JPWO2016175088A1 - 被覆部材 - Google Patents
被覆部材 Download PDFInfo
- Publication number
- JPWO2016175088A1 JPWO2016175088A1 JP2017515495A JP2017515495A JPWO2016175088A1 JP WO2016175088 A1 JPWO2016175088 A1 JP WO2016175088A1 JP 2017515495 A JP2017515495 A JP 2017515495A JP 2017515495 A JP2017515495 A JP 2017515495A JP WO2016175088 A1 JPWO2016175088 A1 JP WO2016175088A1
- Authority
- JP
- Japan
- Prior art keywords
- diamond
- diamond layer
- substrate
- ratio
- measurement point
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 229910003460 diamond Inorganic materials 0.000 claims abstract description 243
- 239000010432 diamond Substances 0.000 claims abstract description 243
- 239000000758 substrate Substances 0.000 claims abstract description 97
- 239000013078 crystal Substances 0.000 claims abstract description 94
- 238000005259 measurement Methods 0.000 claims abstract description 64
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 12
- 238000001069 Raman spectroscopy Methods 0.000 claims abstract description 12
- 229910002804 graphite Inorganic materials 0.000 claims abstract description 12
- 239000010439 graphite Substances 0.000 claims abstract description 12
- 238000004611 spectroscopical analysis Methods 0.000 claims abstract description 10
- 239000010941 cobalt Substances 0.000 claims description 30
- 229910017052 cobalt Inorganic materials 0.000 claims description 30
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 30
- 239000002245 particle Substances 0.000 claims description 28
- 239000010410 layer Substances 0.000 description 137
- 238000005520 cutting process Methods 0.000 description 76
- 239000011247 coating layer Substances 0.000 description 45
- 239000010408 film Substances 0.000 description 40
- 239000002585 base Substances 0.000 description 39
- 230000015572 biosynthetic process Effects 0.000 description 29
- 238000000034 method Methods 0.000 description 20
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 18
- UONOETXJSWQNOL-UHFFFAOYSA-N tungsten carbide Chemical compound [W+]#[C-] UONOETXJSWQNOL-UHFFFAOYSA-N 0.000 description 15
- 239000008710 crystal-8 Substances 0.000 description 11
- 239000003513 alkali Substances 0.000 description 10
- 239000002159 nanocrystal Substances 0.000 description 9
- 238000012545 processing Methods 0.000 description 9
- 239000000843 powder Substances 0.000 description 7
- 238000005530 etching Methods 0.000 description 6
- 239000007789 gas Substances 0.000 description 6
- 238000004458 analytical method Methods 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- 238000004506 ultrasonic cleaning Methods 0.000 description 5
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 4
- 238000005299 abrasion Methods 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 230000007423 decrease Effects 0.000 description 4
- 239000001257 hydrogen Substances 0.000 description 4
- 229910052739 hydrogen Inorganic materials 0.000 description 4
- 238000003754 machining Methods 0.000 description 4
- 239000012495 reaction gas Substances 0.000 description 4
- 230000003746 surface roughness Effects 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- 239000006061 abrasive grain Substances 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 238000005498 polishing Methods 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- 238000010306 acid treatment Methods 0.000 description 2
- 239000012670 alkaline solution Substances 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 239000004918 carbon fiber reinforced polymer Substances 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- UFGZSIPAQKLCGR-UHFFFAOYSA-N chromium carbide Chemical compound [Cr]#C[Cr]C#[Cr] UFGZSIPAQKLCGR-UHFFFAOYSA-N 0.000 description 2
- 239000012153 distilled water Substances 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 238000004050 hot filament vapor deposition Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000013507 mapping Methods 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 238000007517 polishing process Methods 0.000 description 2
- 238000001878 scanning electron micrograph Methods 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 229910003470 tongbaite Inorganic materials 0.000 description 2
- MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 description 2
- 229910052582 BN Inorganic materials 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- 229910000997 High-speed steel Inorganic materials 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 230000002159 abnormal effect Effects 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000000443 aerosol Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 239000011195 cermet Substances 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000005553 drilling Methods 0.000 description 1
- 238000004453 electron probe microanalysis Methods 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 229910021385 hard carbon Inorganic materials 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 230000006911 nucleation Effects 0.000 description 1
- 238000010899 nucleation Methods 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
- C23C16/27—Diamond only
- C23C16/271—Diamond only using hot filaments
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23P—METAL-WORKING NOT OTHERWISE PROVIDED FOR; COMBINED OPERATIONS; UNIVERSAL MACHINE TOOLS
- B23P15/00—Making specific metal objects by operations not covered by a single other subclass or a group in this subclass
- B23P15/28—Making specific metal objects by operations not covered by a single other subclass or a group in this subclass cutting tools
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
- C23C16/27—Diamond only
- C23C16/279—Diamond only control of diamond crystallography
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45523—Pulsed gas flow or change of composition over time
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B2226/00—Materials of tools or workpieces not comprising a metal
- B23B2226/31—Diamond
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B2228/00—Properties of materials of tools or workpieces, materials of tools or workpieces applied in a specific manner
- B23B2228/04—Properties of materials of tools or workpieces, materials of tools or workpieces applied in a specific manner applied by chemical vapour deposition [CVD]
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B2228/00—Properties of materials of tools or workpieces, materials of tools or workpieces applied in a specific manner
- B23B2228/10—Coatings
- B23B2228/105—Coatings with specified thickness
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B27/00—Tools for turning or boring machines; Tools of a similar kind in general; Accessories therefor
- B23B27/14—Cutting tools of which the bits or tips or cutting inserts are of special material
- B23B27/148—Composition of the cutting inserts
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B27/00—Tools for turning or boring machines; Tools of a similar kind in general; Accessories therefor
- B23B27/14—Cutting tools of which the bits or tips or cutting inserts are of special material
- B23B27/18—Cutting tools of which the bits or tips or cutting inserts are of special material with cutting bits or tips or cutting inserts rigidly mounted, e.g. by brazing
- B23B27/20—Cutting tools of which the bits or tips or cutting inserts are of special material with cutting bits or tips or cutting inserts rigidly mounted, e.g. by brazing with diamond bits or cutting inserts
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B51/00—Tools for drilling machines
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Crystallography & Structural Chemistry (AREA)
- Cutting Tools, Boring Holders, And Turrets (AREA)
- Chemical Vapour Deposition (AREA)
- Carbon And Carbon Compounds (AREA)
- Drilling Tools (AREA)
Abstract
Description
上述した第2の実施態様であるドリルの製造方法について説明する。
まず、基体を準備する。例えば、被覆工具がインサートの場合、焼成によって焼結体を作製した後、所望によって研磨加工を施して、インサート形状の基体を作製する。被覆工具がドリルの場合、円柱状の硬質合金の表面にセンタレス加工を施した後、刃付け加工をして、ドリルの形状の基体を作製する。所望によって、基体の切刃側に研磨加工を施す。
切削方法:溝加工
被削材 :CFRP
切削速度(送り):120mm/分
送り :0.075mm/刃
切り込み:深さ8mm、加工径φ6mm
切削状態:乾式
評価方法:切削長、および加工不能になった時点でのエンドミルの状態(表中、切刃状態と記載)を確認。
切削方法:穴あけ(通り穴)
被削材 :CFRP
切削速度(送り):100mm/分
送り :0.075mm/刃
切り込み:深さ8mm、加工径φ6mm
切削状態:乾式
評価方法:1500穴加工後の切刃の先端摩耗幅(表中、摩耗幅と記載)、バリが発生した加工長を測定するとともに、加工不能になった時点でのドリルの状態を確認。
2 基体
3 被覆層
4 ダイヤモンド層
6 ダイヤモンド結晶
6a 最大ダイヤモンド結晶
6b 微細ダイヤモンド結晶
8 主結晶相
10 界面領域
12 中間領域
14 表面領域
15 基体側界面領域
17 粒状コバルト粒子
Claims (14)
- 基体と、該基体に隣接して位置するダイヤモンド層とを備えて、ラマン分光分析によって測定されるダイヤモンド結晶に由来するSP3ピークとグラファイト相に由来するSP2ピークから求められる比(SP3/SP2)をSP3比としたとき、前記基体と前記ダイヤモンド層との界面から前記ダイヤモンド層側に1μmまでの厚みの第1測定点のSP3比が、前記ダイヤモンド層の厚み方向の中間である第2測定点のSP3比よりも高い被覆部材。
- 前記ダイヤモンド層の前記第1測定点におけるSP3比が1.1〜1.8であり、前記ダイヤモンド層の前記第2測定点におけるSP3比が1.0〜1.5である請求項1記載の被覆部材。
- 前記第1測定点における残留応力が圧縮応力であり、かつ前記第2測定点における残留応力が引張応力である請求項1または2記載の被覆部材。
- 前記基体および前記ダイヤモンド層を含む破断面において、該ダイヤモンド層の厚み方向についてダイヤモンド結晶の粒径を比較したとき、粒径が最も大きい最大ダイヤモンド結晶が存在する、前記第1測定点を含む界面領域を有する界面領域を有する請求項1乃至3のいずれか記載の被覆部材。
- 前記界面領域が、0.3〜2μmの厚みで存在する請求項4記載の被覆部材。
- 前記ダイヤモンド層の破断面における前記最大ダイヤモンド結晶は、前記ダイヤモンド層の厚み方向が長径であり、アスペクト比が1.8以上である請求項4または5記載の被覆部材。
- 前記ダイヤモンド層の破断面における前記最大ダイヤモンド結晶の粒径が0.15〜0.5μmである請求項4乃至6のいずれか記載の被覆部材。
- 前記ダイヤモンド層の厚みが3〜20μmである請求項1乃至7のいずれか記載の被覆部材。
- 前記基体および前記ダイヤモンド層を含む研磨面において、該ダイヤモンド層の厚み方向についてダイヤモンド結晶の粒径を比較したとき、前記界面領域におけるダイヤモンド結晶の平均粒径d1と、前記界面領域に隣接する、前記第2測定点を含む中間領域におけるダイヤモンド結晶の平均粒径d2との比(d2/d1)が1.0〜1.2である請求項4乃至8のいずれか記載の被覆部材。
- 前記基体および前記ダイヤモンド層を含む研磨面において、前記界面に位置する前記基体を構成する主結晶相が、前記ダイヤモンド層との対向面に凹みを有する請求項1乃至9のいずれか記載の被覆部材。
- 前記基体がコバルトを含有するとともに、前記界面から0.5μm〜5μmの基体側界面領域は、前記コバルトの含有量が前記界面から500μmの位置より少なく、前記基体側界面領域において前記コバルトが粒状で存在する請求項1乃至10のいずれか記載の被覆部材。
- 前記界面における界面粗さが0.12〜0.8μmである請求項1乃至11のいずれか記載の被覆部材。
- 前記ダイヤモンド層は、前記ダイヤモンド層の表面から1μmまでの厚みの第3測定点のSP3比が、前記第2測定点のSP3比よりも低い請求項1乃至12のいずれか記載の被覆部材。
- 前記基体および前記ダイヤモンド層を含む研磨断面において、該ダイヤモンド層の厚み方向についてダイヤモンド結晶の粒径を比較したとき、ダイヤモンド結晶が前記第2測定点よりも小さい、前記第3測定点を含む表面領域が存在し、該表面領域の厚みが0.1μm〜2μmである請求項13記載の被覆部材。
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2015090527 | 2015-04-27 | ||
JP2015090527 | 2015-04-27 | ||
JP2016064012 | 2016-03-28 | ||
JP2016064012 | 2016-03-28 | ||
PCT/JP2016/062382 WO2016175088A1 (ja) | 2015-04-27 | 2016-04-19 | 被覆部材 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2016175088A1 true JPWO2016175088A1 (ja) | 2018-03-15 |
JP6533286B2 JP6533286B2 (ja) | 2019-06-19 |
Family
ID=57198348
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2017515495A Active JP6533286B2 (ja) | 2015-04-27 | 2016-04-19 | 被覆部材 |
Country Status (6)
Country | Link |
---|---|
US (1) | US10640868B2 (ja) |
JP (1) | JP6533286B2 (ja) |
KR (1) | KR102053677B1 (ja) |
CN (1) | CN107532296B (ja) |
DE (1) | DE112016001931T5 (ja) |
WO (1) | WO2016175088A1 (ja) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10745802B2 (en) * | 2017-03-22 | 2020-08-18 | Mitsubishi Materials Corporation | Diamond-coated cemented carbide cutting tool |
US20210237164A1 (en) | 2018-06-19 | 2021-08-05 | Sumitomo Electric Hardmetal Corp. | Diamond joined body and method for manufacturing diamond joined body |
WO2020008722A1 (ja) * | 2018-07-02 | 2020-01-09 | 住友電工ハードメタル株式会社 | ダイヤモンド被覆工具 |
JP6927954B2 (ja) * | 2018-12-25 | 2021-09-01 | ユニオンツール株式会社 | 切削工具用ダイヤモンド皮膜 |
WO2020170572A1 (ja) * | 2019-02-19 | 2020-08-27 | 住友電工ハードメタル株式会社 | 切削工具 |
CN114286731A (zh) * | 2019-10-24 | 2022-04-05 | 住友电工硬质合金株式会社 | 金刚石切削工具及其制造方法 |
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US10640868B2 (en) | 2020-05-05 |
KR102053677B1 (ko) | 2019-12-09 |
CN107532296B (zh) | 2019-11-08 |
WO2016175088A1 (ja) | 2016-11-03 |
JP6533286B2 (ja) | 2019-06-19 |
KR20170129827A (ko) | 2017-11-27 |
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