JPS52142970A - Plasma treating device - Google Patents
Plasma treating deviceInfo
- Publication number
- JPS52142970A JPS52142970A JP6025176A JP6025176A JPS52142970A JP S52142970 A JPS52142970 A JP S52142970A JP 6025176 A JP6025176 A JP 6025176A JP 6025176 A JP6025176 A JP 6025176A JP S52142970 A JPS52142970 A JP S52142970A
- Authority
- JP
- Japan
- Prior art keywords
- treating device
- plasma treating
- plasma
- graphite
- alumina
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Drying Of Semiconductors (AREA)
Abstract
PURPOSE: To prevent the deposition of the harmful substances owing to etching of the apparatus members by plasma atoms on the object to be treated, by using alumina, graphite, etc.
COPYRIGHT: (C)1977,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6025176A JPS52142970A (en) | 1976-05-25 | 1976-05-25 | Plasma treating device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6025176A JPS52142970A (en) | 1976-05-25 | 1976-05-25 | Plasma treating device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS52142970A true JPS52142970A (en) | 1977-11-29 |
Family
ID=13136761
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6025176A Pending JPS52142970A (en) | 1976-05-25 | 1976-05-25 | Plasma treating device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS52142970A (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5680136A (en) * | 1979-12-06 | 1981-07-01 | Fujitsu Ltd | Dry etching device |
JPS5699848U (en) * | 1979-12-27 | 1981-08-06 | ||
JPS57173936A (en) * | 1981-04-03 | 1982-10-26 | Xerox Corp | Device and method for forming semiconductor film |
JPS59121843A (en) * | 1982-12-27 | 1984-07-14 | Tokyo Daigaku | Dry etching method |
JPS62159418A (en) * | 1986-01-07 | 1987-07-15 | Fujitsu Ltd | Vapor growth apparatus |
WO2002091445A1 (en) * | 2001-05-09 | 2002-11-14 | Tokyo Electron Limited | Coating agent, plasma-resistant component having coating film formed by the coating agent, plasma processing device provided with the plasma-resistant component |
-
1976
- 1976-05-25 JP JP6025176A patent/JPS52142970A/en active Pending
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5680136A (en) * | 1979-12-06 | 1981-07-01 | Fujitsu Ltd | Dry etching device |
JPS5699848U (en) * | 1979-12-27 | 1981-08-06 | ||
JPS57173936A (en) * | 1981-04-03 | 1982-10-26 | Xerox Corp | Device and method for forming semiconductor film |
JPH0381294B2 (en) * | 1981-04-03 | 1991-12-27 | Xerox Corp | |
JPS59121843A (en) * | 1982-12-27 | 1984-07-14 | Tokyo Daigaku | Dry etching method |
JPS62159418A (en) * | 1986-01-07 | 1987-07-15 | Fujitsu Ltd | Vapor growth apparatus |
WO2002091445A1 (en) * | 2001-05-09 | 2002-11-14 | Tokyo Electron Limited | Coating agent, plasma-resistant component having coating film formed by the coating agent, plasma processing device provided with the plasma-resistant component |
JP2002334866A (en) * | 2001-05-09 | 2002-11-22 | Tokyo Electron Ltd | Coating agent and plasma-resistant component treated thereby |
US7892361B2 (en) | 2001-05-09 | 2011-02-22 | Tokyo Electron Limited | In-chamber member, a cleaning method therefor and a plasma processing apparatus |
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