JPS6285251A - ホトマスクの保護膜形成方法 - Google Patents

ホトマスクの保護膜形成方法

Info

Publication number
JPS6285251A
JPS6285251A JP60226139A JP22613985A JPS6285251A JP S6285251 A JPS6285251 A JP S6285251A JP 60226139 A JP60226139 A JP 60226139A JP 22613985 A JP22613985 A JP 22613985A JP S6285251 A JPS6285251 A JP S6285251A
Authority
JP
Japan
Prior art keywords
photomask
alkylfluoroalkoxysilane
vapor
protective coating
protective film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60226139A
Other languages
English (en)
Japanese (ja)
Other versions
JPH041338B2 (enExample
Inventor
Shigeyoshi Suzuki
成嘉 鈴木
Kazuto Kobayashi
和人 小林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP60226139A priority Critical patent/JPS6285251A/ja
Publication of JPS6285251A publication Critical patent/JPS6285251A/ja
Publication of JPH041338B2 publication Critical patent/JPH041338B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/48—Protective coatings

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP60226139A 1985-10-09 1985-10-09 ホトマスクの保護膜形成方法 Granted JPS6285251A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60226139A JPS6285251A (ja) 1985-10-09 1985-10-09 ホトマスクの保護膜形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60226139A JPS6285251A (ja) 1985-10-09 1985-10-09 ホトマスクの保護膜形成方法

Publications (2)

Publication Number Publication Date
JPS6285251A true JPS6285251A (ja) 1987-04-18
JPH041338B2 JPH041338B2 (enExample) 1992-01-10

Family

ID=16840459

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60226139A Granted JPS6285251A (ja) 1985-10-09 1985-10-09 ホトマスクの保護膜形成方法

Country Status (1)

Country Link
JP (1) JPS6285251A (enExample)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01123232A (ja) * 1987-11-09 1989-05-16 Mitsubishi Electric Corp パターン形成方法
US5134015A (en) * 1989-10-13 1992-07-28 Kabushiki Kaisha Toshiba Aperture pattern-printing plate for shadow mask and method for manufacturing the same
JP2002214761A (ja) * 2001-01-16 2002-07-31 Dainippon Printing Co Ltd フォトリソグラフィー用フォトマスクおよびその製造方法
US6566021B2 (en) 2001-07-26 2003-05-20 Micro Lithography, Inc. Fluoropolymer-coated photomasks for photolithography
JP2011206720A (ja) * 2010-03-30 2011-10-20 Hitachi High-Technologies Corp ドライ完結型有機ｅｌ用マスククリーナ装置及びそのためのマスククリーニング方法
JP2018535446A (ja) * 2016-01-27 2018-11-29 エルジー・ケム・リミテッド フィルムマスク、その製造方法およびこれを用いたパターンの形成方法
US10969686B2 (en) 2016-01-27 2021-04-06 Lg Chem, Ltd. Film mask, method for manufacturing same, and method for forming pattern using film mask and pattern formed thereby
US11029596B2 (en) 2016-01-27 2021-06-08 Lg Chem, Ltd. Film mask, method for manufacturing same, and method for forming pattern using film mask and pattern formed thereby

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01123232A (ja) * 1987-11-09 1989-05-16 Mitsubishi Electric Corp パターン形成方法
US5134015A (en) * 1989-10-13 1992-07-28 Kabushiki Kaisha Toshiba Aperture pattern-printing plate for shadow mask and method for manufacturing the same
JP2002214761A (ja) * 2001-01-16 2002-07-31 Dainippon Printing Co Ltd フォトリソグラフィー用フォトマスクおよびその製造方法
US6566021B2 (en) 2001-07-26 2003-05-20 Micro Lithography, Inc. Fluoropolymer-coated photomasks for photolithography
JP2011206720A (ja) * 2010-03-30 2011-10-20 Hitachi High-Technologies Corp ドライ完結型有機ｅｌ用マスククリーナ装置及びそのためのマスククリーニング方法
JP2018535446A (ja) * 2016-01-27 2018-11-29 エルジー・ケム・リミテッド フィルムマスク、その製造方法およびこれを用いたパターンの形成方法
US10969686B2 (en) 2016-01-27 2021-04-06 Lg Chem, Ltd. Film mask, method for manufacturing same, and method for forming pattern using film mask and pattern formed thereby
US10969677B2 (en) 2016-01-27 2021-04-06 Lg Chem, Ltd. Film mask, method for manufacturing same, and method for forming pattern using film mask
US11029596B2 (en) 2016-01-27 2021-06-08 Lg Chem, Ltd. Film mask, method for manufacturing same, and method for forming pattern using film mask and pattern formed thereby

Also Published As

Publication number Publication date
JPH041338B2 (enExample) 1992-01-10

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