JPS6464322A - Method of removing organic material - Google Patents

Method of removing organic material

Info

Publication number
JPS6464322A
JPS6464322A JP22015087A JP22015087A JPS6464322A JP S6464322 A JPS6464322 A JP S6464322A JP 22015087 A JP22015087 A JP 22015087A JP 22015087 A JP22015087 A JP 22015087A JP S6464322 A JPS6464322 A JP S6464322A
Authority
JP
Japan
Prior art keywords
plate
cleaned
matter
photoresist
uneven
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP22015087A
Other languages
Japanese (ja)
Inventor
Akiisa Inada
Kenichi Kawasumi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP22015087A priority Critical patent/JPS6464322A/en
Publication of JPS6464322A publication Critical patent/JPS6464322A/en
Pending legal-status Critical Current

Links

Landscapes

  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Drying Of Semiconductors (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To accelerate the removing rate of an organic material by mounting a flat plate above a matter to be cleaned, forming the surface of the plate uneven, and feeding gas containing ozone between the plate and the matter to be cleaned. CONSTITUTION:A silicon wafer coated with a photoresist is employed as a matter 1 to be cleaned, and mounted on a heater 2. A disclike flat plate 3 is mounted above the wafer, and oxygen gas containing ozone is fed by a nozzle 4 provided at the center of the plate. The surface of the plate 3 is formed to be uneven 5. When the photoresist on the matter to be cleaned is removed by this method, the photoresist is removed at a rate as high as approx. twice as compared with the case that there is no uneven on the plate. The plate is formed of a material for transmitting an ultraviolet ray, such as quartz or the like, and when the ultraviolet ray is irradiated from above, the removing removing rate is further improved.
JP22015087A 1987-09-04 1987-09-04 Method of removing organic material Pending JPS6464322A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22015087A JPS6464322A (en) 1987-09-04 1987-09-04 Method of removing organic material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22015087A JPS6464322A (en) 1987-09-04 1987-09-04 Method of removing organic material

Publications (1)

Publication Number Publication Date
JPS6464322A true JPS6464322A (en) 1989-03-10

Family

ID=16746677

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22015087A Pending JPS6464322A (en) 1987-09-04 1987-09-04 Method of removing organic material

Country Status (1)

Country Link
JP (1) JPS6464322A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013534725A (en) * 2010-06-18 2013-09-05 アプライド マテリアルズ インコーポレイテッド Method and apparatus for inducing turbulent flow of process chamber cleaning gas
JP2014225634A (en) * 2013-04-16 2014-12-04 パナソニックＩｐマネジメント株式会社 Non-plasma dry etching apparatus
WO2015030035A1 (en) * 2013-08-28 2015-03-05 国立大学法人筑波大学 Cleaning device and cleaning method

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013534725A (en) * 2010-06-18 2013-09-05 アプライド マテリアルズ インコーポレイテッド Method and apparatus for inducing turbulent flow of process chamber cleaning gas
JP2014225634A (en) * 2013-04-16 2014-12-04 パナソニックＩｐマネジメント株式会社 Non-plasma dry etching apparatus
WO2015030035A1 (en) * 2013-08-28 2015-03-05 国立大学法人筑波大学 Cleaning device and cleaning method

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