JPS60111041U - Semiconductor wafer cleaning equipment - Google Patents
Semiconductor wafer cleaning equipmentInfo
- Publication number
- JPS60111041U JPS60111041U JP20353483U JP20353483U JPS60111041U JP S60111041 U JPS60111041 U JP S60111041U JP 20353483 U JP20353483 U JP 20353483U JP 20353483 U JP20353483 U JP 20353483U JP S60111041 U JPS60111041 U JP S60111041U
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor wafer
- wafer cleaning
- cleaning equipment
- bottom plate
- cleaning tank
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Cleaning Or Drying Semiconductors (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
第１図は従来の洗浄装置を示す斜視図、第２図はこの装
置を使用したウェーハ洗浄の様子を示す拡大断面図、第
３図は本考案にかかる洗浄装置の構成および作用を示す
正面断面図、第４図はこの装置を使用したウェーハの洗
浄を行う様子を示す部分断面図である。
１．２１・・・洗浄装置、２，２２・・・洗浄槽、３゜
２３・・・底板、４，２４・・・小孔、５，２５・・・
純水供給管、１１・・・ウェーハ、１２・・・ウェーハ
カセット治具、１３・・・溝、２６・・・ヒンジ。FIG. 1 is a perspective view showing a conventional cleaning device, FIG. 2 is an enlarged cross-sectional view showing how wafers are cleaned using this device, and FIG. 3 is a front cross-sectional view showing the structure and operation of the cleaning device according to the present invention. 4 are partial cross-sectional views showing how wafers are cleaned using this apparatus. 1.21...Cleaning device, 2,22...Cleaning tank, 3゜23...Bottom plate, 4,24...Small hole, 5,25...
Pure water supply pipe, 11... Wafer, 12... Wafer cassette jig, 13... Groove, 26... Hinge.
Claims (1)
垂直に保持するウェーハカセット治具を支持しかつ洗浄
液を下面から上面へ自由に通過させる底板を洗浄槽の底
部に有する半導体ウェーハの洗浄装置において、 前記底板を前記洗浄槽の底面に対して任意の角度をなし
得るように傾斜自在に取付けたことを特徴とする半導体
ウェーハの洗浄装置。[Claims for Utility Model Registration] A cleaning tank includes a bottom plate that supports a wafer cassette jig that holds a plurality of semiconductor wafers to be cleaned perpendicular to the mounting surface and allows cleaning liquid to freely pass from the bottom surface to the top surface. What is claimed is: 1. A semiconductor wafer cleaning apparatus having a bottom plate, wherein the bottom plate is mounted so as to be tiltable so as to form an arbitrary angle with respect to the bottom surface of the cleaning tank.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20353483U JPS60111041U (en) | 1983-12-28 | 1983-12-28 | Semiconductor wafer cleaning equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20353483U JPS60111041U (en) | 1983-12-28 | 1983-12-28 | Semiconductor wafer cleaning equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS60111041U true JPS60111041U (en) | 1985-07-27 |
Family
ID=30765940
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP20353483U Pending JPS60111041U (en) | 1983-12-28 | 1983-12-28 | Semiconductor wafer cleaning equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60111041U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63285938A (en) * | 1987-05-19 | 1988-11-22 | Koujiyundo Silicon Kk | Cleaning device |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5887832A (en) * | 1981-11-20 | 1983-05-25 | Toshiba Corp | Semiconductor treating device |
-
1983
- 1983-12-28 JP JP20353483U patent/JPS60111041U/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5887832A (en) * | 1981-11-20 | 1983-05-25 | Toshiba Corp | Semiconductor treating device |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63285938A (en) * | 1987-05-19 | 1988-11-22 | Koujiyundo Silicon Kk | Cleaning device |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS60111041U (en) | Semiconductor wafer cleaning equipment | |
| JPS6016538U (en) | Single-sided processing equipment for semiconductor wafers | |
| JPS59177940U (en) | cleaning equipment | |
| JPS58114042U (en) | Silicon wafer cleaning equipment | |
| JPS6041045U (en) | semiconductor wafer prober | |
| JPS6095991U (en) | cleaning nozzle | |
| JPS59169042U (en) | Liquid processing equipment | |
| JPS5941124U (en) | cleaning equipment | |
| JPS585342U (en) | Wafer surface treatment equipment | |
| JPS58155833U (en) | Rotary semiconductor wafer cleaning equipment | |
| JPS59177942U (en) | Wafer cleaning equipment | |
| JPS58102258U (en) | Solder surface cleaning device using detergent foam | |
| JPS6092824U (en) | Liquid phase epitaxial growth equipment | |
| JPS5958565U (en) | cleaning equipment | |
| JPS602830U (en) | Semiconductor wafer etching tank | |
| JPS60130634U (en) | jet scrubber equipment | |
| JPS6064926U (en) | Wafer transfer device | |
| JPS6052621U (en) | Resist coating equipment | |
| JPH0766169A (en) | Wet treatment equipment | |
| JPS6016537U (en) | Single-sided processing equipment for semiconductor wafers | |
| JPS5884613U (en) | Cleaning equipment for magnetic substrates for thin film magnetic heads | |
| JPS6063936U (en) | Semiconductor wafer washing equipment | |
| JPS60103647U (en) | Semiconductor wafer polishing equipment | |
| JPS60187534U (en) | Automatic cleaning device | |
| JPS6039242U (en) | Liquid processing equipment |