JPS59177941U - Wafer cleaning equipment - Google Patents

Wafer cleaning equipment

Info

Publication number
JPS59177941U
JPS59177941U JP7332283U JP7332283U JPS59177941U JP S59177941 U JPS59177941 U JP S59177941U JP 7332283 U JP7332283 U JP 7332283U JP 7332283 U JP7332283 U JP 7332283U JP S59177941 U JPS59177941 U JP S59177941U
Authority
JP
Japan
Prior art keywords
wafer
support structure
running water
wafer support
cleaning equipment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7332283U
Other languages
Japanese (ja)
Inventor
小野　市
Original Assignee
株式会社東芝
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 株式会社東芝 filed Critical 株式会社東芝
Priority to JP7332283U priority Critical patent/JPS59177941U/en
Publication of JPS59177941U publication Critical patent/JPS59177941U/en
Pending legal-status Critical Current

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  • Cleaning By Liquid Or Steam (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第１図は従来の流水洗浄装置を示す断面図、第２図は本
考案の一実施例を示す断面図、第３図は上記実施例の側
断面図である。 １０・・・流水洗浄槽、１１・・・洗浄水流水口、１２
・・・洗浄水給水管、１３・・・多孔板、１４．１４・
・・小Ｌ１５，１５・・・被洗浄ウェハ、１６・・・キ
ャリア（治具）、１７・・・回転シャフト、１８．１８
・・・回転伝達ベルト、１９・・・プーリ、２０・・・
電動回転機構。FIG. 1 is a sectional view showing a conventional running water washing device, FIG. 2 is a sectional view showing an embodiment of the present invention, and FIG. 3 is a side sectional view of the above embodiment. 10...Running water cleaning tank, 11...Washing water outlet, 12
...Washing water supply pipe, 13...Perforated plate, 14.14.
...Small L15, 15...Wafer to be cleaned, 16...Carrier (jig), 17...Rotating shaft, 18.18
...Rotation transmission belt, 19...Pulley, 20...
Electric rotation mechanism.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 流水洗浄槽内において被洗浄ウェハを立位状態に保ち、
回転及び上下動自在に支持するウェハ支持構体と、この
ウェハ支持構体の周縁一部に接して前記ウェハ支持構体
に回転及び上下動力を付与する所定の偏心量をもつ回転
シャフトと、この回゛　　転シャフトを回転駆動する駆
動機構とを有し、前記ウェハ支持構体に支持された被洗
浄ウェハを前記流水洗浄槽内において回転及び上下動さ
せながら流水洗浄することを特徴としたウェハ洗浄装置
。Keep the wafer to be cleaned in an upright position in the running water cleaning tank,
a wafer support structure supported rotatably and vertically; a rotating shaft having a predetermined eccentricity that contacts a part of the periphery of the wafer support structure and applies rotational and vertical power to the wafer support structure; 1. A wafer cleaning apparatus, comprising: a drive mechanism that rotates a shaft, and cleans a wafer supported by the wafer support structure with running water while rotating and moving the wafer up and down in the running water washing tank.
JP7332283U 1983-05-17 1983-05-17 Wafer cleaning equipment Pending JPS59177941U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7332283U JPS59177941U (en) 1983-05-17 1983-05-17 Wafer cleaning equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7332283U JPS59177941U (en) 1983-05-17 1983-05-17 Wafer cleaning equipment

Publications (1)

Publication Number Publication Date
JPS59177941U true JPS59177941U (en) 1984-11-28

Family

ID=30203449

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7332283U Pending JPS59177941U (en) 1983-05-17 1983-05-17 Wafer cleaning equipment

Country Status (1)

Country Link
JP (1) JPS59177941U (en)

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