JPS59177942U - Wafer cleaning equipment - Google Patents
Wafer cleaning equipmentInfo
- Publication number
- JPS59177942U JPS59177942U JP7332383U JP7332383U JPS59177942U JP S59177942 U JPS59177942 U JP S59177942U JP 7332383 U JP7332383 U JP 7332383U JP 7332383 U JP7332383 U JP 7332383U JP S59177942 U JPS59177942 U JP S59177942U
- Authority
- JP
- Japan
- Prior art keywords
- running water
- wafer
- cleaning equipment
- wafer cleaning
- holder
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Cleaning By Liquid Or Steam (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
第１図は従来の流水洗浄装置を示す断面図、第２図は本
考案の一実施例を示す断面図である。
１１・・・流水洗浄槽、１２・・・洗浄水流入口、１３
・・・多孔板、１４．１４・・・小孔、１５．１５・・
・被洗浄ウェハ、１６・・・キャリア、１７・・・ホル
ダ、１８・・・電動駆動機構。FIG. 1 is a sectional view showing a conventional running water cleaning device, and FIG. 2 is a sectional view showing an embodiment of the present invention. 11...Running water cleaning tank, 12...Washing water inlet, 13
...Perforated plate, 14.14...Small hole, 15.15...
-Wafer to be cleaned, 16...Carrier, 17...Holder, 18...Electric drive mechanism.
Claims (1)
するウェハ支持構体と、このウェハ支持構体を前記流水
洗浄槽内にて保持するホルダ、及びこのホルダを揺動せ
しめるホルダ揺動機構とを具備し、前記ウェハ支持構体
を前記流水洗浄槽内において揺動させながら流水洗浄す
ることを特徴とするウェハ洗浄装置。A wafer support structure that supports a wafer to be cleaned in an upright position in a running water cleaning tank, a holder that holds this wafer support structure in the running water cleaning tank, and a holder swing mechanism that swings this holder. A wafer cleaning apparatus, characterized in that the wafer support structure is washed with running water while being oscillated in the running water washing tank.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7332383U JPS59177942U (en) | 1983-05-17 | 1983-05-17 | Wafer cleaning equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7332383U JPS59177942U (en) | 1983-05-17 | 1983-05-17 | Wafer cleaning equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS59177942U true JPS59177942U (en) | 1984-11-28 |
Family
ID=30203450
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7332383U Pending JPS59177942U (en) | 1983-05-17 | 1983-05-17 | Wafer cleaning equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59177942U (en) |
-
1983
- 1983-05-17 JP JP7332383U patent/JPS59177942U/en active Pending
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