JP2004500299A5 - - Google Patents
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- Publication number
- JP2004500299A5 JP2004500299A5 JP2001546594A JP2001546594A JP2004500299A5 JP 2004500299 A5 JP2004500299 A5 JP 2004500299A5 JP 2001546594 A JP2001546594 A JP 2001546594A JP 2001546594 A JP2001546594 A JP 2001546594A JP 2004500299 A5 JP2004500299 A5 JP 2004500299A5
- Authority
- JP
- Japan
- Prior art keywords
- sio
- granules
- primary particles
- specific surface
- surface area
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 239000008187 granular material Substances 0.000 claims description 29
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 23
- 238000000034 method Methods 0.000 claims description 15
- 239000011164 primary particle Substances 0.000 claims description 14
- 239000002245 particle Substances 0.000 claims description 10
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 7
- 238000004017 vitrification Methods 0.000 claims description 6
- 238000005245 sintering Methods 0.000 claims description 3
- 238000010438 heat treatment Methods 0.000 claims 7
- 238000004519 manufacturing process Methods 0.000 claims 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims 2
- 229910052782 aluminium Inorganic materials 0.000 claims 2
- 238000009826 distribution Methods 0.000 claims 2
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 claims 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims 1
- 238000005054 agglomeration Methods 0.000 claims 1
- 230000002776 aggregation Effects 0.000 claims 1
- 229910052799 carbon Inorganic materials 0.000 claims 1
- 239000000460 chlorine Substances 0.000 claims 1
- 229910052801 chlorine Inorganic materials 0.000 claims 1
- 239000002019 doping agent Substances 0.000 claims 1
- 239000011796 hollow space material Substances 0.000 claims 1
- 238000000465 moulding Methods 0.000 claims 1
- 239000002105 nanoparticle Substances 0.000 claims 1
- 239000002344 surface layer Substances 0.000 claims 1
- 239000011148 porous material Substances 0.000 description 8
- 238000004438 BET method Methods 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 238000004031 devitrification Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 229910021331 inorganic silicon compound Inorganic materials 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 150000003961 organosilicon compounds Chemical class 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19962451A DE19962451C1 (de) | 1999-12-22 | 1999-12-22 | Verfahren für die Herstellung von opakem Quarzglas und für die Durchführung des Verfahrens geeignetes Si0¶2¶-Granulat |
| PCT/EP2000/012687 WO2001046079A1 (de) | 1999-12-22 | 2000-12-14 | VERFAHREN FÜR DIE HERSTELLUNG VON OPAKEM QUARZGLAS, FÜR DIE DURCHFÜHRUNG DES VERFAHRENS GEEIGNETES SiO2-GRANULAT UND BAUTEIL AUS OPAKEM QUARZGLAS |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2004500299A JP2004500299A (ja) | 2004-01-08 |
| JP2004500299A5 true JP2004500299A5 (https=) | 2005-02-24 |
| JP4681189B2 JP4681189B2 (ja) | 2011-05-11 |
Family
ID=7934123
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001546594A Expired - Lifetime JP4681189B2 (ja) | 1999-12-22 | 2000-12-14 | 不透明石英ガラスの製造方法、該方法に適したＳｉＯ２粒子および不透明石英ガラス物品 |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US6380110B1 (https=) |
| EP (1) | EP1240114B1 (https=) |
| JP (1) | JP4681189B2 (https=) |
| KR (1) | KR100716485B1 (https=) |
| CN (1) | CN1200896C (https=) |
| CA (1) | CA2395501A1 (https=) |
| DE (2) | DE19962451C1 (https=) |
| TW (1) | TW548246B (https=) |
| WO (1) | WO2001046079A1 (https=) |
Families Citing this family (38)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10019693B4 (de) * | 2000-04-20 | 2006-01-19 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung eines Bauteils aus opakem, synthetischen Quarzglas, nach dem Verfahren hergestelltes Quarzglasrohr, sowie Verwendung desselben |
| DE10020955A1 (de) * | 2000-04-28 | 2001-11-22 | Fraunhofer Ges Forschung | Formkörper und Verfahren zur Herstellung |
| DE10055362C1 (de) * | 2000-11-08 | 2002-01-24 | Heraeus Quarzglas | Verfahren zur Herstellung eines SiO¶2¶-Rohlings und Vorrichtung zur Durchführung des Verfahrens |
| DE10055357C1 (de) * | 2000-11-08 | 2002-08-14 | Heraeus Quarzglas | Verfahren und Vorrichtung zur Herstellung eines SiO¶2¶-Rohlings |
| DE10159959A1 (de) * | 2001-12-06 | 2003-06-26 | Heraeus Quarzglas | Quarzglasrohling für ein optisches Bauteil und Verwendung desselben |
| DE10243953B4 (de) * | 2002-09-21 | 2005-11-17 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren für die Herstellung eines Bauteils aus opakem Quarzglas |
| EP1580170B1 (en) * | 2002-11-29 | 2019-01-16 | Heraeus Quarzglas GmbH & Co. KG | Method for producing synthetic quartz glass and synthetic quartz glass article |
| US7637126B2 (en) * | 2003-12-08 | 2009-12-29 | Heraeus Quarzglas Gmbh & Co. Kg | Method for the production of laser-active quartz glass and use thereof |
| DE102004038602B3 (de) * | 2004-08-07 | 2005-12-29 | Heraeus Quarzglas Gmbh & Co. Kg | Elektrogeschmolzenes, synthetisches Quarzglas, insbesondere für den Einsatz in der Lampen- und in der Halbleiterfertigung und Verfahren zur Herstellung desselben |
| DE102004052312A1 (de) * | 2004-08-23 | 2006-03-02 | Heraeus Quarzglas Gmbh & Co. Kg | Beschichtetes Bauteil aus Quarzglas sowie Verfahren zur Herstellung des Bauteils |
| DE102004051846B4 (de) * | 2004-08-23 | 2009-11-05 | Heraeus Quarzglas Gmbh & Co. Kg | Bauteil mit einer Reflektorschicht sowie Verfahren für seine Herstellung |
| US7563512B2 (en) * | 2004-08-23 | 2009-07-21 | Heraeus Quarzglas Gmbh & Co. Kg | Component with a reflector layer and method for producing the same |
| DE102006018711B4 (de) * | 2006-04-20 | 2008-09-25 | Heraeus Quarzglas Gmbh & Co. Kg | Werkstoff, insbesondere für ein optisches Bauteil zum Einsatz in der Mikrolithographie und Verfahren zur Herstellung eines Formkörpers aus dem Werkstoff |
| US10843954B2 (en) * | 2006-12-05 | 2020-11-24 | Shin-Etsu Quartz Products Co., Ltd. | Synthetic opaque quartz glass and method for producing the same |
| DE102007017004A1 (de) * | 2007-02-27 | 2008-08-28 | Heraeus Quarzglas Gmbh & Co. Kg | Optisches Bauteil aus synthetischem Quarzglas mit erhöhter Strahlenbeständigkeit, sowie Verfahren zur Herstellung des Bauteils |
| JP5171098B2 (ja) * | 2007-04-24 | 2013-03-27 | 岩崎電気株式会社 | 石英ガラス製品の製造方法、それに用いるシリカ顆粒とその生成方法 |
| DE102009005446A1 (de) * | 2009-01-21 | 2010-07-22 | Schott Ag | Granulat, Verfahren zu dessen Herstellung sowie dessen Verwendung |
| KR101246157B1 (ko) * | 2010-12-09 | 2013-03-20 | 한국세라믹기술원 | 엔지니어드 스톤의 제조방법 |
| TWI652240B (zh) * | 2014-02-17 | 2019-03-01 | 日商東曹股份有限公司 | 不透明石英玻璃及其製造方法 |
| EP3000790B2 (de) | 2014-09-29 | 2023-07-26 | Heraeus Quarzglas GmbH & Co. KG | Verfahren für die Herstellung von Bauteilen aus synthetischem Quarzglas aus SiO2-Granulat |
| JP6558137B2 (ja) * | 2015-08-07 | 2019-08-14 | 東ソー株式会社 | 不透明シリカガラス製造用の高強度成形体 |
| KR20180095617A (ko) * | 2015-12-18 | 2018-08-27 | 헤래우스 크바르츠글라스 게엠베하 ＆ 컴파니 케이지 | 스탠딩 소결 도가니에서 실리카 유리 제품의 제조 |
| WO2017103160A1 (de) | 2015-12-18 | 2017-06-22 | Heraeus Quarzglas Gmbh & Co. Kg | Herstellung von quarzglaskörpern aus siliziumdioxidgranulat |
| CN108698889A (zh) * | 2015-12-18 | 2018-10-23 | 贺利氏石英玻璃有限两合公司 | 在悬挂式金属片坩埚中制备石英玻璃体 |
| EP3390290B1 (de) | 2015-12-18 | 2023-03-15 | Heraeus Quarzglas GmbH & Co. KG | Herstellung eines opaken quarzglaskörpers |
| WO2017103114A2 (de) * | 2015-12-18 | 2017-06-22 | Heraeus Quarzglas Gmbh & Co. Kg | Herstellung eines quarzglaskörpers in einem hängenden sintertiegel |
| JP7044454B2 (ja) | 2015-12-18 | 2022-03-30 | ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー | 石英ガラス調製時の中間体としての炭素ドープ二酸化ケイ素造粒体の調製 |
| US10676388B2 (en) | 2015-12-18 | 2020-06-09 | Heraeus Quarzglas Gmbh & Co. Kg | Glass fibers and pre-forms made of homogeneous quartz glass |
| US11952303B2 (en) | 2015-12-18 | 2024-04-09 | Heraeus Quarzglas Gmbh & Co. Kg | Increase in silicon content in the preparation of quartz glass |
| TWI794149B (zh) | 2015-12-18 | 2023-03-01 | 德商何瑞斯廓格拉斯公司 | 石英玻璃粉粒、不透明成型體及彼等之製備方法 |
| CN108698894A (zh) | 2015-12-18 | 2018-10-23 | 贺利氏石英玻璃有限两合公司 | 在多腔式烘箱中制备石英玻璃体 |
| WO2017103115A2 (de) | 2015-12-18 | 2017-06-22 | Heraeus Quarzglas Gmbh & Co. Kg | Herstellung eines quarzglaskörpers in einem schmelztiegel aus refraktärmetall |
| US11492282B2 (en) | 2015-12-18 | 2022-11-08 | Heraeus Quarzglas Gmbh & Co. Kg | Preparation of quartz glass bodies with dew point monitoring in the melting oven |
| US11053152B2 (en) | 2015-12-18 | 2021-07-06 | Heraeus Quarzglas Gmbh & Co. Kg | Spray granulation of silicon dioxide in the preparation of quartz glass |
| EP3185057A1 (de) * | 2015-12-22 | 2017-06-28 | Heraeus Quarzglas GmbH & Co. KG | Faseroptische streueinrichtung und herstellungsverfahren dafür |
| EP3248950B1 (de) * | 2016-05-24 | 2020-08-05 | Heraeus Quarzglas GmbH & Co. KG | Verfahren zur herstellung eines poren enthaltenden, opaken quarzglases |
| JP6878829B2 (ja) * | 2016-10-26 | 2021-06-02 | 東ソー株式会社 | シリカ粉末及び高流動性シリカ造粒粉末並びにその製造方法 |
| EP3476815B1 (en) | 2017-10-27 | 2023-11-29 | Heraeus Quarzglas GmbH & Co. KG | Production of a porous product including post-adapting a pore structure |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1567440B1 (de) | 1965-04-29 | 1971-02-25 | Degussa | Kugelfoermiges kieselsaeuregranulat |
| DE2557932A1 (de) * | 1975-12-22 | 1977-06-30 | Dynamit Nobel Ag | Verfahren zur herstellung von koernigem quarzglas |
| JPH02219814A (ja) * | 1989-02-21 | 1990-09-03 | Sumitomo Bakelite Co Ltd | エポキシ樹脂組成物 |
| JPH0326717A (ja) * | 1989-06-26 | 1991-02-05 | Sumitomo Bakelite Co Ltd | エポキシ樹脂組成物 |
| JPH07138015A (ja) * | 1993-06-15 | 1995-05-30 | Catalysts & Chem Ind Co Ltd | シリカ微小球状粒子およびその製造方法 |
| DE4338807C1 (de) * | 1993-11-12 | 1995-01-26 | Heraeus Quarzglas | Formkörper mit hohem Gehalt an Siliziumdioxid und Verfahren zur Herstellung solcher Formkörper |
| JP3368547B2 (ja) * | 1994-04-28 | 2003-01-20 | 信越石英株式会社 | 不透明石英ガラスおよびその製造方法 |
| DE4424044A1 (de) | 1994-07-11 | 1996-01-18 | Heraeus Quarzglas | Verfahren zur Herstellung von Kieselsäuregranulat und Verwendung des so hergestellten Granulats |
| ES2154748T3 (es) * | 1995-02-04 | 2001-04-16 | Degussa | Granulados a base de dioxido de silicio preparado por via pirogena, procedimiento para su preparacion y su empleo. |
| JPH0912325A (ja) * | 1995-06-29 | 1997-01-14 | Nitto Chem Ind Co Ltd | 高純度不透明石英ガラス及びその製造方法並びにその用途 |
| JP3647959B2 (ja) * | 1996-02-01 | 2005-05-18 | 水澤化学工業株式会社 | 非晶質シリカ系定形粒子の製造方法 |
| JP3471514B2 (ja) * | 1996-02-01 | 2003-12-02 | 水澤化学工業株式会社 | 半導体封止用樹脂組成物及びそれに用いる吸湿性充填剤 |
| US5972488A (en) * | 1996-07-04 | 1999-10-26 | Tosoh Corporation | Opaque quartz glass and process for production thereof |
| GB2316414B (en) * | 1996-07-31 | 2000-10-11 | Tosoh Corp | Abrasive shaped article, abrasive disc and polishing method |
| DE19729505A1 (de) * | 1997-07-10 | 1999-01-14 | Heraeus Quarzglas | Verfahren zur Herstellung von Si0¶2¶-Granulat |
| FR2766170B1 (fr) * | 1997-07-17 | 1999-09-24 | Alsthom Cge Alcatel | Procede ameliore de fabrication d'une poudre de silice |
-
1999
- 1999-12-22 DE DE19962451A patent/DE19962451C1/de not_active Expired - Fee Related
-
2000
- 2000-01-14 US US09/484,113 patent/US6380110B1/en not_active Expired - Lifetime
- 2000-12-14 EP EP00993506A patent/EP1240114B1/de not_active Expired - Lifetime
- 2000-12-14 CN CNB008177104A patent/CN1200896C/zh not_active Expired - Lifetime
- 2000-12-14 CA CA002395501A patent/CA2395501A1/en not_active Abandoned
- 2000-12-14 WO PCT/EP2000/012687 patent/WO2001046079A1/de not_active Ceased
- 2000-12-14 JP JP2001546594A patent/JP4681189B2/ja not_active Expired - Lifetime
- 2000-12-14 KR KR1020027008182A patent/KR100716485B1/ko not_active Expired - Lifetime
- 2000-12-14 DE DE50011832T patent/DE50011832D1/de not_active Expired - Lifetime
- 2000-12-22 TW TW089127771A patent/TW548246B/zh not_active IP Right Cessation
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