JPS57183038A - Wafer drying machine - Google Patents

Wafer drying machine

Info

Publication number
JPS57183038A
JPS57183038A JP6765781A JP6765781A JPS57183038A JP S57183038 A JPS57183038 A JP S57183038A JP 6765781 A JP6765781 A JP 6765781A JP 6765781 A JP6765781 A JP 6765781A JP S57183038 A JPS57183038 A JP S57183038A
Authority
JP
Japan
Prior art keywords
stage
shielding plates
drying machine
opening
ceiling
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6765781A
Other languages
Japanese (ja)
Inventor
Toshiro Suzuki
Masanori Nishiyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP6765781A priority Critical patent/JPS57183038A/en
Publication of JPS57183038A publication Critical patent/JPS57183038A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/67034—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying

Abstract

PURPOSE:To prevent the wet air that was exhausted from a stage from flowing in again from the opening of the stage by a method wherein shielding plates installed at the ceiling of a vessel is provided in such a manner that they are located outside the stage. CONSTITUTION:The shielding plates 5 are provided at the ceiling la of the vessel 1 of the wafer drying machine. These shielding plates 5 are located outside the stage 2 at the closest possible position, and the lower end of the plates 5 is positioned lower than the ceiling plate 2b of the stage 2. As a result, all the air exhausted from the stage 2 is discharged from an exhausting opening 3 as shown by the arrows in the diagram. Also, the partially blown up wet air is interrupted by the shielding plates 5, and no wet air is flowed into the opening 2a of the stage 2. Accordingly, there is entirely no possibility of adhering dust on the wafer.
JP6765781A 1981-05-07 1981-05-07 Wafer drying machine Pending JPS57183038A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6765781A JPS57183038A (en) 1981-05-07 1981-05-07 Wafer drying machine

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6765781A JPS57183038A (en) 1981-05-07 1981-05-07 Wafer drying machine

Publications (1)

Publication Number Publication Date
JPS57183038A true JPS57183038A (en) 1982-11-11

Family

ID=13351300

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6765781A Pending JPS57183038A (en) 1981-05-07 1981-05-07 Wafer drying machine

Country Status (1)

Country Link
JP (1) JPS57183038A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5818927A (en) * 1981-07-27 1983-02-03 Seiichiro Sogo Strainer-drier
JPS5840836U (en) * 1981-09-12 1983-03-17 三菱電機株式会社 Wafer cleaning and drying equipment
JPS59101190U (en) * 1982-12-23 1984-07-07 黒谷　信子 Top lid of drain dryer
JPS59185590U (en) * 1983-05-14 1984-12-10 黒谷　巌 Top lid of drain dryer

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5818927A (en) * 1981-07-27 1983-02-03 Seiichiro Sogo Strainer-drier
JPS5840836U (en) * 1981-09-12 1983-03-17 三菱電機株式会社 Wafer cleaning and drying equipment
JPS59101190U (en) * 1982-12-23 1984-07-07 黒谷　信子 Top lid of drain dryer
JPS59185590U (en) * 1983-05-14 1984-12-10 黒谷　巌 Top lid of drain dryer
JPH0310668Y2 (en) * 1983-05-14 1991-03-15

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