JPS6039242U - Liquid processing equipment - Google Patents

Liquid processing equipment

Info

Publication number
JPS6039242U
JPS6039242U JP13090683U JP13090683U JPS6039242U JP S6039242 U JPS6039242 U JP S6039242U JP 13090683 U JP13090683 U JP 13090683U JP 13090683 U JP13090683 U JP 13090683U JP S6039242 U JPS6039242 U JP S6039242U
Authority
JP
Japan
Prior art keywords
liquid
processing equipment
liquid processing
processing
processing liquid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13090683U
Other languages
Japanese (ja)
Inventor
舘 良男
Original Assignee
関西日本電気株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 関西日本電気株式会社 filed Critical 関西日本電気株式会社
Priority to JP13090683U priority Critical patent/JPS6039242U/en
Publication of JPS6039242U publication Critical patent/JPS6039242U/en
Pending legal-status Critical Current

Links

Landscapes

  • Measuring Temperature Or Quantity Of Heat (AREA)
  • ing And Chemical Polishing (AREA)
  • Weting (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図及び第2図は従来の液処理装置の二側を示す概略
部分断面図、第3図は本考案の一実施例の液処理装置を
示す概略部分断面図である。 8・・・・・・被処理物(半導体ウェーハ)、14・・
・・・・液槽、15・・・・・・処理液(エツチング液
)、16・・・・・・多孔中空部材、21・・・・・・
気体(N2ガス)。
1 and 2 are schematic partial sectional views showing two sides of a conventional liquid processing apparatus, and FIG. 3 is a schematic partial sectional view showing a liquid processing apparatus according to an embodiment of the present invention. 8...Processed object (semiconductor wafer), 14...
...Liquid tank, 15...Processing liquid (etching liquid), 16...Porous hollow member, 21...
Gas (N2 gas).

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 1つの液槽内に収容さ、れた処理液に被処理物を浸漬す
る装置において、前記処理液の温度変化に応じて温度制
御された気体を泡状にして処理液内に噴出する温度制御
用多孔中空部材を液槽の底部に設置したことを特徴とす
る液処理装置。
In a device for immersing an object to be processed in a processing liquid housed in a single liquid tank, temperature control is performed to eject temperature-controlled gas into bubbles into the processing liquid in response to temperature changes in the processing liquid. A liquid processing device characterized in that a porous hollow member is installed at the bottom of a liquid tank.
JP13090683U 1983-08-23 1983-08-23 Liquid processing equipment Pending JPS6039242U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13090683U JPS6039242U (en) 1983-08-23 1983-08-23 Liquid processing equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13090683U JPS6039242U (en) 1983-08-23 1983-08-23 Liquid processing equipment

Publications (1)

Publication Number Publication Date
JPS6039242U true JPS6039242U (en) 1985-03-19

Family

ID=30296130

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13090683U Pending JPS6039242U (en) 1983-08-23 1983-08-23 Liquid processing equipment

Country Status (1)

Country Link
JP (1) JPS6039242U (en)

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