JPWO2014175357A1 - 水性親水化表面処理剤、親水性皮膜及び親水化表面処理方法 - Google Patents
水性親水化表面処理剤、親水性皮膜及び親水化表面処理方法 Download PDFInfo
- Publication number
- JPWO2014175357A1 JPWO2014175357A1 JP2015513819A JP2015513819A JPWO2014175357A1 JP WO2014175357 A1 JPWO2014175357 A1 JP WO2014175357A1 JP 2015513819 A JP2015513819 A JP 2015513819A JP 2015513819 A JP2015513819 A JP 2015513819A JP WO2014175357 A1 JPWO2014175357 A1 JP WO2014175357A1
- Authority
- JP
- Japan
- Prior art keywords
- surface treatment
- treatment agent
- aqueous
- agent according
- range
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000012756 surface treatment agent Substances 0.000 title claims abstract description 88
- 238000000034 method Methods 0.000 title abstract description 42
- 238000004381 surface treatment Methods 0.000 title abstract description 25
- 230000005660 hydrophilic surface Effects 0.000 title description 6
- 239000002245 particle Substances 0.000 claims abstract description 56
- 229910021331 inorganic silicon compound Inorganic materials 0.000 claims abstract description 40
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 35
- 239000010954 inorganic particle Substances 0.000 claims abstract description 32
- 239000008119 colloidal silica Substances 0.000 claims abstract description 26
- 239000007787 solid Substances 0.000 claims abstract description 16
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 15
- 238000002156 mixing Methods 0.000 claims abstract description 9
- 150000001875 compounds Chemical class 0.000 claims abstract description 8
- 239000007769 metal material Substances 0.000 claims description 32
- 229910052782 aluminium Inorganic materials 0.000 claims description 16
- 238000001035 drying Methods 0.000 claims description 13
- 150000003839 salts Chemical class 0.000 claims description 13
- 150000003755 zirconium compounds Chemical class 0.000 claims description 13
- 229910052751 metal Inorganic materials 0.000 claims description 10
- 239000002184 metal Substances 0.000 claims description 10
- 125000000524 functional group Chemical group 0.000 claims description 9
- 239000004094 surface-active agent Substances 0.000 claims description 7
- 125000003277 amino group Chemical group 0.000 claims description 6
- 229910001463 metal phosphate Inorganic materials 0.000 claims description 6
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims description 5
- -1 acryloxy group Chemical group 0.000 claims description 5
- 150000003863 ammonium salts Chemical class 0.000 claims description 5
- 125000003700 epoxy group Chemical group 0.000 claims description 5
- 229910052725 zinc Inorganic materials 0.000 claims description 5
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 claims description 4
- 229910002651 NO3 Inorganic materials 0.000 claims description 4
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 claims description 4
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 claims description 4
- XAEFZNCEHLXOMS-UHFFFAOYSA-M potassium benzoate Chemical compound [K+].[O-]C(=O)C1=CC=CC=C1 XAEFZNCEHLXOMS-UHFFFAOYSA-M 0.000 claims description 4
- 229910052791 calcium Inorganic materials 0.000 claims description 3
- 125000001951 carbamoylamino group Chemical group C(N)(=O)N* 0.000 claims description 3
- 229910052742 iron Inorganic materials 0.000 claims description 3
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 claims description 3
- 229910052748 manganese Inorganic materials 0.000 claims description 3
- 159000000000 sodium salts Chemical class 0.000 claims description 3
- 125000003396 thiol group Chemical group [H]S* 0.000 claims description 3
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 3
- 238000003672 processing method Methods 0.000 claims 1
- 230000007797 corrosion Effects 0.000 abstract description 40
- 238000005260 corrosion Methods 0.000 abstract description 40
- 230000002688 persistence Effects 0.000 abstract description 2
- 230000001747 exhibiting effect Effects 0.000 abstract 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 45
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 24
- 238000011282 treatment Methods 0.000 description 23
- 238000000576 coating method Methods 0.000 description 19
- 239000000463 material Substances 0.000 description 18
- 238000012360 testing method Methods 0.000 description 18
- LRXTYHSAJDENHV-UHFFFAOYSA-H zinc phosphate Chemical compound [Zn+2].[Zn+2].[Zn+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O LRXTYHSAJDENHV-UHFFFAOYSA-H 0.000 description 15
- 229910000165 zinc phosphate Inorganic materials 0.000 description 15
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 14
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 13
- 239000011248 coating agent Substances 0.000 description 13
- 230000000052 comparative effect Effects 0.000 description 11
- 238000010438 heat treatment Methods 0.000 description 9
- WMYWOWFOOVUPFY-UHFFFAOYSA-L dihydroxy(dioxo)chromium;phosphoric acid Chemical compound OP(O)(O)=O.O[Cr](O)(=O)=O WMYWOWFOOVUPFY-UHFFFAOYSA-L 0.000 description 8
- 230000000694 effects Effects 0.000 description 8
- 238000011156 evaluation Methods 0.000 description 8
- 239000000047 product Substances 0.000 description 7
- 239000011651 chromium Substances 0.000 description 6
- 238000001816 cooling Methods 0.000 description 6
- 239000012528 membrane Substances 0.000 description 6
- 239000003921 oil Substances 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- 239000011701 zinc Substances 0.000 description 6
- 125000003545 alkoxy group Chemical group 0.000 description 5
- 230000000903 blocking effect Effects 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 5
- 238000005507 spraying Methods 0.000 description 5
- WRAGBEWQGHCDDU-UHFFFAOYSA-M C([O-])([O-])=O.[NH4+].[Zr+] Chemical compound C([O-])([O-])=O.[NH4+].[Zr+] WRAGBEWQGHCDDU-UHFFFAOYSA-M 0.000 description 4
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 4
- 229910000831 Steel Inorganic materials 0.000 description 4
- 239000006185 dispersion Substances 0.000 description 4
- 239000010959 steel Substances 0.000 description 4
- XJUNLJFOHNHSAR-UHFFFAOYSA-J zirconium(4+);dicarbonate Chemical compound [Zr+4].[O-]C([O-])=O.[O-]C([O-])=O XJUNLJFOHNHSAR-UHFFFAOYSA-J 0.000 description 4
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 3
- 229910000838 Al alloy Inorganic materials 0.000 description 3
- 241001163841 Albugo ipomoeae-panduratae Species 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 239000012298 atmosphere Substances 0.000 description 3
- 239000004566 building material Substances 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- ZCDOYSPFYFSLEW-UHFFFAOYSA-N chromate(2-) Chemical compound [O-][Cr]([O-])(=O)=O ZCDOYSPFYFSLEW-UHFFFAOYSA-N 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 3
- 239000000470 constituent Substances 0.000 description 3
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 3
- 238000006460 hydrolysis reaction Methods 0.000 description 3
- 230000005923 long-lasting effect Effects 0.000 description 3
- 239000003973 paint Substances 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 3
- 238000005406 washing Methods 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 2
- 229910001335 Galvanized steel Inorganic materials 0.000 description 2
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 125000002947 alkylene group Chemical group 0.000 description 2
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 2
- 239000003242 anti bacterial agent Substances 0.000 description 2
- 230000000844 anti-bacterial effect Effects 0.000 description 2
- 239000002518 antifoaming agent Substances 0.000 description 2
- 239000003429 antifungal agent Substances 0.000 description 2
- 229940121375 antifungal agent Drugs 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 2
- 239000003086 colorant Substances 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- 238000006482 condensation reaction Methods 0.000 description 2
- 230000021615 conjugation Effects 0.000 description 2
- IJKVHSBPTUYDLN-UHFFFAOYSA-N dihydroxy(oxo)silane Chemical compound O[Si](O)=O IJKVHSBPTUYDLN-UHFFFAOYSA-N 0.000 description 2
- WBFZBNKJVDQAMA-UHFFFAOYSA-D dipotassium;zirconium(4+);pentacarbonate Chemical compound [K+].[K+].[Zr+4].[Zr+4].[O-]C([O-])=O.[O-]C([O-])=O.[O-]C([O-])=O.[O-]C([O-])=O.[O-]C([O-])=O WBFZBNKJVDQAMA-UHFFFAOYSA-D 0.000 description 2
- 238000007598 dipping method Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 239000008397 galvanized steel Substances 0.000 description 2
- 230000007062 hydrolysis Effects 0.000 description 2
- 230000003301 hydrolyzing effect Effects 0.000 description 2
- CPSYWNLKRDURMG-UHFFFAOYSA-L hydron;manganese(2+);phosphate Chemical compound [Mn+2].OP([O-])([O-])=O CPSYWNLKRDURMG-UHFFFAOYSA-L 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 2
- 125000005647 linker group Chemical group 0.000 description 2
- 239000011572 manganese Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 239000008399 tap water Substances 0.000 description 2
- 235000020679 tap water Nutrition 0.000 description 2
- LTQBNYCMVZQRSD-UHFFFAOYSA-N (4-ethenylphenyl)-trimethoxysilane Chemical compound CO[Si](OC)(OC)C1=CC=C(C=C)C=C1 LTQBNYCMVZQRSD-UHFFFAOYSA-N 0.000 description 1
- IVORCBKUUYGUOL-UHFFFAOYSA-N 1-ethynyl-2,4-dimethoxybenzene Chemical compound COC1=CC=C(C#C)C(OC)=C1 IVORCBKUUYGUOL-UHFFFAOYSA-N 0.000 description 1
- 125000000022 2-aminoethyl group Chemical group [H]C([*])([H])C([H])([H])N([H])[H] 0.000 description 1
- NECRQCBKTGZNMH-UHFFFAOYSA-N 3,5-dimethylhex-1-yn-3-ol Chemical compound CC(C)CC(C)(O)C#C NECRQCBKTGZNMH-UHFFFAOYSA-N 0.000 description 1
- ZDZYGYFHTPFREM-UHFFFAOYSA-N 3-[3-aminopropyl(dimethoxy)silyl]oxypropan-1-amine Chemical compound NCCC[Si](OC)(OC)OCCCN ZDZYGYFHTPFREM-UHFFFAOYSA-N 0.000 description 1
- DOYKFSOCSXVQAN-UHFFFAOYSA-N 3-[diethoxy(methyl)silyl]propyl 2-methylprop-2-enoate Chemical compound CCO[Si](C)(OCC)CCCOC(=O)C(C)=C DOYKFSOCSXVQAN-UHFFFAOYSA-N 0.000 description 1
- ZYAASQNKCWTPKI-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]propan-1-amine Chemical compound CO[Si](C)(OC)CCCN ZYAASQNKCWTPKI-UHFFFAOYSA-N 0.000 description 1
- IKYAJDOSWUATPI-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]propane-1-thiol Chemical compound CO[Si](C)(OC)CCCS IKYAJDOSWUATPI-UHFFFAOYSA-N 0.000 description 1
- LZMNXXQIQIHFGC-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]propyl 2-methylprop-2-enoate Chemical compound CO[Si](C)(OC)CCCOC(=O)C(C)=C LZMNXXQIQIHFGC-UHFFFAOYSA-N 0.000 description 1
- LVNLBBGBASVLLI-UHFFFAOYSA-N 3-triethoxysilylpropylurea Chemical compound CCO[Si](OCC)(OCC)CCCNC(N)=O LVNLBBGBASVLLI-UHFFFAOYSA-N 0.000 description 1
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 description 1
- KBQVDAIIQCXKPI-UHFFFAOYSA-N 3-trimethoxysilylpropyl prop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C=C KBQVDAIIQCXKPI-UHFFFAOYSA-N 0.000 description 1
- DDFHBQSCUXNBSA-UHFFFAOYSA-N 5-(5-carboxythiophen-2-yl)thiophene-2-carboxylic acid Chemical compound S1C(C(=O)O)=CC=C1C1=CC=C(C(O)=O)S1 DDFHBQSCUXNBSA-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 238000005481 NMR spectroscopy Methods 0.000 description 1
- 229910008051 Si-OH Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910006358 Si—OH Inorganic materials 0.000 description 1
- 229910007567 Zn-Ni Inorganic materials 0.000 description 1
- 229910007614 Zn—Ni Inorganic materials 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000008186 active pharmaceutical agent Substances 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 150000001450 anions Chemical class 0.000 description 1
- 239000003125 aqueous solvent Substances 0.000 description 1
- 125000000732 arylene group Chemical group 0.000 description 1
- GOZLPQZIQDBYMO-UHFFFAOYSA-N azanium;zirconium;fluoride Chemical compound [NH4+].[F-].[Zr] GOZLPQZIQDBYMO-UHFFFAOYSA-N 0.000 description 1
- 238000007611 bar coating method Methods 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical compound OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011362 coarse particle Substances 0.000 description 1
- 239000000084 colloidal system Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- SJJCABYOVIHNPZ-UHFFFAOYSA-N cyclohexyl-dimethoxy-methylsilane Chemical compound CO[Si](C)(OC)C1CCCCC1 SJJCABYOVIHNPZ-UHFFFAOYSA-N 0.000 description 1
- KQAHMVLQCSALSX-UHFFFAOYSA-N decyl(trimethoxy)silane Chemical compound CCCCCCCCCC[Si](OC)(OC)OC KQAHMVLQCSALSX-UHFFFAOYSA-N 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000005238 degreasing Methods 0.000 description 1
- 239000013527 degreasing agent Substances 0.000 description 1
- 238000005237 degreasing agent Methods 0.000 description 1
- 238000007791 dehumidification Methods 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 238000000502 dialysis Methods 0.000 description 1
- ZZNQQQWFKKTOSD-UHFFFAOYSA-N diethoxy(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](OCC)(OCC)C1=CC=CC=C1 ZZNQQQWFKKTOSD-UHFFFAOYSA-N 0.000 description 1
- OTARVPUIYXHRRB-UHFFFAOYSA-N diethoxy-methyl-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](C)(OCC)CCCOCC1CO1 OTARVPUIYXHRRB-UHFFFAOYSA-N 0.000 description 1
- JJQZDUKDJDQPMQ-UHFFFAOYSA-N dimethoxy(dimethyl)silane Chemical compound CO[Si](C)(C)OC JJQZDUKDJDQPMQ-UHFFFAOYSA-N 0.000 description 1
- AHUXYBVKTIBBJW-UHFFFAOYSA-N dimethoxy(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](OC)(OC)C1=CC=CC=C1 AHUXYBVKTIBBJW-UHFFFAOYSA-N 0.000 description 1
- YYLGKUPAFFKGRQ-UHFFFAOYSA-N dimethyldiethoxysilane Chemical compound CCO[Si](C)(C)OCC YYLGKUPAFFKGRQ-UHFFFAOYSA-N 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 1
- RSIHJDGMBDPTIM-UHFFFAOYSA-N ethoxy(trimethyl)silane Chemical compound CCO[Si](C)(C)C RSIHJDGMBDPTIM-UHFFFAOYSA-N 0.000 description 1
- 125000000031 ethylamino group Chemical group [H]C([H])([H])C([H])([H])N([H])[*] 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000004817 gas chromatography Methods 0.000 description 1
- CZWLNMOIEMTDJY-UHFFFAOYSA-N hexyl(trimethoxy)silane Chemical compound CCCCCC[Si](OC)(OC)OC CZWLNMOIEMTDJY-UHFFFAOYSA-N 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 229910000040 hydrogen fluoride Inorganic materials 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 229910000398 iron phosphate Inorganic materials 0.000 description 1
- WBJZTOZJJYAKHQ-UHFFFAOYSA-K iron(3+) phosphate Chemical compound [Fe+3].[O-]P([O-])([O-])=O WBJZTOZJJYAKHQ-UHFFFAOYSA-K 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- POPACFLNWGUDSR-UHFFFAOYSA-N methoxy(trimethyl)silane Chemical compound CO[Si](C)(C)C POPACFLNWGUDSR-UHFFFAOYSA-N 0.000 description 1
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- KBJFYLLAMSZSOG-UHFFFAOYSA-N n-(3-trimethoxysilylpropyl)aniline Chemical compound CO[Si](OC)(OC)CCCNC1=CC=CC=C1 KBJFYLLAMSZSOG-UHFFFAOYSA-N 0.000 description 1
- BVWUEIUNONATML-UHFFFAOYSA-N n-benzylethenamine Chemical compound C=CNCC1=CC=CC=C1 BVWUEIUNONATML-UHFFFAOYSA-N 0.000 description 1
- SLYCYWCVSGPDFR-UHFFFAOYSA-N octadecyltrimethoxysilane Chemical compound CCCCCCCCCCCCCCCCCC[Si](OC)(OC)OC SLYCYWCVSGPDFR-UHFFFAOYSA-N 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 238000005554 pickling Methods 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 1
- 159000000001 potassium salts Chemical class 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000002203 pretreatment Methods 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- 230000001846 repelling effect Effects 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- SCPYDCQAZCOKTP-UHFFFAOYSA-N silanol Chemical compound [SiH3]O SCPYDCQAZCOKTP-UHFFFAOYSA-N 0.000 description 1
- 125000005372 silanol group Chemical group 0.000 description 1
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 150000003377 silicon compounds Chemical class 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- KKCBUQHMOMHUOY-UHFFFAOYSA-N sodium oxide Chemical compound [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 description 1
- 229910001948 sodium oxide Inorganic materials 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 1
- 238000011071 total organic carbon measurement Methods 0.000 description 1
- GQIUQDDJKHLHTB-UHFFFAOYSA-N trichloro(ethenyl)silane Chemical compound Cl[Si](Cl)(Cl)C=C GQIUQDDJKHLHTB-UHFFFAOYSA-N 0.000 description 1
- FRGPKMWIYVTFIQ-UHFFFAOYSA-N triethoxy(3-isocyanatopropyl)silane Chemical compound CCO[Si](OCC)(OCC)CCCN=C=O FRGPKMWIYVTFIQ-UHFFFAOYSA-N 0.000 description 1
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 1
- FZMJEGJVKFTGMU-UHFFFAOYSA-N triethoxy(octadecyl)silane Chemical compound CCCCCCCCCCCCCCCCCC[Si](OCC)(OCC)OCC FZMJEGJVKFTGMU-UHFFFAOYSA-N 0.000 description 1
- JCVQKRGIASEUKR-UHFFFAOYSA-N triethoxy(phenyl)silane Chemical compound CCO[Si](OCC)(OCC)C1=CC=CC=C1 JCVQKRGIASEUKR-UHFFFAOYSA-N 0.000 description 1
- VTHOKNTVYKTUPI-UHFFFAOYSA-N triethoxy-[3-(3-triethoxysilylpropyltetrasulfanyl)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCSSSSCCC[Si](OCC)(OCC)OCC VTHOKNTVYKTUPI-UHFFFAOYSA-N 0.000 description 1
- XYJRNCYWTVGEEG-UHFFFAOYSA-N trimethoxy(2-methylpropyl)silane Chemical compound CO[Si](OC)(OC)CC(C)C XYJRNCYWTVGEEG-UHFFFAOYSA-N 0.000 description 1
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 description 1
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- 238000009423 ventilation Methods 0.000 description 1
- 239000005050 vinyl trichlorosilane Substances 0.000 description 1
- 229920003169 water-soluble polymer Polymers 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
- 229910052845 zircon Inorganic materials 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
- 229910000166 zirconium phosphate Inorganic materials 0.000 description 1
- LEHFSLREWWMLPU-UHFFFAOYSA-B zirconium(4+);tetraphosphate Chemical compound [Zr+4].[Zr+4].[Zr+4].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O LEHFSLREWWMLPU-UHFFFAOYSA-B 0.000 description 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
- C09D5/08—Anti-corrosive paints
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/40—Distributing applied liquids or other fluent materials by members moving relatively to surface
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/02—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by baking
- B05D3/0254—After-treatment
- B05D3/0272—After-treatment with ovens
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/02—Polysilicates
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
- C09D5/08—Anti-corrosive paints
- C09D5/082—Anti-corrosive paints characterised by the anti-corrosive pigment
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/60—Additives non-macromolecular
- C09D7/61—Additives non-macromolecular inorganic
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/66—Additives characterised by particle size
- C09D7/68—Particle size between 100-1000 nm
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
- C23C18/122—Inorganic polymers, e.g. silanes, polysilazanes, polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1229—Composition of the substrate
- C23C18/1241—Metallic substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/125—Process of deposition of the inorganic material
- C23C18/1254—Sol or sol-gel processing
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/125—Process of deposition of the inorganic material
- C23C18/1262—Process of deposition of the inorganic material involving particles, e.g. carbon nanotubes [CNT], flakes
- C23C18/127—Preformed particles
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C22/00—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C22/73—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals characterised by the process
- C23C22/74—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals characterised by the process for obtaining burned-in conversion coatings
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C22/00—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C22/82—After-treatment
- C23C22/83—Chemical after-treatment
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F28—HEAT EXCHANGE IN GENERAL
- F28F—DETAILS OF HEAT-EXCHANGE AND HEAT-TRANSFER APPARATUS, OF GENERAL APPLICATION
- F28F19/00—Preventing the formation of deposits or corrosion, e.g. by using filters or scrapers
- F28F19/02—Preventing the formation of deposits or corrosion, e.g. by using filters or scrapers by using coatings, e.g. vitreous or enamel coatings
- F28F19/04—Preventing the formation of deposits or corrosion, e.g. by using filters or scrapers by using coatings, e.g. vitreous or enamel coatings of rubber; of plastics material; of varnish
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/32—Phosphorus-containing compounds
- C08K2003/321—Phosphates
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/32—Phosphorus-containing compounds
- C08K2003/321—Phosphates
- C08K2003/325—Calcium, strontium or barium phosphate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/32—Phosphorus-containing compounds
- C08K2003/321—Phosphates
- C08K2003/327—Aluminium phosphate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K2201/00—Specific properties of additives
- C08K2201/002—Physical properties
- C08K2201/005—Additives being defined by their particle size in general
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K2201/00—Specific properties of additives
- C08K2201/011—Nanostructured additives
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/34—Silicon-containing compounds
- C08K3/36—Silica
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K9/00—Use of pretreated ingredients
- C08K9/04—Ingredients treated with organic substances
- C08K9/06—Ingredients treated with organic substances with silicon-containing compounds
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C2222/00—Aspects relating to chemical surface treatment of metallic material by reaction of the surface with a reactive medium
- C23C2222/20—Use of solutions containing silanes
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F28—HEAT EXCHANGE IN GENERAL
- F28F—DETAILS OF HEAT-EXCHANGE AND HEAT-TRANSFER APPARATUS, OF GENERAL APPLICATION
- F28F2245/00—Coatings; Surface treatments
- F28F2245/02—Coatings; Surface treatments hydrophilic
Abstract
Description
本発明に係る水性親水化表面処理剤は、有機無機ケイ素化合物(A)と無機粒子(B)とを含む処理剤である。そして、有機無機ケイ素化合物(A)は、コロイダルシリカ(C)及びオルガノアルコキシシラン(D)を混合して得られた化合物である。この水性親水化表面処理剤は、更に、成分(E)としてジルコニウム化合物を含んでもよく、その成分(E)は硝酸塩、硫酸塩、炭酸塩、フッ化水素酸塩、アンモニウム塩、カリウム塩及びナトリウム塩から選ばれる1種又は2種以上を含む金属塩であってもよい。また、成分(F)として、界面活性剤を含んでもよい。
有機無機ケイ素化合物(A)は、水性親水化表面処理剤の必須の構成材料であり、コロイダルシリカ(C)及びオルガノアルコキシシラン(D)を混合して得られたものである。得られた有機無機ケイ素化合物(A)は、水性親水化表面処理剤中にケイ素化合物分散体として存在する。オルガノアルコキシシラン(D)は加水分解反応及び縮合反応するが、その方法は特に制限されず、加熱や撹拌等の公知の方法を採用できる。なお、水分とオルガノアルコキシシラン(D)との加水分解により、アルコール(G)が生じるが、このアルコール(G)は、水性親水化表面処理剤を塗布した後の乾燥時に揮発させることができる。
コロイダルシリカ(C)は、SiO2又はその水和物のコロイドであり、オルガノアルコキシシラン(D)と共に有機無機ケイ素化合物(A)を形成するためのものである。コロイダルシリカ(C)は、通常、ケイ酸塩に希塩酸を作用させてから透析して得られ、常温ではなかなか沈殿しないゾル状である。
オルガノアルコキシシラン(D)は、コロイダルシリカ(A)と共に有機無機ケイ素化合物(A)を形成するためのものであり、アルコキシシラン基を有している。このアルコキシシラン基は、水と接触すると加水分解してシラノール基(Si−OH)を形成し、その後に架橋してシロキサン化合物を形成する。
アルコールは、オルガノアルコキシシラン(D)の加水分解により生じるものであり、水性親水化表面処理剤に含まれる。なお、アルコールは、水性親水化表面処理剤を金属材料の表面に塗布し、乾燥して親水性皮膜を形成する過程で揮発させることができる。したがって、アルコールは、形成された親水性皮膜には実質的に含まれないようにすることができる。アルコールの種類としては、使用されるオルガノアルコキシシラン(D)のアルコキシ基の種類に依存し、例えば、メタノール、エタノール、プロパノール等が挙げられる。
無機粒子(B)は、水性親水化表面処理剤の必須の構成材料である。無機粒子(B)は、難溶性のりん酸金属塩粒子であることが好ましい。りん酸金属塩としては、Zn、Fe、Mn、Al、及びCaから選ばれる1種又は2種以上の金属の塩であることが好ましい。なお、「難溶性」とは、水性親水化表面処理剤に溶解しないことを意味する。
水性親水化表面処理剤は、成分(E)としてジルコニウム化合物を含有することが更に好ましく、また成分(E)は、硝酸塩、硫酸塩、炭酸塩、フッ化水素酸塩、アンモニウム塩、カリウム塩及びナトリウム塩から選ばれる1種又は2種以上を含む金属塩であることが更に好ましい。なかでも、耐水性と耐湿性の観点から、炭酸塩、硫酸塩、アンモニウム塩及びカリウム塩から選ばれる1種又は2種以上を含むジルコニウム化合物であることが特に好ましく、炭酸塩を含むジルコニウム化合物及び/又はアンモニウムを含むジルコニウム化合物であることがより好ましい。なお、成分(E)は、水性親水化表面処理剤に任意に含まれる成分である。
水性親水化表面処理剤には、成分(F)としての界面活性剤を含んでいてもよい。界面活性剤の種類は、本発明の効果を阻害しない種類の界面活性剤であることが好ましい。成分(F)の含有量は、作業性、貯蔵性及び意匠性を向上させつつ、本発明で得られる品質(親水性と耐食性等)を損なわないという観点から、水性親水化表面処理剤中の全固形分に対して、1質量%以上、50質量%以下の範囲内であることが好ましく、1質量%以上、20質量%以下の範囲内であることがより好ましい。
水性親水化表面処理剤は、必要に応じて、消泡剤、レベリング剤、防菌防カビ剤、着色剤等を含んでいてもよい。ただし、これらは、その水性親水化表面処理剤で得られる親水性皮膜の品質を損なわない程度に添加されるべきで、多くても水性親水化表面処理剤中に数質量%であることが好ましい。
本発明に係る親水化表面処理方法は、上記した水性親水化表面処理剤を、金属材料の表面の一部又は全部に塗布し、乾燥して、親水性皮膜を形成する方法である。
本発明に係る親水性皮膜は、上記した本発明に係る水性親水化表面処理剤を塗布し、乾燥して得られる。例えば、上記した金属材料の表面に、上記した親水化表面処理方法によって水性親水化表面処理剤を塗布し、乾燥して得ることができる。
(金属材料)
以下の市販のアルミニウム材を金属材料として使用した。その試験片の大きさは、縦300mm×横150mm×厚さ0.1mmである。
A2:JIS−H−4000 A−1050(下地処理:りん酸クロメート、Cr付着量:5mg/m2)、
A3:JIS−H−4000 A−1050(下地処理:りん酸クロメート、Cr付着量:15mg/m2)、
A4:JIS−H−4000 A−1050(下地処理:りん酸クロメート、Cr付着量:20mg/m2)
A5:JIS−H−4000 A−1050(下地処理:りん酸クロメート、Cr付着量:40mg/m2)
試験片の作製方法としては、先ず、上記アルミニウム材の表面を、40℃に保たれた非エッチング型弱アルカリ脱脂剤(商品名:ファインクリーナー315E、日本パーカライジング株式会社製)の30g/L水溶液中に60秒間浸漬し、表面上の油分や汚れを取り除いた。次に、水道水で水洗して金属材料の表面が水で100%濡れることを確認した後、更に純水を流しかけ、100℃の雰囲気で水分を除去した。これを試験片として使用した。
上記A2〜A5の試験片の作製方法としては、先ず、上記と同様に金属材料の表面を洗浄し、次いで、50℃に保たれたりん酸クロメート表面処理剤(商品名:アルクロム−K702、日本パーカライジング株式会社製)の4.7g/L水溶液で、上記した所定のCr付着量になるように2〜10秒間スプレー処理し、りん酸クロメート皮膜を形成した。次に、水道水で水洗し、更に純水を流しかけ、80℃の雰囲気で3分間乾燥させた。これを試験片として使用した。
(成分A)
水性親水化表面処理剤を構成する有機無機ケイ素化合物(成分A)は、下記のコロイダルシリカ(C)と下記のオルガノアルコキシシラン(D)とを混合し、オルガノアルコキシシラン(D)の加水分解反応及び縮合反応が進行することにより得られたものである。
C1:スノーテックスXS(平均粒子径:4〜6nm)
C2:スノーテックスOS(平均粒子径:8〜11nm)
C3:スノーテックス50(平均粒子径:20〜30nm)
C4:スノーテックスXL(平均粒子径:40〜60nm)
C5:スノーテックスZL(平均粒子径:70〜100nm)
C6:スノーテックスMP−2040(平均粒子径:200nm)
C7:スノーテックスMP−4540M(平均粒子径:450nm)
D1:ビニルトリエトキシシラン
D2:テトラエトキシシラン
D3:アミノプロピルトリエトキシシラン
D4:γ−グリシドキシプロピルトリエトキシシラン
無機粒子(成分B)としてZn3(PO4)2・4H2Oをジルコニアビーズを用いたボールミルで粉砕し、以下の平均粒子径のりん酸亜鉛粒子を用いた。水にこのりん酸亜鉛粒子を加えて縣濁液とした後に5μmのペーパーフィルターで濾過し、りん酸亜鉛粒子の平均粒子径を粒度分布測定装置(型名:ナノトラックEX150、日機装株式会社製)で測定した。
B2:りん酸亜鉛粒子(平均粒子径:50nm)
B3:りん酸亜鉛粒子(平均粒子径:100nm)
B4:りん酸亜鉛粒子(平均粒子径:300nm)
B5:りん酸亜鉛粒子(平均粒子径:500nm)
B6:りん酸亜鉛粒子(平均粒子径:600nm)
E1:ジルコンフッ化アンモニウム(商品名:森田化学工業株式会社)
E2:炭酸ジルコニウムアンモニウム(商品名:ジルコゾールAC−7、第一稀元素化学工業株式会社製)
E3:炭酸ジルコニウムカリウム(商品名:ジルコゾ−ルZK−10、第一稀元素化学工業株式会社製)
F1:ペレックスSS−H(商品名、花王株式会社製)
F2:メガファックF−444(商品名、DIC株式会社製)
F3:サーフィノール440(商品名、信越化学株式会社製)
上記した各成分を用いて、表1〜表4に示す組成となるように調製して、実施例用処理剤1〜49と比較例用処理剤1〜4を準備した。
準備した実施例用処理剤1〜49と比較例用処理剤1〜4を用い、前処理した金属材料上に、表5〜表9に示す条件で処理して、実施例1〜67及び比較例1〜4の表面処理皮膜を形成した。表面処理方法は、各表面処理剤をバーコート法で各試験片上に塗装し、その後、水洗することなく、そのままオーブンに入れて乾燥させ、所定の皮膜量の皮膜を形成させた。バーコート法での塗装は、表面処理剤を試験片に滴下して、ロッドNo.3〜No.5のバーコーターで行った。なお、このロッドNoは、旧規格のJIS K 5400の「7.5 バーコーター塗り」に記載の巻き線の直径をミル単位で示した番号である。使用したバーコーターの種類と表面処理剤の濃度とにより、所定の皮膜量となるように調整した。乾燥温度は、オーブン中の雰囲気温度とオーブンに入れている時間とで調節した。このときの乾燥温度は、試験片表面の到達温度を示す。
実施例1〜67及び比較例1〜6の条件で処理して得た表面処理皮膜について、以下の性能評価を行った。その結果を、表面処理条件と併せて表5〜表9に示す。以下では、◎(ランク1)、○(ランク2)及び△(ランク3)が使用可能範囲とし、×(ランク4)が不合格として評価した。
親水性は、接触角計(型名:DIGIDROP D−S、仏国 GBX社製)を用い、液滴法により測定した接触角により評価した。接触角は、水滴量を2μLとし、滴下30秒後の接触角を測定した。評価基準を以下に示す。
○(ランク2):5°超、25°以下の接触角
△(ランク3):25°超、40°以下の接触角
×(ランク4):40°超の接触角
親水持続性は、流水浸漬360時間後の接触角により評価した。なお、流水浸漬は供試材を室温で流水(流水量:脱イオン水で0.5L/分)に浸漬させ、乾燥は80℃で10分間行った。接触角の測定は上記した親水性の評価と同じ方法である。評価基準を以下に示す。
○(ランク2):5°超、25°以下の接触角
△(ランク3):25°超、40°以下の接触角
×(ランク4):40°超の接触角
耐食性Aは、塩水噴霧試験により評価した。塩水噴霧試験は、JIS−Z−2371に基づいて行い、960時間保持した後、純水で軽く濯いで乾燥させ、腐食状態を目視で観察し、平面部における白錆発生の面積率(試験片の全面積に対する、白錆が生じた面積の割合)で耐食性を評価した。評価基準を以下に示す。
○(ランク2):5%超、20%以下の腐食
△(ランク3):20%超、50%以下の腐食
×(ランク4):50%超の腐食
耐食性Bは、湿潤試験により評価した。湿潤試験は、相対湿度95%、温度50℃の雰囲気中に960時間保持した後、乾燥させて腐食状態を目視で観察し、平面部における白錆発生の面積率(試験片の全面積に対する白錆が生じた面積の割合)で耐食性を評価した。評価基準を以下に示す。
○(ランク2):5%超、20%以下の腐食
△(ランク3):20%超、50%以下の腐食
×(ランク4):50%超の腐食
密着性は、JIS−K−5600に従ってテープ剥離試験を行い、皮膜の剥離の程度(面積割合)により評価した。評価基準を以下に示す。なお、面積割合は、目視で評価したものを百分率で表した。
○(ランク2):5%超、20%以下の剥離
△(ランク3):20%超、50%以下の剥離
×(ランク4):50%超の剥離
実施例1〜10の結果より、質量比(MD/MC)が1.0以上3.0以下の特に好ましい範囲内である場合には、親水性皮膜と金属材料表面との密着性がより一層向上していた。また、実施例5,11〜16の結果より、コロイダルシリカ(C)の平均粒子径が4nm以上100nm以下のより好ましい範囲内である場合には、親水性皮膜の親水性と親水持続性、及び親水性皮膜と金属材料表面との密着性がより一層向上していた。また、実施例5,17〜19の結果より、オルガノアルコキシシラン(D)としてビニルトリエトキシシラン、アミノプロピルトリエトキシシラン、γ−グリシドキシプロピルトリエトキシシランが、密着性と耐食性の点で好ましかった。また、実施例17,20〜24の結果より、無機粒子(B)の平均粒子径が50nm以上500nm以下のより好ましい範囲内である場合には、密着性と、耐食性A,Bと、親水性持続性がより一層向上していた。また、実施例23,25〜31の結果より、質量比(MB/MA)が0.4以上1.2以下のより好ましい範囲内である場合には、親水性及び耐食性Aがより向上していた。また、実施例5,32〜34の結果より、成分(E)であるジルコニウム化合物は含有させることで各種性能が向上し、特に炭酸ジルコニウムアンモニウムが最も良い特性であった。また、実施例23,35〜40の結果より、成分(E)の含有量が3質量%以上30質量%以下の特に好ましい範囲内である場合には、特に親水性が優れていた。また、実施例43〜49の結果より、水性親水化表面処理剤は成分(F)の界面活性剤を含んでいてもよく、その含有量が1質量%以上20質量%以下のより好ましい範囲内である場合に親水性皮膜と金属材料表面との密着性が優れていた。
Claims (14)
- 有機無機ケイ素化合物(A)と無機粒子(B)とを含む表面処理剤であって、
前記有機無機ケイ素化合物(A)が、コロイダルシリカ(C)及びオルガノアルコキシシラン(D)を混合して得られた化合物であることを特徴とする水性親水化表面処理剤。 - 前記有機無機ケイ素化合物(A)の固形分質量MAと前記無機粒子(B)の固形分質量MBとの比(MB/MA)が、0.2以上2.0以下の範囲内である、請求項1に記載の水性親水化表面処理剤。
- 前記有機無機ケイ素化合物(A)の平均粒子径が、3nm以上500nm以下の範囲内である、請求項1又は2に記載の水性親水化表面処理剤。
- 前記コロイダルシリカ(C)の平均粒子径が、3nm以上500nm以下の範囲内である、請求項1〜3のいずれかに記載の水性親水化表面処理剤。
- 前記無機粒子(B)の平均粒子径が、10nm以上600nm以下の範囲内である、請求項1〜4のいずれか1項に記載の水性親水化表面処理剤。
- 前記オルガノアルコキシシラン(D)の末端基が、エポキシ基、アミノ基、メルカプト基、アクリロキシ基、ウレイド基、イソシアナート基、及びビニル基から選択される1又は2以上の官能基である、請求項1〜5のいずれか1項に記載の水性親水化表面処理剤。
- 前記無機粒子(B)が、難溶性のりん酸金属塩粒子である、請求項1〜6のいずれか1項に記載の水性親水化表面処理剤。
- 前記りん酸金属塩粒子に含まれる金属が、Zn、Fe、Mn、Al及びCaから選ばれる少なくとも1種である、請求項7に記載の水性親水化表面処理剤。
- 成分(E)として、ジルコニウム化合物を含有する、請求項1〜8のいずれか1項に記載の水性親水化表面処理剤。
- 前記成分(E)が、硝酸塩、硫酸塩、炭酸塩、フッ化水素酸塩、アンモニウム塩、カリウム塩及びナトリウム塩から選ばれる1種又は2種以上を含む金属塩である、請求項1〜8のいずれか1項に記載の水性親水化表面処理剤。
- 成分(F)として、界面活性剤を含有する、請求項1〜10のいずれか1項に記載の水性親水化表面処理剤。
- 前記成分(F)の含有量が、全固形分に対して1質量%以上50質量%以下の範囲内である、請求項11に記載の水性親水化表面処理剤。
- 請求項1〜12のいずれか1項に記載の水性親水化表面処理剤を塗布し、乾燥して得られることを特徴とする親水性皮膜。
- 請求項1〜12のいずれか1項に記載の水性親水化表面処理剤を、金属材料の表面の一部又は全部に塗布し乾燥して親水性皮膜を形成することを特徴とする親水化表面処理方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013093868 | 2013-04-26 | ||
JP2013093868 | 2013-04-26 | ||
PCT/JP2014/061491 WO2014175357A1 (ja) | 2013-04-26 | 2014-04-23 | 水性親水化表面処理剤、親水性皮膜及び親水化表面処理方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP6064042B2 JP6064042B2 (ja) | 2017-01-18 |
JPWO2014175357A1 true JPWO2014175357A1 (ja) | 2017-02-23 |
Family
ID=51791924
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2015513819A Active JP6064042B2 (ja) | 2013-04-26 | 2014-04-23 | 水性親水化表面処理剤、親水性皮膜及び親水化表面処理方法 |
Country Status (7)
Country | Link |
---|---|
US (1) | US10023750B2 (ja) |
EP (1) | EP2990504B1 (ja) |
JP (1) | JP6064042B2 (ja) |
KR (1) | KR101723329B1 (ja) |
CN (1) | CN105189816B (ja) |
MX (1) | MX2015014946A (ja) |
WO (1) | WO2014175357A1 (ja) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2017180961A (ja) * | 2016-03-30 | 2017-10-05 | 株式会社Uacj | 親水性皮膜及びそれを用いた熱交換器用フィン並びに熱交換器 |
JP6760196B2 (ja) * | 2017-05-08 | 2020-09-23 | 日本軽金属株式会社 | アルミニウム塗装材及びその製造方法 |
US20200061973A1 (en) * | 2017-05-08 | 2020-02-27 | Nippon Light Metal Company, Ltd. | Coated aluminum material for joining and aluminum resin composite material |
JP7148237B2 (ja) * | 2017-11-02 | 2022-10-05 | 株式会社放電精密加工研究所 | アルマイト材の代替材料に用いることができる表面被覆基材、その基板表面にトップコート層を形成するための塗料組成物 |
JP7467866B2 (ja) * | 2019-10-02 | 2024-04-16 | 住友ゴム工業株式会社 | 親水性基材及び親水性基材作製方法 |
Family Cites Families (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4144074A (en) * | 1976-11-30 | 1979-03-13 | Kansai Paint Co., Ltd. | Inorganic coating composition |
JPS58126989A (ja) | 1982-01-25 | 1983-07-28 | Showa Alum Corp | 噴霧容器入り熱交換器親水性付与液 |
JPS5913078A (ja) | 1982-07-14 | 1984-01-23 | Nippon Radiator Co Ltd | アルミニウム蒸発器の表面処理方法 |
JPS63372A (ja) | 1986-06-19 | 1988-01-05 | Sony Chem Corp | 空調用抗菌塗料 |
JP2997066B2 (ja) | 1990-12-27 | 2000-01-11 | 大日本塗料株式会社 | 塗料組成物及び被覆アルミニウム材 |
JPH06228459A (ja) * | 1993-01-29 | 1994-08-16 | Kansai Paint Co Ltd | 親水化処理用組成物および親水化処理方法 |
JP3424533B2 (ja) * | 1997-11-25 | 2003-07-07 | 松下電工株式会社 | 親水性無機塗料とそれを用いた親水性塗装品 |
JP4667562B2 (ja) * | 2000-06-29 | 2011-04-13 | 日新製鋼株式会社 | 加工性,光反射性及び光反射持続性に優れた白色塗装金属板 |
JP4653731B2 (ja) | 2003-03-31 | 2011-03-16 | ベール ゲーエムベーハー ウント コー カーゲー | 熱交換機およびその表面処理方法 |
JP2004315730A (ja) * | 2003-04-18 | 2004-11-11 | Toto Ltd | 曇り止め剤 |
US20060166013A1 (en) * | 2005-01-24 | 2006-07-27 | Hoden Seimitsu Kako Kenyusho Co., Ltd. | Chromium-free rust inhibitive treatment method for metal products having zinc surface and metal products treated thereby |
US7745010B2 (en) * | 2005-08-26 | 2010-06-29 | Prc Desoto International, Inc. | Coating compositions exhibiting corrosion resistance properties, related coated substrates, and methods |
CN101573472B (zh) * | 2006-11-15 | 2010-12-22 | 新日本制铁株式会社 | 表面处理金属材料及其制造方法 |
JP2010090461A (ja) | 2008-10-10 | 2010-04-22 | Central Glass Co Ltd | 親水性膜およびそれを用いた熱交換素子部材 |
JP5555177B2 (ja) * | 2008-12-16 | 2014-07-23 | 日本パーカライジング株式会社 | 金属材料用表面処理剤 |
KR101104262B1 (ko) | 2008-12-31 | 2012-01-11 | 주식회사 노루홀딩스 | 자기세정성 부재 및 그 제조방법 |
CN101941001B (zh) * | 2009-07-03 | 2014-04-02 | 3M创新有限公司 | 亲水涂层、制品、涂料组合物和方法 |
JP5666803B2 (ja) * | 2009-11-27 | 2015-02-12 | 旭化成イーマテリアルズ株式会社 | エネルギー変換装置用部材、リフレクター装置及び太陽熱発電システム |
KR101264231B1 (ko) * | 2009-12-23 | 2013-05-22 | 주식회사 포스코 | 절연성이 우수한 절연피막 형성용 피복조성물, 이를 이용한 무방향성 전기강판 및 무방향성 전기강판의 절연피막 형성방법 |
JP5480664B2 (ja) * | 2010-02-23 | 2014-04-23 | パナソニック株式会社 | 親水性コーティング材組成物及び外回り住宅部材 |
CN102241899B (zh) * | 2010-05-11 | 2014-05-14 | 3M创新有限公司 | 涂料组合物,改性基体表面的方法和制品 |
US9005355B2 (en) * | 2010-10-15 | 2015-04-14 | Bunge Amorphic Solutions Llc | Coating compositions with anticorrosion properties |
WO2014147782A1 (ja) * | 2013-03-21 | 2014-09-25 | 日本パーカライジング株式会社 | 排水性に優れたアルミニウム含有金属製熱交換器の親水性表面処理剤 |
JP6043663B2 (ja) * | 2013-03-21 | 2016-12-14 | 日本パーカライジング株式会社 | 付着汚れに対する自己洗浄能力に優れた皮膜を形成する水系親水性塗料組成物並びに付着汚れに対する自己洗浄能力に優れた皮膜を形成した表面処理材 |
CA2994234A1 (en) * | 2014-10-22 | 2016-04-28 | Gsr Solutions Llc | Symbiotic algae system with looped reactor |
-
2014
- 2014-04-23 JP JP2015513819A patent/JP6064042B2/ja active Active
- 2014-04-23 EP EP14788792.1A patent/EP2990504B1/en active Active
- 2014-04-23 CN CN201480022932.4A patent/CN105189816B/zh active Active
- 2014-04-23 KR KR1020157032174A patent/KR101723329B1/ko active IP Right Grant
- 2014-04-23 WO PCT/JP2014/061491 patent/WO2014175357A1/ja active Application Filing
- 2014-04-23 MX MX2015014946A patent/MX2015014946A/es unknown
- 2014-04-23 US US14/786,344 patent/US10023750B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
MX2015014946A (es) | 2016-03-07 |
EP2990504A1 (en) | 2016-03-02 |
KR101723329B1 (ko) | 2017-04-04 |
CN105189816A (zh) | 2015-12-23 |
JP6064042B2 (ja) | 2017-01-18 |
US20160068687A1 (en) | 2016-03-10 |
US10023750B2 (en) | 2018-07-17 |
CN105189816B (zh) | 2018-06-08 |
EP2990504B1 (en) | 2020-04-29 |
EP2990504A4 (en) | 2017-01-04 |
WO2014175357A1 (ja) | 2014-10-30 |
KR20150140808A (ko) | 2015-12-16 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5555179B2 (ja) | 亜鉛めっき鋼板用表面処理剤、亜鉛めっき鋼板の表面処理方法および亜鉛めっき鋼板 | |
US10907053B2 (en) | Aqueous anti-rust surface treatment composition and surface-coated metal member | |
JP5555178B2 (ja) | 金属材料用表面処理剤、およびそれを用いた金属材料の表面処理方法、表面処理金属材料 | |
ES2372248T3 (es) | Procedimiento para el tratamiento previo o/y el revestimiento de superficies met�?licas antes de la conformación con un revestimiento similar a un barniz, y utilización de los substratos revestidos de tal manera. | |
US8648135B2 (en) | Surface-treatment agent, method for producing coated steel sheet using the surface-treatment agent, and coated steel sheet | |
JP4683582B2 (ja) | 水系金属材料表面処理剤、表面処理方法及び表面処理金属材料 | |
JP6064042B2 (ja) | 水性親水化表面処理剤、親水性皮膜及び親水化表面処理方法 | |
CA2754138C (en) | Process for coating metallic surfaces in a multi-stage process | |
US10822705B2 (en) | Surface-treatment solution composition containing trivalent chromium and inorganic compound, zinc-based plated steel sheet surface-treated using same, and method for producing same | |
JP2006213958A (ja) | 金属材料表面処理用組成物及び処理方法 | |
JP6523253B2 (ja) | 亜鉛めっき鋼材用の金属表面処理剤、被覆方法及び被覆鋼材 | |
JP6151960B2 (ja) | 親水化表面処理金属材及び熱交換器 | |
EP1310579A1 (en) | Coating material for forming titanium oxide film, method for forming titanium oxide film and use of said coating material | |
JP6569194B2 (ja) | 耐食性に優れた表面処理溶融亜鉛めっき鋼板 | |
JP6510670B2 (ja) | 亜鉛めっき鋼材用または亜鉛基合金めっき鋼材用水系表面処理剤、被覆方法及び被覆鋼材 | |
JP6056792B2 (ja) | 亜鉛系めっき鋼板用の表面処理液ならびに表面処理亜鉛系めっき鋼板およびその製造方法 | |
JP2006213859A (ja) | 熱交換器、冷凍サイクル装置及びそれらの製造に用いる親水性塗料 | |
JP5532022B2 (ja) | 塗装鋼板 | |
JP2019073749A (ja) | 親水化表面処理アルミニウム含有金属材及び熱交換器 | |
JP2019073750A (ja) | 親水化表面処理剤、親水性皮膜及び親水化表面処理方法 | |
JP2020084285A (ja) | 水性防錆表面処理組成物および表面被覆金属部材 | |
JP2018187847A (ja) | アルミニウム塗装材及びその製造方法 | |
JP2002105402A (ja) | 無機膜形成用塗布剤、無機膜形成方法、アルミニウム含有金属材料用下地処理剤、親水化処理された熱交換器アルミニウムフィン材及び熱交換器アルミニウムフィン材の製造方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20150928 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20160823 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20161020 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20161129 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20161219 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 6064042 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |