KR100716485B1 - 불투명 석영유리의 제조 방법, 이 방법을 실행하기에적합한 ｓｉｏ2 과립재료 및 불투명 석영유리로 이루어진물품 - Google Patents

불투명 석영유리의 제조 방법, 이 방법을 실행하기에적합한 ｓｉｏ2 과립재료 및 불투명 석영유리로 이루어진물품 Download PDF

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KR100716485B1
KR100716485B1 KR1020027008182A KR20027008182A KR100716485B1 KR 100716485 B1 KR100716485 B1 KR 100716485B1 KR 1020027008182 A KR1020027008182 A KR 1020027008182A KR 20027008182 A KR20027008182 A KR 20027008182A KR 100716485 B1 KR100716485 B1 KR 100716485B1
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South Korea
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sio
quartz glass
granules
delete delete
opaque quartz
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Korean (ko)
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KR20020066333A (ko
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베르덱커발트라우트
파비안하인쯔
게르티그우도
라이스트요한
괴벨롤프
Original Assignee
헤래우스 크바르츠글라스 게엠베하 ＆ 컴파니 케이지
신에쯔 세끼에이 가부시키가이샤
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Assigned to 헤래우스 크바르츠글라스 게엠베하 ＆ 컴파니 케이지 reassignment 헤래우스 크바르츠글라스 게엠베하 ＆ 컴파니 케이지 권리지분의 전부이전등록 Assignors: 신에쯔 세끼에이 가부시키가이샤
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    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B20/00—Processes specially adapted for the production of quartz or fused silica articles, not otherwise provided for
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C1/00—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
    • C03C1/02—Pretreated ingredients
    • C03C1/026—Pelletisation or prereacting of powdered raw materials
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/10—Forming beads
    • C03B19/1005—Forming solid beads
    • C03B19/106—Forming solid beads by chemical vapour deposition; by liquid phase reaction
    • C03B19/1065—Forming solid beads by chemical vapour deposition; by liquid phase reaction by liquid phase reactions, e.g. by means of a gel phase
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/02—Pure silica glass, e.g. pure fused quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
    • C03C2201/24—Doped silica-based glasses containing non-metals other than boron or halide containing nitrogen, e.g. silicon oxy-nitride glasses
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
    • C03C2201/26—Doped silica-based glasses containing non-metals other than boron or halide containing carbon
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/30—Doped silica-based glasses containing metals
    • C03C2201/32—Doped silica-based glasses containing metals containing aluminium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/80—Glass compositions containing bubbles or microbubbles, e.g. opaque quartz glass
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/10—Melting processes
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/50—After-treatment
    • C03C2203/52—Heat-treatment
    • C03C2203/54—Heat-treatment in a dopant containing atmosphere

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Geochemistry & Mineralogy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Dispersion Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Silicon Compounds (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Glass Compositions (AREA)
KR1020027008182A 1999-12-22 2000-12-14 불투명 석영유리의 제조 방법, 이 방법을 실행하기에적합한 ｓｉｏ2 과립재료 및 불투명 석영유리로 이루어진물품 Expired - Lifetime KR100716485B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE19962451A DE19962451C1 (de) 1999-12-22 1999-12-22 Verfahren für die Herstellung von opakem Quarzglas und für die Durchführung des Verfahrens geeignetes Si0¶2¶-Granulat
DE19962451.8 1999-12-22
PCT/EP2000/012687 WO2001046079A1 (de) 1999-12-22 2000-12-14 VERFAHREN FÜR DIE HERSTELLUNG VON OPAKEM QUARZGLAS, FÜR DIE DURCHFÜHRUNG DES VERFAHRENS GEEIGNETES SiO2-GRANULAT UND BAUTEIL AUS OPAKEM QUARZGLAS

Publications (2)

Publication Number Publication Date
KR20020066333A KR20020066333A (ko) 2002-08-14
KR100716485B1 true KR100716485B1 (ko) 2007-05-10

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KR1020027008182A Expired - Lifetime KR100716485B1 (ko) 1999-12-22 2000-12-14 불투명 석영유리의 제조 방법, 이 방법을 실행하기에적합한 ｓｉｏ2 과립재료 및 불투명 석영유리로 이루어진물품

Country Status (9)

Country Link
US (1) US6380110B1 (https=)
EP (1) EP1240114B1 (https=)
JP (1) JP4681189B2 (https=)
KR (1) KR100716485B1 (https=)
CN (1) CN1200896C (https=)
CA (1) CA2395501A1 (https=)
DE (2) DE19962451C1 (https=)
TW (1) TW548246B (https=)
WO (1) WO2001046079A1 (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3248950A1 (de) * 2016-05-24 2017-11-29 Heraeus Quarzglas GmbH & Co. KG Verfahren zur herstellung eines poren enthaltenden, opaken quarzglases

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DE10019693B4 (de) * 2000-04-20 2006-01-19 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Herstellung eines Bauteils aus opakem, synthetischen Quarzglas, nach dem Verfahren hergestelltes Quarzglasrohr, sowie Verwendung desselben
DE10020955A1 (de) * 2000-04-28 2001-11-22 Fraunhofer Ges Forschung Formkörper und Verfahren zur Herstellung
DE10055362C1 (de) * 2000-11-08 2002-01-24 Heraeus Quarzglas Verfahren zur Herstellung eines SiO¶2¶-Rohlings und Vorrichtung zur Durchführung des Verfahrens
DE10055357C1 (de) * 2000-11-08 2002-08-14 Heraeus Quarzglas Verfahren und Vorrichtung zur Herstellung eines SiO¶2¶-Rohlings
DE10159959A1 (de) * 2001-12-06 2003-06-26 Heraeus Quarzglas Quarzglasrohling für ein optisches Bauteil und Verwendung desselben
DE10243953B4 (de) * 2002-09-21 2005-11-17 Heraeus Quarzglas Gmbh & Co. Kg Verfahren für die Herstellung eines Bauteils aus opakem Quarzglas
EP1580170B1 (en) * 2002-11-29 2019-01-16 Heraeus Quarzglas GmbH & Co. KG Method for producing synthetic quartz glass and synthetic quartz glass article
US7637126B2 (en) * 2003-12-08 2009-12-29 Heraeus Quarzglas Gmbh & Co. Kg Method for the production of laser-active quartz glass and use thereof
DE102004038602B3 (de) * 2004-08-07 2005-12-29 Heraeus Quarzglas Gmbh & Co. Kg Elektrogeschmolzenes, synthetisches Quarzglas, insbesondere für den Einsatz in der Lampen- und in der Halbleiterfertigung und Verfahren zur Herstellung desselben
DE102004052312A1 (de) * 2004-08-23 2006-03-02 Heraeus Quarzglas Gmbh & Co. Kg Beschichtetes Bauteil aus Quarzglas sowie Verfahren zur Herstellung des Bauteils
DE102004051846B4 (de) * 2004-08-23 2009-11-05 Heraeus Quarzglas Gmbh & Co. Kg Bauteil mit einer Reflektorschicht sowie Verfahren für seine Herstellung
US7563512B2 (en) * 2004-08-23 2009-07-21 Heraeus Quarzglas Gmbh & Co. Kg Component with a reflector layer and method for producing the same
DE102006018711B4 (de) * 2006-04-20 2008-09-25 Heraeus Quarzglas Gmbh & Co. Kg Werkstoff, insbesondere für ein optisches Bauteil zum Einsatz in der Mikrolithographie und Verfahren zur Herstellung eines Formkörpers aus dem Werkstoff
US10843954B2 (en) * 2006-12-05 2020-11-24 Shin-Etsu Quartz Products Co., Ltd. Synthetic opaque quartz glass and method for producing the same
DE102007017004A1 (de) * 2007-02-27 2008-08-28 Heraeus Quarzglas Gmbh & Co. Kg Optisches Bauteil aus synthetischem Quarzglas mit erhöhter Strahlenbeständigkeit, sowie Verfahren zur Herstellung des Bauteils
JP5171098B2 (ja) * 2007-04-24 2013-03-27 岩崎電気株式会社 石英ガラス製品の製造方法、それに用いるシリカ顆粒とその生成方法
DE102009005446A1 (de) * 2009-01-21 2010-07-22 Schott Ag Granulat, Verfahren zu dessen Herstellung sowie dessen Verwendung
KR101246157B1 (ko) * 2010-12-09 2013-03-20 한국세라믹기술원 엔지니어드 스톤의 제조방법
TWI652240B (zh) * 2014-02-17 2019-03-01 日商東曹股份有限公司 不透明石英玻璃及其製造方法
EP3000790B2 (de) 2014-09-29 2023-07-26 Heraeus Quarzglas GmbH & Co. KG Verfahren für die Herstellung von Bauteilen aus synthetischem Quarzglas aus SiO2-Granulat
JP6558137B2 (ja) * 2015-08-07 2019-08-14 東ソー株式会社 不透明シリカガラス製造用の高強度成形体
KR20180095617A (ko) * 2015-12-18 2018-08-27 헤래우스 크바르츠글라스 게엠베하 ＆ 컴파니 케이지 스탠딩 소결 도가니에서 실리카 유리 제품의 제조
WO2017103160A1 (de) 2015-12-18 2017-06-22 Heraeus Quarzglas Gmbh & Co. Kg Herstellung von quarzglaskörpern aus siliziumdioxidgranulat
CN108698889A (zh) * 2015-12-18 2018-10-23 贺利氏石英玻璃有限两合公司 在悬挂式金属片坩埚中制备石英玻璃体
EP3390290B1 (de) 2015-12-18 2023-03-15 Heraeus Quarzglas GmbH & Co. KG Herstellung eines opaken quarzglaskörpers
WO2017103114A2 (de) * 2015-12-18 2017-06-22 Heraeus Quarzglas Gmbh & Co. Kg Herstellung eines quarzglaskörpers in einem hängenden sintertiegel
JP7044454B2 (ja) 2015-12-18 2022-03-30 ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー 石英ガラス調製時の中間体としての炭素ドープ二酸化ケイ素造粒体の調製
US10676388B2 (en) 2015-12-18 2020-06-09 Heraeus Quarzglas Gmbh & Co. Kg Glass fibers and pre-forms made of homogeneous quartz glass
US11952303B2 (en) 2015-12-18 2024-04-09 Heraeus Quarzglas Gmbh & Co. Kg Increase in silicon content in the preparation of quartz glass
TWI794149B (zh) 2015-12-18 2023-03-01 德商何瑞斯廓格拉斯公司 石英玻璃粉粒、不透明成型體及彼等之製備方法
CN108698894A (zh) 2015-12-18 2018-10-23 贺利氏石英玻璃有限两合公司 在多腔式烘箱中制备石英玻璃体
WO2017103115A2 (de) 2015-12-18 2017-06-22 Heraeus Quarzglas Gmbh & Co. Kg Herstellung eines quarzglaskörpers in einem schmelztiegel aus refraktärmetall
US11492282B2 (en) 2015-12-18 2022-11-08 Heraeus Quarzglas Gmbh & Co. Kg Preparation of quartz glass bodies with dew point monitoring in the melting oven
US11053152B2 (en) 2015-12-18 2021-07-06 Heraeus Quarzglas Gmbh & Co. Kg Spray granulation of silicon dioxide in the preparation of quartz glass
EP3185057A1 (de) * 2015-12-22 2017-06-28 Heraeus Quarzglas GmbH & Co. KG Faseroptische streueinrichtung und herstellungsverfahren dafür
JP6878829B2 (ja) * 2016-10-26 2021-06-02 東ソー株式会社 シリカ粉末及び高流動性シリカ造粒粉末並びにその製造方法
EP3476815B1 (en) 2017-10-27 2023-11-29 Heraeus Quarzglas GmbH & Co. KG Production of a porous product including post-adapting a pore structure

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US3532473A (en) 1965-04-29 1970-10-06 Degussa Process for producing a spherical granulated silica material
JPH07300341A (ja) * 1994-04-28 1995-11-14 Shinetsu Quartz Prod Co Ltd 不透明石英ガラスおよびその製造方法
US5643347A (en) 1994-07-11 1997-07-01 Heraeus Quarzglas Gmbh Process for manufacture of silica granules
EP0890555A1 (de) * 1997-07-10 1999-01-13 Heraeus Quarzglas GmbH Verfahren zur Herstellung von SiO2-Granulat

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JPH07138015A (ja) * 1993-06-15 1995-05-30 Catalysts & Chem Ind Co Ltd シリカ微小球状粒子およびその製造方法
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Publication number Priority date Publication date Assignee Title
US3532473A (en) 1965-04-29 1970-10-06 Degussa Process for producing a spherical granulated silica material
JPH07300341A (ja) * 1994-04-28 1995-11-14 Shinetsu Quartz Prod Co Ltd 不透明石英ガラスおよびその製造方法
US5643347A (en) 1994-07-11 1997-07-01 Heraeus Quarzglas Gmbh Process for manufacture of silica granules
EP0890555A1 (de) * 1997-07-10 1999-01-13 Heraeus Quarzglas GmbH Verfahren zur Herstellung von SiO2-Granulat

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3248950A1 (de) * 2016-05-24 2017-11-29 Heraeus Quarzglas GmbH & Co. KG Verfahren zur herstellung eines poren enthaltenden, opaken quarzglases
US10358373B2 (en) 2016-05-24 2019-07-23 Heraeus Quarzglas Gmbh & Co. Kg Method for producing a pore-containing opaque quartz glass

Also Published As

Publication number Publication date
DE19962451C1 (de) 2001-08-30
JP4681189B2 (ja) 2011-05-11
CA2395501A1 (en) 2001-06-28
US6380110B1 (en) 2002-04-30
TW548246B (en) 2003-08-21
KR20020066333A (ko) 2002-08-14
CN1200896C (zh) 2005-05-11
DE50011832D1 (de) 2006-01-12
EP1240114A1 (de) 2002-09-18
EP1240114B1 (de) 2005-12-07
JP2004500299A (ja) 2004-01-08
CN1413175A (zh) 2003-04-23
WO2001046079A1 (de) 2001-06-28

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