JPS5840836U - Wafer cleaning and drying equipment - Google Patents
Wafer cleaning and drying equipmentInfo
- Publication number
- JPS5840836U JPS5840836U JP13568481U JP13568481U JPS5840836U JP S5840836 U JPS5840836 U JP S5840836U JP 13568481 U JP13568481 U JP 13568481U JP 13568481 U JP13568481 U JP 13568481U JP S5840836 U JPS5840836 U JP S5840836U
- Authority
- JP
- Japan
- Prior art keywords
- cleaning
- wafer cleaning
- lid
- nozzles
- drying equipment
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Cleaning By Liquid Or Steam (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
第１図は従来のウェーハ洗浄乾燥装置の縦断面図、第２
図はこの考案の一実施例によるウェーハ洗浄乾燥装置の
縦断面図である。 １・・・洗浄容器、１ａ・・・
側板、３・・・電動機、６・・・ターンテーブル、８・
・・回転わく、９・・・収納用具、１０・・・ウェーハ
、１１・・・ふた、１３・・・ノズル取付棒、１４・・
・ノズル、２１・・・阻止環。なお、図中同一符号は同
−又は相当部分を示す。Figure 1 is a longitudinal cross-sectional view of a conventional wafer cleaning and drying device;
The figure is a longitudinal sectional view of a wafer cleaning and drying apparatus according to an embodiment of this invention. 1...Washing container, 1a...
Side plate, 3... Electric motor, 6... Turntable, 8.
... Rotating frame, 9... Storage tool, 10... Wafer, 11... Lid, 13... Nozzle mounting rod, 14...
- Nozzle, 21... blocking ring. Note that the same reference numerals in the figures indicate the same or equivalent parts.
Claims (1)
と、この洗浄容器内の下方に配設され回転されるターン
テーブル上に固着された回転わくと、この回転わくに円
周方向に対し等間隔に保持され、それぞれ多数枚のウェ
ーハを上下のすき間をあけて収容した複数の収納用具と
、上記ふたの下面中央に取付けられ側部に複数のノズル
が設けられ、上記回転わくの軸中心に位置しており、上
記各ノズルから洗浄液を噴射させ、後、乾燥ガスを噴出
させるためのノズル取付棒とを備えたウェーハ洗浄乾燥
装置において、筒状をなし上記ふたの下面に下方に突出
し′そ固着され、下部が上記回転わ（の上部に接近して
おり、上記洗浄液の霧状混合気の上記洗浄容器側板内面
に沿う上方の循環を防ぐ阻止環を備えたことを特徴とす
るウェーハ洗浄乾燥装置。A cleaning container with a cylindrical shape and an open top covered with a lid, a rotating frame fixed to a turntable disposed below the cleaning container and rotated, and A plurality of storage devices are held at equal intervals and each accommodates a large number of wafers with vertical gaps, and a plurality of nozzles are attached to the center of the lower surface of the lid and provided on the side, and a plurality of nozzles are provided on the side of the lid. In the wafer cleaning/drying apparatus, the wafer cleaning/drying apparatus is equipped with a nozzle mounting rod for jetting cleaning liquid from each of the nozzles and then spouting drying gas. A wafer cleaning device having a blocking ring fixed thereto, the lower part of which is close to the upper part of the rotating rack, and which prevents the atomized mixture of the cleaning liquid from circulating upwardly along the inner surface of the side plate of the cleaning container. drying equipment.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13568481U JPS5840836U (en) | 1981-09-12 | 1981-09-12 | Wafer cleaning and drying equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13568481U JPS5840836U (en) | 1981-09-12 | 1981-09-12 | Wafer cleaning and drying equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5840836U true JPS5840836U (en) | 1983-03-17 |
Family
ID=29929038
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13568481U Pending JPS5840836U (en) | 1981-09-12 | 1981-09-12 | Wafer cleaning and drying equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5840836U (en) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57183038A (en) * | 1981-05-07 | 1982-11-11 | Toshiba Corp | Wafer drying machine |
| JPS5818927A (en) * | 1981-07-27 | 1983-02-03 | Seiichiro Sogo | Strainer-drier |
-
1981
- 1981-09-12 JP JP13568481U patent/JPS5840836U/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57183038A (en) * | 1981-05-07 | 1982-11-11 | Toshiba Corp | Wafer drying machine |
| JPS5818927A (en) * | 1981-07-27 | 1983-02-03 | Seiichiro Sogo | Strainer-drier |
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