JPS52142970A - Plasma treating device - Google Patents

Plasma treating device

Info

Publication number
JPS52142970A
JPS52142970A JP6025176A JP6025176A JPS52142970A JP S52142970 A JPS52142970 A JP S52142970A JP 6025176 A JP6025176 A JP 6025176A JP 6025176 A JP6025176 A JP 6025176A JP S52142970 A JPS52142970 A JP S52142970A
Authority
JP
Japan
Prior art keywords
treating device
plasma treating
plasma
graphite
alumina
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6025176A
Other languages
Japanese (ja)
Inventor
Masahiko Nakamae
Sokichi Yamagishi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP6025176A priority Critical patent/JPS52142970A/en
Publication of JPS52142970A publication Critical patent/JPS52142970A/en
Pending legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)

Abstract

PURPOSE: To prevent the deposition of the harmful substances owing to etching of the apparatus members by plasma atoms on the object to be treated, by using alumina, graphite, etc.
COPYRIGHT: (C)1977,JPO&Japio
JP6025176A 1976-05-25 1976-05-25 Plasma treating device Pending JPS52142970A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6025176A JPS52142970A (en) 1976-05-25 1976-05-25 Plasma treating device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6025176A JPS52142970A (en) 1976-05-25 1976-05-25 Plasma treating device

Publications (1)

Publication Number Publication Date
JPS52142970A true JPS52142970A (en) 1977-11-29

Family

ID=13136761

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6025176A Pending JPS52142970A (en) 1976-05-25 1976-05-25 Plasma treating device

Country Status (1)

Country Link
JP (1) JPS52142970A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5680136A (en) * 1979-12-06 1981-07-01 Fujitsu Ltd Dry etching device
JPS5699848U (en) * 1979-12-27 1981-08-06
JPS57173936A (en) * 1981-04-03 1982-10-26 Xerox Corp Device and method for forming semiconductor film
JPS59121843A (en) * 1982-12-27 1984-07-14 Tokyo Daigaku Dry etching method
JPS62159418A (en) * 1986-01-07 1987-07-15 Fujitsu Ltd Vapor growth apparatus
WO2002091445A1 (en) * 2001-05-09 2002-11-14 Tokyo Electron Limited Coating agent, plasma-resistant component having coating film formed by the coating agent, plasma processing device provided with the plasma-resistant component

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5680136A (en) * 1979-12-06 1981-07-01 Fujitsu Ltd Dry etching device
JPS5699848U (en) * 1979-12-27 1981-08-06
JPS57173936A (en) * 1981-04-03 1982-10-26 Xerox Corp Device and method for forming semiconductor film
JPH0381294B2 (en) * 1981-04-03 1991-12-27 Xerox Corp
JPS59121843A (en) * 1982-12-27 1984-07-14 Tokyo Daigaku Dry etching method
JPS62159418A (en) * 1986-01-07 1987-07-15 Fujitsu Ltd Vapor growth apparatus
WO2002091445A1 (en) * 2001-05-09 2002-11-14 Tokyo Electron Limited Coating agent, plasma-resistant component having coating film formed by the coating agent, plasma processing device provided with the plasma-resistant component
JP2002334866A (en) * 2001-05-09 2002-11-22 Tokyo Electron Ltd Coating agent and plasma-resistant component treated thereby
US7892361B2 (en) 2001-05-09 2011-02-22 Tokyo Electron Limited In-chamber member, a cleaning method therefor and a plasma processing apparatus

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