JPH1098019A5 - - Google Patents

Info

Publication number
JPH1098019A5
JPH1098019A5 JP1996251434A JP25143496A JPH1098019A5 JP H1098019 A5 JPH1098019 A5 JP H1098019A5 JP 1996251434 A JP1996251434 A JP 1996251434A JP 25143496 A JP25143496 A JP 25143496A JP H1098019 A5 JPH1098019 A5 JP H1098019A5
Authority
JP
Japan
Prior art keywords
manufacturing equipment
equipment system
surface cleaning
cleaning method
process chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1996251434A
Other languages
English (en)
Japanese (ja)
Other versions
JPH1098019A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP25143496A priority Critical patent/JPH1098019A/ja
Priority claimed from JP25143496A external-priority patent/JPH1098019A/ja
Publication of JPH1098019A publication Critical patent/JPH1098019A/ja
Publication of JPH1098019A5 publication Critical patent/JPH1098019A5/ja
Pending legal-status Critical Current

Links

JP25143496A 1996-09-24 1996-09-24 表面清浄化方法 Pending JPH1098019A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP25143496A JPH1098019A (ja) 1996-09-24 1996-09-24 表面清浄化方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP25143496A JPH1098019A (ja) 1996-09-24 1996-09-24 表面清浄化方法

Publications (2)

Publication Number Publication Date
JPH1098019A JPH1098019A (ja) 1998-04-14
JPH1098019A5 true JPH1098019A5 (enrdf_load_stackoverflow) 2004-10-21

Family

ID=17222791

Family Applications (1)

Application Number Title Priority Date Filing Date
JP25143496A Pending JPH1098019A (ja) 1996-09-24 1996-09-24 表面清浄化方法

Country Status (1)

Country Link
JP (1) JPH1098019A (enrdf_load_stackoverflow)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6533952B2 (en) * 1999-06-08 2003-03-18 Euv Llc Mitigation of radiation induced surface contamination
DE10008829B4 (de) * 2000-02-25 2005-06-23 Steag Rtp Systems Gmbh Verfahren zum Entfernen von adsorbierten Molekülen aus einer Kammer
JP4773735B2 (ja) * 2005-03-18 2011-09-14 東京エレクトロン株式会社 真空容器の水分除去方法、該方法を実行するためのプログラム、及び記憶媒体
US7964039B2 (en) * 2007-09-07 2011-06-21 Imec Cleaning of plasma chamber walls using noble gas cleaning step
JP2016092347A (ja) * 2014-11-11 2016-05-23 株式会社ディスコ エッチング方法
JP2016100343A (ja) * 2014-11-18 2016-05-30 株式会社ディスコ エッチング方法

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