JPS59177940U - cleaning equipment - Google Patents

cleaning equipment

Info

Publication number
JPS59177940U
JPS59177940U JP7261383U JP7261383U JPS59177940U JP S59177940 U JPS59177940 U JP S59177940U JP 7261383 U JP7261383 U JP 7261383U JP 7261383 U JP7261383 U JP 7261383U JP S59177940 U JPS59177940 U JP S59177940U
Authority
JP
Japan
Prior art keywords
cleaned
cleaning equipment
cleaning
samples
holder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7261383U
Other languages
Japanese (ja)
Other versions
JPS645881Y2 (en
Inventor
小林 美勝
Original Assignee
富士通株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 富士通株式会社 filed Critical 富士通株式会社
Priority to JP7261383U priority Critical patent/JPS59177940U/en
Publication of JPS59177940U publication Critical patent/JPS59177940U/en
Application granted granted Critical
Publication of JPS645881Y2 publication Critical patent/JPS645881Y2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Cleaning By Liquid Or Steam (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of the drawing]

、゛ 第1図は従来のマスク洗浄の一例を示す概要図、
第2図はマスクホルダーを示す斜視図、第3図は洗浄後
におけるマスク上の汚染残渣を示す斜視図、第4図は本
考案の一実施例である洗浄機構を示す側面図、第5図は
本考案の一実施例である噴出ノズル形状を示す斜視図、
第6図は本考案の他の実施例である洗浄ノズル形状を示
す斜視図である。 図中、11・・・試料(半導体基板又はマスク)、12
・・・ホルダー、13・・・ノズル、14・・・純水供
給導管、15・・・噴出孔。 第Z1習
,゛ Figure 1 is a schematic diagram showing an example of conventional mask cleaning.
Fig. 2 is a perspective view showing the mask holder, Fig. 3 is a perspective view showing contamination residue on the mask after cleaning, Fig. 4 is a side view showing the cleaning mechanism that is an embodiment of the present invention, and Fig. 5 is a perspective view showing the shape of a jet nozzle which is an embodiment of the present invention;
FIG. 6 is a perspective view showing the shape of a cleaning nozzle according to another embodiment of the present invention. In the figure, 11...sample (semiconductor substrate or mask), 12
... Holder, 13... Nozzle, 14... Pure water supply conduit, 15... Spout hole. Lesson Z1

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 板状の被洗浄試料を複数枚保持するホルダと、該被洗浄
試料間の空間に延在する洗浄ノズルを具備し、それぞれ
の該被洗浄試料の両面を同時に洗浄できる様にしたこと
を特徴とする洗浄装置。
It is characterized by comprising a holder for holding a plurality of plate-shaped samples to be cleaned, and a cleaning nozzle extending into the space between the samples to be cleaned, so that both sides of each sample to be cleaned can be cleaned at the same time. cleaning equipment.
JP7261383U 1983-05-16 1983-05-16 cleaning equipment Granted JPS59177940U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7261383U JPS59177940U (en) 1983-05-16 1983-05-16 cleaning equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7261383U JPS59177940U (en) 1983-05-16 1983-05-16 cleaning equipment

Publications (2)

Publication Number Publication Date
JPS59177940U true JPS59177940U (en) 1984-11-28
JPS645881Y2 JPS645881Y2 (en) 1989-02-14

Family

ID=30202748

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7261383U Granted JPS59177940U (en) 1983-05-16 1983-05-16 cleaning equipment

Country Status (1)

Country Link
JP (1) JPS59177940U (en)

Also Published As

Publication number Publication date
JPS645881Y2 (en) 1989-02-14

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