JPS6025141U - cleaning nozzle - Google Patents

cleaning nozzle

Info

Publication number
JPS6025141U
JPS6025141U JP11703683U JP11703683U JPS6025141U JP S6025141 U JPS6025141 U JP S6025141U JP 11703683 U JP11703683 U JP 11703683U JP 11703683 U JP11703683 U JP 11703683U JP S6025141 U JPS6025141 U JP S6025141U
Authority
JP
Japan
Prior art keywords
cleaning nozzle
nozzle
ejection
pipe
recorded
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11703683U
Other languages
Japanese (ja)
Inventor
水津　志弘
美男 原山
Original Assignee
富士通株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 富士通株式会社 filed Critical 富士通株式会社
Priority to JP11703683U priority Critical patent/JPS6025141U/en
Publication of JPS6025141U publication Critical patent/JPS6025141U/en
Pending legal-status Critical Current

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  • Cleaning By Liquid Or Steam (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第１図は従来の洗浄機のノズル部の部分斜視図、第２図
は本考案の実施例による洗浄機のノズル部の側面図、第
３図はそのｘ−ｘ’断面図、第４図は第３図におけるＡ
部拡大断面図、第５図は本考案の実施例による洗浄機の
ノズルを使用して半導体ウェハーを洗浄する場合の説明
図を示す。 図において１はパイプ、２はノズル、３は細管、４は噴
出用小穴、５はキャップ、６は半導体ウェハーを示す。Fig. 1 is a partial perspective view of the nozzle part of a conventional washing machine, Fig. 2 is a side view of the nozzle part of a washing machine according to an embodiment of the present invention, Fig. 3 is a sectional view taken along line xx', and Fig. 4 is A in Figure 3
FIG. 5 is an enlarged cross-sectional view showing a case where a semiconductor wafer is cleaned using a nozzle of a cleaning machine according to an embodiment of the present invention. In the figure, 1 is a pipe, 2 is a nozzle, 3 is a thin tube, 4 is a small hole for ejection, 5 is a cap, and 6 is a semiconductor wafer.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] パイプの側面に角度をつけた複数個の噴出用小穴を明け
た事を特徴とする洗浄ノズル。A cleaning nozzle characterized by having multiple angled small holes for ejection on the side of the pipe.
JP11703683U 1983-07-27 1983-07-27 cleaning nozzle Pending JPS6025141U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11703683U JPS6025141U (en) 1983-07-27 1983-07-27 cleaning nozzle

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11703683U JPS6025141U (en) 1983-07-27 1983-07-27 cleaning nozzle

Publications (1)

Publication Number Publication Date
JPS6025141U true JPS6025141U (en) 1985-02-20

Family

ID=30269566

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11703683U Pending JPS6025141U (en) 1983-07-27 1983-07-27 cleaning nozzle

Country Status (1)

Country Link
JP (1) JPS6025141U (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0338628U (en) * 1989-08-25 1991-04-15

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55115332A (en) * 1979-02-26 1980-09-05 Mitsubishi Electric Corp Washing and drying apparatus for photomask
JPS5769747A (en) * 1980-10-17 1982-04-28 Hitachi Ltd Wafer conveying device in liquid

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55115332A (en) * 1979-02-26 1980-09-05 Mitsubishi Electric Corp Washing and drying apparatus for photomask
JPS5769747A (en) * 1980-10-17 1982-04-28 Hitachi Ltd Wafer conveying device in liquid

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0338628U (en) * 1989-08-25 1991-04-15

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