KR100588456B1 - 옥세탄 화합물, 옥세탄 공중합체 및 옥세탄 화합물의 제조방법 - Google Patents
옥세탄 화합물, 옥세탄 공중합체 및 옥세탄 화합물의 제조방법 Download PDFInfo
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- KR100588456B1 KR100588456B1 KR1020017000276A KR20017000276A KR100588456B1 KR 100588456 B1 KR100588456 B1 KR 100588456B1 KR 1020017000276 A KR1020017000276 A KR 1020017000276A KR 20017000276 A KR20017000276 A KR 20017000276A KR 100588456 B1 KR100588456 B1 KR 100588456B1
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D407/00—Heterocyclic compounds containing two or more hetero rings, at least one ring having oxygen atoms as the only ring hetero atoms, not provided for by group C07D405/00
- C07D407/02—Heterocyclic compounds containing two or more hetero rings, at least one ring having oxygen atoms as the only ring hetero atoms, not provided for by group C07D405/00 containing two hetero rings
- C07D407/04—Heterocyclic compounds containing two or more hetero rings, at least one ring having oxygen atoms as the only ring hetero atoms, not provided for by group C07D405/00 containing two hetero rings directly linked by a ring-member-to-ring-member bond
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D305/00—Heterocyclic compounds containing four-membered rings having one oxygen atom as the only ring hetero atoms
- C07D305/02—Heterocyclic compounds containing four-membered rings having one oxygen atom as the only ring hetero atoms not condensed with other rings
- C07D305/04—Heterocyclic compounds containing four-membered rings having one oxygen atom as the only ring hetero atoms not condensed with other rings having no double bonds between ring members or between ring members and non-ring members
- C07D305/06—Heterocyclic compounds containing four-membered rings having one oxygen atom as the only ring hetero atoms not condensed with other rings having no double bonds between ring members or between ring members and non-ring members with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to the ring atoms
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- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D409/00—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms
- C07D409/02—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings
- C07D409/04—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings directly linked by a ring-member-to-ring-member bond
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F16/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal or ketal radical
- C08F16/12—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal or ketal radical by an ether radical
- C08F16/14—Monomers containing only one unsaturated aliphatic radical
- C08F16/26—Monomers containing oxygen atoms in addition to the ether oxygen
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F216/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal or ketal radical
- C08F216/12—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal or ketal radical by an ether radical
- C08F216/14—Monomers containing only one unsaturated aliphatic radical
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
- C08G61/12—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
- C08G65/04—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
- C08G65/06—Cyclic ethers having no atoms other than carbon and hydrogen outside the ring
- C08G65/16—Cyclic ethers having four or more ring atoms
- C08G65/18—Oxetanes
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
- C08G65/04—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
- C08G65/22—Cyclic ethers having at least one atom other than carbon and hydrogen outside the ring
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Polyethers (AREA)
- Epoxy Compounds (AREA)
Abstract
Description
Claims (5)
- 하기 화학식 1로 표시되는 옥세탄 화합물을 라디칼 중합하여 얻어지는, GPC (Gel Permeation Chromatography, 겔 투과 크로마토그래피)를 이용해서 측정된 폴리스티렌 환산 수평균 분자량이 1,000 내지 1,000,000의 범위 내의 옥세탄 공중합체.<화학식 1>상기 식 중, 치환기 R1은 수소 원자, 알킬기, 불소 원자, 플루오로알킬기, 알릴기, 아릴기, 푸릴기 또는 티에닐기이고, 치환기 R2, R3 및 R4는 각각 독립적으로 수소 원자 또는 탄소수 1 내지 6의 알킬기이며, m 및 n은 각각 1 내지 1O의 정수이다.
- 제2항에 있어서, 상기 옥세탄 공중합체가 하기 화학식 2로 표시되는 옥세탄 공중합체.<화학식 2>상기 식 중, 치환기 R1은 수소 원자, 알킬기, 불소 원자, 플루오로알킬기, 알릴기, 아릴기, 푸릴기 또는 티에닐기이고, 치환기 R2, R3 및 R4는 각각 독립적으로 수소 원자 또는 탄소수 1 내지 6의 알킬기이고, 치환기 R5는 수소 원자, 불소 원자 또는 염소 원자이고, 치환기 R6은 수소 원자, 불소 원자, 플루오로알킬기, 알콕시기 또는 불화알콕시기로 표시되는 기이고, m 및 n은 각각 1 내지 1O의 정수이고, a 및 b는 각각 0.1 내지 99.9 몰% 범위 내 값이다.
- 하기 화학식 1로 표시되는 옥세탄 화합물의 제조 방법에 있어서, 하기 화학식 4로 표시되는 옥세탄알코올 화합물과 하기 화학식 5로 표시되는 할로겐화 비닐에테르 화합물을 상간 이동 촉매의 존재하에 반응시키는 것을 특징으로 하는 옥세탄 화합물의 제조 방법.<화학식 1>상기 식 중, 치환기 R1은 수소 원자, 알킬기, 불소 원자, 플루오로알킬기, 알릴기, 아릴기, 푸릴기 또는 티에닐기이고, 치환기 R2, R3 및 R4는 각각 수소 원자 또는 탄소수 1 내지 6의 알킬기이며, m 및 n은 각각 1 내지 1O의 정수이다.<화학식 4>상기 식 중, 치환기 R1 및 반복수 m은 화학식 1의 내용과 동일하다.<화학식 5>상기 식 중, 치환기 R2, R3, R4 및 반복수 n은 각각 화학식 1의 내용과 동일하고, X는 할로겐 원자이다.
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19481598A JP4200548B2 (ja) | 1998-07-09 | 1998-07-09 | オキセタン化合物およびその製造方法 |
JP19481698A JP3956490B2 (ja) | 1998-07-09 | 1998-07-09 | オキセタン共重合体およびその製造方法 |
JP98-194816 | 1998-07-09 | ||
JP98-194815 | 1998-07-09 |
Publications (2)
Publication Number | Publication Date |
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KR20010071785A KR20010071785A (ko) | 2001-07-31 |
KR100588456B1 true KR100588456B1 (ko) | 2006-06-13 |
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Application Number | Title | Priority Date | Filing Date |
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KR1020017000276A KR100588456B1 (ko) | 1998-07-09 | 1999-06-25 | 옥세탄 화합물, 옥세탄 공중합체 및 옥세탄 화합물의 제조방법 |
Country Status (6)
Country | Link |
---|---|
US (1) | US6495636B2 (ko) |
EP (1) | EP1095938B1 (ko) |
KR (1) | KR100588456B1 (ko) |
DE (1) | DE69941954D1 (ko) |
TW (1) | TW552272B (ko) |
WO (1) | WO2000002873A1 (ko) |
Families Citing this family (27)
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DE69941954D1 (de) | 1998-07-09 | 2010-03-11 | Jsr Corp | Oxetanderivate, oxetancopolymer, und verfahren zur herstellung von oxetanderivaten |
EP1548062B1 (en) * | 2002-08-13 | 2011-10-05 | Daikin Industries, Ltd. | Optical material containing photocurable fluoropolymer and photocurable fluororesin composition |
US7084184B2 (en) * | 2002-08-30 | 2006-08-01 | Konica Corporation | Actinic ray curable composition, actinic ray curable ink, image forming method, and ink jet recording apparatus |
WO2004090646A1 (ja) * | 2003-04-09 | 2004-10-21 | Konica Minolta Medical & Graphic, Inc. | ホログラフィック記録メディア及びその記録方法 |
US6953121B2 (en) * | 2003-05-06 | 2005-10-11 | Johnson Crushers International | Vibrating screen |
US6953862B2 (en) * | 2003-05-06 | 2005-10-11 | National Starch And Chemical Investment Holding Corporation | Oxetane compounds containing styrenic functionality |
US7034064B2 (en) | 2003-05-06 | 2006-04-25 | National Starch And Chemical Investment Holding Corporation | Method of attaching a die to a substrate using a hybrid oxetane compound |
JP4037856B2 (ja) * | 2003-10-28 | 2008-01-23 | 東芝テック株式会社 | インクジェットインク |
US7288514B2 (en) * | 2005-04-14 | 2007-10-30 | The Clorox Company | Polymer-fluorosurfactant associative complexes |
EP2103639A1 (en) * | 2005-11-04 | 2009-09-23 | Fujifilm Corporation | Curable polycyclic epoxy composition, ink composition and inkjet recording method therewith |
ATE496766T1 (de) * | 2006-03-03 | 2011-02-15 | Fujifilm Corp | Härtbare zusammensetzung, tintenzusammensetzung, tintenstrahlaufzeichnungsverfahren und flachdruckplatte |
US20100189809A1 (en) * | 2006-08-23 | 2010-07-29 | The Clorox Company | Foamable Compositions Containing Alcohol |
US7723279B2 (en) * | 2006-08-23 | 2010-05-25 | The Clorox Company | Foamable compositions containing alcohol |
EP2233475A1 (en) * | 2007-03-23 | 2010-09-29 | Daicel Chemical Industries, Ltd. | Epoxycyclohexane vinyl ether compounds and their use in polymerizable compositions |
US8434793B2 (en) * | 2007-07-19 | 2013-05-07 | Swagelok Company | Coated seals |
WO2011021670A1 (ja) | 2009-08-20 | 2011-02-24 | 旭硝子株式会社 | 光硬化性含フッ素重合体組成物 |
KR20130098866A (ko) * | 2010-04-16 | 2013-09-05 | 가부시끼가이샤 다이셀 | 라디칼 중합성 수지, 라디칼 중합성 수지 조성물 및 그의 경화물 |
CN104011130B (zh) * | 2011-12-28 | 2017-04-26 | 旭硝子株式会社 | 光固化性含氟共聚物组合物 |
NO20140637A1 (no) | 2014-05-21 | 2015-11-23 | The Future Group As | Virtuell protokoll |
TWI519560B (zh) | 2014-11-24 | 2016-02-01 | 財團法人工業技術研究院 | 含氧雜環丁烷基與環氧基之樹脂與樹脂組成物 |
WO2017136266A1 (en) * | 2016-02-05 | 2017-08-10 | The Chemours Company Fc, Llc | Fluoropolymer solution for forming a fluoropolymer coating |
CN107619399B (zh) | 2016-07-13 | 2021-04-27 | 常州强力先端电子材料有限公司 | 多官能度氧杂环丁烷类化合物及其制备方法 |
CN107621752B (zh) | 2016-07-13 | 2019-11-12 | 常州强力先端电子材料有限公司 | 一种混杂型光敏树脂及其制备方法 |
TWI702241B (zh) * | 2016-12-09 | 2020-08-21 | 南韓商Lg化學股份有限公司 | 封裝組成物 |
CN109305947B (zh) * | 2017-07-27 | 2023-01-13 | 常州强力先端电子材料有限公司 | 一种氧杂环丁烷类单体化合物及其制备方法 |
CN111057029B (zh) * | 2018-10-17 | 2021-12-10 | 北京师范大学 | 含氟阳离子聚合单体及其合成和应用 |
CN115746186A (zh) * | 2022-11-24 | 2023-03-07 | 湖北固润科技股份有限公司 | 含有氧杂环丁烷官能团的丙烯酸系预聚物及其制备和应用 |
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CH452201A (de) * | 1965-04-01 | 1968-05-31 | Ciba Geigy | Verfahren zur Herstellung von neuen Oxetangruppen enthaltenden Polymerisaten |
US5807977A (en) * | 1992-07-10 | 1998-09-15 | Aerojet General Corporation | Polymers and prepolymers from mono-substituted fluorinated oxetane monomers |
JP2902269B2 (ja) * | 1993-06-30 | 1999-06-07 | レンセラー ポリテクニク インスチチュート | オキセタン化合物 |
US6096903A (en) * | 1997-03-25 | 2000-08-01 | Ivoclar Ag | Hydrolysable and polymerizable oxetane silanes |
JPH10316670A (ja) * | 1997-05-16 | 1998-12-02 | Nippon Kayaku Co Ltd | 新規オキセタンビニルエーテル、重合性組成物およびその硬化物 |
TW482817B (en) * | 1998-06-18 | 2002-04-11 | Jsr Corp | Photosetting compositions and photoset articles |
DE69941954D1 (de) | 1998-07-09 | 2010-03-11 | Jsr Corp | Oxetanderivate, oxetancopolymer, und verfahren zur herstellung von oxetanderivaten |
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1999
- 1999-06-25 DE DE69941954T patent/DE69941954D1/de not_active Expired - Lifetime
- 1999-06-25 KR KR1020017000276A patent/KR100588456B1/ko not_active IP Right Cessation
- 1999-06-25 EP EP99960679A patent/EP1095938B1/en not_active Expired - Lifetime
- 1999-06-25 WO PCT/JP1999/003432 patent/WO2000002873A1/ja active IP Right Grant
- 1999-06-28 TW TW088110827A patent/TW552272B/zh not_active IP Right Cessation
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2001
- 2001-01-09 US US09/756,220 patent/US6495636B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
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EP1095938B1 (en) | 2010-01-20 |
US6495636B2 (en) | 2002-12-17 |
KR20010071785A (ko) | 2001-07-31 |
WO2000002873A1 (fr) | 2000-01-20 |
EP1095938A4 (en) | 2005-01-05 |
US20010002423A1 (en) | 2001-05-31 |
TW552272B (en) | 2003-09-11 |
DE69941954D1 (de) | 2010-03-11 |
EP1095938A1 (en) | 2001-05-02 |
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