JPS6039242U - Liquid processing equipment - Google Patents
Liquid processing equipmentInfo
- Publication number
- JPS6039242U JPS6039242U JP13090683U JP13090683U JPS6039242U JP S6039242 U JPS6039242 U JP S6039242U JP 13090683 U JP13090683 U JP 13090683U JP 13090683 U JP13090683 U JP 13090683U JP S6039242 U JPS6039242 U JP S6039242U
- Authority
- JP
- Japan
- Prior art keywords
- liquid
- processing equipment
- liquid processing
- processing
- processing liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Measuring Temperature Or Quantity Of Heat (AREA)
- ing And Chemical Polishing (AREA)
- Weting (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
第1図及び第2図は従来の液処理装置の二側を示す概略
部分断面図、第3図は本考案の一実施例の液処理装置を
示す概略部分断面図である。
8・・・・・・被処理物(半導体ウェーハ)、14・・
・・・・液槽、15・・・・・・処理液(エツチング液
)、16・・・・・・多孔中空部材、21・・・・・・
気体(N2ガス)。1 and 2 are schematic partial sectional views showing two sides of a conventional liquid processing apparatus, and FIG. 3 is a schematic partial sectional view showing a liquid processing apparatus according to an embodiment of the present invention. 8...Processed object (semiconductor wafer), 14...
...Liquid tank, 15...Processing liquid (etching liquid), 16...Porous hollow member, 21...
Gas (N2 gas).
Claims (1)
る装置において、前記処理液の温度変化に応じて温度制
御された気体を泡状にして処理液内に噴出する温度制御
用多孔中空部材を液槽の底部に設置したことを特徴とす
る液処理装置。In a device for immersing an object to be processed in a processing liquid housed in a single liquid tank, temperature control is performed to eject temperature-controlled gas into bubbles into the processing liquid in response to temperature changes in the processing liquid. A liquid processing device characterized in that a porous hollow member is installed at the bottom of a liquid tank.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13090683U JPS6039242U (en) | 1983-08-23 | 1983-08-23 | Liquid processing equipment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13090683U JPS6039242U (en) | 1983-08-23 | 1983-08-23 | Liquid processing equipment |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6039242U true JPS6039242U (en) | 1985-03-19 |
Family
ID=30296130
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13090683U Pending JPS6039242U (en) | 1983-08-23 | 1983-08-23 | Liquid processing equipment |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6039242U (en) |
-
1983
- 1983-08-23 JP JP13090683U patent/JPS6039242U/en active Pending
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS5936262U (en) | semiconductor memory element | |
JPS6039242U (en) | Liquid processing equipment | |
JPS6016538U (en) | Single-sided processing equipment for semiconductor wafers | |
JPS5985956U (en) | Flow type ion selective electrode | |
JPS6022833U (en) | semiconductor manufacturing equipment | |
JPS59169042U (en) | Liquid processing equipment | |
JPS6094842U (en) | Grinding equipment for semiconductor substrates | |
JPS6016537U (en) | Single-sided processing equipment for semiconductor wafers | |
JPS617030U (en) | semiconductor manufacturing equipment | |
JPS5984839U (en) | semiconductor manufacturing equipment | |
JPS5977225U (en) | Semiconductor device manufacturing equipment | |
JPS59177940U (en) | cleaning equipment | |
JPS5931239U (en) | semiconductor manufacturing equipment | |
JPS59151441U (en) | semiconductor test equipment | |
JPS5952627U (en) | dry etching equipment | |
JPS60103827U (en) | semiconductor manufacturing equipment | |
JPS6039241U (en) | Liquid processing equipment | |
JPS60111041U (en) | Semiconductor wafer cleaning equipment | |
JPS5812938U (en) | semiconductor wafer | |
JPS62136432U (en) | ||
JPS5991734U (en) | Sample loading section for cryostat | |
JPS594671U (en) | Solder immersion test equipment | |
JPS5939937U (en) | Semiconductor wafer support stand | |
JPS6072563U (en) | Ultrasonic probe device | |
JPS59160256U (en) | Electronic equipment with printing function |