JPWO2020027088A1 - ディスプレイ用基板及びその製造方法 - Google Patents
ディスプレイ用基板及びその製造方法 Download PDFInfo
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- JPWO2020027088A1 JPWO2020027088A1 JP2020534646A JP2020534646A JPWO2020027088A1 JP WO2020027088 A1 JPWO2020027088 A1 JP WO2020027088A1 JP 2020534646 A JP2020534646 A JP 2020534646A JP 2020534646 A JP2020534646 A JP 2020534646A JP WO2020027088 A1 JPWO2020027088 A1 JP WO2020027088A1
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- temperature
- glass
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- display substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000000758 substrate Substances 0.000 title claims abstract description 78
- 238000004519 manufacturing process Methods 0.000 title claims description 13
- 238000010438 heat treatment Methods 0.000 claims abstract description 19
- 238000001816 cooling Methods 0.000 claims abstract description 8
- 239000011521 glass Substances 0.000 claims description 88
- 238000000034 method Methods 0.000 claims description 40
- 239000000203 mixture Substances 0.000 claims description 11
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 8
- 238000002834 transmittance Methods 0.000 claims description 8
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 7
- 229910018068 Li 2 O Inorganic materials 0.000 claims description 7
- 239000006060 molten glass Substances 0.000 claims description 6
- 238000005520 cutting process Methods 0.000 claims description 3
- 239000013078 crystal Substances 0.000 description 46
- 238000000465 moulding Methods 0.000 description 9
- 230000006911 nucleation Effects 0.000 description 8
- 238000010899 nucleation Methods 0.000 description 7
- 239000006104 solid solution Substances 0.000 description 6
- 239000010408 film Substances 0.000 description 5
- 239000011159 matrix material Substances 0.000 description 5
- 238000002844 melting Methods 0.000 description 5
- 230000008018 melting Effects 0.000 description 5
- 239000010409 thin film Substances 0.000 description 5
- 229910008556 Li2O—Al2O3—SiO2 Inorganic materials 0.000 description 4
- 239000004973 liquid crystal related substance Substances 0.000 description 4
- 230000003746 surface roughness Effects 0.000 description 4
- 229910000500 β-quartz Inorganic materials 0.000 description 4
- 229910010413 TiO 2 Inorganic materials 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 229910000174 eucryptite Inorganic materials 0.000 description 3
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 3
- 229920005591 polysilicon Polymers 0.000 description 3
- 230000001376 precipitating effect Effects 0.000 description 3
- 239000002994 raw material Substances 0.000 description 3
- 239000002390 adhesive tape Substances 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 238000004031 devitrification Methods 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 239000000835 fiber Substances 0.000 description 2
- 125000001475 halogen functional group Chemical group 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 238000007372 rollout process Methods 0.000 description 2
- 239000003566 sealing material Substances 0.000 description 2
- 238000010583 slow cooling Methods 0.000 description 2
- 238000007088 Archimedes method Methods 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 238000006124 Pilkington process Methods 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229910006404 SnO 2 Inorganic materials 0.000 description 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000005352 clarification Methods 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 238000010411 cooking Methods 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 239000006066 glass batch Substances 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000007500 overflow downdraw method Methods 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 238000009774 resonance method Methods 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000011029 spinel Substances 0.000 description 1
- 229910052596 spinel Inorganic materials 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/097—Glass compositions containing silica with 40% to 90% silica, by weight containing phosphorus, niobium or tantalum
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/02—Other methods of shaping glass by casting molten glass, e.g. injection moulding
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B25/00—Annealing glass products
- C03B25/02—Annealing glass products in a discontinuous way
- C03B25/025—Glass sheets
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B32/00—Thermal after-treatment of glass products not provided for in groups C03B19/00, C03B25/00 - C03B31/00 or C03B37/00, e.g. crystallisation, eliminating gas inclusions or other impurities; Hot-pressing vitrified, non-porous, shaped glass products
- C03B32/02—Thermal crystallisation, e.g. for crystallising glass bodies into glass-ceramic articles
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C10/00—Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition
- C03C10/0018—Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition containing SiO2, Al2O3 and monovalent metal oxide as main constituents
- C03C10/0027—Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition containing SiO2, Al2O3 and monovalent metal oxide as main constituents containing SiO2, Al2O3, Li2O as main constituents
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
-
- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
- G09F9/00—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
- G09F9/30—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/1218—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition or structure of the substrate
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2204/00—Glasses, glazes or enamels with special properties
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Crystallography & Structural Chemistry (AREA)
- Ceramic Engineering (AREA)
- Power Engineering (AREA)
- General Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Thermal Sciences (AREA)
- Dispersion Chemistry (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Nonlinear Science (AREA)
- Manufacturing & Machinery (AREA)
- Theoretical Computer Science (AREA)
- Mathematical Physics (AREA)
- Optics & Photonics (AREA)
- Glass Compositions (AREA)
- Liquid Crystal (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
Abstract
Description
Claims (8)
- 常温から5℃/分の昇温速度で500℃まで昇温し、500℃で1時間保持した後、5℃/分の降温速度で常温まで冷却した時の熱収縮値が10ppm以下であることを特徴とするディスプレイ用基板。
- 常温から5℃/分の昇温速度で600℃まで昇温し、600℃で10時間保持した後、5℃/分の降温速度で常温まで冷却した時の熱収縮値が10ppm以下であることを特徴とする請求項1に記載のディスプレイ用基板。
- 結晶化ガラスからなることを特徴とする請求項1又は2に記載のディスプレイ用基板。
- 30〜380℃における熱膨張係数が−30×10−7〜30×10−7/℃であることを特徴とする請求項1〜3の何れかに記載のディスプレイ用基板。
- 板厚1.1mm換算、波長400nmにおける全光線透過率が65%以上であることを特徴とする請求項1〜4の何れかに記載のディスプレイ用基板。
- 組成として、質量%で、SiO2 50〜70%、Al2O3 10〜30%、Li2O 0〜15%を含有することを特徴とする請求項1〜5の何れかに記載のディスプレイ用基板。
- TFT基板に用いることを特徴とする請求項1〜6の何れかに記載のディスプレイ用基板。
- 溶融ガラスを板状に成形した後、切断し、ディスプレイ用基板を得る工程と、得られたディスプレイ用基板を800℃以上の温度に保持した後、室温まで200℃/時間以下の降温速度で冷却することにより、熱収縮値を10ppm以下に低減する工程と、を備えることを特徴とするディスプレイ用基板の製造方法。ここで、熱収縮値は、常温から5℃/分の昇温速度で500℃まで昇温し、500℃で1時間保持した後、5℃/分の降温速度で常温まで冷却した時の熱収縮率を意味する。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2018143843 | 2018-07-31 | ||
JP2018143843 | 2018-07-31 | ||
PCT/JP2019/029741 WO2020027088A1 (ja) | 2018-07-31 | 2019-07-30 | ディスプレイ用基板及びその製造方法 |
Publications (1)
Publication Number | Publication Date |
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JPWO2020027088A1 true JPWO2020027088A1 (ja) | 2021-09-24 |
Family
ID=69232236
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP2020534646A Pending JPWO2020027088A1 (ja) | 2018-07-31 | 2019-07-30 | ディスプレイ用基板及びその製造方法 |
Country Status (5)
Country | Link |
---|---|
US (1) | US20210313354A1 (ja) |
JP (1) | JPWO2020027088A1 (ja) |
CN (1) | CN112384485B (ja) |
TW (1) | TW202013747A (ja) |
WO (1) | WO2020027088A1 (ja) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
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CN113571556B (zh) * | 2021-07-09 | 2022-11-25 | 武汉华星光电半导体显示技术有限公司 | 柔性显示装置的制作方法以及柔性显示装置 |
JP2023072220A (ja) * | 2021-11-12 | 2023-05-24 | 日本電気硝子株式会社 | Li2O-Al2O3-SiO2系結晶化ガラス |
Citations (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01208343A (ja) * | 1988-02-15 | 1989-08-22 | Ohara Inc | 透明結晶化ガラス |
JPH1045422A (ja) * | 1996-07-29 | 1998-02-17 | Asahi Glass Co Ltd | 無アルカリガラスおよびフラットディスプレイパネル |
JPH11335139A (ja) * | 1998-02-26 | 1999-12-07 | Corning Inc | 高温寸法安定度を有する透明ガラスセラミックの製造方法 |
JPH11354021A (ja) * | 1998-06-08 | 1999-12-24 | Ngk Insulators Ltd | ディスプレイ及びその製造方法 |
JP2002154841A (ja) * | 2000-07-07 | 2002-05-28 | Ohara Inc | 低膨張透明結晶化ガラス、結晶化ガラス基板及び光導波路素子 |
JP2007091503A (ja) * | 2005-09-27 | 2007-04-12 | Nippon Electric Glass Co Ltd | 板ガラスの製造方法及びその装置 |
JP2009196879A (ja) * | 2008-01-21 | 2009-09-03 | Nippon Electric Glass Co Ltd | ガラス基板の製造方法及びガラス基板 |
WO2014112552A1 (ja) * | 2013-01-18 | 2014-07-24 | 日本電気硝子株式会社 | 結晶性ガラス基板及び結晶化ガラス基板並びに拡散板及びそれを備えた照明装置 |
JP2014136668A (ja) * | 2013-01-18 | 2014-07-28 | Nippon Electric Glass Co Ltd | 結晶性ガラス基板及び結晶化ガラス基板 |
JP2014136672A (ja) * | 2013-01-18 | 2014-07-28 | Nippon Electric Glass Co Ltd | 拡散板及びそれを備えた照明装置 |
WO2014163130A1 (ja) * | 2013-04-05 | 2014-10-09 | 日本電気硝子株式会社 | ガラス基板及びその徐冷方法 |
WO2016143665A1 (ja) * | 2015-03-10 | 2016-09-15 | 日本電気硝子株式会社 | ガラス基板 |
Family Cites Families (7)
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JPS6179315U (ja) * | 1984-10-26 | 1986-05-27 | ||
CN1745321A (zh) * | 2003-08-05 | 2006-03-08 | 日本电气硝子株式会社 | 光通信元件用基材、其制造方法及利用它的光通信元件 |
US7226881B2 (en) * | 2003-09-19 | 2007-06-05 | Kabushiki Kaisha Ohara | Ultra low thermal expansion transparent glass ceramics |
JP2008511137A (ja) * | 2004-08-18 | 2008-04-10 | コーニング インコーポレイテッド | 高歪ガラス/ガラス−セラミックを有する絶縁体上半導体構造 |
KR101654753B1 (ko) * | 2011-12-28 | 2016-09-08 | 아반스트레이트 가부시키가이샤 | 플랫 패널 디스플레이용 유리 기판 및 그 제조 방법 |
FR3036700B1 (fr) * | 2015-05-29 | 2021-04-16 | Eurokera | Vitroceramiques du type aluminosilicate de lithium, transparentes, essentiellement incolores, affinees a l'etain, avec une microstructure amelioree et des proprietes de dilatation thermique ameliorees |
JP6315011B2 (ja) * | 2016-03-15 | 2018-04-25 | 旭硝子株式会社 | 無アルカリガラス基板、および無アルカリガラス基板の製造方法 |
-
2019
- 2019-07-30 CN CN201980045068.2A patent/CN112384485B/zh active Active
- 2019-07-30 JP JP2020534646A patent/JPWO2020027088A1/ja active Pending
- 2019-07-30 WO PCT/JP2019/029741 patent/WO2020027088A1/ja active Application Filing
- 2019-07-30 TW TW108126996A patent/TW202013747A/zh unknown
- 2019-07-30 US US17/261,994 patent/US20210313354A1/en not_active Abandoned
Patent Citations (12)
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JPH01208343A (ja) * | 1988-02-15 | 1989-08-22 | Ohara Inc | 透明結晶化ガラス |
JPH1045422A (ja) * | 1996-07-29 | 1998-02-17 | Asahi Glass Co Ltd | 無アルカリガラスおよびフラットディスプレイパネル |
JPH11335139A (ja) * | 1998-02-26 | 1999-12-07 | Corning Inc | 高温寸法安定度を有する透明ガラスセラミックの製造方法 |
JPH11354021A (ja) * | 1998-06-08 | 1999-12-24 | Ngk Insulators Ltd | ディスプレイ及びその製造方法 |
JP2002154841A (ja) * | 2000-07-07 | 2002-05-28 | Ohara Inc | 低膨張透明結晶化ガラス、結晶化ガラス基板及び光導波路素子 |
JP2007091503A (ja) * | 2005-09-27 | 2007-04-12 | Nippon Electric Glass Co Ltd | 板ガラスの製造方法及びその装置 |
JP2009196879A (ja) * | 2008-01-21 | 2009-09-03 | Nippon Electric Glass Co Ltd | ガラス基板の製造方法及びガラス基板 |
WO2014112552A1 (ja) * | 2013-01-18 | 2014-07-24 | 日本電気硝子株式会社 | 結晶性ガラス基板及び結晶化ガラス基板並びに拡散板及びそれを備えた照明装置 |
JP2014136668A (ja) * | 2013-01-18 | 2014-07-28 | Nippon Electric Glass Co Ltd | 結晶性ガラス基板及び結晶化ガラス基板 |
JP2014136672A (ja) * | 2013-01-18 | 2014-07-28 | Nippon Electric Glass Co Ltd | 拡散板及びそれを備えた照明装置 |
WO2014163130A1 (ja) * | 2013-04-05 | 2014-10-09 | 日本電気硝子株式会社 | ガラス基板及びその徐冷方法 |
WO2016143665A1 (ja) * | 2015-03-10 | 2016-09-15 | 日本電気硝子株式会社 | ガラス基板 |
Also Published As
Publication number | Publication date |
---|---|
TW202013747A (zh) | 2020-04-01 |
WO2020027088A1 (ja) | 2020-02-06 |
US20210313354A1 (en) | 2021-10-07 |
CN112384485A (zh) | 2021-02-19 |
CN112384485B (zh) | 2024-01-02 |
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