JPWO2011043058A1 - 半導体装置 - Google Patents
半導体装置 Download PDFInfo
- Publication number
- JPWO2011043058A1 JPWO2011043058A1 JP2011535278A JP2011535278A JPWO2011043058A1 JP WO2011043058 A1 JPWO2011043058 A1 JP WO2011043058A1 JP 2011535278 A JP2011535278 A JP 2011535278A JP 2011535278 A JP2011535278 A JP 2011535278A JP WO2011043058 A1 JPWO2011043058 A1 JP WO2011043058A1
- Authority
- JP
- Japan
- Prior art keywords
- epoxy resin
- semiconductor device
- group
- general formula
- metal hydroxide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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- 229910000000 metal hydroxide Inorganic materials 0.000 claims abstract description 60
- 150000004692 metal hydroxides Chemical class 0.000 claims abstract description 60
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 56
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Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
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- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Epoxy Resins (AREA)
Applications Claiming Priority (5)
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JP2009234716 | 2009-10-09 | ||
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PCT/JP2010/005950 WO2011043058A1 (ja) | 2009-10-09 | 2010-10-05 | 半導体装置 |
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US8900677B2 (en) | 2011-07-21 | 2014-12-02 | Hewlett-Packard Development Company, L.P. | Print medium |
JP6218413B2 (ja) * | 2013-03-29 | 2017-10-25 | 株式会社Subaru | プレドープ剤、これを用いた蓄電デバイス及びその製造方法 |
CN104882386B (zh) | 2014-02-27 | 2019-03-01 | 恩智浦美国有限公司 | 半导体器件格栅阵列封装 |
JP6605190B2 (ja) * | 2014-05-28 | 2019-11-13 | 住友ベークライト株式会社 | 封止用樹脂組成物、および半導体装置 |
KR101689833B1 (ko) * | 2015-05-19 | 2017-01-10 | 주식회사 프로텍 | Bga 반도체 패키지의 전자파 차폐막 형성 방법 및 이에 사용되는 베이스 테이프 |
US10797025B2 (en) | 2016-05-17 | 2020-10-06 | Taiwan Semiconductor Manufacturing Company, Ltd. | Advanced INFO POP and method of forming thereof |
SG10201912594XA (en) | 2016-05-30 | 2020-02-27 | Hitachi Chemical Co Ltd | Sealing composition and semiconductor device |
DE102017121485A1 (de) * | 2017-09-15 | 2019-03-21 | Infineon Technologies Austria Ag | Halbleitervorrichtung mit Kupferkorrosionsinhibitoren |
KR20210000530A (ko) | 2019-06-25 | 2021-01-05 | 삼성전자주식회사 | 칩 적층 반도체 패키지 및 그 제조 방법 |
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-
2010
- 2010-10-05 JP JP2011535278A patent/JPWO2011043058A1/ja active Pending
- 2010-10-05 US US13/496,547 patent/US9082708B2/en not_active Expired - Fee Related
- 2010-10-05 CN CN201080044844.6A patent/CN102576696B/zh not_active Expired - Fee Related
- 2010-10-05 SG SG10201406428QA patent/SG10201406428QA/en unknown
- 2010-10-05 WO PCT/JP2010/005950 patent/WO2011043058A1/ja active Application Filing
- 2010-10-05 KR KR1020127011809A patent/KR101678256B1/ko active IP Right Grant
- 2010-10-08 TW TW099134346A patent/TWI500648B/zh not_active IP Right Cessation
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JP2000309684A (ja) * | 1999-02-25 | 2000-11-07 | Nitto Denko Corp | 半導体封止用樹脂組成物およびそれを用いた半導体装置ならびに半導体装置の製法 |
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KR101678256B1 (ko) | 2016-11-21 |
US9082708B2 (en) | 2015-07-14 |
US20120175761A1 (en) | 2012-07-12 |
SG10201406428QA (en) | 2014-12-30 |
KR20120091190A (ko) | 2012-08-17 |
CN102576696A (zh) | 2012-07-11 |
TWI500648B (zh) | 2015-09-21 |
TW201120083A (en) | 2011-06-16 |
WO2011043058A1 (ja) | 2011-04-14 |
CN102576696B (zh) | 2015-10-07 |
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