JPS51106638A - Zetsuentaihyomenno fukatsuseikaho - Google Patents
Zetsuentaihyomenno fukatsuseikahoInfo
- Publication number
- JPS51106638A JPS51106638A JP3121475A JP3121475A JPS51106638A JP S51106638 A JPS51106638 A JP S51106638A JP 3121475 A JP3121475 A JP 3121475A JP 3121475 A JP3121475 A JP 3121475A JP S51106638 A JPS51106638 A JP S51106638A
- Authority
- JP
- Japan
- Prior art keywords
- zetsuentaihyomenno
- fukatsuseikaho
- zetsuentaihyomenno fukatsuseikaho
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Manufacturing Of Printed Wiring (AREA)
- Chemically Coating (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3121475A JPS51106638A (en) | 1975-03-17 | 1975-03-17 | Zetsuentaihyomenno fukatsuseikaho |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3121475A JPS51106638A (en) | 1975-03-17 | 1975-03-17 | Zetsuentaihyomenno fukatsuseikaho |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS51106638A true JPS51106638A (en) | 1976-09-21 |
Family
ID=12325172
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3121475A Pending JPS51106638A (en) | 1975-03-17 | 1975-03-17 | Zetsuentaihyomenno fukatsuseikaho |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS51106638A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1999059386A1 (en) * | 1998-05-14 | 1999-11-18 | Seiko Epson Corporation | Substrate for formation of special pattern, and method of manufacture of substrate |
-
1975
- 1975-03-17 JP JP3121475A patent/JPS51106638A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1999059386A1 (en) * | 1998-05-14 | 1999-11-18 | Seiko Epson Corporation | Substrate for formation of special pattern, and method of manufacture of substrate |
US6733868B1 (en) | 1998-05-14 | 2004-05-11 | Seiko Epson Corporation | Substrate for forming specific pattern, and method for manufacturing same |
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