JPS58155833U - Rotary semiconductor wafer cleaning equipment - Google Patents
Rotary semiconductor wafer cleaning equipmentInfo
- Publication number
- JPS58155833U JPS58155833U JP5229982U JP5229982U JPS58155833U JP S58155833 U JPS58155833 U JP S58155833U JP 5229982 U JP5229982 U JP 5229982U JP 5229982 U JP5229982 U JP 5229982U JP S58155833 U JPS58155833 U JP S58155833U
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor wafer
- cleaning equipment
- wafer cleaning
- rotary
- rotary semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Cleaning By Liquid Or Steam (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
第１図は従来の回転式洗浄装置の要部概要図、第２図は
本発明にか）る回転式洗浄装置の要部概要図である。
図中、１は半導体ウェハー、２は回転試料台、３は噴射
ノズル、４は碗状容器、５は噴出板、６はフィルタを示
す。FIG. 1 is a schematic diagram of the main parts of a conventional rotary cleaning device, and FIG. 2 is a schematic diagram of the main parts of a rotary cleaning device according to the present invention. In the figure, 1 is a semiconductor wafer, 2 is a rotating sample stage, 3 is an injection nozzle, 4 is a bowl-shaped container, 5 is an injection plate, and 6 is a filter.
Claims (1)
半導体ウェハーに対向した噴出板から洗浄液が噴射され
て洗浄される構造を有することを特徴とする回転式半導
体ウェハー洗浄装置。1. A rotary semiconductor wafer cleaning apparatus characterized by having a structure in which a semiconductor wafer is held on a rotating sample stage and rotated, and a cleaning liquid is jetted from a jetting plate facing the semiconductor wafer to clean it.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5229982U JPS58155833U (en) | 1982-04-09 | 1982-04-09 | Rotary semiconductor wafer cleaning equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5229982U JPS58155833U (en) | 1982-04-09 | 1982-04-09 | Rotary semiconductor wafer cleaning equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS58155833U true JPS58155833U (en) | 1983-10-18 |
Family
ID=30063007
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5229982U Pending JPS58155833U (en) | 1982-04-09 | 1982-04-09 | Rotary semiconductor wafer cleaning equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58155833U (en) |
-
1982
- 1982-04-09 JP JP5229982U patent/JPS58155833U/en active Pending
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