (ja) * 1999-12-27 2001-07-06 Ebara Corp 磁気軸受装置
DE20006302U1 (de) * 2000-04-06 2001-10-25 Band-Zink-GmbH, 40764 Langenfeld Beschichtungsvorrichtung
JP2002093724A (ja) * 2000-09-18 2002-03-29 Tokyo Electron Ltd 熱処理装置
JP2002212729A (ja) * 2001-01-17 2002-07-31 Hitachi Kokusai Electric Inc 基板処理装置および半導体装置の製造方法
US6770146B2 (en) * 2001-02-02 2004-08-03 Mattson Technology, Inc. Method and system for rotating a semiconductor wafer in processing chambers
DE50212020D1 (de) * 2001-05-29 2008-05-15 Aixtron Ag Aus einem tragkörper und darauf gasgelagerten und drehangetriebenen substrathalter bestehende anordnung
US6876122B2 (en) * 2002-09-16 2005-04-05 Lockheed Martin Corporation Circular rail linear induction motor
KR100439276B1 (ko) * 2003-11-24 2004-07-30 코닉 시스템 주식회사 급속열처리 장치
JP2006179613A (ja) * 2004-12-21 2006-07-06 Rigaku Corp 半導体ウエハ縦型熱処理装置用磁性流体シールユニット
DE102005032184A1 (de) * 2005-07-09 2007-01-18 Saurer Gmbh & Co. Kg Verfahren zum Betreiben eines elektromotorischen Antriebs
JP4885000B2 (ja) * 2007-02-13 2012-02-29 株式会社ニューフレアテクノロジー 気相成長装置および気相成長方法
JP5416104B2 (ja) 2007-06-27 2014-02-12 ブルックス オートメーション インコーポレイテッド セルフベアリングモータ用位置フィードバック
WO2009012396A2 (en) * 2007-07-17 2009-01-22 Brooks Automation, Inc. Substrate processing apparatus with motors integral to chamber walls
KR101958874B1 (ko) 2008-06-04 2019-03-15 가부시키가이샤 에바라 세이사꾸쇼 기판처리장치, 기판처리방법, 기판 파지기구, 및 기판 파지방법
JP5533335B2 (ja) * 2009-07-22 2014-06-25 東京エレクトロン株式会社 処理装置及びその動作方法
KR101288483B1 (ko) * 2010-04-21 2013-07-26 주성엔지니어링(주) 기판 처리장치
KR101312962B1 (ko) * 2011-09-07 2013-10-01 스미도모쥬기가이고교 가부시키가이샤 반송장치
WO2014054034A2 (en) * 2012-10-05 2014-04-10 Koninklijke Philips N.V. Rotary positioning device
US9394938B2 (en) 2013-06-19 2016-07-19 Applied Materials, Inc. Internal chamber rotation motor, alternative rotation
JP6387863B2 (ja) * 2015-03-05 2018-09-12 株式会社島津製作所 磁気軸受装置
JP7055720B2 (ja) * 2018-08-10 2022-04-18 株式会社荏原製作所 基板回転装置、基板洗浄装置および基板処理装置ならびに基板回転装置の制御方法
CN109099065B (zh) * 2018-09-30 2020-02-18 珠海格力电器股份有限公司 焊接防护套和磁悬浮轴向轴承
EP4001681B1 (en) * 2019-07-19 2024-01-17 Iwaki Co., Ltd. Pump
CN115692300A (zh) * 2021-07-22 2023-02-03 北京北方华创微电子装备有限公司 半导体工艺设备
JP2024002304A (ja) * 2022-06-23 2024-01-11 東京エレクトロン株式会社 成膜装置
CN117005025B (zh) * 2023-09-01 2024-03-19 苏州中科重仪半导体材料有限公司 一种磁悬浮自转公转反应室装置
CN120020993B (zh) * 2023-11-20 2026-03-20 北京北方华创微电子装备有限公司 承载装置和半导体工艺腔室

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5072146A (en) * 1989-08-04 1991-12-10 The Glacier Metal Company Limited Magnetic bearings coil heat removal
WO1997015978A1 (en) * 1995-10-26 1997-05-01 Satcon Technology Corporation Integrated magnetic levitation and rotation system
US5630881A (en) * 1993-08-16 1997-05-20 Ebara Corporation Thin-film forming apparatus with magnetic bearings and a non-contact seal and drive

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2377549A1 (fr) 1977-01-12 1978-08-11 Europ Propulsion Montage de rotor court de grand diametre
US5471105A (en) * 1992-09-25 1995-11-28 Magnetic Bearing Technologies, Inc. Null flux magnetic bearing with cross-connected loop portions
TW331652B (en) 1995-06-16 1998-05-11 Ebara Corp Thin film vapor deposition apparatus
JPH0931656A (ja) 1995-07-24 1997-02-04 Ebara Corp 薄膜気相成長装置
US5965047A (en) 1997-10-24 1999-10-12 Steag Ast Rapid thermal processing (RTP) system with rotating substrate

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5072146A (en) * 1989-08-04 1991-12-10 The Glacier Metal Company Limited Magnetic bearings coil heat removal
US5630881A (en) * 1993-08-16 1997-05-20 Ebara Corporation Thin-film forming apparatus with magnetic bearings and a non-contact seal and drive
WO1997015978A1 (en) * 1995-10-26 1997-05-01 Satcon Technology Corporation Integrated magnetic levitation and rotation system

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101831375B1 (ko) 2013-07-17 2018-02-22 어플라이드 머티어리얼스, 인코포레이티드 기판 이동을 위한 위치 설정 장치
WO2023113262A1 (ko) * 2021-12-16 2023-06-22 에이피시스템 주식회사 자기부상 회전 장치 및 자기부상 회전 방법
KR20230091507A (ko) * 2021-12-16 2023-06-23 에이피시스템 주식회사 자기부상 회전 장치 및 자기부상 회전 방법
KR102766145B1 (ko) 2021-12-16 2025-02-12 에이피시스템 주식회사 자기부상 회전 장치 및 자기부상 회전 방법

Also Published As

Publication number Publication date
JP2001093967A (ja) 2001-04-06
JP3923696B2 (ja) 2007-06-06
DE60040320D1 (de) 2008-11-06
TW517277B (en) 2003-01-11
KR20010029971A (ko) 2001-04-16
EP1071118B1 (en) 2008-09-24
US6373159B1 (en) 2002-04-16
EP1071118A2 (en) 2001-01-24
EP1071118A3 (en) 2005-10-26

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