JPS63269150A - パタ−ン形成方法 - Google Patents

パタ−ン形成方法

Info

Publication number
JPS63269150A
JPS63269150A JP62103137A JP10313787A JPS63269150A JP S63269150 A JPS63269150 A JP S63269150A JP 62103137 A JP62103137 A JP 62103137A JP 10313787 A JP10313787 A JP 10313787A JP S63269150 A JPS63269150 A JP S63269150A
Authority
JP
Japan
Prior art keywords
tables
formulas
chemical formulas
pattern
mathematical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP62103137A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0544019B2 (OSRAM
Inventor
Saburo Imamura
三郎 今村
Haruyori Tanaka
啓順 田中
Katsuhide Onose
小野瀬　勝秀
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NTT Inc
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP62103137A priority Critical patent/JPS63269150A/ja
Publication of JPS63269150A publication Critical patent/JPS63269150A/ja
Publication of JPH0544019B2 publication Critical patent/JPH0544019B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP62103137A 1987-04-28 1987-04-28 パタ−ン形成方法 Granted JPS63269150A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62103137A JPS63269150A (ja) 1987-04-28 1987-04-28 パタ−ン形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62103137A JPS63269150A (ja) 1987-04-28 1987-04-28 パタ−ン形成方法

Publications (2)

Publication Number Publication Date
JPS63269150A true JPS63269150A (ja) 1988-11-07
JPH0544019B2 JPH0544019B2 (OSRAM) 1993-07-05

Family

ID=14346140

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62103137A Granted JPS63269150A (ja) 1987-04-28 1987-04-28 パタ−ン形成方法

Country Status (1)

Country Link
JP (1) JPS63269150A (OSRAM)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0436755A (ja) * 1990-06-01 1992-02-06 Fuji Photo Film Co Ltd レジスト組成物
JP2010043200A (ja) * 2008-08-13 2010-02-25 Az Electronic Materials Kk アルカリ可溶性シルセスキオキサン及び感光性組成物

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5692536A (en) * 1979-12-27 1981-07-27 Fujitsu Ltd Pattern formation method
JPS60147732A (ja) * 1983-12-30 1985-08-03 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション オルガノシリコン組成物
JPS61144639A (ja) * 1984-12-19 1986-07-02 Hitachi Ltd 放射線感応性組成物及びそれを用いたパタ−ン形成法
JPS61256347A (ja) * 1985-05-10 1986-11-13 Hitachi Ltd アルカリ可溶性シロキサン重合体

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5692536A (en) * 1979-12-27 1981-07-27 Fujitsu Ltd Pattern formation method
JPS60147732A (ja) * 1983-12-30 1985-08-03 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション オルガノシリコン組成物
JPS61144639A (ja) * 1984-12-19 1986-07-02 Hitachi Ltd 放射線感応性組成物及びそれを用いたパタ−ン形成法
JPS61256347A (ja) * 1985-05-10 1986-11-13 Hitachi Ltd アルカリ可溶性シロキサン重合体

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0436755A (ja) * 1990-06-01 1992-02-06 Fuji Photo Film Co Ltd レジスト組成物
JP2010043200A (ja) * 2008-08-13 2010-02-25 Az Electronic Materials Kk アルカリ可溶性シルセスキオキサン及び感光性組成物

Also Published As

Publication number Publication date
JPH0544019B2 (OSRAM) 1993-07-05

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term