KR100671773B1 - 유전체 배리어 방전 램프에 의한 처리 장치, 및 처리 방법 - Google Patents
유전체 배리어 방전 램프에 의한 처리 장치, 및 처리 방법 Download PDFInfo
- Publication number
- KR100671773B1 KR100671773B1 KR1020020062500A KR20020062500A KR100671773B1 KR 100671773 B1 KR100671773 B1 KR 100671773B1 KR 1020020062500 A KR1020020062500 A KR 1020020062500A KR 20020062500 A KR20020062500 A KR 20020062500A KR 100671773 B1 KR100671773 B1 KR 100671773B1
- Authority
- KR
- South Korea
- Prior art keywords
- gas
- chamber
- lamp
- pressure
- processing
- Prior art date
Links
- 230000004888 barrier function Effects 0.000 title claims abstract description 55
- 238000000034 method Methods 0.000 title claims description 26
- 239000007789 gas Substances 0.000 claims abstract description 130
- 239000011261 inert gas Substances 0.000 claims abstract description 16
- 238000007599 discharging Methods 0.000 claims abstract description 5
- 238000000638 solvent extraction Methods 0.000 claims description 2
- 230000005855 radiation Effects 0.000 abstract description 3
- 230000008569 process Effects 0.000 description 19
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 11
- 229910001873 dinitrogen Inorganic materials 0.000 description 11
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 6
- 229910001882 dioxygen Inorganic materials 0.000 description 6
- 238000001514 detection method Methods 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- 230000005540 biological transmission Effects 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- 229910052786 argon Inorganic materials 0.000 description 3
- 239000000498 cooling water Substances 0.000 description 3
- 238000003672 processing method Methods 0.000 description 3
- 229910052724 xenon Inorganic materials 0.000 description 3
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 230000002238 attenuated effect Effects 0.000 description 2
- 208000037998 chronic venous disease Diseases 0.000 description 2
- 230000006837 decompression Effects 0.000 description 2
- 238000005108 dry cleaning Methods 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 238000005192 partition Methods 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 238000010301 surface-oxidation reaction Methods 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 230000004308 accommodation Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000010891 electric arc Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 229910052743 krypton Inorganic materials 0.000 description 1
- DNNSSWSSYDEUBZ-UHFFFAOYSA-N krypton atom Chemical compound [Kr] DNNSSWSSYDEUBZ-UHFFFAOYSA-N 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910001120 nichrome Inorganic materials 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000010926 purge Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 230000008719 thickening Effects 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J65/00—Lamps without any electrode inside the vessel; Lamps with at least one main electrode outside the vessel
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/0033—Heating devices using lamps
- H05B3/0038—Heating devices using lamps for industrial applications
- H05B3/0052—Heating devices using lamps for industrial applications for fluid treatments
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J19/12—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electromagnetic waves
- B01J19/122—Incoherent waves
- B01J19/123—Ultraviolet light
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/48—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation
- C23C16/482—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation using incoherent light, UV to IR, e.g. lamps
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Metallurgy (AREA)
- Mechanical Engineering (AREA)
- Materials Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Electromagnetism (AREA)
- General Health & Medical Sciences (AREA)
- Plasma & Fusion (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Cleaning In General (AREA)
Abstract
Description
Claims (7)
- 내부에 유전체 배리어 방전 램프가 배치되어 불활성 가스 분위기가 형성되는 램프실과, 내부에 피처리물이 배치되어 처리용 가스 분위기가 형성되는 처리실과, 램프실과 처리실을 구획하는 자외선 투과 부재로 이루어지는 유전체 배리어 방전 램프에 의한 처리 장치에 있어서,상기 램프실과 상기 처리실에는 각각 내부의 가스 압력을 검지하는 수단과, 내부에 가스를 도입, 배출하는 수단을 가지며,상기 램프실과 상기 처리실의 가스 압력을 각각 검지함으로써, 검지된 가스 압력에 기초하여, 상기 램프실 내의 가스 분위기 압력과 상기 처리실의 가스 분위기 압력을 상대적으로 조정하는 수단을 가지는 것을 특징으로 하는 유전체 배리어 방전 램프에 의한 처리 장치.
- 제1항에 있어서, 상기 램프실의 가스 분위기 압력을 상기 처리실의 가스 분위기 압력에 대응시켜 조정하는 것을 특징으로 하는 유전체 배리어 방전 램프에 의한 처리 장치.
- 제1항에 있어서, 상기 램프실의 가스 분위기와 상기 처리실의 가스 분위기의 압력차가 ±0.2기압 이내로 되도록 조정하는 것을 특징으로 하는 유전체 배리어 방전 램프에 의한 처리 장치.
- 제3항에 있어서, 상기 램프실의 가스 분위기와 상기 처리실의 가스 분위기의 압력차가 실질적으로 동등하게 되도록 조정하는 것을 특징으로 하는 유전체 배리어 방전 램프에 의한 처리 장치.
- 내부에 유전체 배리어 방전 램프가 배치된 램프실에 불활성 가스를 도입하고, 내부에 피처리물이 배치됨과 더불어 램프실과 자외선 투과 부재에 의해 구획된 처리실에 대하여, 상기 불활성 가스 도입의 전후, 또는 동시에 처리용 가스를 도입하며,상기 처리실 내의 가스 압력과 상기 램프실 내의 가스 압력을 각각 검출함과 더불어, 그 검출치에 기초하여, 상기 램프실 및 상기 처리실 중 적어도 하나의 가스 압력을 상대적으로 조정하는 것을 특징으로 하는 유전체 배리어 방전 램프에 의한 처리 방법.
- 제5항에 있어서, 상기 램프실과 상기 처리실의 가스 압력의 상대적인 조정은 양자의 차가 ±0.2기압 이내로 되도록 조정하는 것을 특징으로 하는 유전체 배리어 방전 램프에 의한 처리 방법.
- 제6항에 있어서, 상기 램프실과 상기 처리실의 가스 압력의 상대적인 조정은 양자의 가스 압력이 실질적으로 동등하게 되도록 조정하는 것을 특징으로 하는 유전체 배리어 방전 램프에 의한 처리 방법.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JPJP-P-2001-00347699 | 2001-11-13 | ||
JP2001347699A JP2003144913A (ja) | 2001-11-13 | 2001-11-13 | 誘電体バリア放電ランプによる処理装置、および処理方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20030040037A KR20030040037A (ko) | 2003-05-22 |
KR100671773B1 true KR100671773B1 (ko) | 2007-01-19 |
Family
ID=19160663
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020020062500A KR100671773B1 (ko) | 2001-11-13 | 2002-10-14 | 유전체 배리어 방전 램프에 의한 처리 장치, 및 처리 방법 |
Country Status (6)
Country | Link |
---|---|
US (1) | US6624428B2 (ko) |
EP (1) | EP1310298B1 (ko) |
JP (1) | JP2003144913A (ko) |
KR (1) | KR100671773B1 (ko) |
DE (1) | DE60220007T2 (ko) |
TW (1) | TW569280B (ko) |
Families Citing this family (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003246648A (ja) * | 2002-02-25 | 2003-09-02 | Canon Inc | 光学素子の洗浄方法 |
TWI264037B (en) * | 2004-01-20 | 2006-10-11 | Harison Toshiba Lighting Corp | Dielectric barrier discharge lamp, and ultraviolet-ray irradiation device |
JP4380591B2 (ja) * | 2004-09-13 | 2009-12-09 | ウシオ電機株式会社 | エキシマランプ装置 |
DE102004048005A1 (de) * | 2004-10-01 | 2006-04-13 | Dr. Hönle AG | Gasentladungslampe, System und Verfahren zum Härten von durch UV-Licht härtbare Materialien sowie durch UV-Licht gehärtetes Material |
JP4453527B2 (ja) * | 2004-11-22 | 2010-04-21 | ウシオ電機株式会社 | エキシマランプ装置 |
KR20070086649A (ko) * | 2004-11-25 | 2007-08-27 | 코닌클리즈케 필립스 일렉트로닉스 엔.브이. | 선택적인 통합된 냉각 회로를 갖는 램프와 밸러스트의조합체 |
JP4692249B2 (ja) * | 2005-11-30 | 2011-06-01 | ウシオ電機株式会社 | フィラメントランプ |
JP5118337B2 (ja) * | 2006-11-30 | 2013-01-16 | アペックス株式会社 | エキシマ真空紫外光照射処理装置 |
JP2009081076A (ja) * | 2007-09-27 | 2009-04-16 | Ushio Inc | エキシマランプ |
JP2010029784A (ja) * | 2008-07-29 | 2010-02-12 | Harison Toshiba Lighting Corp | 誘電体バリア放電ランプ装置 |
TWI384520B (zh) * | 2008-08-27 | 2013-02-01 | Wellypower Optronics Corp | 放電燈管及其製作方法 |
KR101042437B1 (ko) * | 2008-12-16 | 2011-06-16 | 현대위아 주식회사 | 차량의 샤프트용 댐퍼 |
WO2012009628A1 (en) * | 2010-07-16 | 2012-01-19 | Nordson Corporation | Lamp systems and methods for generating ultraviolet light |
DE102010043215A1 (de) | 2010-11-02 | 2012-05-03 | Osram Ag | Strahler mit Sockel für die Bestrahlung von Oberflächen |
DE102010043208A1 (de) | 2010-11-02 | 2012-05-03 | Osram Ag | Vorrichtung zum Bestrahlen von Oberflächen |
JP5729034B2 (ja) * | 2011-03-15 | 2015-06-03 | ウシオ電機株式会社 | 光照射装置 |
JP6133152B2 (ja) * | 2013-07-10 | 2017-05-24 | 株式会社ディスコ | 樹脂シート貼着方法 |
JP2015119127A (ja) * | 2013-12-20 | 2015-06-25 | ウシオ電機株式会社 | 光照射装置 |
JP6142797B2 (ja) * | 2013-12-27 | 2017-06-07 | ウシオ電機株式会社 | 光照射装置 |
US20150206741A1 (en) | 2014-01-17 | 2015-07-23 | Taiwan Semiconductor Manufacturing Co., Ltd. | Apparatus and method for in situ steam generation |
US10232954B2 (en) * | 2016-09-21 | 2019-03-19 | The Boeing Company | Apparatuses and methods for reducing ozone creation from ultraviolet (UV) light |
JP6294435B1 (ja) * | 2016-11-07 | 2018-03-14 | 日機装株式会社 | 流体殺菌装置 |
JP7002262B2 (ja) * | 2017-09-21 | 2022-01-20 | 株式会社Screenホールディングス | 露光装置、基板処理装置、露光方法および基板処理方法 |
EP3861331A4 (en) * | 2018-10-03 | 2022-04-27 | The Regents Of The University Of Michigan | BUILT-IN MICRO-PHOTOIONIZATION DETECTOR INCLUDING AN ULTRA-THIN UV TRANSMISSION WINDOW |
JP2021146231A (ja) * | 2020-03-16 | 2021-09-27 | ウシオ電機株式会社 | ガス供給装置 |
JP6947261B1 (ja) | 2020-09-01 | 2021-10-13 | ウシオ電機株式会社 | 紫外線照射装置 |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60193232A (ja) * | 1985-02-15 | 1985-10-01 | Hitachi Ltd | 管球の不活性ガス封入装置 |
JPH08124536A (ja) * | 1994-10-25 | 1996-05-17 | Ushio Inc | 誘電体バリア放電ランプ装置 |
JPH09199460A (ja) * | 1996-01-22 | 1997-07-31 | Dainippon Screen Mfg Co Ltd | 基板処理装置 |
JPH09302326A (ja) * | 1996-05-14 | 1997-11-25 | Ushio Inc | 耐紫外線材料、紫外線照射装置および紫外線処理装置 |
JPH10289694A (ja) * | 1997-04-11 | 1998-10-27 | Ushio Inc | 光源装置 |
JPH11204087A (ja) * | 1998-01-09 | 1999-07-30 | Ushio Inc | 光源装置 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6075327A (ja) * | 1983-09-30 | 1985-04-27 | Toshiba Corp | 紫外線発生装置及びそれを用いた材料処理装置 |
CH675504A5 (ko) | 1988-01-15 | 1990-09-28 | Asea Brown Boveri | |
DE4022279A1 (de) | 1989-08-17 | 1991-02-21 | Asea Brown Boveri | Bestrahlungseinrichtung |
JPH08124540A (ja) | 1994-10-25 | 1996-05-17 | Ushio Inc | キセノン照射装置とそれを用いた物体表面改質装置 |
JP3315843B2 (ja) | 1995-09-01 | 2002-08-19 | 大日本スクリーン製造株式会社 | 基板処理装置 |
US6057038A (en) * | 1996-08-02 | 2000-05-02 | Sharp Kabushiki Kaisha | Substrate for use in display element, method of manufacturing the same, and apparatus for manufacturing the same |
-
2001
- 2001-11-13 JP JP2001347699A patent/JP2003144913A/ja active Pending
-
2002
- 2002-09-10 TW TW091120623A patent/TW569280B/zh not_active IP Right Cessation
- 2002-10-14 KR KR1020020062500A patent/KR100671773B1/ko active IP Right Grant
- 2002-11-11 DE DE60220007T patent/DE60220007T2/de not_active Expired - Lifetime
- 2002-11-11 EP EP02025186A patent/EP1310298B1/en not_active Expired - Lifetime
- 2002-11-13 US US10/292,630 patent/US6624428B2/en not_active Expired - Lifetime
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60193232A (ja) * | 1985-02-15 | 1985-10-01 | Hitachi Ltd | 管球の不活性ガス封入装置 |
JPH08124536A (ja) * | 1994-10-25 | 1996-05-17 | Ushio Inc | 誘電体バリア放電ランプ装置 |
JPH09199460A (ja) * | 1996-01-22 | 1997-07-31 | Dainippon Screen Mfg Co Ltd | 基板処理装置 |
JPH09302326A (ja) * | 1996-05-14 | 1997-11-25 | Ushio Inc | 耐紫外線材料、紫外線照射装置および紫外線処理装置 |
JPH10289694A (ja) * | 1997-04-11 | 1998-10-27 | Ushio Inc | 光源装置 |
JPH11204087A (ja) * | 1998-01-09 | 1999-07-30 | Ushio Inc | 光源装置 |
Also Published As
Publication number | Publication date |
---|---|
TW569280B (en) | 2004-01-01 |
EP1310298B1 (en) | 2007-05-09 |
DE60220007T2 (de) | 2008-01-10 |
DE60220007D1 (de) | 2007-06-21 |
US6624428B2 (en) | 2003-09-23 |
EP1310298A1 (en) | 2003-05-14 |
JP2003144913A (ja) | 2003-05-20 |
US20030094909A1 (en) | 2003-05-22 |
KR20030040037A (ko) | 2003-05-22 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR100671773B1 (ko) | 유전체 배리어 방전 램프에 의한 처리 장치, 및 처리 방법 | |
JP3887291B2 (ja) | 基板処理装置 | |
JP3877157B2 (ja) | 基板処理装置 | |
JP5079949B2 (ja) | 処理装置および処理方法 | |
US7763869B2 (en) | UV light irradiating apparatus with liquid filter | |
US7695673B2 (en) | Processes and devices for sterilizing contaminated objects | |
KR102240492B1 (ko) | 열처리 장치 및 열처리 방법 | |
JP2008192709A (ja) | 真空紫外線モニタ及びそれを用いた真空紫外線照射装置 | |
JP2001300451A (ja) | 紫外光照射装置 | |
JP3315843B2 (ja) | 基板処理装置 | |
JPS6146290A (ja) | 流体処理装置 | |
JP2004041843A (ja) | 紫外線照射装置 | |
JP3314656B2 (ja) | 光源装置 | |
WO2022137725A1 (ja) | 基板処理装置、基板処理方法、および紫外線照射ユニット | |
JP3564988B2 (ja) | 光源装置 | |
JP3893942B2 (ja) | 紫外線照射装置 | |
JP2004119523A (ja) | 基板処理装置 | |
JPS6157237A (ja) | 光照射処理装置 | |
JP4078868B2 (ja) | 真空紫外光照射装置 | |
JP2001217216A (ja) | 紫外線照射方法及び装置 | |
WO2004030063A1 (ja) | 基板処理装置 | |
KR20010051892A (ko) | 자외선 조사방법 및 장치 | |
JP2004091828A (ja) | 基板処理装置のクリーニング方法及び基板処理装置 | |
JPH07105347B2 (ja) | 光化学気相成長方法 | |
JPH08267057A (ja) | 紫外線照射装置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant | ||
FPAY | Annual fee payment |
Payment date: 20121227 Year of fee payment: 7 |
|
FPAY | Annual fee payment |
Payment date: 20131218 Year of fee payment: 8 |
|
FPAY | Annual fee payment |
Payment date: 20141230 Year of fee payment: 9 |
|
FPAY | Annual fee payment |
Payment date: 20151217 Year of fee payment: 10 |
|
FPAY | Annual fee payment |
Payment date: 20161220 Year of fee payment: 11 |
|
FPAY | Annual fee payment |
Payment date: 20171219 Year of fee payment: 12 |
|
FPAY | Annual fee payment |
Payment date: 20181226 Year of fee payment: 13 |
|
FPAY | Annual fee payment |
Payment date: 20191217 Year of fee payment: 14 |