KR100597015B1 - 특정 패턴 형성용 기판, 박막 형성 기판 및 기판의 제조 방법 - Google Patents

특정 패턴 형성용 기판, 박막 형성 기판 및 기판의 제조 방법 Download PDF

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Publication number
KR100597015B1
KR100597015B1 KR1020007000370A KR20007000370A KR100597015B1 KR 100597015 B1 KR100597015 B1 KR 100597015B1 KR 1020007000370 A KR1020007000370 A KR 1020007000370A KR 20007000370 A KR20007000370 A KR 20007000370A KR 100597015 B1 KR100597015 B1 KR 100597015B1
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KR
South Korea
Prior art keywords
region
fluid
affinity
thin film
substrate
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Expired - Fee Related
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KR1020007000370A
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English (en)
Korean (ko)
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KR20010021806A (ko
Inventor
칸베사다오
세키순이치
후쿠시마히토시
키구치히로시
Original Assignee
세이코 엡슨 가부시키가이샤
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    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/02Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M3/00Printing processes to produce particular kinds of printed work, e.g. patterns
    • B41M3/006Patterns of chemical products used for a specific purpose, e.g. pesticides, perfumes, adhesive patterns; use of microencapsulated material; Printing on smoking articles
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/10Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/18Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
    • H05K3/181Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating
    • H05K3/182Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method
    • H05K3/185Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method by making a catalytic pattern by photo-imaging
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/24Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/31504Composite [nonstructural laminate]
    • Y10T428/31652Of asbestos
    • Y10T428/31663As siloxane, silicone or silane

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • General Chemical & Material Sciences (AREA)
  • Pest Control & Pesticides (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
  • Structure Of Printed Boards (AREA)
  • Particle Formation And Scattering Control In Inkjet Printers (AREA)
KR1020007000370A 1998-05-14 1999-05-14 특정 패턴 형성용 기판, 박막 형성 기판 및 기판의 제조 방법 Expired - Fee Related KR100597015B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP98-132446 1998-05-14
JP13244698A JP3606047B2 (ja) 1998-05-14 1998-05-14 基板の製造方法
PCT/JP1999/002524 WO1999059386A1 (en) 1998-05-14 1999-05-14 Substrate for formation of special pattern, and method of manufacture of substrate

Publications (2)

Publication Number Publication Date
KR20010021806A KR20010021806A (ko) 2001-03-15
KR100597015B1 true KR100597015B1 (ko) 2006-07-06

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020007000370A Expired - Fee Related KR100597015B1 (ko) 1998-05-14 1999-05-14 특정 패턴 형성용 기판, 박막 형성 기판 및 기판의 제조 방법

Country Status (7)

Country Link
US (2) US6733868B1 (enExample)
EP (1) EP1011298B1 (enExample)
JP (1) JP3606047B2 (enExample)
KR (1) KR100597015B1 (enExample)
CN (2) CN1247054C (enExample)
DE (1) DE69939420D1 (enExample)
WO (1) WO1999059386A1 (enExample)

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JP3606047B2 (ja) * 1998-05-14 2005-01-05 セイコーエプソン株式会社 基板の製造方法
JP2002340989A (ja) * 2001-05-15 2002-11-27 Semiconductor Energy Lab Co Ltd 測定方法、検査方法及び検査装置
US6973710B2 (en) * 2001-08-03 2005-12-13 Seiko Epson Corporation Method and apparatus for making devices
JP4039035B2 (ja) 2001-10-31 2008-01-30 セイコーエプソン株式会社 線パターンの形成方法、線パターン、電気光学装置、電子機器、非接触型カード媒体
US20030108725A1 (en) * 2001-12-10 2003-06-12 Matthew Hamilton Visual images produced by surface patterning
GB0207350D0 (en) * 2002-03-28 2002-05-08 Univ Sheffield Surface
JP4068883B2 (ja) * 2002-04-22 2008-03-26 セイコーエプソン株式会社 導電膜配線の形成方法、膜構造体の製造方法、電気光学装置の製造方法、及び電子機器の製造方法
JP2004066138A (ja) * 2002-08-07 2004-03-04 Fujimori Gijutsu Kenkyusho:Kk 薄膜形成方法及びパターン形成方法並びにパターン形成装置
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KR100623227B1 (ko) * 2004-05-27 2006-09-19 학교법인 영남학원 오프셋 인쇄방식을 이용한 적층형 전자소자 제조방법
FR2872911B1 (fr) * 2004-07-07 2006-09-15 Commissariat Energie Atomique Procede de localisation d'une espece chimique ou biologique sur un substrat, microsysteme d'analyse et biopuce
USD564721S1 (en) * 2004-10-20 2008-03-18 The Procter & Gamble Company Cleaning article
GB0424005D0 (en) * 2004-10-29 2004-12-01 Eastman Kodak Co Method of coating
DE102004058209A1 (de) * 2004-12-02 2006-06-08 Printed Systems Gmbh Verfahren und Vorrichtung zur Erzeugung von Strukturen aus Funktionsmaterialien
KR101290012B1 (ko) * 2004-12-30 2013-07-30 이 아이 듀폰 디 네모아 앤드 캄파니 유기 전자 장치 및 방법
JP4151652B2 (ja) * 2005-01-11 2008-09-17 セイコーエプソン株式会社 識別コード描画方法
DE602005011870D1 (de) 2005-07-01 2009-01-29 Commissariat Energie Atomique Hydrophobe oberflächenbeschichtung mit geringer benetzungshysterese, aufbringungsverfahren dafür, mikrokomponente und verwendung
US20070259114A1 (en) * 2006-05-02 2007-11-08 Boston Scientific Scimed, Inc. Partially coated workpieces and method and system for making the same
JP4929115B2 (ja) * 2007-09-28 2012-05-09 本田技研工業株式会社 船外機用塗装金属製品及び同製造方法
JP5206154B2 (ja) * 2008-06-27 2013-06-12 富士通株式会社 配線基板の製造方法
US8173552B2 (en) * 2009-08-04 2012-05-08 Intel Corporation Method of fabricating an identification mark utilizing a liquid film assisted by a laser
JP5402511B2 (ja) * 2009-10-19 2014-01-29 セイコーエプソン株式会社 液晶装置及びその製造方法、並びに電子機器
JP5797883B2 (ja) * 2010-06-07 2015-10-21 住友電気工業株式会社 プリント配線板用基板
US8828484B2 (en) * 2013-01-28 2014-09-09 Taiwan Semiconductor Manufacturing Co., Ltd. Self-alignment due to wettability difference of an interface
CN103213940B (zh) * 2013-03-15 2016-04-06 北京工业大学 一种基于微纳米尺度使材料具有两种不同浸润性的方法
EP2799154A1 (en) * 2013-05-03 2014-11-05 Nederlandse Organisatie voor toegepast -natuurwetenschappelijk onderzoek TNO Slot-die coating method, apparatus, and substrate
USD765327S1 (en) * 2013-06-27 2016-08-30 The Procter & Gamble Company Pad
US9305807B2 (en) * 2014-02-27 2016-04-05 Palo Alto Research Center Incorporated Fabrication method for microelectronic components and microchip inks used in electrostatic assembly
WO2016194968A1 (ja) * 2015-06-02 2016-12-08 株式会社村田製作所 金属層の形成方法
DE102015224992A1 (de) * 2015-12-11 2017-06-14 Robert Bosch Gmbh Verfahren zum mikrostrukturierten Aufbringen einer Flüssigkeit oder Paste auf eine Oberfläche
JPWO2019177120A1 (ja) * 2018-03-16 2021-03-25 Agc株式会社 膜付き基材
JP2021181158A (ja) * 2018-08-20 2021-11-25 Agc株式会社 膜付き基材の製造方法

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EP0794015A1 (en) * 1996-03-04 1997-09-10 Motorola, Inc. Apparatus and method for patterning a surface

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Also Published As

Publication number Publication date
EP1011298A4 (en) 2003-08-27
US20040169004A1 (en) 2004-09-02
CN1697598A (zh) 2005-11-16
CN1247054C (zh) 2006-03-22
US6733868B1 (en) 2004-05-11
EP1011298B1 (en) 2008-08-27
JPH11330666A (ja) 1999-11-30
EP1011298A1 (en) 2000-06-21
KR20010021806A (ko) 2001-03-15
JP3606047B2 (ja) 2005-01-05
WO1999059386A1 (en) 1999-11-18
CN1274516A (zh) 2000-11-22
DE69939420D1 (de) 2008-10-09

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