KR100709457B1 - 반도체 웨이퍼의 연삭방법 - Google Patents
반도체 웨이퍼의 연삭방법 Download PDFInfo
- Publication number
- KR100709457B1 KR100709457B1 KR1020010039514A KR20010039514A KR100709457B1 KR 100709457 B1 KR100709457 B1 KR 100709457B1 KR 1020010039514 A KR1020010039514 A KR 1020010039514A KR 20010039514 A KR20010039514 A KR 20010039514A KR 100709457 B1 KR100709457 B1 KR 100709457B1
- Authority
- KR
- South Korea
- Prior art keywords
- grinding
- wafer
- semiconductor wafer
- holding
- tray
- Prior art date
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 127
- 238000000034 method Methods 0.000 title claims abstract description 31
- 239000000758 substrate Substances 0.000 claims description 24
- 238000004140 cleaning Methods 0.000 claims description 13
- 239000011148 porous material Substances 0.000 claims description 12
- 238000004891 communication Methods 0.000 claims description 10
- 238000001179 sorption measurement Methods 0.000 claims description 9
- 238000005406 washing Methods 0.000 claims description 8
- 238000003825 pressing Methods 0.000 claims description 2
- 230000000274 adsorptive effect Effects 0.000 claims 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 1
- 238000005498 polishing Methods 0.000 abstract description 3
- 235000012431 wafers Nutrition 0.000 description 165
- 238000012545 processing Methods 0.000 description 8
- 238000003860 storage Methods 0.000 description 4
- 239000000919 ceramic Substances 0.000 description 3
- 230000008676 import Effects 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000005520 cutting process Methods 0.000 description 2
- 239000008188 pellet Substances 0.000 description 2
- 230000000149 penetrating effect Effects 0.000 description 2
- 229920003002 synthetic resin Polymers 0.000 description 2
- 239000000057 synthetic resin Substances 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 150000004996 alkyl benzenes Chemical class 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 229940092714 benzenesulfonic acid Drugs 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 230000001360 synchronised effect Effects 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
- B24B7/20—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground
- B24B7/22—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain
- B24B7/228—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding thin, brittle parts, e.g. semiconductors, wafers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B41/00—Component parts such as frames, beds, carriages, headstocks
- B24B41/06—Work supports, e.g. adjustable steadies
- B24B41/068—Table-like supports for panels, sheets or the like
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Ceramic Engineering (AREA)
- Inorganic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Grinding Of Cylindrical And Plane Surfaces (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
Description
Claims (4)
- 삭제
- 반도체 웨이퍼를 보지하는 척테이블(chuck table)과, 상기 척테이블상에 보지된 반도체 웨이퍼의 상부면을 연삭하는 연삭수단을 구비하는 연삭장치를 사용한 반도체 웨이퍼의 연삭방법으로서,상기 척테이블에 연삭해야할 상기 반도체 웨이퍼를 거치하는 연삭전 웨이퍼 거치공정과, 상기 척테이블에 거치된 상기 반도체 웨이퍼의 상부면을 상기 연삭수단에 의해 소정 두께로 연삭하는 웨이퍼 연삭공정과, 연삭후의 상기 반도체 웨이퍼를 상기 척테이블로부터 반출하는 웨이퍼 반출공정과, 상기 척테이블로부터 반출된 연삭후 상기 반도체 웨이퍼를 웨이퍼 보지 트레이에 보지시키는 트레이 보지공정을 포함하는 것을 특징으로 하는 반도체 웨이퍼의 연삭방법에 있어서,상기 반도체 웨이퍼를 보지하는 상기 웨이퍼 보지 트레이는 무수한 기공이 표면에 형성되어 탄성에 의한 복원력과 밀착성으로 기공이 찌부러져서 부압이 생겼을 때에 흡착력을 발생하는 탄성패드와, 상기 탄성패드를 장착함과 동시에 상기 탄성패드에 부압 또는 가압력을 도입하는 연통공을 구비하는 기판으로 구성되어 있으며,상기 트레이 보지공정은 상기 척테이블로부터 반출된 상기 반도체 웨이퍼를 상기 웨이퍼 보지 트레이의 상기 탄성패드의 표면에 거치하고, 상기 연통공에 부압을 도입하여 상기 반도체 웨이퍼를 탄성패드에 흡착보지시키는 것을 특징으로 하는 반도체 웨이퍼의 연삭방법.
- 제 2 항에 있어서, 상기 연삭장치는 연삭후의 상기 반도체 웨이퍼를 거치하는 스피너 테이블을 가진 세척수단과, 상기 웨이퍼 보지 트레이를 수용하는 트레이용 카세트를 구비하고 있으며,상기 트레이 보지공정은 연삭후의 상기 반도체 웨이퍼를 상기 스피너 테이블로 거치하기 전에 상기 트레이용 카세트 내에 수납되어 있는 상기 웨이퍼 보지 트레이를 반출하여 상기 스피너 테이블로 거치하는 보지 트레이 세트공정과, 상기 스피너 테이블에 거치된 상기 웨이퍼 보지 트레이의 상기 탄성패드상에 연삭후 반도체 웨이퍼를 거치하는 연삭후의 웨이퍼 거치공정과, 상기 스피너 테이블에 거치된 상기 웨이퍼 보지 트레이의 상기 기판에 형성된 상기 연통공에 부압을 도입하여 상기 반도체 웨이퍼를 상기 탄성패드로 흡착보지시키는 연삭후 웨이퍼 흡착공정을 포함하는 것을 특징으로 하는 반도체 웨이퍼 연삭방법.
- 제 3 항에 있어서, 상기 연삭장치는 세척후의 반도체 웨이퍼를 수납하는 연삭후 웨이퍼 카세트를 구비하고 있으며,상기 세척수단에서 상기 반도체 웨이퍼의 세척이 완료된 후에, 상기 세척수 단으로부터 상기 웨이퍼 보지 트레이와 일체가 된 상기 반도체 웨이퍼를 상기 연삭후 웨이퍼용 카세트 내에 수납하는 연삭후 웨이퍼 수납공정을 구비하는 것을 특징으로 하는 반도체 웨이퍼의 연삭방법.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JPJP-P-2000-00202661 | 2000-07-04 | ||
JP2000202661A JP2002025961A (ja) | 2000-07-04 | 2000-07-04 | 半導体ウエーハの研削方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20020017943A KR20020017943A (ko) | 2002-03-07 |
KR100709457B1 true KR100709457B1 (ko) | 2007-04-18 |
Family
ID=18700155
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020010039514A KR100709457B1 (ko) | 2000-07-04 | 2001-07-03 | 반도체 웨이퍼의 연삭방법 |
Country Status (7)
Country | Link |
---|---|
US (1) | US6527627B2 (ko) |
EP (1) | EP1170088B1 (ko) |
JP (1) | JP2002025961A (ko) |
KR (1) | KR100709457B1 (ko) |
DE (1) | DE60103701T2 (ko) |
SG (1) | SG116418A1 (ko) |
TW (1) | TW490359B (ko) |
Families Citing this family (24)
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KR20010035163A (ko) * | 2001-01-09 | 2001-05-07 | 이민기 | 세계 헤드헌터 네트워크를 이용한 국제 고급인력 수급인터넷망 |
US6826986B2 (en) * | 2001-05-05 | 2004-12-07 | Ah Beng Lim | Bi-directional singulation system and method |
JP2002359211A (ja) * | 2001-05-30 | 2002-12-13 | Disco Abrasive Syst Ltd | 切削機 |
KR20040031071A (ko) * | 2001-09-28 | 2004-04-09 | 신에쯔 한도타이 가부시키가이샤 | 연마용 워크지지반, 워크의 연마장치 및 연마방법 |
US7018268B2 (en) | 2002-04-09 | 2006-03-28 | Strasbaugh | Protection of work piece during surface processing |
JP2004319697A (ja) * | 2003-04-15 | 2004-11-11 | Disco Abrasive Syst Ltd | 板状物に形成された電極の加工装置 |
JP4464113B2 (ja) * | 2003-11-27 | 2010-05-19 | 株式会社ディスコ | ウエーハの加工装置 |
US6910956B1 (en) | 2003-12-22 | 2005-06-28 | Powerchip Semiconductor Corp. | Wafer grinding apparatus |
US7011567B2 (en) * | 2004-02-05 | 2006-03-14 | Robert Gerber | Semiconductor wafer grinder |
US7163441B2 (en) * | 2004-02-05 | 2007-01-16 | Robert Gerber | Semiconductor wafer grinder |
JP4427396B2 (ja) * | 2004-06-30 | 2010-03-03 | 株式会社ディスコ | 加工装置 |
TWI251924B (en) * | 2004-12-29 | 2006-03-21 | Siliconware Precision Industries Co Ltd | A process applied to semiconductor |
US7713846B2 (en) * | 2004-12-29 | 2010-05-11 | Siliconware Precision Industries Co., Ltd. | Process applied to semiconductor |
JP2007243112A (ja) * | 2006-03-13 | 2007-09-20 | Disco Abrasive Syst Ltd | ウェーハの凹状加工方法及び凹凸吸収パッド |
JP4806282B2 (ja) * | 2006-03-29 | 2011-11-02 | 株式会社ディスコ | ウエーハの処理装置 |
JP4937674B2 (ja) * | 2006-08-16 | 2012-05-23 | 株式会社ディスコ | ウエーハのエッチング方法 |
KR101109078B1 (ko) * | 2009-11-17 | 2012-03-13 | (주)엘이티 | 기판 지지 유닛 및 이를 포함하는 기판 검사 장치, 그리고 이를 이용한 기판 검사 방법 |
US9508570B2 (en) * | 2013-10-21 | 2016-11-29 | Asm Technology Singapore Pte Ltd | Singulation apparatus and method |
WO2016151121A2 (de) * | 2015-03-26 | 2016-09-29 | Mauser-Werke Oberndorf Maschinenbau Gmbh | Bearbeitungseinheit |
KR20160125585A (ko) * | 2015-04-21 | 2016-11-01 | 삼성전자주식회사 | 기판 처리 장치 및 기판 처리 방법 |
JP2018114573A (ja) * | 2017-01-17 | 2018-07-26 | 株式会社ディスコ | 研削装置 |
CN108000267A (zh) * | 2017-12-26 | 2018-05-08 | 北京中电科电子装备有限公司 | 减薄机 |
JP7171140B2 (ja) * | 2018-12-11 | 2022-11-15 | 株式会社ディスコ | 被加工物の加工方法および樹脂シートユニット |
US20220115226A1 (en) * | 2020-10-08 | 2022-04-14 | Okmetic Oy | Manufacture method of a high-resistivity silicon handle wafer for a hybrid substrate structure |
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- 2000-07-04 JP JP2000202661A patent/JP2002025961A/ja active Pending
-
2001
- 2001-06-25 SG SG200103861A patent/SG116418A1/en unknown
- 2001-06-27 TW TW090115651A patent/TW490359B/zh not_active IP Right Cessation
- 2001-06-29 US US09/894,127 patent/US6527627B2/en not_active Expired - Lifetime
- 2001-07-03 DE DE60103701T patent/DE60103701T2/de not_active Expired - Lifetime
- 2001-07-03 KR KR1020010039514A patent/KR100709457B1/ko active IP Right Grant
- 2001-07-03 EP EP20010115657 patent/EP1170088B1/en not_active Expired - Lifetime
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JPH1123450A (ja) * | 1997-07-09 | 1999-01-29 | Mitsubishi Heavy Ind Ltd | ガス濃度検知方法及び装置 |
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Also Published As
Publication number | Publication date |
---|---|
DE60103701T2 (de) | 2005-06-16 |
EP1170088B1 (en) | 2004-06-09 |
US6527627B2 (en) | 2003-03-04 |
JP2002025961A (ja) | 2002-01-25 |
KR20020017943A (ko) | 2002-03-07 |
TW490359B (en) | 2002-06-11 |
US20020004359A1 (en) | 2002-01-10 |
EP1170088A3 (en) | 2002-01-30 |
DE60103701D1 (de) | 2004-07-15 |
EP1170088A2 (en) | 2002-01-09 |
SG116418A1 (en) | 2005-11-28 |
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