JPS64738A - Heat treatment of semiconductor wafer - Google Patents

Heat treatment of semiconductor wafer

Info

Publication number
JPS64738A
JPS64738A JP12170488A JP12170488A JPS64738A JP S64738 A JPS64738 A JP S64738A JP 12170488 A JP12170488 A JP 12170488A JP 12170488 A JP12170488 A JP 12170488A JP S64738 A JPS64738 A JP S64738A
Authority
JP
Japan
Prior art keywords
chamber
flowed
baking chamber
gas
baking
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12170488A
Other languages
English (en)
Japanese (ja)
Other versions
JPH01738A (ja
JPH0424855B2 (enrdf_load_stackoverflow
Inventor
Haruo Amada
Hiroshi Ikeda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP12170488A priority Critical patent/JPS64738A/ja
Publication of JPH01738A publication Critical patent/JPH01738A/ja
Publication of JPS64738A publication Critical patent/JPS64738A/ja
Publication of JPH0424855B2 publication Critical patent/JPH0424855B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP12170488A 1988-05-20 1988-05-20 Heat treatment of semiconductor wafer Granted JPS64738A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12170488A JPS64738A (en) 1988-05-20 1988-05-20 Heat treatment of semiconductor wafer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12170488A JPS64738A (en) 1988-05-20 1988-05-20 Heat treatment of semiconductor wafer

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP11019880A Division JPS5735319A (en) 1980-08-13 1980-08-13 Heat treatment device

Publications (3)

Publication Number Publication Date
JPH01738A JPH01738A (ja) 1989-01-05
JPS64738A true JPS64738A (en) 1989-01-05
JPH0424855B2 JPH0424855B2 (enrdf_load_stackoverflow) 1992-04-28

Family

ID=14817815

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12170488A Granted JPS64738A (en) 1988-05-20 1988-05-20 Heat treatment of semiconductor wafer

Country Status (1)

Country Link
JP (1) JPS64738A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007158088A (ja) * 2005-12-06 2007-06-21 Tokyo Electron Ltd 加熱処理装置、加熱処理方法、制御プログラム、コンピュータ読取可能な記憶媒体
WO2012141081A1 (ja) * 2011-04-14 2012-10-18 シャープ株式会社 表示パネル用基板の製造装置
KR20150048806A (ko) * 2012-08-31 2015-05-07 오엘리콘 썰피스 솔루션즈 아게, 츠르바크 기판 방사선 처리 시스템

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4895638A (enrdf_load_stackoverflow) * 1972-03-21 1973-12-07
JPS5148969U (enrdf_load_stackoverflow) * 1974-10-11 1976-04-13
JPS51124839A (en) * 1975-04-25 1976-10-30 Hitachi Ltd Infrared ray baking furnace
JPS5218665U (enrdf_load_stackoverflow) * 1975-07-25 1977-02-09
JPS52104067A (en) * 1976-02-27 1977-09-01 Hitachi Ltd Dust proof baking method
JPS5320867A (en) * 1976-08-11 1978-02-25 Hitachi Ltd Housing and conveying machine of articles
JPS5427770A (en) * 1977-08-04 1979-03-02 Takasago Thermal Engineering Constant temperature clean bench
JPS54158445A (en) * 1978-06-05 1979-12-14 Mitsubishi Electric Corp Sintering of photosensitive resin
JPS5595332A (en) * 1979-01-12 1980-07-19 Toshiba Corp Dust removing system for conveyor

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4895638A (enrdf_load_stackoverflow) * 1972-03-21 1973-12-07
JPS5148969U (enrdf_load_stackoverflow) * 1974-10-11 1976-04-13
JPS51124839A (en) * 1975-04-25 1976-10-30 Hitachi Ltd Infrared ray baking furnace
JPS5218665U (enrdf_load_stackoverflow) * 1975-07-25 1977-02-09
JPS52104067A (en) * 1976-02-27 1977-09-01 Hitachi Ltd Dust proof baking method
JPS5320867A (en) * 1976-08-11 1978-02-25 Hitachi Ltd Housing and conveying machine of articles
JPS5427770A (en) * 1977-08-04 1979-03-02 Takasago Thermal Engineering Constant temperature clean bench
JPS54158445A (en) * 1978-06-05 1979-12-14 Mitsubishi Electric Corp Sintering of photosensitive resin
JPS5595332A (en) * 1979-01-12 1980-07-19 Toshiba Corp Dust removing system for conveyor

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007158088A (ja) * 2005-12-06 2007-06-21 Tokyo Electron Ltd 加熱処理装置、加熱処理方法、制御プログラム、コンピュータ読取可能な記憶媒体
WO2012141081A1 (ja) * 2011-04-14 2012-10-18 シャープ株式会社 表示パネル用基板の製造装置
KR20150048806A (ko) * 2012-08-31 2015-05-07 오엘리콘 썰피스 솔루션즈 아게, 츠르바크 기판 방사선 처리 시스템
JP2015536809A (ja) * 2012-08-31 2015-12-24 エリコン サーフェス ソリューションズ アーゲー、 トリュープバッハ 基板の照射処理装置

Also Published As

Publication number Publication date
JPH0424855B2 (enrdf_load_stackoverflow) 1992-04-28

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