JPS5422777A - Invertible processing device - Google Patents
Invertible processing deviceInfo
- Publication number
- JPS5422777A JPS5422777A JP8738277A JP8738277A JPS5422777A JP S5422777 A JPS5422777 A JP S5422777A JP 8738277 A JP8738277 A JP 8738277A JP 8738277 A JP8738277 A JP 8738277A JP S5422777 A JPS5422777 A JP S5422777A
- Authority
- JP
- Japan
- Prior art keywords
- invertible
- processing device
- treating
- shorten
- turning
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Weting (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE: To ensure a uniform coating of the treating solution as well as to shorten the treating time by turning the treatment stand forward and backward alternately.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8738277A JPS5422777A (en) | 1977-07-22 | 1977-07-22 | Invertible processing device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8738277A JPS5422777A (en) | 1977-07-22 | 1977-07-22 | Invertible processing device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5422777A true JPS5422777A (en) | 1979-02-20 |
Family
ID=13913339
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8738277A Pending JPS5422777A (en) | 1977-07-22 | 1977-07-22 | Invertible processing device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5422777A (en) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS598340A (en) * | 1982-07-06 | 1984-01-17 | Mitsubishi Electric Corp | Forming method for protective film of semiconductor device |
US4456500A (en) * | 1982-03-02 | 1984-06-26 | Nippon Tenshashi Kabushiki Kaisha | Method of manufacturing a polisher |
JPS61111546A (en) * | 1984-11-05 | 1986-05-29 | Yamagata Nippon Denki Kk | Semiconductor etching device |
JPS61112319A (en) * | 1984-11-07 | 1986-05-30 | Nec Kyushu Ltd | Developing device |
JPS61236543A (en) * | 1985-04-12 | 1986-10-21 | Internatl Rectifier Corp Japan Ltd | Photoresist coating apparatus |
JPS6278820A (en) * | 1985-10-01 | 1987-04-11 | Rohm Co Ltd | Resist developing method |
JPH024986A (en) * | 1987-10-31 | 1990-01-09 | Dainippon Screen Mfg Co Ltd | Surface treatment of substrate |
-
1977
- 1977-07-22 JP JP8738277A patent/JPS5422777A/en active Pending
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4456500A (en) * | 1982-03-02 | 1984-06-26 | Nippon Tenshashi Kabushiki Kaisha | Method of manufacturing a polisher |
JPS598340A (en) * | 1982-07-06 | 1984-01-17 | Mitsubishi Electric Corp | Forming method for protective film of semiconductor device |
JPS61111546A (en) * | 1984-11-05 | 1986-05-29 | Yamagata Nippon Denki Kk | Semiconductor etching device |
JPS61112319A (en) * | 1984-11-07 | 1986-05-30 | Nec Kyushu Ltd | Developing device |
JPS61236543A (en) * | 1985-04-12 | 1986-10-21 | Internatl Rectifier Corp Japan Ltd | Photoresist coating apparatus |
JPS6278820A (en) * | 1985-10-01 | 1987-04-11 | Rohm Co Ltd | Resist developing method |
JPH0543172B2 (en) * | 1985-10-01 | 1993-06-30 | Rohm Kk | |
JPH024986A (en) * | 1987-10-31 | 1990-01-09 | Dainippon Screen Mfg Co Ltd | Surface treatment of substrate |
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