DE19962451C1 - Verfahren für die Herstellung von opakem Quarzglas und für die Durchführung des Verfahrens geeignetes Si0¶2¶-Granulat - Google Patents
Verfahren für die Herstellung von opakem Quarzglas und für die Durchführung des Verfahrens geeignetes Si0¶2¶-GranulatInfo
- Publication number
- DE19962451C1 DE19962451C1 DE19962451A DE19962451A DE19962451C1 DE 19962451 C1 DE19962451 C1 DE 19962451C1 DE 19962451 A DE19962451 A DE 19962451A DE 19962451 A DE19962451 A DE 19962451A DE 19962451 C1 DE19962451 C1 DE 19962451C1
- Authority
- DE
- Germany
- Prior art keywords
- sio
- granules
- density
- primary particles
- range
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000008187 granular material Substances 0.000 title claims abstract description 104
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 53
- 238000000034 method Methods 0.000 title claims abstract description 52
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 18
- 239000011164 primary particle Substances 0.000 claims abstract description 47
- 239000002245 particle Substances 0.000 claims abstract description 28
- 238000009826 distribution Methods 0.000 claims abstract description 15
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 81
- 238000000465 moulding Methods 0.000 claims description 16
- 238000007669 thermal treatment Methods 0.000 claims description 12
- 239000000460 chlorine Substances 0.000 claims description 8
- 238000010438 heat treatment Methods 0.000 claims description 8
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 7
- 229910052782 aluminium Inorganic materials 0.000 claims description 7
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 7
- 229910052801 chlorine Inorganic materials 0.000 claims description 7
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 6
- 238000005245 sintering Methods 0.000 claims description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 5
- 229910052799 carbon Inorganic materials 0.000 claims description 3
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 claims description 3
- 239000002344 surface layer Substances 0.000 claims description 3
- 238000010891 electric arc Methods 0.000 claims 1
- 239000011148 porous material Substances 0.000 abstract description 50
- 238000004031 devitrification Methods 0.000 abstract description 8
- 238000005469 granulation Methods 0.000 description 15
- 230000003179 granulation Effects 0.000 description 15
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 12
- 230000015572 biosynthetic process Effects 0.000 description 12
- 239000007921 spray Substances 0.000 description 12
- 230000007062 hydrolysis Effects 0.000 description 10
- 238000006460 hydrolysis reaction Methods 0.000 description 10
- 239000007789 gas Substances 0.000 description 9
- 239000010410 layer Substances 0.000 description 9
- 239000012535 impurity Substances 0.000 description 8
- 238000002156 mixing Methods 0.000 description 7
- 239000000843 powder Substances 0.000 description 7
- 229910052757 nitrogen Inorganic materials 0.000 description 6
- 150000003377 silicon compounds Chemical class 0.000 description 6
- 238000003980 solgel method Methods 0.000 description 6
- 230000005540 biological transmission Effects 0.000 description 5
- 230000001698 pyrogenic effect Effects 0.000 description 5
- 239000000654 additive Substances 0.000 description 4
- 230000000996 additive effect Effects 0.000 description 4
- 229910021331 inorganic silicon compound Inorganic materials 0.000 description 4
- 238000002844 melting Methods 0.000 description 4
- 230000008018 melting Effects 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 230000003647 oxidation Effects 0.000 description 4
- 238000007254 oxidation reaction Methods 0.000 description 4
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 4
- 230000003595 spectral effect Effects 0.000 description 4
- 230000002776 aggregation Effects 0.000 description 3
- 229910052791 calcium Inorganic materials 0.000 description 3
- 229910052804 chromium Inorganic materials 0.000 description 3
- 238000005056 compaction Methods 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000002019 doping agent Substances 0.000 description 3
- 238000001125 extrusion Methods 0.000 description 3
- 238000009413 insulation Methods 0.000 description 3
- 229910052742 iron Inorganic materials 0.000 description 3
- 229910052744 lithium Inorganic materials 0.000 description 3
- 229910052749 magnesium Inorganic materials 0.000 description 3
- 229910052748 manganese Inorganic materials 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229910052700 potassium Inorganic materials 0.000 description 3
- 229910052708 sodium Inorganic materials 0.000 description 3
- 239000000725 suspension Substances 0.000 description 3
- 229910052719 titanium Inorganic materials 0.000 description 3
- 238000004017 vitrification Methods 0.000 description 3
- 238000005550 wet granulation Methods 0.000 description 3
- 229910052726 zirconium Inorganic materials 0.000 description 3
- 238000004438 BET method Methods 0.000 description 2
- 238000004220 aggregation Methods 0.000 description 2
- 239000007900 aqueous suspension Substances 0.000 description 2
- 150000001805 chlorine compounds Chemical class 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 239000000356 contaminant Substances 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229910002804 graphite Inorganic materials 0.000 description 2
- 239000010439 graphite Substances 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 238000012856 packing Methods 0.000 description 2
- 239000007858 starting material Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 229910003902 SiCl 4 Inorganic materials 0.000 description 1
- 238000005054 agglomeration Methods 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000000839 emulsion Substances 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 229910021485 fumed silica Inorganic materials 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- -1 heat shields Chemical compound 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 230000002250 progressing effect Effects 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B20/00—Processes specially adapted for the production of quartz or fused silica articles, not otherwise provided for
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C1/00—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
- C03C1/02—Pretreated ingredients
- C03C1/026—Pelletisation or prereacting of powdered raw materials
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/10—Forming beads
- C03B19/1005—Forming solid beads
- C03B19/106—Forming solid beads by chemical vapour deposition; by liquid phase reaction
- C03B19/1065—Forming solid beads by chemical vapour deposition; by liquid phase reaction by liquid phase reactions, e.g. by means of a gel phase
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/02—Pure silica glass, e.g. pure fused quartz
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
- C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
- C03C2201/24—Doped silica-based glasses containing non-metals other than boron or halide containing nitrogen, e.g. silicon oxy-nitride glasses
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
- C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
- C03C2201/26—Doped silica-based glasses containing non-metals other than boron or halide containing carbon
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
- C03C2201/30—Doped silica-based glasses containing metals
- C03C2201/32—Doped silica-based glasses containing metals containing aluminium
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/80—Glass compositions containing bubbles or microbubbles, e.g. opaque quartz glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2203/00—Production processes
- C03C2203/10—Melting processes
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2203/00—Production processes
- C03C2203/50—After-treatment
- C03C2203/52—Heat-treatment
- C03C2203/54—Heat-treatment in a dopant containing atmosphere
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Geochemistry & Mineralogy (AREA)
- General Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Dispersion Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Silicon Compounds (AREA)
- Glass Melting And Manufacturing (AREA)
- Glass Compositions (AREA)
Priority Applications (10)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19962451A DE19962451C1 (de) | 1999-12-22 | 1999-12-22 | Verfahren für die Herstellung von opakem Quarzglas und für die Durchführung des Verfahrens geeignetes Si0¶2¶-Granulat |
| US09/484,113 US6380110B1 (en) | 1999-12-22 | 2000-01-14 | Process for making opaque quartz, for carrying out the process suitable SiO2 granulate, and component of opaque quartz glass |
| EP00993506A EP1240114B1 (de) | 1999-12-22 | 2000-12-14 | VERFAHREN FÜR DIE HERSTELLUNG VON OPAKEM QUARZGLAS, FÜR DIE DURCHFÜHRUNG DES VERFAHRENS GEEIGNETES SiO2-GRANULAT UND BAUTEIL AUS OPAKEM QUARZGLAS |
| CNB008177104A CN1200896C (zh) | 1999-12-22 | 2000-12-14 | 石英玻璃的制造方法及所用的颗粒和由其构成的部件 |
| CA002395501A CA2395501A1 (en) | 1999-12-22 | 2000-12-14 | Method for the production of opaque quartz glass, sio2 granulate suitable for use in performing the method and a component made of opaque quartzglass |
| JP2001546594A JP4681189B2 (ja) | 1999-12-22 | 2000-12-14 | 不透明石英ガラスの製造方法、該方法に適したＳｉＯ２粒子および不透明石英ガラス物品 |
| PCT/EP2000/012687 WO2001046079A1 (de) | 1999-12-22 | 2000-12-14 | VERFAHREN FÜR DIE HERSTELLUNG VON OPAKEM QUARZGLAS, FÜR DIE DURCHFÜHRUNG DES VERFAHRENS GEEIGNETES SiO2-GRANULAT UND BAUTEIL AUS OPAKEM QUARZGLAS |
| DE50011832T DE50011832D1 (de) | 1999-12-22 | 2000-12-14 | VERFAHREN FÜR DIE HERSTELLUNG VON OPAKEM QUARZGLAS, FÜR DIE DURCHFÜHRUNG DES VERFAHRENS GEEIGNETES SiO2-GRANULAT UND BAUTEIL AUS OPAKEM QUARZGLAS |
| KR1020027008182A KR100716485B1 (ko) | 1999-12-22 | 2000-12-14 | 불투명 석영유리의 제조 방법, 이 방법을 실행하기에적합한 ｓｉｏ2 과립재료 및 불투명 석영유리로 이루어진물품 |
| TW089127771A TW548246B (en) | 1999-12-22 | 2000-12-22 | Process for producing opaque quartz glass, SiO2 granulate suitable for the process, and an article of opaque quartz glass |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19962451A DE19962451C1 (de) | 1999-12-22 | 1999-12-22 | Verfahren für die Herstellung von opakem Quarzglas und für die Durchführung des Verfahrens geeignetes Si0¶2¶-Granulat |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE19962451C1 true DE19962451C1 (de) | 2001-08-30 |
Family
ID=7934123
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19962451A Expired - Fee Related DE19962451C1 (de) | 1999-12-22 | 1999-12-22 | Verfahren für die Herstellung von opakem Quarzglas und für die Durchführung des Verfahrens geeignetes Si0¶2¶-Granulat |
| DE50011832T Expired - Lifetime DE50011832D1 (de) | 1999-12-22 | 2000-12-14 | VERFAHREN FÜR DIE HERSTELLUNG VON OPAKEM QUARZGLAS, FÜR DIE DURCHFÜHRUNG DES VERFAHRENS GEEIGNETES SiO2-GRANULAT UND BAUTEIL AUS OPAKEM QUARZGLAS |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE50011832T Expired - Lifetime DE50011832D1 (de) | 1999-12-22 | 2000-12-14 | VERFAHREN FÜR DIE HERSTELLUNG VON OPAKEM QUARZGLAS, FÜR DIE DURCHFÜHRUNG DES VERFAHRENS GEEIGNETES SiO2-GRANULAT UND BAUTEIL AUS OPAKEM QUARZGLAS |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US6380110B1 (https=) |
| EP (1) | EP1240114B1 (https=) |
| JP (1) | JP4681189B2 (https=) |
| KR (1) | KR100716485B1 (https=) |
| CN (1) | CN1200896C (https=) |
| CA (1) | CA2395501A1 (https=) |
| DE (2) | DE19962451C1 (https=) |
| TW (1) | TW548246B (https=) |
| WO (1) | WO2001046079A1 (https=) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10243953A1 (de) * | 2002-09-21 | 2004-04-08 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren für die Herstellung eines Bauteils aus opakem Quarzglas |
| DE102004038602B3 (de) * | 2004-08-07 | 2005-12-29 | Heraeus Quarzglas Gmbh & Co. Kg | Elektrogeschmolzenes, synthetisches Quarzglas, insbesondere für den Einsatz in der Lampen- und in der Halbleiterfertigung und Verfahren zur Herstellung desselben |
| EP3000790A1 (de) | 2014-09-29 | 2016-03-30 | Heraeus Quarzglas GmbH & Co. KG | Verfahren für die Herstellung von synthetischem Quarzglas aus SiO2-Granulat und geeignetes SiO2-Granulat dafür |
Families Citing this family (35)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10019693B4 (de) * | 2000-04-20 | 2006-01-19 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung eines Bauteils aus opakem, synthetischen Quarzglas, nach dem Verfahren hergestelltes Quarzglasrohr, sowie Verwendung desselben |
| DE10020955A1 (de) * | 2000-04-28 | 2001-11-22 | Fraunhofer Ges Forschung | Formkörper und Verfahren zur Herstellung |
| DE10055362C1 (de) * | 2000-11-08 | 2002-01-24 | Heraeus Quarzglas | Verfahren zur Herstellung eines SiO¶2¶-Rohlings und Vorrichtung zur Durchführung des Verfahrens |
| DE10055357C1 (de) * | 2000-11-08 | 2002-08-14 | Heraeus Quarzglas | Verfahren und Vorrichtung zur Herstellung eines SiO¶2¶-Rohlings |
| DE10159959A1 (de) * | 2001-12-06 | 2003-06-26 | Heraeus Quarzglas | Quarzglasrohling für ein optisches Bauteil und Verwendung desselben |
| EP1580170B1 (en) * | 2002-11-29 | 2019-01-16 | Heraeus Quarzglas GmbH & Co. KG | Method for producing synthetic quartz glass and synthetic quartz glass article |
| US7637126B2 (en) * | 2003-12-08 | 2009-12-29 | Heraeus Quarzglas Gmbh & Co. Kg | Method for the production of laser-active quartz glass and use thereof |
| DE102004052312A1 (de) * | 2004-08-23 | 2006-03-02 | Heraeus Quarzglas Gmbh & Co. Kg | Beschichtetes Bauteil aus Quarzglas sowie Verfahren zur Herstellung des Bauteils |
| DE102004051846B4 (de) * | 2004-08-23 | 2009-11-05 | Heraeus Quarzglas Gmbh & Co. Kg | Bauteil mit einer Reflektorschicht sowie Verfahren für seine Herstellung |
| US7563512B2 (en) * | 2004-08-23 | 2009-07-21 | Heraeus Quarzglas Gmbh & Co. Kg | Component with a reflector layer and method for producing the same |
| DE102006018711B4 (de) * | 2006-04-20 | 2008-09-25 | Heraeus Quarzglas Gmbh & Co. Kg | Werkstoff, insbesondere für ein optisches Bauteil zum Einsatz in der Mikrolithographie und Verfahren zur Herstellung eines Formkörpers aus dem Werkstoff |
| US10843954B2 (en) * | 2006-12-05 | 2020-11-24 | Shin-Etsu Quartz Products Co., Ltd. | Synthetic opaque quartz glass and method for producing the same |
| DE102007017004A1 (de) * | 2007-02-27 | 2008-08-28 | Heraeus Quarzglas Gmbh & Co. Kg | Optisches Bauteil aus synthetischem Quarzglas mit erhöhter Strahlenbeständigkeit, sowie Verfahren zur Herstellung des Bauteils |
| JP5171098B2 (ja) * | 2007-04-24 | 2013-03-27 | 岩崎電気株式会社 | 石英ガラス製品の製造方法、それに用いるシリカ顆粒とその生成方法 |
| DE102009005446A1 (de) * | 2009-01-21 | 2010-07-22 | Schott Ag | Granulat, Verfahren zu dessen Herstellung sowie dessen Verwendung |
| KR101246157B1 (ko) * | 2010-12-09 | 2013-03-20 | 한국세라믹기술원 | 엔지니어드 스톤의 제조방법 |
| TWI652240B (zh) * | 2014-02-17 | 2019-03-01 | 日商東曹股份有限公司 | 不透明石英玻璃及其製造方法 |
| JP6558137B2 (ja) * | 2015-08-07 | 2019-08-14 | 東ソー株式会社 | 不透明シリカガラス製造用の高強度成形体 |
| KR20180095617A (ko) * | 2015-12-18 | 2018-08-27 | 헤래우스 크바르츠글라스 게엠베하 ＆ 컴파니 케이지 | 스탠딩 소결 도가니에서 실리카 유리 제품의 제조 |
| WO2017103160A1 (de) | 2015-12-18 | 2017-06-22 | Heraeus Quarzglas Gmbh & Co. Kg | Herstellung von quarzglaskörpern aus siliziumdioxidgranulat |
| CN108698889A (zh) * | 2015-12-18 | 2018-10-23 | 贺利氏石英玻璃有限两合公司 | 在悬挂式金属片坩埚中制备石英玻璃体 |
| EP3390290B1 (de) | 2015-12-18 | 2023-03-15 | Heraeus Quarzglas GmbH & Co. KG | Herstellung eines opaken quarzglaskörpers |
| WO2017103114A2 (de) * | 2015-12-18 | 2017-06-22 | Heraeus Quarzglas Gmbh & Co. Kg | Herstellung eines quarzglaskörpers in einem hängenden sintertiegel |
| JP7044454B2 (ja) | 2015-12-18 | 2022-03-30 | ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー | 石英ガラス調製時の中間体としての炭素ドープ二酸化ケイ素造粒体の調製 |
| US10676388B2 (en) | 2015-12-18 | 2020-06-09 | Heraeus Quarzglas Gmbh & Co. Kg | Glass fibers and pre-forms made of homogeneous quartz glass |
| US11952303B2 (en) | 2015-12-18 | 2024-04-09 | Heraeus Quarzglas Gmbh & Co. Kg | Increase in silicon content in the preparation of quartz glass |
| TWI794149B (zh) | 2015-12-18 | 2023-03-01 | 德商何瑞斯廓格拉斯公司 | 石英玻璃粉粒、不透明成型體及彼等之製備方法 |
| CN108698894A (zh) | 2015-12-18 | 2018-10-23 | 贺利氏石英玻璃有限两合公司 | 在多腔式烘箱中制备石英玻璃体 |
| WO2017103115A2 (de) | 2015-12-18 | 2017-06-22 | Heraeus Quarzglas Gmbh & Co. Kg | Herstellung eines quarzglaskörpers in einem schmelztiegel aus refraktärmetall |
| US11492282B2 (en) | 2015-12-18 | 2022-11-08 | Heraeus Quarzglas Gmbh & Co. Kg | Preparation of quartz glass bodies with dew point monitoring in the melting oven |
| US11053152B2 (en) | 2015-12-18 | 2021-07-06 | Heraeus Quarzglas Gmbh & Co. Kg | Spray granulation of silicon dioxide in the preparation of quartz glass |
| EP3185057A1 (de) * | 2015-12-22 | 2017-06-28 | Heraeus Quarzglas GmbH & Co. KG | Faseroptische streueinrichtung und herstellungsverfahren dafür |
| EP3248950B1 (de) * | 2016-05-24 | 2020-08-05 | Heraeus Quarzglas GmbH & Co. KG | Verfahren zur herstellung eines poren enthaltenden, opaken quarzglases |
| JP6878829B2 (ja) * | 2016-10-26 | 2021-06-02 | 東ソー株式会社 | シリカ粉末及び高流動性シリカ造粒粉末並びにその製造方法 |
| EP3476815B1 (en) | 2017-10-27 | 2023-11-29 | Heraeus Quarzglas GmbH & Co. KG | Production of a porous product including post-adapting a pore structure |
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| DE4440104A1 (de) * | 1993-11-12 | 1995-05-18 | Heraeus Quarzglas | Formkörper aus Quarzglas und Verfahren zur Herstellung eines Formkörpers aus Quarzglas |
| DE4424044A1 (de) * | 1994-07-11 | 1996-01-18 | Heraeus Quarzglas | Verfahren zur Herstellung von Kieselsäuregranulat und Verwendung des so hergestellten Granulats |
| EP0816297A1 (en) * | 1996-07-04 | 1998-01-07 | Tosoh Corporation | Opaque quartz glass and process for production thereof |
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| DE1567440B1 (de) | 1965-04-29 | 1971-02-25 | Degussa | Kugelfoermiges kieselsaeuregranulat |
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| JPH02219814A (ja) * | 1989-02-21 | 1990-09-03 | Sumitomo Bakelite Co Ltd | エポキシ樹脂組成物 |
| JPH0326717A (ja) * | 1989-06-26 | 1991-02-05 | Sumitomo Bakelite Co Ltd | エポキシ樹脂組成物 |
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| JP3368547B2 (ja) * | 1994-04-28 | 2003-01-20 | 信越石英株式会社 | 不透明石英ガラスおよびその製造方法 |
| ES2154748T3 (es) * | 1995-02-04 | 2001-04-16 | Degussa | Granulados a base de dioxido de silicio preparado por via pirogena, procedimiento para su preparacion y su empleo. |
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- 1999-12-22 DE DE19962451A patent/DE19962451C1/de not_active Expired - Fee Related
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- 2000-01-14 US US09/484,113 patent/US6380110B1/en not_active Expired - Lifetime
- 2000-12-14 EP EP00993506A patent/EP1240114B1/de not_active Expired - Lifetime
- 2000-12-14 CN CNB008177104A patent/CN1200896C/zh not_active Expired - Lifetime
- 2000-12-14 CA CA002395501A patent/CA2395501A1/en not_active Abandoned
- 2000-12-14 WO PCT/EP2000/012687 patent/WO2001046079A1/de not_active Ceased
- 2000-12-14 JP JP2001546594A patent/JP4681189B2/ja not_active Expired - Lifetime
- 2000-12-14 KR KR1020027008182A patent/KR100716485B1/ko not_active Expired - Lifetime
- 2000-12-14 DE DE50011832T patent/DE50011832D1/de not_active Expired - Lifetime
- 2000-12-22 TW TW089127771A patent/TW548246B/zh not_active IP Right Cessation
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| DE4440104A1 (de) * | 1993-11-12 | 1995-05-18 | Heraeus Quarzglas | Formkörper aus Quarzglas und Verfahren zur Herstellung eines Formkörpers aus Quarzglas |
| DE4424044A1 (de) * | 1994-07-11 | 1996-01-18 | Heraeus Quarzglas | Verfahren zur Herstellung von Kieselsäuregranulat und Verwendung des so hergestellten Granulats |
| EP0816297A1 (en) * | 1996-07-04 | 1998-01-07 | Tosoh Corporation | Opaque quartz glass and process for production thereof |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10243953A1 (de) * | 2002-09-21 | 2004-04-08 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren für die Herstellung eines Bauteils aus opakem Quarzglas |
| DE10243953B4 (de) * | 2002-09-21 | 2005-11-17 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren für die Herstellung eines Bauteils aus opakem Quarzglas |
| DE102004038602B3 (de) * | 2004-08-07 | 2005-12-29 | Heraeus Quarzglas Gmbh & Co. Kg | Elektrogeschmolzenes, synthetisches Quarzglas, insbesondere für den Einsatz in der Lampen- und in der Halbleiterfertigung und Verfahren zur Herstellung desselben |
| EP3000790A1 (de) | 2014-09-29 | 2016-03-30 | Heraeus Quarzglas GmbH & Co. KG | Verfahren für die Herstellung von synthetischem Quarzglas aus SiO2-Granulat und geeignetes SiO2-Granulat dafür |
| US10029938B2 (en) | 2014-09-29 | 2018-07-24 | Heraeus Quarzglas Gmbh & Co. Kg | Method for producing synthetic quartz glass of SiO2 granulate and SiO2 granulate suited therefor |
Also Published As
| Publication number | Publication date |
|---|---|
| JP4681189B2 (ja) | 2011-05-11 |
| CA2395501A1 (en) | 2001-06-28 |
| US6380110B1 (en) | 2002-04-30 |
| TW548246B (en) | 2003-08-21 |
| KR20020066333A (ko) | 2002-08-14 |
| CN1200896C (zh) | 2005-05-11 |
| DE50011832D1 (de) | 2006-01-12 |
| EP1240114A1 (de) | 2002-09-18 |
| KR100716485B1 (ko) | 2007-05-10 |
| EP1240114B1 (de) | 2005-12-07 |
| JP2004500299A (ja) | 2004-01-08 |
| CN1413175A (zh) | 2003-04-23 |
| WO2001046079A1 (de) | 2001-06-28 |
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