JPS6380888A - 洗浄装置 - Google Patents
洗浄装置Info
- Publication number
- JPS6380888A JPS6380888A JP61224709A JP22470986A JPS6380888A JP S6380888 A JPS6380888 A JP S6380888A JP 61224709 A JP61224709 A JP 61224709A JP 22470986 A JP22470986 A JP 22470986A JP S6380888 A JPS6380888 A JP S6380888A
- Authority
- JP
- Japan
- Prior art keywords
- cleaning
- workpiece
- unit
- work
- supply
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004140 cleaning Methods 0.000 claims description 69
- 238000001035 drying Methods 0.000 claims description 20
- 238000000034 method Methods 0.000 claims description 14
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 18
- 230000007246 mechanism Effects 0.000 description 11
- 239000007788 liquid Substances 0.000 description 9
- 239000000758 substrate Substances 0.000 description 5
- 230000003247 decreasing effect Effects 0.000 description 2
- 239000003599 detergent Substances 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 239000011120 plywood Substances 0.000 description 2
- 238000003825 pressing Methods 0.000 description 2
- 239000000969 carrier Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 210000000078 claw Anatomy 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000002269 spontaneous effect Effects 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 230000007723 transport mechanism Effects 0.000 description 1
- 230000002747 voluntary effect Effects 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
Landscapes
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Cleaning By Liquid Or Steam (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61224709A JPS6380888A (ja) | 1986-09-22 | 1986-09-22 | 洗浄装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61224709A JPS6380888A (ja) | 1986-09-22 | 1986-09-22 | 洗浄装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6380888A true JPS6380888A (ja) | 1988-04-11 |
JPH0446195B2 JPH0446195B2 (enrdf_load_stackoverflow) | 1992-07-29 |
Family
ID=16818013
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP61224709A Granted JPS6380888A (ja) | 1986-09-22 | 1986-09-22 | 洗浄装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6380888A (enrdf_load_stackoverflow) |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0227722A (ja) * | 1988-06-29 | 1990-01-30 | Samsung Electron Co Ltd | 半導体製造用のウェーハ洗浄装置 |
JPH02197119A (ja) * | 1989-01-26 | 1990-08-03 | Tel Sagami Ltd | 熱処理炉用基板保持具の搬送装置 |
JPH0596254A (ja) * | 1990-05-07 | 1993-04-20 | Haneda Seisakusho:Kk | 超音波洗浄装置並びに該装置に用いる洗浄槽 |
JPH06106142A (ja) * | 1992-09-30 | 1994-04-19 | Yoshihide Shibano | 洗浄装置 |
JP2003086555A (ja) * | 2001-09-10 | 2003-03-20 | Mimasu Semiconductor Industry Co Ltd | ウェーハの表面処理装置 |
JP2011077152A (ja) * | 2009-09-29 | 2011-04-14 | Dainippon Screen Mfg Co Ltd | 基板処理装置 |
KR101331022B1 (ko) * | 2012-03-08 | 2013-11-19 | 주식회사 세림지엠티 | 하우징 세척기 |
JP2022077021A (ja) * | 2020-11-10 | 2022-05-20 | 株式会社スギノマシン | 処理システム |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5868933A (ja) * | 1981-10-21 | 1983-04-25 | Hitachi Ltd | 自動洗浄装置 |
-
1986
- 1986-09-22 JP JP61224709A patent/JPS6380888A/ja active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5868933A (ja) * | 1981-10-21 | 1983-04-25 | Hitachi Ltd | 自動洗浄装置 |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0227722A (ja) * | 1988-06-29 | 1990-01-30 | Samsung Electron Co Ltd | 半導体製造用のウェーハ洗浄装置 |
JPH02197119A (ja) * | 1989-01-26 | 1990-08-03 | Tel Sagami Ltd | 熱処理炉用基板保持具の搬送装置 |
JPH0596254A (ja) * | 1990-05-07 | 1993-04-20 | Haneda Seisakusho:Kk | 超音波洗浄装置並びに該装置に用いる洗浄槽 |
JPH06106142A (ja) * | 1992-09-30 | 1994-04-19 | Yoshihide Shibano | 洗浄装置 |
JP2003086555A (ja) * | 2001-09-10 | 2003-03-20 | Mimasu Semiconductor Industry Co Ltd | ウェーハの表面処理装置 |
JP2011077152A (ja) * | 2009-09-29 | 2011-04-14 | Dainippon Screen Mfg Co Ltd | 基板処理装置 |
KR101331022B1 (ko) * | 2012-03-08 | 2013-11-19 | 주식회사 세림지엠티 | 하우징 세척기 |
JP2022077021A (ja) * | 2020-11-10 | 2022-05-20 | 株式会社スギノマシン | 処理システム |
Also Published As
Publication number | Publication date |
---|---|
JPH0446195B2 (enrdf_load_stackoverflow) | 1992-07-29 |
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