JPWO2013088547A1 - ウエハ搬送装置 - Google Patents
ウエハ搬送装置 Download PDFInfo
- Publication number
- JPWO2013088547A1 JPWO2013088547A1 JP2013549019A JP2013549019A JPWO2013088547A1 JP WO2013088547 A1 JPWO2013088547 A1 JP WO2013088547A1 JP 2013549019 A JP2013549019 A JP 2013549019A JP 2013549019 A JP2013549019 A JP 2013549019A JP WO2013088547 A1 JPWO2013088547 A1 JP WO2013088547A1
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- JP
- Japan
- Prior art keywords
- wafer
- supports
- wafers
- main surface
- support
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67259—Position monitoring, e.g. misposition detection or presence detection
- H01L21/67265—Position monitoring, e.g. misposition detection or presence detection of substrates stored in a container, a magazine, a carrier, a boat or the like
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67742—Mechanical parts of transfer devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
- B25J11/00—Manipulators not otherwise provided for
- B25J11/0095—Manipulators transporting wafers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67259—Position monitoring, e.g. misposition detection or presence detection
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67754—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber horizontal transfer of a batch of workpieces
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Robotics (AREA)
- Mechanical Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Manipulator (AREA)
Abstract
Description
3,4−ウエハサポート
7−制御部
10−ウエハ搬送装置
21〜23−アーム
51〜54−センサ
61〜63−旋回モータ
64−昇降モータ
100−ウエハ
200A,200B−搬入ステージ
図2は、同ウエハ搬送装置の搬入時の平面図である。
図3は、同ウエハ搬送装置の制御部のブロック図である。
図4は、同制御部の処理手順を示すフローチャートである。
図5(A)〜図5(E)は、同ウエハ搬送装置における動作状態を示す図である。
図6は、この発明の第2の実施形態に係るウエハ搬送装置の平面図である。
図7(A)及び図7(B)は、この発明の第3の実施形態に係るウエハ搬送装置の平面図及び側面図である。
Claims (3)
- 複数枚のウエハのそれぞれを同時に複数の搬入ステージに向けて搬送するウエハ搬送装置であって、
本体と、
前記本体に少なくともウエハの主面内で移動自在にして支持されたハンドリングアームと、
前記ハンドリングアームに支持され、それぞれ単一のウエハを保持する複数のウエハサポートと、
複数の搬入ステージのそれぞれで主面内におけるウエハの位置を検出する複数の検出部と、
前記複数のウエハサポートのそれぞれが保持するウエハの主面内の位置を、前記検出部の検出結果に基づいて、前記搬入ステージにおける互いに異なる高さ位置で順に補正する制御部と、
を備えたウエハ搬送装置。 - 前記制御部は、前記複数のウエハのそれぞれを、より低い位置から順に補正する請求項1に記載のウエハ搬送装置。
- 前記ハンドリングアームは、前記本体に昇降自在に支持され、前記複数のウエハサポートを互いに異なる高さ位置に支持する請求項2に記載のウエハ搬送装置。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/JP2011/079029 WO2013088547A1 (ja) | 2011-12-15 | 2011-12-15 | ウエハ搬送装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2013088547A1 true JPWO2013088547A1 (ja) | 2015-04-27 |
JP5925217B2 JP5925217B2 (ja) | 2016-05-25 |
Family
ID=48612033
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2013549019A Active JP5925217B2 (ja) | 2011-12-15 | 2011-12-15 | ウエハ搬送装置 |
Country Status (4)
Country | Link |
---|---|
US (1) | US20140348622A1 (ja) |
JP (1) | JP5925217B2 (ja) |
KR (1) | KR20140087038A (ja) |
WO (1) | WO2013088547A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10290523B2 (en) | 2017-03-17 | 2019-05-14 | Asm Ip Holding B.V. | Wafer processing apparatus, recording medium and wafer conveying method |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101212514B1 (ko) * | 2010-09-15 | 2012-12-14 | 주식회사 유진테크 | 기판 처리 장치 및 기판 전달 방법 |
US10090188B2 (en) * | 2016-05-05 | 2018-10-02 | Applied Materials, Inc. | Robot subassemblies, end effector assemblies, and methods with reduced cracking |
CN110668188B (zh) * | 2018-07-03 | 2021-07-30 | 日本电产三协株式会社 | 工业用机器人 |
JP7183635B2 (ja) * | 2018-08-31 | 2022-12-06 | 東京エレクトロン株式会社 | 基板搬送機構、基板処理装置及び基板搬送方法 |
JP7158238B2 (ja) * | 2018-10-10 | 2022-10-21 | 東京エレクトロン株式会社 | 基板処理システム |
JP2022148398A (ja) * | 2021-03-24 | 2022-10-06 | 東京エレクトロン株式会社 | 基板搬送方法 |
WO2024080332A1 (ja) * | 2022-10-14 | 2024-04-18 | 川崎重工業株式会社 | 基板搬送ロボットシステム |
JP2024067818A (ja) * | 2022-11-07 | 2024-05-17 | 東京エレクトロン株式会社 | 基板搬送システムおよび基板位置調整方法 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004193418A (ja) * | 2002-12-12 | 2004-07-08 | Seiko Epson Corp | 半導体装置の製造方法 |
JP2004288720A (ja) * | 2003-03-19 | 2004-10-14 | Tokyo Electron Ltd | 基板搬送装置及び基板処理装置 |
JP2009094530A (ja) * | 1996-11-18 | 2009-04-30 | Applied Materials Inc | 超高スループット・ウェハ真空処理システム |
US20090142163A1 (en) * | 2007-11-30 | 2009-06-04 | Novellus System, Inc. | Wafer position correction with a dual, side-by-side wafer transfer robot |
JP2011091275A (ja) * | 2009-10-23 | 2011-05-06 | Kawasaki Heavy Ind Ltd | アライナ装置、及びそれを備える半導体処理設備 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100310249B1 (ko) * | 1995-08-05 | 2001-12-17 | 엔도 마코토 | 기판처리장치 |
JPH1138909A (ja) * | 1997-07-18 | 1999-02-12 | Toa Resin Kk | 看 板 |
JPH11300663A (ja) * | 1998-04-24 | 1999-11-02 | Mecs Corp | 薄型基板搬送装置 |
JP2002026108A (ja) * | 2000-07-12 | 2002-01-25 | Tokyo Electron Ltd | 被処理体の移載機構、処理システム及び移載機構の使用方法 |
JP4727500B2 (ja) * | 2006-05-25 | 2011-07-20 | 東京エレクトロン株式会社 | 基板搬送装置、基板処理システムおよび基板搬送方法 |
JP4744427B2 (ja) * | 2006-12-27 | 2011-08-10 | 大日本スクリーン製造株式会社 | 基板処理装置 |
JP5241368B2 (ja) * | 2008-07-31 | 2013-07-17 | キヤノン株式会社 | 処理装置及びデバイス製造方法 |
JP2011071293A (ja) * | 2009-09-25 | 2011-04-07 | Tokyo Electron Ltd | プロセスモジュール、基板処理装置、および基板搬送方法 |
JP5395271B2 (ja) * | 2010-08-17 | 2014-01-22 | キヤノンアネルバ株式会社 | 基板搬送装置、電子デバイスの製造システムおよび電子デバイスの製造方法 |
JP5610952B2 (ja) * | 2010-09-24 | 2014-10-22 | 日本電産サンキョー株式会社 | 産業用ロボット |
-
2011
- 2011-12-15 JP JP2013549019A patent/JP5925217B2/ja active Active
- 2011-12-15 WO PCT/JP2011/079029 patent/WO2013088547A1/ja active Application Filing
- 2011-12-15 KR KR1020147014482A patent/KR20140087038A/ko not_active Application Discontinuation
- 2011-12-15 US US14/365,419 patent/US20140348622A1/en not_active Abandoned
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009094530A (ja) * | 1996-11-18 | 2009-04-30 | Applied Materials Inc | 超高スループット・ウェハ真空処理システム |
JP2004193418A (ja) * | 2002-12-12 | 2004-07-08 | Seiko Epson Corp | 半導体装置の製造方法 |
JP2004288720A (ja) * | 2003-03-19 | 2004-10-14 | Tokyo Electron Ltd | 基板搬送装置及び基板処理装置 |
US20090142163A1 (en) * | 2007-11-30 | 2009-06-04 | Novellus System, Inc. | Wafer position correction with a dual, side-by-side wafer transfer robot |
JP2011091275A (ja) * | 2009-10-23 | 2011-05-06 | Kawasaki Heavy Ind Ltd | アライナ装置、及びそれを備える半導体処理設備 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10290523B2 (en) | 2017-03-17 | 2019-05-14 | Asm Ip Holding B.V. | Wafer processing apparatus, recording medium and wafer conveying method |
Also Published As
Publication number | Publication date |
---|---|
US20140348622A1 (en) | 2014-11-27 |
KR20140087038A (ko) | 2014-07-08 |
JP5925217B2 (ja) | 2016-05-25 |
WO2013088547A1 (ja) | 2013-06-20 |
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