JPWO2021131960A1 - - Google Patents

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Publication number
JPWO2021131960A1
JPWO2021131960A1 JP2021567336A JP2021567336A JPWO2021131960A1 JP WO2021131960 A1 JPWO2021131960 A1 JP WO2021131960A1 JP 2021567336 A JP2021567336 A JP 2021567336A JP 2021567336 A JP2021567336 A JP 2021567336A JP WO2021131960 A1 JPWO2021131960 A1 JP WO2021131960A1
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Japan
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JP2021567336A
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JPWO2021131960A5 (https=
JP7760915B2 (ja
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    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02Silicon compounds
    • C07F7/08Compounds having one or more C—Si linkages
    • C07F7/0803Compounds with Si-C or Si-Si linkages
    • C07F7/081Compounds with Si-C or Si-Si linkages comprising at least one atom selected from the elements N, O, halogen, S, Se or Te
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C09D5/16Antifouling paints; Underwater paints
    • C09D5/1656Antifouling paints; Underwater paints characterised by the film-forming substance
    • C09D5/1662Synthetic film-forming substance
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02Silicon compounds
    • C07F7/08Compounds having one or more C—Si linkages
    • C07F7/18Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
    • C07F7/1804Compounds having Si-O-C linkages
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/002Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from unsaturated compounds
    • C08G65/005Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from unsaturated compounds containing halogens
    • C08G65/007Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from unsaturated compounds containing halogens containing fluorine
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/04Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
    • C08G65/22Cyclic ethers having at least one atom other than carbon and hydrogen outside the ring
    • C08G65/223Cyclic ethers having at least one atom other than carbon and hydrogen outside the ring containing halogens
    • C08G65/226Cyclic ethers having at least one atom other than carbon and hydrogen outside the ring containing halogens containing fluorine
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/32Polymers modified by chemical after-treatment
    • C08G65/329Polymers modified by chemical after-treatment with organic compounds
    • C08G65/336Polymers modified by chemical after-treatment with organic compounds containing silicon
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D171/00Coating compositions based on polyethers obtained by reactions forming an ether link in the main chain; Coating compositions based on derivatives of such polymers
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D171/00Coating compositions based on polyethers obtained by reactions forming an ether link in the main chain; Coating compositions based on derivatives of such polymers
    • C09D171/02Polyalkylene oxides
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D201/00Coating compositions based on unspecified macromolecular compounds
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C09D5/16Antifouling paints; Underwater paints
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40Additives
    • C09D7/60Additives non-macromolecular
    • C09D7/63Additives non-macromolecular organic
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00Materials not provided for elsewhere
    • C09K3/18Materials not provided for elsewhere for application to surfaces to minimize adherence of ice, mist or water thereto; Thawing or antifreeze materials for application to surfaces

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Combustion & Propulsion (AREA)
  • General Chemical & Material Sciences (AREA)
  • Paints Or Removers (AREA)
  • Polyethers (AREA)
JP2021567336A 2019-12-26 2020-12-16 表面処理剤、表面処理剤組成物、コーティング液、物品、及び物品の製造方法 Active JP7760915B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2019235862 2019-12-26
JP2019235862 2019-12-26
PCT/JP2020/046948 WO2021131960A1 (ja) 2019-12-26 2020-12-16 含フッ素エーテル化合物、表面処理剤、含フッ素エーテル組成物、コーティング液、物品、及び物品の製造方法

Publications (3)

Publication Number Publication Date
JPWO2021131960A1 true JPWO2021131960A1 (https=) 2021-07-01
JPWO2021131960A5 JPWO2021131960A5 (https=) 2022-08-25
JP7760915B2 JP7760915B2 (ja) 2025-10-28

Family

ID=76575891

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021567336A Active JP7760915B2 (ja) 2019-12-26 2020-12-16 表面処理剤、表面処理剤組成物、コーティング液、物品、及び物品の製造方法

Country Status (5)

Country Link
US (1) US12570677B2 (https=)
JP (1) JP7760915B2 (https=)
KR (1) KR20220121825A (https=)
CN (1) CN114867730B (https=)
WO (1) WO2021131960A1 (https=)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP4424745A4 (en) 2021-10-29 2025-10-29 Agc Inc COMPOUND, COMPOSITION, SURFACE TREATMENT AGENT, COATING LIQUID, ARTICLE AND METHOD OF MANUFACTURING AN ARTICLE
KR20240134335A (ko) * 2022-01-11 2024-09-09 에이지씨 가부시키가이샤 표면 처리제, 물품, 물품의 제조 방법
WO2023136143A1 (ja) * 2022-01-11 2023-07-20 Agc株式会社 表面処理剤、物品、物品の製造方法
CN118660946A (zh) * 2022-02-04 2024-09-17 Agc株式会社 表面处理剂、物品、物品的制造方法
WO2023149339A1 (ja) * 2022-02-04 2023-08-10 Agc株式会社 表面処理剤、物品、物品の製造方法
KR20240112322A (ko) * 2022-02-09 2024-07-18 니혼 고꾸 덴시 고교 가부시끼가이샤 내지문성의 평가 방법, 적층체, 그 제조방법 및 표시 장치

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09255979A (ja) * 1996-03-21 1997-09-30 Sony Corp 潤滑剤、これを用いた磁気記録媒体及び磁気ヘッド
JP2000063797A (ja) * 1998-08-13 2000-02-29 Toppan Printing Co Ltd 防汚剤及び防汚層の形成方法
JP2002226838A (ja) * 2001-02-01 2002-08-14 Asahi Glass Co Ltd 撥水性組成物、表面処理された基材、その製造方法および輸送機器用物品
JP2008024759A (ja) * 2006-07-19 2008-02-07 Matsushita Electric Ind Co Ltd 機能性樹脂基体およびその製造方法
WO2009008380A1 (ja) * 2007-07-06 2009-01-15 Asahi Glass Company, Limited 表面処理剤、物品、および新規含フッ素エーテル化合物
WO2011016458A1 (ja) * 2009-08-03 2011-02-10 旭硝子株式会社 撥水膜形成用組成物、撥水膜付き基体およびその製造方法並びに輸送機器用物品
WO2013172177A1 (ja) * 2012-05-18 2013-11-21 ダイキン工業株式会社 フルオロポリエーテル基含有シリコーン化合物
JP2014070164A (ja) * 2012-09-28 2014-04-21 Fujifilm Corp 表面改質剤、処理基材、化合物の製造方法、及び化合物
WO2015146861A1 (ja) * 2014-03-26 2015-10-01 ユニマテック株式会社 ポリフルオロアルキルポリマー、表面改質剤、撥水撥油層形成材料、防汚層形成材料及び離型層形成材料

Family Cites Families (49)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0844265B1 (en) 1995-08-11 2002-11-20 Daikin Industries, Limited Silicon-containing organic fluoropolymers and use of the same
JP2874715B2 (ja) 1995-08-11 1999-03-24 ダイキン工業株式会社 ケイ素含有有機含フッ素ポリマー及びその製造方法
IT1290462B1 (it) 1997-04-08 1998-12-03 Ausimont Spa Polimeri idrogenati modificati
JPH1129585A (ja) 1997-07-04 1999-02-02 Shin Etsu Chem Co Ltd パーフルオロポリエーテル変性アミノシラン及び表面処理剤
US6277485B1 (en) 1998-01-27 2001-08-21 3M Innovative Properties Company Antisoiling coatings for antireflective surfaces and methods of preparation
JP4733798B2 (ja) * 1998-01-31 2011-07-27 凸版印刷株式会社 防汚剤、防汚層の形成方法、光学部材、反射防止光学部材、光学機能性部材及び表示装置
JP3601580B2 (ja) 1999-05-20 2004-12-15 信越化学工業株式会社 パーフルオロポリエーテル変性アミノシラン及び表面処理剤並びに該アミノシランの被膜が形成された物品
CN103551075B (zh) 2005-04-01 2016-07-06 大金工业株式会社 表面改性剂
JP4940677B2 (ja) 2006-02-01 2012-05-30 ユニマテック株式会社 パーフルオロポリエーテルカルボン酸フロライドの製造法
CN101736346A (zh) 2008-11-24 2010-06-16 3M创新有限公司 在不锈钢表面形成易清洁层的制品及其制备方法
WO2011001846A1 (ja) * 2009-06-30 2011-01-06 旭硝子株式会社 表面処理剤、物品および含フッ素エーテル化合物
WO2011059430A1 (en) 2009-11-11 2011-05-19 Essilor International Surface treatment composition, process for producing the same, and surface-treated article
JP5235026B2 (ja) 2010-09-28 2013-07-10 信越化学工業株式会社 フルオロオキシアルキレン基含有ポリマー組成物および該組成物を含む表面処理剤並びに該表面処理剤で表面処理された物品
EP2638116B1 (en) 2010-11-10 2015-08-12 3M Innovative Properties Company Optical device surface treatment process and smudge-resistant article produced thereby
TW201319120A (zh) 2011-09-21 2013-05-16 Asahi Glass Co Ltd 含氟醚化合物、塗佈液、及具表面處理層之基材的製造方法
KR101969187B1 (ko) * 2011-09-21 2019-04-15 에이지씨 가부시키가이샤 함불소 에테르 조성물, 그 제조 방법, 코팅액, 및 표면 처리층을 갖는 기재의 제조 방법
TWI579347B (zh) 2012-02-17 2017-04-21 Asahi Glass Co Ltd A fluorine-containing ether compound, a fluorine-containing ether composition and a coating liquid, and a substrate having a surface treatment layer and a method for producing the same (3)
EP2816045B1 (en) 2012-02-17 2019-04-03 AGC Inc. Fluorinated ether compound, fluorinated ether composition and coating fluid, and substrate having surface-treated layer and method for its production
KR102016195B1 (ko) 2012-02-17 2019-08-29 에이지씨 가부시키가이샤 함불소 에테르 화합물, 함불소 에테르 조성물 및 코팅액, 그리고 표면 처리층을 갖는 기재 및 그 제조 방법
JP2014007016A (ja) 2012-06-22 2014-01-16 Hitachi Maxell Ltd 非水電解液二次電池用正極および非水電解液二次電池
JP2014070163A (ja) 2012-09-28 2014-04-21 Fujifilm Corp 表面改質剤、処理基材、化合物の製造方法、及び化合物
JP6127438B2 (ja) 2012-10-15 2017-05-17 旭硝子株式会社 含フッ素エーテル組成物、該組成物から形成された表面層を有する基材およびその製造方法
KR101743851B1 (ko) 2012-11-05 2017-06-05 다이킨 고교 가부시키가이샤 퍼플루오로(폴리)에테르기 함유 실란 화합물
WO2014126064A1 (ja) 2013-02-15 2014-08-21 旭硝子株式会社 撥水膜形成用組成物及びその使用
JP6264371B2 (ja) 2013-04-04 2018-01-24 旭硝子株式会社 含フッ素エーテル化合物、含フッ素エーテル組成物およびコーティング液、ならびに表面層を有する基材およびその製造方法
JP6378203B2 (ja) 2013-12-13 2018-08-22 Agc株式会社 含フッ素エーテル組成物、その製造方法、コーティング液、表面処理層を有する基材およびその製造方法
JP6181570B2 (ja) 2014-02-05 2017-08-16 株式会社ローソン ショーケース
JP6451279B2 (ja) 2014-03-31 2019-01-16 信越化学工業株式会社 フルオロポリエーテル基含有ポリマー変性シラン、表面処理剤及び物品
JP6024816B2 (ja) 2014-11-28 2016-11-16 ダイキン工業株式会社 フルオロオキシメチレン基含有パーフルオロポリエーテル変性体
EP3085749B1 (en) 2015-04-20 2017-06-28 Shin-Etsu Chemical Co., Ltd. Fluoropolyether-containing polymer-modified silane, surface treating agent, and treated article
JP6260579B2 (ja) 2015-05-01 2018-01-17 信越化学工業株式会社 フルオロポリエーテル基含有ポリマー変性シラン、表面処理剤及び物品
JP6390521B2 (ja) 2015-06-03 2018-09-19 信越化学工業株式会社 フルオロポリエーテル基含有ポリマー変性シラン
KR101992582B1 (ko) 2015-07-31 2019-06-24 다이킨 고교 가부시키가이샤 퍼플루오로(폴리)에테르기 함유 실란 화합물
CN107922445B (zh) 2015-09-01 2020-07-28 Agc株式会社 含氟醚化合物、含氟醚组合物、涂布液和物品
WO2017038832A1 (ja) 2015-09-01 2017-03-09 旭硝子株式会社 含フッ素エーテル化合物、含フッ素エーテル組成物、コーティング液および物品
CN105778080B (zh) * 2016-04-12 2016-12-14 泉州市思康新材料发展有限公司 一种全氟聚醚改性硅烷化合物及包含其的表面处理组合物和薄膜
KR20180138203A (ko) 2016-04-25 2018-12-28 에이지씨 가부시키가이샤 함불소 에테르 화합물, 코팅액, 물품 및 신규 화합물
CN109890870B (zh) 2016-10-27 2021-08-24 大金工业株式会社 含全氟(聚)醚基的硅烷化合物
JP6844994B2 (ja) 2016-11-25 2021-03-17 古河電気工業株式会社 レーザ装置及び光源装置
CN110248983B (zh) 2017-02-03 2022-04-22 大金工业株式会社 含有全氟(聚)醚基的化合物、含有其的表面处理剂和物品
WO2018151055A1 (ja) * 2017-02-14 2018-08-23 Agc株式会社 含フッ素エーテル組成物、コーティング液および物品
JP7156276B2 (ja) 2017-05-26 2022-10-19 Agc株式会社 含フッ素エーテル化合物、含フッ素エーテル組成物、コーティング液、物品およびその製造方法
CN110997754A (zh) 2017-08-22 2020-04-10 Agc株式会社 含氟醚化合物、含氟醚组合物、涂布液、物品及其制造方法
CN111032732B (zh) 2017-08-22 2022-10-21 Agc株式会社 含氟醚化合物、含氟醚组合物、涂布液、物品及其制造方法
CN110997753B (zh) 2017-08-22 2022-05-31 Agc株式会社 含氟醚化合物、含氟醚组合物、涂布液、物品及其制造方法
CN107501543B (zh) * 2017-08-30 2020-03-31 龙岩思康新材料有限公司 一种全氟聚醚改性硅烷化合物及其表面处理组合物
WO2019044479A1 (ja) 2017-08-31 2019-03-07 Agc株式会社 含フッ素エーテル化合物、含フッ素エーテル組成物、コーティング液、物品およびその製造方法
JP7056462B2 (ja) 2017-08-31 2022-04-19 Agc株式会社 含フッ素エーテル化合物、含フッ素エーテル組成物、コーティング液、物品およびその製造方法
KR102628576B1 (ko) 2017-12-27 2024-01-23 에이지씨 가부시키가이샤 함불소 에테르 화합물, 함불소 에테르 조성물, 코팅액, 물품 및 그 제조 방법

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09255979A (ja) * 1996-03-21 1997-09-30 Sony Corp 潤滑剤、これを用いた磁気記録媒体及び磁気ヘッド
JP2000063797A (ja) * 1998-08-13 2000-02-29 Toppan Printing Co Ltd 防汚剤及び防汚層の形成方法
JP2002226838A (ja) * 2001-02-01 2002-08-14 Asahi Glass Co Ltd 撥水性組成物、表面処理された基材、その製造方法および輸送機器用物品
JP2008024759A (ja) * 2006-07-19 2008-02-07 Matsushita Electric Ind Co Ltd 機能性樹脂基体およびその製造方法
WO2009008380A1 (ja) * 2007-07-06 2009-01-15 Asahi Glass Company, Limited 表面処理剤、物品、および新規含フッ素エーテル化合物
WO2011016458A1 (ja) * 2009-08-03 2011-02-10 旭硝子株式会社 撥水膜形成用組成物、撥水膜付き基体およびその製造方法並びに輸送機器用物品
WO2013172177A1 (ja) * 2012-05-18 2013-11-21 ダイキン工業株式会社 フルオロポリエーテル基含有シリコーン化合物
JP2014070164A (ja) * 2012-09-28 2014-04-21 Fujifilm Corp 表面改質剤、処理基材、化合物の製造方法、及び化合物
WO2015146861A1 (ja) * 2014-03-26 2015-10-01 ユニマテック株式会社 ポリフルオロアルキルポリマー、表面改質剤、撥水撥油層形成材料、防汚層形成材料及び離型層形成材料

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