JPS6245697B2 - - Google Patents

Info

Publication number
JPS6245697B2
JPS6245697B2 JP58014052A JP1405283A JPS6245697B2 JP S6245697 B2 JPS6245697 B2 JP S6245697B2 JP 58014052 A JP58014052 A JP 58014052A JP 1405283 A JP1405283 A JP 1405283A JP S6245697 B2 JPS6245697 B2 JP S6245697B2
Authority
JP
Japan
Prior art keywords
electrostatic adsorption
adsorption device
electrodes
insulating layer
glass epoxy
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP58014052A
Other languages
English (en)
Japanese (ja)
Other versions
JPS59139641A (ja
Inventor
Moritaka Nakamura
Naomichi Abe
Toshimasa Kisa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP58014052A priority Critical patent/JPS59139641A/ja
Publication of JPS59139641A publication Critical patent/JPS59139641A/ja
Publication of JPS6245697B2 publication Critical patent/JPS6245697B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10P72/72—
    • H10P72/50—

Landscapes

  • Jigs For Machine Tools (AREA)
JP58014052A 1983-01-31 1983-01-31 静電吸着装置の製造方法 Granted JPS59139641A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58014052A JPS59139641A (ja) 1983-01-31 1983-01-31 静電吸着装置の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58014052A JPS59139641A (ja) 1983-01-31 1983-01-31 静電吸着装置の製造方法

Publications (2)

Publication Number Publication Date
JPS59139641A JPS59139641A (ja) 1984-08-10
JPS6245697B2 true JPS6245697B2 (index.php) 1987-09-28

Family

ID=11850315

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58014052A Granted JPS59139641A (ja) 1983-01-31 1983-01-31 静電吸着装置の製造方法

Country Status (1)

Country Link
JP (1) JPS59139641A (index.php)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61257733A (ja) * 1986-05-21 1986-11-15 Tokuda Seisakusho Ltd 静電チヤツク
JPH01240243A (ja) * 1988-03-18 1989-09-25 Tokuda Seisakusho Ltd 電極およびその製造方法
JP3238925B2 (ja) * 1990-11-17 2001-12-17 株式会社東芝 静電チャック
JPH08274150A (ja) * 1995-03-31 1996-10-18 Nec Corp 静電吸着ステージ

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5267353A (en) * 1975-12-01 1977-06-03 Hitachi Ltd Electrostatic chuck

Also Published As

Publication number Publication date
JPS59139641A (ja) 1984-08-10

Similar Documents

Publication Publication Date Title
JPH08264734A (ja) 強誘電性キャパシタの製造方法
JPH02289402A (ja) オゾン発生器及びその製造方法
JPH0391227A (ja) 半導体基板の接着方法
JPH0434953A (ja) 静電チャック板
JPH05160076A (ja) ドライエッチング装置
JP2009087979A (ja) 基板構造体、及び基板構造体の製造方法
JPS60169139A (ja) 気相法装置
JPS6245697B2 (index.php)
KR101242464B1 (ko) 건식 식각 방법
JP2006066857A (ja) 双極型静電チャック
EP0794569A2 (en) Amorphous carbon film, formation process thereof, and semiconductor device making use of the film
JP2880920B2 (ja) エッチング装置
JP2720386B2 (ja) 半導体装置の製造方法
JP3323298B2 (ja) 静電チャック装置及び同装置を備えたプラズマ処理装置
JPH07177761A (ja) マイクロマシンの製造方法
KR100899292B1 (ko) 수명을 연장시키는 절연막을 갖는 반도체 장비용 정전척
KR970067720A (ko) 신뢰성있는 반도체 소자를 제조하기 위한 방법
JP2775263B2 (ja) 炭素膜で覆われた部材
JPH0258353A (ja) 半導体装置
JP3223522B2 (ja) 半導体装置の製造方法
JP2629587B2 (ja) 半導体装置の製造方法
JPH01223733A (ja) 炭化チタン系膜及び窒化チタン系膜のエッチング方法
KR100234542B1 (ko) 반도체장치의 제조방법
JPH0451473Y2 (index.php)
JPH03232226A (ja) エッチング装置