JPS6476903A - Apparatus for producing oxide superconducting material - Google Patents

Apparatus for producing oxide superconducting material

Info

Publication number
JPS6476903A
JPS6476903A JP62231887A JP23188787A JPS6476903A JP S6476903 A JPS6476903 A JP S6476903A JP 62231887 A JP62231887 A JP 62231887A JP 23188787 A JP23188787 A JP 23188787A JP S6476903 A JPS6476903 A JP S6476903A
Authority
JP
Japan
Prior art keywords
substrate
plasma
chamber
superconducting material
microwave
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP62231887A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0556283B2 (enrdf_load_html_response
Inventor
Shunpei Yamazaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Semiconductor Energy Laboratory Co Ltd
Original Assignee
Semiconductor Energy Laboratory Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Semiconductor Energy Laboratory Co Ltd filed Critical Semiconductor Energy Laboratory Co Ltd
Priority to JP62231887A priority Critical patent/JPS6476903A/ja
Priority to KR1019880011900A priority patent/KR910007384B1/ko
Priority to CN88107276A priority patent/CN1016388B/zh
Priority to EP88308627A priority patent/EP0308266A3/en
Publication of JPS6476903A publication Critical patent/JPS6476903A/ja
Priority to US07/535,302 priority patent/US5162296A/en
Priority to US07/882,525 priority patent/US5262396A/en
Publication of JPH0556283B2 publication Critical patent/JPH0556283B2/ja
Granted legal-status Critical Current

Links

Classifications

    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E40/00—Technologies for an efficient electrical power generation, transmission or distribution
    • Y02E40/60—Superconducting electric elements or equipment; Power systems integrating superconducting elements or equipment

Landscapes

  • Oxygen, Ozone, And Oxides In General (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Superconductor Devices And Manufacturing Methods Thereof (AREA)
  • Superconductors And Manufacturing Methods Therefor (AREA)
JP62231887A 1987-09-16 1987-09-16 Apparatus for producing oxide superconducting material Granted JPS6476903A (en)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP62231887A JPS6476903A (en) 1987-09-16 1987-09-16 Apparatus for producing oxide superconducting material
KR1019880011900A KR910007384B1 (ko) 1987-09-16 1988-09-15 초전도 산화물 형성방법 및 장치
CN88107276A CN1016388B (zh) 1987-09-16 1988-09-16 形成超导氧化物材料的方法和装置
EP88308627A EP0308266A3 (en) 1987-09-16 1988-09-16 Method and apparatus for forming superconducting materials
US07/535,302 US5162296A (en) 1987-09-16 1990-06-08 Plasma-enhanced CVD of oxide superconducting films by utilizing a magnetic field
US07/882,525 US5262396A (en) 1987-09-16 1992-05-13 Plasma-enhanced CVD of oxide superconducting films by utilizing a magnetic field

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62231887A JPS6476903A (en) 1987-09-16 1987-09-16 Apparatus for producing oxide superconducting material

Publications (2)

Publication Number Publication Date
JPS6476903A true JPS6476903A (en) 1989-03-23
JPH0556283B2 JPH0556283B2 (enrdf_load_html_response) 1993-08-19

Family

ID=16930587

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62231887A Granted JPS6476903A (en) 1987-09-16 1987-09-16 Apparatus for producing oxide superconducting material

Country Status (1)

Country Link
JP (1) JPS6476903A (enrdf_load_html_response)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0288408A (ja) * 1988-05-31 1990-03-28 Mitsubishi Metal Corp 超電導セラミックス膜の製造法
JP2017126607A (ja) * 2016-01-12 2017-07-20 株式会社リコー 酸化物半導体

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4417015A1 (de) * 1994-05-14 1995-11-16 Maschimpex Gmbh Sortierautomat zur Sortierung bzw. Klassifikation von Kleinprodukten der pharmazeutischen und der Süßwarenindustrie nach Form und Farbe

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56109824A (en) * 1980-02-05 1981-08-31 Nippon Telegr & Teleph Corp <Ntt> Manufacture of oxide superconductive thin film
JPS5963732A (ja) * 1982-10-04 1984-04-11 Hitachi Ltd 薄膜形成装置
JPS59219461A (ja) * 1983-05-24 1984-12-10 Toshiba Corp アモルフアスシリコン成膜装置
JPS60117711A (ja) * 1983-11-30 1985-06-25 Toshiba Corp 薄膜形成装置
JPS61109036A (ja) * 1984-11-01 1986-05-27 Canon Inc テレビレンズの表示装置
JPS61125133A (ja) * 1984-11-22 1986-06-12 Hitachi Ltd 低温プラズマ電磁界制御機構
JPS61267324A (ja) * 1985-05-21 1986-11-26 Fuji Electric Co Ltd 乾式薄膜加工装置
JPS62150726A (ja) * 1985-12-24 1987-07-04 Fuji Electric Co Ltd 半導体装置の製造方法

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56109824A (en) * 1980-02-05 1981-08-31 Nippon Telegr & Teleph Corp <Ntt> Manufacture of oxide superconductive thin film
JPS5963732A (ja) * 1982-10-04 1984-04-11 Hitachi Ltd 薄膜形成装置
JPS59219461A (ja) * 1983-05-24 1984-12-10 Toshiba Corp アモルフアスシリコン成膜装置
JPS60117711A (ja) * 1983-11-30 1985-06-25 Toshiba Corp 薄膜形成装置
JPS61109036A (ja) * 1984-11-01 1986-05-27 Canon Inc テレビレンズの表示装置
JPS61125133A (ja) * 1984-11-22 1986-06-12 Hitachi Ltd 低温プラズマ電磁界制御機構
JPS61267324A (ja) * 1985-05-21 1986-11-26 Fuji Electric Co Ltd 乾式薄膜加工装置
JPS62150726A (ja) * 1985-12-24 1987-07-04 Fuji Electric Co Ltd 半導体装置の製造方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0288408A (ja) * 1988-05-31 1990-03-28 Mitsubishi Metal Corp 超電導セラミックス膜の製造法
JP2017126607A (ja) * 2016-01-12 2017-07-20 株式会社リコー 酸化物半導体

Also Published As

Publication number Publication date
JPH0556283B2 (enrdf_load_html_response) 1993-08-19

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