KR100282273B1 - 감광성 조성물 및 이들을 광중합시키는 방법 - Google Patents

감광성 조성물 및 이들을 광중합시키는 방법 Download PDF

Info

Publication number
KR100282273B1
KR100282273B1 KR1019930028653A KR930028653A KR100282273B1 KR 100282273 B1 KR100282273 B1 KR 100282273B1 KR 1019930028653 A KR1019930028653 A KR 1019930028653A KR 930028653 A KR930028653 A KR 930028653A KR 100282273 B1 KR100282273 B1 KR 100282273B1
Authority
KR
South Korea
Prior art keywords
component
weight
acrylate
meth
photosensitive composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
KR1019930028653A
Other languages
English (en)
Korean (ko)
Other versions
KR940015712A (ko
Inventor
슈타인만 베티나
피에레 볼프 제안
슐테스 아드리안
훈지커 막스
Original Assignee
베르너 훽스트, 지크프리트 포트호프
반티코 아게
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=4266050&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=KR100282273(B1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by 베르너 훽스트, 지크프리트 포트호프, 반티코 아게 filed Critical 베르너 훽스트, 지크프리트 포트호프
Publication of KR940015712A publication Critical patent/KR940015712A/ko
Application granted granted Critical
Publication of KR100282273B1 publication Critical patent/KR100282273B1/ko
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0037—Production of three-dimensional images
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y70/00—Materials specially adapted for additive manufacturing
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F283/00—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F283/00—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
    • C08F283/10—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G on to polymers containing more than one epoxy radical per molecule
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L67/00—Compositions of polyesters obtained by reactions forming a carboxylic ester link in the main chain; Compositions of derivatives of such polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Epoxy Resins (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Nitrogen Condensed Heterocyclic Rings (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Materials For Photolithography (AREA)
KR1019930028653A 1992-12-21 1993-12-17 감광성 조성물 및 이들을 광중합시키는 방법 Expired - Lifetime KR100282273B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CH92-7/3906 1992-12-21
CH390692 1992-12-21

Publications (2)

Publication Number Publication Date
KR940015712A KR940015712A (ko) 1994-07-21
KR100282273B1 true KR100282273B1 (ko) 2001-03-02

Family

ID=4266050

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019930028653A Expired - Lifetime KR100282273B1 (ko) 1992-12-21 1993-12-17 감광성 조성물 및 이들을 광중합시키는 방법

Country Status (10)

Country Link
US (1) US5476748A (https=)
EP (1) EP0605361B1 (https=)
JP (1) JP3203461B2 (https=)
KR (1) KR100282273B1 (https=)
AT (1) ATE151085T1 (https=)
AU (1) AU658780B2 (https=)
CA (1) CA2111718C (https=)
DE (1) DE59306034D1 (https=)
ES (1) ES2100513T3 (https=)
TW (1) TW269017B (https=)

Families Citing this family (107)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01187424A (ja) * 1988-01-22 1989-07-26 Toshiba Corp トルクセンサ
TW311923B (https=) * 1992-01-27 1997-08-01 Ciba Sc Holding Ag
JPH07291673A (ja) * 1994-04-28 1995-11-07 Kobe Steel Ltd 可撓性を有する光ファイバーケーブル用複合強化材
JP3475528B2 (ja) * 1994-11-18 2003-12-08 東洋インキ製造株式会社 紫外線硬化型樹脂組成物およびこれを含む被覆剤
JP3117394B2 (ja) * 1994-11-29 2000-12-11 帝人製機株式会社 光学的立体造形用樹脂組成物
JPH10510401A (ja) * 1994-12-09 1998-10-06 シーメンス アクチエンゲゼルシヤフト 表面波構成素子及びそのための減衰構造体の製法
TW418215B (en) * 1995-03-13 2001-01-11 Ciba Sc Holding Ag A process for the production of three-dimensional articles in a stereolithography bath comprising the step of sequentially irradiating a plurality of layers of a liquid radiation-curable composition
US5639413A (en) * 1995-03-30 1997-06-17 Crivello; James Vincent Methods and compositions related to stereolithography
WO1996035756A1 (fr) * 1995-05-12 1996-11-14 Asahi Denka Kogyo Kabushiki Kaisha Composition a base de resines stereolithographiques et procede de stereolithographie
US5707780A (en) * 1995-06-07 1998-01-13 E. I. Du Pont De Nemours And Company Photohardenable epoxy composition
DE19630705A1 (de) 1995-08-30 1997-03-20 Deutsche Telekom Ag Verfahren zur Herstellung von 3-dimensional strukturierten Polymerschichten für die integrierte Optik
DE19534664A1 (de) * 1995-09-19 1997-03-20 Thera Ges Fuer Patente Lichtinitiiert kationisch härtende, dauerflexible Epoxidharzmasse und ihre Verwendung
DE19534668A1 (de) * 1995-09-19 1997-03-20 Thera Ges Fuer Patente Kettenverlängerte Epoxidharze enthaltende, vorwiegend kationisch härtende Masse
DE19534594B4 (de) * 1995-09-19 2007-07-26 Delo Industrieklebstoffe Gmbh & Co. Kg Kationisch härtende, flexible Epoxidharzmassen und ihre Verwendung zum Auftragen dünner Schichten
DE19541075C1 (de) * 1995-11-03 1997-04-24 Siemens Ag Photohärtbares Harz mit geringem Schwund und dessen Verwendung in einem Stereolithographieverfahren
JP3626275B2 (ja) * 1996-04-09 2005-03-02 Ｊｓｒ株式会社 光硬化性樹脂組成物
DE69703205T2 (de) * 1996-05-09 2001-04-26 Dsm N.V., Heerlen Lichtempfindliche harzzusammensetzung für rapid prototyping und ein verfahren zur herstellung von dreidimensionalen objekten
KR100491736B1 (ko) * 1996-07-29 2005-09-09 반티코 아게 입체리토그래피용방사선-경화성액체조성물
JP3825506B2 (ja) 1996-09-02 2006-09-27 Ｊｓｒ株式会社 液状硬化性樹脂組成物
US5766277A (en) * 1996-09-20 1998-06-16 Minnesota Mining And Manufacturing Company Coated abrasive article and method of making same
JP3724893B2 (ja) * 1996-09-25 2005-12-07 ナブテスコ株式会社 光学的立体造形用樹脂組成物
JP3786480B2 (ja) * 1996-10-14 2006-06-14 Ｊｓｒ株式会社 光硬化性樹脂組成物
JP3844824B2 (ja) 1996-11-26 2006-11-15 株式会社Ａｄｅｋａ エネルギー線硬化性エポキシ樹脂組成物、光学的立体造形用樹脂組成物及び光学的立体造形方法
JP3650238B2 (ja) * 1996-12-10 2005-05-18 Ｊｓｒ株式会社 光硬化性樹脂組成物
JP3626302B2 (ja) * 1996-12-10 2005-03-09 Ｊｓｒ株式会社 光硬化性樹脂組成物
JP3765896B2 (ja) 1996-12-13 2006-04-12 Ｊｓｒ株式会社 光学的立体造形用光硬化性樹脂組成物
FR2757530A1 (fr) * 1996-12-24 1998-06-26 Rhodia Chimie Sa Utilisation pour la stereophotolithographie - d'une composition liquide photoreticulable par voie cationique comprenant un photoamorceur du type sels d'onium ou de complexes organometalliques
US6054250A (en) * 1997-02-18 2000-04-25 Alliedsignal Inc. High temperature performance polymers for stereolithography
EP0960354A1 (en) * 1997-02-14 1999-12-01 Alliedsignal Inc. High temperature performance polymers for stereolithography
EP0887706A1 (en) 1997-06-25 1998-12-30 Wako Pure Chemical Industries, Ltd Resist composition containing specific cross-linking agent
DE59802943D1 (de) * 1997-06-30 2002-03-14 Siemens Ag Reaktionsharzmischungen und deren Verwendung
US6287745B1 (en) 1998-02-18 2001-09-11 Dsm N.V. Photocurable liquid resin composition comprising an epoxy-branched alicyclic compound
US6448346B1 (en) 1998-03-10 2002-09-10 Canon Kabushiki Kaisha Fluorine-containing epoxy resin composition, and surface modification process, ink jet recording head and ink jet recording apparatus making use of the same
US6472129B2 (en) * 1998-03-10 2002-10-29 Canon Kabushiki Kaisha Fluorine-containing epoxy resin composition, and surface modification process, ink jet recording head and ink jet recording apparatus making use of the same
US6344526B1 (en) * 1998-03-10 2002-02-05 Canon Kabushiki Kaisha Fluorine-containing epoxy resin composition, and surface modification process, ink jet recording head and ink jet recording apparatus using same
US6136497A (en) * 1998-03-30 2000-10-24 Vantico, Inc. Liquid, radiation-curable composition, especially for producing flexible cured articles by stereolithography
US6100007A (en) * 1998-04-06 2000-08-08 Ciba Specialty Chemicals Corp. Liquid radiation-curable composition especially for producing cured articles by stereolithography having high heat deflection temperatures
JP3907144B2 (ja) * 1998-04-09 2007-04-18 富士フイルム株式会社 平版印刷版の製造方法、レーザ走査露光用平版印刷版原版、および光重合性組成物
US20060154175A9 (en) * 1998-07-10 2006-07-13 Lawton John A Solid imaging compositions for preparing polypropylene-like articles
US6287748B1 (en) * 1998-07-10 2001-09-11 Dsm N.V. Solid imaging compositions for preparing polyethylene-like articles
US6762002B2 (en) 1998-07-10 2004-07-13 Dsm Desotech, Inc. Solid imaging compositions for preparing polypropylene-like articles
US6379866B2 (en) * 2000-03-31 2002-04-30 Dsm Desotech Inc Solid imaging compositions for preparing polypropylene-like articles
CN1237856C (zh) 1998-09-18 2006-01-18 范蒂科股份公司 多层电路的制造方法
AU3023301A (en) * 2000-02-08 2001-08-20 Vantico Ag Liquid, radiation-curable composition, especially for stereolithography
US6350792B1 (en) 2000-07-13 2002-02-26 Suncolor Corporation Radiation-curable compositions and cured articles
US6579914B1 (en) * 2000-07-14 2003-06-17 Alcatel Coating compositions for optical waveguides and optical waveguides coated therewith
JP4839525B2 (ja) * 2000-09-29 2011-12-21 大日本印刷株式会社 感光性樹脂組成物および液晶ディスプレイ用カラーフィルタ
US6811937B2 (en) * 2001-06-21 2004-11-02 Dsm Desotech, Inc. Radiation-curable resin composition and rapid prototyping process using the same
US20030149124A1 (en) * 2001-11-27 2003-08-07 Thommes Glen A. Radiation curable resin composition for making colored three dimensional objects
US20030198824A1 (en) 2002-04-19 2003-10-23 Fong John W. Photocurable compositions containing reactive polysiloxane particles
JP2005529200A (ja) 2002-05-03 2005-09-29 ディーエスエム アイピー アセッツ ビー．ブイ． 照射硬化可能な樹脂組成物及びそれを用いるラピッドプロトタイピング法
GB0212977D0 (en) * 2002-06-06 2002-07-17 Vantico Ag Actinic radiation curable compositions and their use
US6989225B2 (en) * 2002-07-18 2006-01-24 3D Systems, Inc. Stereolithographic resins with high temperature and high impact resistance
US20040077745A1 (en) * 2002-10-18 2004-04-22 Jigeng Xu Curable compositions and rapid prototyping process using the same
US20040087687A1 (en) * 2002-10-30 2004-05-06 Vantico A&T Us Inc. Photocurable compositions with phosphite viscosity stabilizers
US20040170923A1 (en) * 2003-02-27 2004-09-02 3D Systems, Inc. Colored stereolithographic resins
US20040229002A1 (en) * 2003-05-15 2004-11-18 3D Systems, Inc. Stereolithographic seal and support structure for semiconductor wafer
US7232850B2 (en) * 2003-10-03 2007-06-19 Huntsman Advanced Materials Americas Inc. Photocurable compositions for articles having stable tensile properties
US20070149667A1 (en) * 2003-10-16 2007-06-28 Dsm Ip Assets B.V. Curable compositions and rapid prototyping process using the same
DE10349394A1 (de) * 2003-10-21 2005-05-25 Marabuwerke Gmbh & Co. Kg UV-härtendes Bindemittel für Farben oder Lacke zur Bedruckung von Glas und Verfahren zur Bedruckung von Glassubstraten
US20050101684A1 (en) * 2003-11-06 2005-05-12 Xiaorong You Curable compositions and rapid prototyping process using the same
US20050165127A1 (en) * 2003-12-31 2005-07-28 Dsm Desotech, Inc. Solid imaging compositions for preparing polyethylene-like articles
US20050158660A1 (en) * 2004-01-20 2005-07-21 Dsm Desotech, Inc. Solid imaging compositions for preparing polypropylene-like articles
KR20070004649A (ko) * 2004-01-27 2007-01-09 시바 스페셜티 케미칼스 홀딩 인크. 열적으로 안정한 양이온성 광경화성 조성물
WO2005092598A1 (en) * 2004-03-22 2005-10-06 Huntsman Advanced Materials (Switzerland) Gmbh Photocurable compositions
WO2006029095A1 (en) * 2004-09-03 2006-03-16 Henkel Corporation Photoinitiated cationic epoxy compositions
US20110144271A1 (en) 2005-06-16 2011-06-16 Jsr Corporation Radioactive ray-curable liquid resin composition for use in optical stereolithography, and optically shaped article produced by curing the composition
JP4873239B2 (ja) * 2005-09-28 2012-02-08 Ｄｉｃ株式会社 紫外線硬化性樹脂組成物
US20070092733A1 (en) * 2005-10-26 2007-04-26 3M Innovative Properties Company Concurrently curable hybrid adhesive composition
DE102006000867A1 (de) * 2006-01-05 2007-07-12 Marabuwerke Gmbh & Co. Kg UV-härtende Glasdruckfarbe und UV-härtender Glasdrucklack sowie Verfahren zum Bedrucken von Glassubstraten
US20080103226A1 (en) 2006-10-31 2008-05-01 Dsm Ip Assets B.V. Photo-curable resin composition
JP2008201913A (ja) 2007-02-20 2008-09-04 Fujifilm Corp 光重合性組成物
US9207373B2 (en) 2007-04-10 2015-12-08 Stoncor Group, Inc. Methods for fabrication and highway marking usage of agglomerated retroreflective beads
KR100959190B1 (ko) * 2007-12-21 2010-05-24 제일모직주식회사 현상액에 용해 가능한 근자외선 바닥 반사방지막 조성물 및이를 이용한 패턴화된 재료 형성 방법
CN102181099B (zh) * 2011-03-07 2013-03-27 黑龙江省润特科技有限公司 紫外光深度交联无卤阻燃乙丙橡胶电缆料及其绝缘或护套层的制备方法
CN102153802B (zh) * 2011-03-07 2013-03-27 沭阳优唯新材料有限公司 紫外光深度交联无卤阻燃聚烯烃电缆料及其绝缘或护套层的制备方法
CN102161801B (zh) * 2011-03-07 2013-03-27 沭阳优唯新材料有限公司 紫外光深度交联三元乙丙橡胶电缆料及其绝缘或护套层的制备方法
CN104114526B (zh) 2012-02-17 2018-09-07 亨斯迈先进材料美国有限责任公司 苯并噁嗪、环氧树脂和酸酐的混合物
JP6083116B2 (ja) * 2012-02-29 2017-02-22 セイコーエプソン株式会社 光硬化型インクジェットインクセット及びこれを用いたインクジェット記録方法
EP2842980B1 (en) 2013-08-09 2021-05-05 DSM IP Assets B.V. Low-viscosity liquid radiation curable dental aligner mold resin compositions for additive manufacturing
JP6802710B2 (ja) 2014-05-14 2020-12-16 ハンツマン・アドバンスド・マテリアルズ・アメリカズ・エルエルシー 保護コーティング用多官能ポリアミド
BR112016029755A2 (pt) 2014-06-23 2017-08-22 Carbon Inc métodos de produção de objetos tridimensionais a partir de materiais tendo múltiplos mecanismos de endurecimento
JP6578660B2 (ja) * 2015-01-22 2019-09-25 富士ゼロックス株式会社 三次元造形用支持材、三次元造形用組成物セット、および三次元造形装置、三次元造形物の製造方法
KR101853387B1 (ko) * 2015-03-27 2018-04-30 동우 화인켐 주식회사 플렉서블 디스플레이용 하드코팅 필름
JP6372887B2 (ja) * 2015-05-14 2018-08-15 信越化学工業株式会社 有機膜材料、有機膜形成方法、パターン形成方法、及び化合物
WO2016193032A1 (en) 2015-06-02 2016-12-08 Basf Se Diglycidyl ethers of tetrahydrofuran diglycol derivatives and oligomers thereof as curable epoxy resins
JP6097815B1 (ja) 2015-12-18 2017-03-15 古河電気工業株式会社 接着剤組成物、これを用いた被着体の接合方法および積層体の製造方法
DK3472221T3 (da) 2016-06-16 2022-01-17 Huntsman Petrochemical Llc Blanding til hærdning af epoxyresinsammensætninger
JP6977026B2 (ja) 2016-08-19 2021-12-08 ハンツマン・アドバンスド・マテリアルズ・アメリカズ・エルエルシー 付加物及びその使用
WO2018087868A1 (ja) * 2016-11-10 2018-05-17 積水化学工業株式会社 エポキシフラン化合物、その製造方法、エポキシフラン化合物を含む硬化性組成物、及びその硬化物
CN109923145B (zh) 2017-02-06 2022-11-29 亨斯迈石油化学有限责任公司 用于环氧树脂的固化剂
WO2018144975A1 (en) 2017-02-06 2018-08-09 Huntsman Petrochemical Llc Curing agent for epoxy resins
JP7068270B2 (ja) * 2017-03-06 2022-05-16 マクセル株式会社 モデル材インクセット、サポート材組成物、インクセット、立体造形物および立体造形物の製造方法
ES2685280B2 (es) * 2017-03-31 2019-06-21 Centro Tecnologico De Nanomateriales Avanzados S L Composición de resina curable por radiación y procedimiento para su obtención
KR102604506B1 (ko) 2017-06-12 2023-11-21 오르멧 서키츠 인코퍼레이티드 양호한 사용가능 시간 및 열전도성을 갖는 금속성 접착제 조성물, 이의 제조 방법 및 이의 용도
JP6886588B2 (ja) * 2017-08-30 2021-06-16 Dic株式会社 エポキシ樹脂改質剤
CN112074395A (zh) * 2018-03-02 2020-12-11 福姆实验室公司 潜伏性固化树脂及相关方法
EP3597668A1 (en) 2018-07-20 2020-01-22 Clariant International Ltd Photo-curable resin composition for 3d printing
CN109897189B (zh) * 2019-02-27 2021-05-25 黑龙江省科学院石油化学研究院 一种原位接枝氧化石墨烯改性耐高温环氧树脂复合材料的制备方法
JP7682178B2 (ja) 2019-12-10 2025-05-23 ハンツマン・アドバンスド・マテリアルズ・アメリカズ・エルエルシー 脂肪族ポリケトン強化剤を含む硬化性樹脂組成物及び該組成物から製造される複合材料
CN111072871A (zh) * 2019-12-24 2020-04-28 无锡市腰果新材料有限公司 一种耐高温sla型3d打印光固化材料及其制备方法
RU2757595C1 (ru) * 2020-08-31 2021-10-19 Федеральное государственное бюджетное образовательное учреждение высшего образования «Кабардино-Балкарский государственный университет им. Х.М. Бербекова» (КБГУ) Полимерный композиционный материал
WO2022081271A1 (en) 2020-10-13 2022-04-21 Cabot Corporation Conductive photo-curable compositions for additive manufacturing
WO2022180175A1 (en) 2021-02-25 2022-09-01 Huntsman Advanced Materials Licensing (Switzerland) Gmbh One component polymerizable composition for trickle impregnation
KR20240004994A (ko) * 2021-05-07 2024-01-11 바스프 에스이 3d 광중합체 분사를 위한 지지체 하위-구조체를 생성하기 위한 방사선-경화성 조성물
CN115947658B (zh) * 2022-12-28 2025-02-28 Tcl华星光电技术有限公司 配向膜添加剂、配向膜、液晶显示面板及其制作方法
WO2024203363A1 (ja) * 2023-03-24 2024-10-03 株式会社Adeka 抗菌性組成物、形成用材料、硬化物及び抗菌方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH490444A (de) * 1967-04-19 1970-05-15 Ciba Geigy Neue, heisshärtbare Mischungen aus Polyepoxydverbindungen, Polyestern und Polycarbonsäureanhydriden
CA1240439A (en) * 1983-02-07 1988-08-09 Union Carbide Corporation Photocopolymerizable compositions based on epoxy and hydroxyl-containing organic materials having primary hydroxyl content
JPS61500974A (ja) * 1983-10-28 1986-05-15 ロクタイト．コ−ポレ−シヨン ２つの硬化タイプのプレポリマ−を含む光硬化性組成物
US4575330A (en) * 1984-08-08 1986-03-11 Uvp, Inc. Apparatus for production of three-dimensional objects by stereolithography
EP0222582B1 (en) * 1985-11-07 1990-05-09 Uvexs Incorporated Epoxy siloxy u.v. curable polymeric composition
DE3880642T2 (de) * 1987-12-08 1993-11-18 Mitsui Petrochemical Ind Zusammensetzung , mit aktiven Strahlen härtbar, und Medium für die optische Registrierung mit dieser gehärteten Zusammensetzung.
ATE161860T1 (de) * 1988-02-19 1998-01-15 Asahi Denka Kogyo Kk Kunststoffzusammensetzung für optisches modellieren
JPH07103218B2 (ja) * 1988-09-13 1995-11-08 旭電化工業株式会社 光学的造形用樹脂組成物
TW363999B (en) * 1991-06-04 1999-07-11 Vantico Ag Photosensitive compositions

Also Published As

Publication number Publication date
AU5252493A (en) 1994-06-30
AU658780B2 (en) 1995-04-27
EP0605361A2 (de) 1994-07-06
JPH06228413A (ja) 1994-08-16
TW269017B (https=) 1996-01-21
EP0605361B1 (de) 1997-04-02
KR940015712A (ko) 1994-07-21
EP0605361A3 (de) 1995-02-22
ES2100513T3 (es) 1997-06-16
CA2111718A1 (en) 1994-06-22
CA2111718C (en) 2004-10-05
DE59306034D1 (de) 1997-05-07
US5476748A (en) 1995-12-19
ATE151085T1 (de) 1997-04-15
JP3203461B2 (ja) 2001-08-27

Similar Documents

Publication Publication Date Title
KR100282273B1 (ko) 감광성 조성물 및 이들을 광중합시키는 방법
KR100491736B1 (ko) 입체리토그래피용방사선-경화성액체조성물
EP1080392B1 (en) Liquid, radiation-curable composition, especially for producing flexible cured articles by stereolithography
US6413696B1 (en) Liquid, radiation-curable composition, especially for producing cured articles by stereolithography having heat deflection temperatures
KR100808954B1 (ko) 특히 입체리소그래피에 적합한 액체 방사선―경화성 조성물
KR100355313B1 (ko) 부가적인관능기를갖는비닐에테르화합물
US6749976B2 (en) Solid imaging compositions for preparing polypropylene-like articles
EP1099138B1 (en) Stereolithographic compositions for preparing polyethylene-like articles
US5783358A (en) Stabilization of liquid radiation-curable compositions against undesired premature polymerization
US6762002B2 (en) Solid imaging compositions for preparing polypropylene-like articles
JPH10168107A (ja) 光硬化性樹脂組成物
US20050158660A1 (en) Solid imaging compositions for preparing polypropylene-like articles
HK1032635B (en) Liquid, radiation-curable composition, especially for producing flexible cured articles by stereolithography
HK1057260B (en) Solid imaging compositions for preparing polypropylene-like articles

Legal Events

Date Code Title Description
PA0109 Patent application

Patent event code: PA01091R01D

Comment text: Patent Application

Patent event date: 19931217

PG1501 Laying open of application
N231 Notification of change of applicant
PN2301 Change of applicant

Patent event date: 19970225

Comment text: Notification of Change of Applicant

Patent event code: PN23011R01D

A201 Request for examination
PA0201 Request for examination

Patent event code: PA02012R01D

Patent event date: 19981204

Comment text: Request for Examination of Application

Patent event code: PA02011R01I

Patent event date: 19931217

Comment text: Patent Application

N231 Notification of change of applicant
PN2301 Change of applicant

Patent event date: 20000920

Comment text: Notification of Change of Applicant

Patent event code: PN23011R01D

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

Patent event code: PE07011S01D

Comment text: Decision to Grant Registration

Patent event date: 20001030

GRNT Written decision to grant
PR0701 Registration of establishment

Comment text: Registration of Establishment

Patent event date: 20001127

Patent event code: PR07011E01D

PR1002 Payment of registration fee

Payment date: 20001128

End annual number: 3

Start annual number: 1

PG1601 Publication of registration
PR1001 Payment of annual fee

Payment date: 20031120

Start annual number: 4

End annual number: 4

PR1001 Payment of annual fee

Payment date: 20041021

Start annual number: 5

End annual number: 5

PR1001 Payment of annual fee

Payment date: 20051025

Start annual number: 6

End annual number: 6

PR1001 Payment of annual fee

Payment date: 20061031

Start annual number: 7

End annual number: 7

PR1001 Payment of annual fee

Payment date: 20071224

Start annual number: 8

End annual number: 8

PR1001 Payment of annual fee

Payment date: 20081007

Start annual number: 9

End annual number: 9

PR1001 Payment of annual fee

Payment date: 20091012

Start annual number: 10

End annual number: 10

PR1001 Payment of annual fee

Payment date: 20101029

Start annual number: 11

End annual number: 11

PR1001 Payment of annual fee

Payment date: 20111028

Start annual number: 12

End annual number: 12

FPAY Annual fee payment

Payment date: 20121107

Year of fee payment: 13

PR1001 Payment of annual fee

Payment date: 20121107

Start annual number: 13

End annual number: 13

FPAY Annual fee payment

Payment date: 20131108

Year of fee payment: 14

PR1001 Payment of annual fee

Payment date: 20131108

Start annual number: 14

End annual number: 14

EXPY Expiration of term
PC1801 Expiration of term

Termination date: 20140617

Termination category: Expiration of duration