JPS62186427U - - Google Patents
Info
- Publication number
- JPS62186427U JPS62186427U JP7676586U JP7676586U JPS62186427U JP S62186427 U JPS62186427 U JP S62186427U JP 7676586 U JP7676586 U JP 7676586U JP 7676586 U JP7676586 U JP 7676586U JP S62186427 U JPS62186427 U JP S62186427U
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- brush
- cleaning device
- holds
- rotating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims description 9
- 238000004140 cleaning Methods 0.000 claims description 3
- 239000000356 contaminant Substances 0.000 claims 1
Landscapes
- Cleaning In General (AREA)
Description
第１図及び第２図は本考案の一実施例の部分断
面を含む正面図及び平面図、第３図は従来のスク
ラバ洗浄装置の一例を示す部分断面を含む正面図
である。
１，２１……本体、２，２２……基板回転モー
タ、３，２３……基板保持板、４，２４……基板
、５，２５……駆動軸、６，２６……ブラシ、７
，２７……軸、８，２８……支持部、９，２９…
…ブラシ駆動モータ、１０，３０……駆動プーリ
、１１，３１……従動プーリ、１２，３２……ベ
ルト、１３，３３……カバー、１４，３４……ア
ーム、１５……バランサ、３５……加圧シリンダ
、３６……アングル。
1 and 2 are a front view and a plan view including a partial cross section of an embodiment of the present invention, and FIG. 3 is a front view including a partial cross section showing an example of a conventional scrubber cleaning device. 1, 21... Main body, 2, 22... Substrate rotation motor, 3, 23... Substrate holding plate, 4, 24... Substrate, 5, 25... Drive shaft, 6, 26... Brush, 7
, 27... shaft, 8, 28... support section, 9, 29...
...Brush drive motor, 10, 30... Drive pulley, 11, 31... Driven pulley, 12, 32... Belt, 13, 33... Cover, 14, 34... Arm, 15... Balancer, 35... Pressure cylinder, 36... angle.
Claims (1)
せて基板表面に付着している汚染物を除去する洗
浄装置において、前記基板を保持して垂直軸のま
わりに自転する基板保持部と、水平軸のまわりに
自転するブラシと、該ブラシを上下可動自在に保
持する保持機構と、前記基板に加わる前記ブラシ
の荷重を調整する荷重調整手段とを備えることを
特徴とする洗浄装置。 A cleaning device that removes contaminants adhering to the surface of a substrate by contacting and rotating a cylindrical brush on a rotating substrate, which includes a substrate holder that holds the substrate and rotates around a vertical axis, and a horizontal axis. 1. A cleaning device comprising: a brush that rotates around the substrate; a holding mechanism that holds the brush movably up and down; and a load adjustment means that adjusts the load of the brush applied to the substrate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7676586U JPS62186427U (en) | 1986-05-20 | 1986-05-20 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7676586U JPS62186427U (en) | 1986-05-20 | 1986-05-20 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS62186427U true JPS62186427U (en) | 1987-11-27 |
Family
ID=30924154
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7676586U Pending JPS62186427U (en) | 1986-05-20 | 1986-05-20 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62186427U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0352228A (en) * | 1989-07-20 | 1991-03-06 | Tokyo Electron Ltd | Adjusting device of contact pressure of scribing brush |
-
1986
- 1986-05-20 JP JP7676586U patent/JPS62186427U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0352228A (en) * | 1989-07-20 | 1991-03-06 | Tokyo Electron Ltd | Adjusting device of contact pressure of scribing brush |
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