JPS62294160A - 反応性気体プラズマ中での材料の熱化学的表面処理方法 - Google Patents
反応性気体プラズマ中での材料の熱化学的表面処理方法Info
- Publication number
- JPS62294160A JPS62294160A JP62093484A JP9348487A JPS62294160A JP S62294160 A JPS62294160 A JP S62294160A JP 62093484 A JP62093484 A JP 62093484A JP 9348487 A JP9348487 A JP 9348487A JP S62294160 A JPS62294160 A JP S62294160A
- Authority
- JP
- Japan
- Prior art keywords
- gas
- substrate
- treated
- surface treatment
- plasma
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000463 material Substances 0.000 title claims description 41
- 238000004381 surface treatment Methods 0.000 title claims description 20
- 238000000034 method Methods 0.000 claims description 88
- 239000007789 gas Substances 0.000 claims description 78
- 239000000758 substrate Substances 0.000 claims description 39
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 36
- 238000006243 chemical reaction Methods 0.000 claims description 36
- 239000000203 mixture Substances 0.000 claims description 30
- 229910052757 nitrogen Inorganic materials 0.000 claims description 23
- 238000010891 electric arc Methods 0.000 claims description 22
- 238000010438 heat treatment Methods 0.000 claims description 17
- 238000011282 treatment Methods 0.000 claims description 16
- 238000009826 distribution Methods 0.000 claims description 11
- 238000005240 physical vapour deposition Methods 0.000 claims description 10
- 238000000576 coating method Methods 0.000 claims description 8
- 238000007733 ion plating Methods 0.000 claims description 6
- 229910052796 boron Inorganic materials 0.000 claims description 5
- 238000005229 chemical vapour deposition Methods 0.000 claims description 5
- 238000004544 sputter deposition Methods 0.000 claims description 4
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 claims description 3
- 238000001311 chemical methods and process Methods 0.000 claims description 3
- 229910052804 chromium Inorganic materials 0.000 claims description 3
- 239000011651 chromium Substances 0.000 claims description 3
- 238000001704 evaporation Methods 0.000 claims description 3
- 238000000465 moulding Methods 0.000 claims description 3
- 229910052719 titanium Inorganic materials 0.000 claims description 3
- 239000010936 titanium Substances 0.000 claims description 3
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 2
- 229910052782 aluminium Inorganic materials 0.000 claims description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 2
- 229910052799 carbon Inorganic materials 0.000 claims description 2
- 229910052717 sulfur Inorganic materials 0.000 claims description 2
- 229910052720 vanadium Inorganic materials 0.000 claims description 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims 1
- 230000008020 evaporation Effects 0.000 claims 1
- 229910052698 phosphorus Inorganic materials 0.000 claims 1
- 239000011574 phosphorus Substances 0.000 claims 1
- 229910052710 silicon Inorganic materials 0.000 claims 1
- 239000010703 silicon Substances 0.000 claims 1
- 239000011593 sulfur Substances 0.000 claims 1
- 229910052718 tin Inorganic materials 0.000 claims 1
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 claims 1
- 210000002381 plasma Anatomy 0.000 description 19
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 16
- 229910052739 hydrogen Inorganic materials 0.000 description 16
- 239000010410 layer Substances 0.000 description 16
- 239000001257 hydrogen Substances 0.000 description 15
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 14
- 150000002500 ions Chemical class 0.000 description 11
- 239000012778 molding material Substances 0.000 description 11
- 238000012360 testing method Methods 0.000 description 10
- 229910052786 argon Inorganic materials 0.000 description 8
- 230000035515 penetration Effects 0.000 description 8
- 238000012545 processing Methods 0.000 description 8
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 6
- 238000005255 carburizing Methods 0.000 description 5
- 150000001875 compounds Chemical class 0.000 description 5
- 238000005530 etching Methods 0.000 description 5
- 238000005121 nitriding Methods 0.000 description 5
- 239000002585 base Substances 0.000 description 4
- 238000005260 corrosion Methods 0.000 description 4
- 230000007797 corrosion Effects 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- 229910000831 Steel Inorganic materials 0.000 description 3
- 238000005299 abrasion Methods 0.000 description 3
- 230000007547 defect Effects 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 230000002829 reductive effect Effects 0.000 description 3
- 239000010959 steel Substances 0.000 description 3
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 3
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- 229910010038 TiAl Inorganic materials 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 2
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 2
- 125000004429 atom Chemical group 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000005256 carbonitriding Methods 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 2
- 238000007542 hardness measurement Methods 0.000 description 2
- 150000004678 hydrides Chemical class 0.000 description 2
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 2
- 230000036961 partial effect Effects 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 239000000376 reactant Substances 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 230000007704 transition Effects 0.000 description 2
- SANRKQGLYCLAFE-UHFFFAOYSA-H uranium hexafluoride Chemical compound F[U](F)(F)(F)(F)F SANRKQGLYCLAFE-UHFFFAOYSA-H 0.000 description 2
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-IGMARMGPSA-N Carbon-12 Chemical compound [12C] OKTJSMMVPCPJKN-IGMARMGPSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- YZCKVEUIGOORGS-OUBTZVSYSA-N Deuterium Chemical compound [2H] YZCKVEUIGOORGS-OUBTZVSYSA-N 0.000 description 1
- 229910000997 High-speed steel Inorganic materials 0.000 description 1
- 240000004064 Poterium sanguisorba Species 0.000 description 1
- 229910052774 Proactinium Inorganic materials 0.000 description 1
- 229910004688 Ti-V Inorganic materials 0.000 description 1
- 229910003074 TiCl4 Inorganic materials 0.000 description 1
- 229910010968 Ti—V Inorganic materials 0.000 description 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 1
- 229910021552 Vanadium(IV) chloride Inorganic materials 0.000 description 1
- 235000009754 Vitis X bourquina Nutrition 0.000 description 1
- 235000012333 Vitis X labruscana Nutrition 0.000 description 1
- 240000006365 Vitis vinifera Species 0.000 description 1
- 235000014787 Vitis vinifera Nutrition 0.000 description 1
- 230000002159 abnormal effect Effects 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 235000019270 ammonium chloride Nutrition 0.000 description 1
- 239000012300 argon atmosphere Substances 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000004202 carbamide Substances 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 239000002826 coolant Substances 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 239000013256 coordination polymer Substances 0.000 description 1
- 150000001879 copper Chemical class 0.000 description 1
- PYRZPBDTPRQYKG-UHFFFAOYSA-N cyclopentene-1-carboxylic acid Chemical compound OC(=O)C1=CCCC1 PYRZPBDTPRQYKG-UHFFFAOYSA-N 0.000 description 1
- ZOCHARZZJNPSEU-UHFFFAOYSA-N diboron Chemical compound B#B ZOCHARZZJNPSEU-UHFFFAOYSA-N 0.000 description 1
- 239000008151 electrolyte solution Substances 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 239000012526 feed medium Substances 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 150000002483 hydrogen compounds Chemical class 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 210000003127 knee Anatomy 0.000 description 1
- 239000004310 lactic acid Substances 0.000 description 1
- 235000014655 lactic acid Nutrition 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 150000002902 organometallic compounds Chemical class 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 239000012495 reaction gas Substances 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 238000010561 standard procedure Methods 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- FAQYAMRNWDIXMY-UHFFFAOYSA-N trichloroborane Chemical compound ClB(Cl)Cl FAQYAMRNWDIXMY-UHFFFAOYSA-N 0.000 description 1
- MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 description 1
- JTJFQBNJBPPZRI-UHFFFAOYSA-J vanadium tetrachloride Chemical compound Cl[V](Cl)(Cl)Cl JTJFQBNJBPPZRI-UHFFFAOYSA-J 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0272—Deposition of sub-layers, e.g. to promote the adhesion of the main coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/021—Cleaning or etching treatments
- C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
- C23C8/36—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases using ionised gases, e.g. ionitriding
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Vapour Deposition (AREA)
- Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CH02415/86-9 | 1986-06-13 | ||
| CH2415/86A CH671407A5 (nl) | 1986-06-13 | 1986-06-13 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS62294160A true JPS62294160A (ja) | 1987-12-21 |
Family
ID=4233265
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62093484A Pending JPS62294160A (ja) | 1986-06-13 | 1987-04-17 | 反応性気体プラズマ中での材料の熱化学的表面処理方法 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US4762756A (nl) |
| JP (1) | JPS62294160A (nl) |
| CH (1) | CH671407A5 (nl) |
| DE (1) | DE3702984A1 (nl) |
| FR (1) | FR2600082B1 (nl) |
| GB (1) | GB2192196B (nl) |
| NL (1) | NL194551C (nl) |
| SE (1) | SE465578B (nl) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011236507A (ja) * | 2003-09-19 | 2011-11-24 | Akzo Nobel Nv | 液体／蒸気堆積方法による基体の金属被覆 |
| JP2021025063A (ja) * | 2019-07-31 | 2021-02-22 | Ｄｏｗａサーモテック株式会社 | 珪窒化バナジウム膜被覆部材の製造方法および珪窒化バナジウム膜被覆部材 |
Families Citing this family (47)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3742317A1 (de) * | 1987-12-14 | 1989-06-22 | Repenning Detlev | Verfahren zur herstellung korrosion-, verschleiss- und pressfester schichten |
| FR2630133B1 (fr) * | 1988-04-18 | 1993-09-24 | Siderurgie Fse Inst Rech | Procede pour l'amelioration de la resistance a la corrosion de materiaux metalliques |
| US5192410A (en) * | 1988-07-28 | 1993-03-09 | Nippon Steel Corporation | Process for manufacturing multi ceramic layer-coated metal plate |
| US5079089A (en) * | 1988-07-28 | 1992-01-07 | Nippon Steel Corporation | Multi ceramic layer-coated metal plate and process for manufacturing same |
| US5304417A (en) * | 1989-06-02 | 1994-04-19 | Air Products And Chemicals, Inc. | Graphite/carbon articles for elevated temperature service and method of manufacture |
| DE3918562A1 (de) * | 1989-06-07 | 1990-12-13 | Repenning Detlev | Verfahren zur herstellung hochharter schichten auf refraktaeren metallwerkstoffen sowie ihren legierungen |
| US5266389A (en) * | 1989-09-29 | 1993-11-30 | Sumitomo Electric Industries, Ltd. | Surface-coated hard material for cutting tools or wear resistance tools |
| US5264297A (en) * | 1990-03-09 | 1993-11-23 | Kennametal Inc. | Physical vapor deposition of titanium nitride on a nonconductive substrate |
| JP2704317B2 (ja) * | 1990-03-09 | 1998-01-26 | ケンナメタル インコーポレイテツド | 窒化チタニウムの非電導体基板上への物理的蒸着 |
| US5707692A (en) * | 1990-10-23 | 1998-01-13 | Canon Kabushiki Kaisha | Apparatus and method for processing a base substance using plasma and a magnetic field |
| US5503725A (en) * | 1991-04-29 | 1996-04-02 | Novatech | Method and device for treatment of products in gas-discharge plasma |
| CH683776A5 (de) * | 1991-12-05 | 1994-05-13 | Alusuisse Lonza Services Ag | Beschichten einer Substratfläche mit einer Permeationssperre. |
| US5383980A (en) * | 1992-01-20 | 1995-01-24 | Leybold Durferrit Gmbh | Process for hardening workpieces in a pulsed plasma discharge |
| CA2121266C (en) * | 1992-08-14 | 1998-06-09 | Simon K. Nieh | Surface preparation and deposition method for titanium nitride onto carbonaceous |
| DE4416525B4 (de) * | 1993-05-27 | 2008-06-05 | Oerlikon Trading Ag, Trübbach | Verfahren zur Herstellung einer Beschichtung erhöhter Verschleißfestigkeit auf Werkstückoberflächen, und dessen Verwendung |
| KR100326488B1 (ko) * | 1993-06-21 | 2002-06-20 | 조셉 제이. 스위니 | 플라즈마화학기상증착법 |
| JP2909361B2 (ja) * | 1993-09-21 | 1999-06-23 | 大阪府 | チタン金属の表面処理方法 |
| RU2048601C1 (ru) * | 1993-12-20 | 1995-11-20 | Рыжов Николай Михайлович | Способ диагностики процесса химико-термической обработки сталей и сплавов в тлеющем разряде и устройство для его осуществления |
| US5975912A (en) * | 1994-06-03 | 1999-11-02 | Materials Research Corporation | Low temperature plasma-enhanced formation of integrated circuits |
| US5665640A (en) | 1994-06-03 | 1997-09-09 | Sony Corporation | Method for producing titanium-containing thin films by low temperature plasma-enhanced chemical vapor deposition using a rotating susceptor reactor |
| US5628829A (en) | 1994-06-03 | 1997-05-13 | Materials Research Corporation | Method and apparatus for low temperature deposition of CVD and PECVD films |
| DE19526387C2 (de) * | 1994-07-19 | 1998-12-10 | Sumitomo Metal Mining Co | Doppelt beschichteter Stahlverbundgegenstand und Verfahren zu dessen Herstellung |
| EP0703303A1 (de) * | 1994-07-27 | 1996-03-27 | Balzers Sa | Korrosions- und verschleissfester Körper sowie Verfahren zu dessen Herstellung |
| EP0694629A3 (de) | 1994-07-27 | 1998-09-23 | Balzers Sa | Korrosions- und verschleissfester Körper, Verfahren zu dessen Herstellung sowie Vakuumbehandlungsanlage |
| US5830540A (en) * | 1994-09-15 | 1998-11-03 | Eltron Research, Inc. | Method and apparatus for reactive plasma surfacing |
| DE4440521C1 (de) | 1994-11-12 | 1995-11-02 | Rowo Coating Ges Fuer Beschich | Vorrichtung zum Beschichten von Substraten mit einem Materialdampf im Unterdruck oder Vakuum |
| US5753045A (en) * | 1995-01-25 | 1998-05-19 | Balzers Aktiengesellschaft | Vacuum treatment system for homogeneous workpiece processing |
| EP0724026B1 (de) * | 1995-01-25 | 1999-10-13 | Balzers Aktiengesellschaft | Verfahren zur reaktiven Schichtabscheidung |
| US5749937A (en) | 1995-03-14 | 1998-05-12 | Lockheed Idaho Technologies Company | Fast quench reactor and method |
| US7576296B2 (en) * | 1995-03-14 | 2009-08-18 | Battelle Energy Alliance, Llc | Thermal synthesis apparatus |
| US6821500B2 (en) | 1995-03-14 | 2004-11-23 | Bechtel Bwxt Idaho, Llc | Thermal synthesis apparatus and process |
| WO1996031899A1 (en) * | 1995-04-07 | 1996-10-10 | Advanced Energy Industries, Inc. | Adjustable energy quantum thin film plasma processing system |
| US5972790A (en) * | 1995-06-09 | 1999-10-26 | Tokyo Electron Limited | Method for forming salicides |
| US6452338B1 (en) | 1999-12-13 | 2002-09-17 | Semequip, Inc. | Electron beam ion source with integral low-temperature vaporizer |
| AU2906401A (en) * | 1999-12-21 | 2001-07-03 | Bechtel Bwxt Idaho, Llc | Hydrogen and elemental carbon production from natural gas and other hydrocarbons |
| US6605160B2 (en) | 2000-08-21 | 2003-08-12 | Robert Frank Hoskin | Repair of coatings and surfaces using reactive metals coating processes |
| DE10048589A1 (de) * | 2000-09-30 | 2002-04-25 | Volkswagen Ag | Schaltvorrichtung für ein Kraftfahrzeuggetriebe |
| US6936145B2 (en) * | 2002-02-28 | 2005-08-30 | Ionedge Corporation | Coating method and apparatus |
| BR0205419B1 (pt) * | 2002-12-20 | 2017-10-24 | Coppe/Ufrj Coordenacao Dos Programas De Pos Graduacao De Engenharia Da Univ Federal Do Rio De Janeir | Process of ionic nitretation by pulsed plasma for obtaining diffusion barrier for hydrogen for steel api 5l x-65 |
| US7216067B2 (en) * | 2002-12-31 | 2007-05-08 | Tokyo Electron Limited | Non-linear test load and method of calibrating a plasma system |
| US20050281958A1 (en) * | 2004-06-22 | 2005-12-22 | Walton Scott G | Electron beam enhanced nitriding system (EBENS) |
| US7354561B2 (en) * | 2004-11-17 | 2008-04-08 | Battelle Energy Alliance, Llc | Chemical reactor and method for chemically converting a first material into a second material |
| US8591821B2 (en) * | 2009-04-23 | 2013-11-26 | Battelle Energy Alliance, Llc | Combustion flame-plasma hybrid reactor systems, and chemical reactant sources |
| EP2429777B2 (en) * | 2009-05-15 | 2022-06-01 | The Gillette Company LLC | Razor blade coating |
| US9761424B1 (en) | 2011-09-07 | 2017-09-12 | Nano-Product Engineering, LLC | Filtered cathodic arc method, apparatus and applications thereof |
| US10304665B2 (en) | 2011-09-07 | 2019-05-28 | Nano-Product Engineering, LLC | Reactors for plasma-assisted processes and associated methods |
| RU2611251C2 (ru) * | 2015-06-15 | 2017-02-21 | Федеральное государственное бюджетное образовательное учреждение высшего профессионального образования "Уфимский государственный авиационный технический университет" | Способ азотирования в плазме повышенной плотности |
Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5118944A (ja) * | 1974-08-07 | 1976-02-14 | Suwa Seikosha Kk | Kisohokaho |
| JPS5665975A (en) * | 1979-11-02 | 1981-06-04 | Akihiro Saito | Surface treatment of metal |
| JPS58174568A (ja) * | 1982-04-08 | 1983-10-13 | Toshiba Corp | 金属化合物被膜の形成方法 |
| JPS5968821A (ja) * | 1982-10-12 | 1984-04-18 | Tdk Corp | 磁気記録媒体 |
| JPS59205471A (ja) * | 1983-05-02 | 1984-11-21 | Kowa Eng Kk | 被処理物品の表面に黒色被膜を形成する方法 |
| JPS59205470A (ja) * | 1983-05-02 | 1984-11-21 | Kowa Eng Kk | 硬質被膜の形成装置及びその形成方法 |
| JPS61205146A (ja) * | 1985-03-08 | 1986-09-11 | Hitachi Koki Co Ltd | ドツトプリンタ用印字ヘツド |
| JPS6289858A (ja) * | 1985-09-10 | 1987-04-24 | 張 弋飛 | 金属表面に硫化物外皮を形成する方法およびその装置 |
| JPS62188771A (ja) * | 1986-02-14 | 1987-08-18 | Daido Steel Co Ltd | 構造用鋼の表面硬化方法 |
| JPS6320300A (ja) * | 1986-07-14 | 1988-01-27 | 三菱重工業株式会社 | 有翼回収飛行体の緊急脱出装置 |
Family Cites Families (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1150655B (de) * | 1960-05-05 | 1963-06-27 | Siemens Ag | Verfahren zum Dotieren eines festen Halbleiterkristalls |
| US3639151A (en) * | 1969-03-13 | 1972-02-01 | United Aircraft Corp | Vapor randomization in vacuum deposition of coatings |
| RO74414A2 (ro) * | 1974-03-23 | 1981-09-24 | Institutul De Cercetari Si Proiectari Tehnologice Pentru Sectoare Calde,Ro | Procedeu de nitrurare ionica |
| GB1483966A (en) * | 1974-10-23 | 1977-08-24 | Sharp Kk | Vapourized-metal cluster ion source and ionized-cluster beam deposition |
| CS176690B1 (nl) * | 1975-03-04 | 1977-06-30 | ||
| GB1422519A (en) * | 1975-03-21 | 1976-01-28 | Telic Corp | Sputtering method and apparatus |
| GB1582231A (en) * | 1976-08-13 | 1981-01-07 | Nat Res Dev | Application of a layer of carbonaceous material to a surface |
| SE407081B (sv) * | 1977-07-27 | 1979-03-12 | Hultquist Gunnar B | Sett att framstella ytskikt med forbettrade korrosionsegenskaper pa foremal av jernkromlegerigar |
| GB2030180B (en) * | 1978-01-26 | 1983-05-25 | Secr Defence | Vapour deposition of metal in plasma discharge |
| JPS5845177B2 (ja) * | 1979-03-09 | 1983-10-07 | 富士通株式会社 | 半導体表面絶縁膜の形成法 |
| GB2058146B (en) * | 1979-09-14 | 1983-08-10 | Atomic Energy Authority Uk | Ion implanting ferrous metals to improve corrosion resistance |
| GB2070340B (en) * | 1980-02-07 | 1983-10-12 | Shinetsu Chemical Co | Method for surface properties of a disclike shaped article of a vinyl chloridebased resin |
| JPS56116869A (en) * | 1980-02-18 | 1981-09-12 | Shunpei Yamazaki | Inductive reduced pressure gaseous phase method |
| FR2501727A1 (fr) * | 1981-03-13 | 1982-09-17 | Vide Traitement | Procede de traitements thermochimiques de metaux par bombardement ionique |
| FI63783C (fi) * | 1981-09-30 | 1983-08-10 | Kymin Oy Kymmene Ab | Foerfarande foer nitrering vid laogt tryck med hjaelp av glimurladdning |
| JPS58141376A (ja) * | 1982-02-16 | 1983-08-22 | Seiko Epson Corp | プラズマセメンテ−シヨン |
| EP0106638A1 (en) * | 1982-10-12 | 1984-04-25 | National Research Development Corporation | Method and apparatus for growing material in a glow discharge |
| GB2134431B (en) * | 1983-02-04 | 1986-05-21 | Atomic Energy Authority Uk | Improvements in ball-point pens |
| EP0154814A3 (en) * | 1984-03-16 | 1987-08-26 | American Cyanamid Company | Substrates coated by plasma enhanced chemical vapor deposition, apparatus and process for their production |
| JPS60200523A (ja) * | 1984-03-26 | 1985-10-11 | Agency Of Ind Science & Technol | シリコン薄膜の製造法 |
| IL71530A (en) * | 1984-04-12 | 1987-09-16 | Univ Ramot | Method and apparatus for surface-treating workpieces |
| GB8512455D0 (en) * | 1985-05-16 | 1985-06-19 | Atomic Energy Authority Uk | Coating apparatus |
-
1986
- 1986-06-13 CH CH2415/86A patent/CH671407A5/de not_active IP Right Cessation
-
1987
- 1987-02-02 DE DE19873702984 patent/DE3702984A1/de active Granted
- 1987-04-17 JP JP62093484A patent/JPS62294160A/ja active Pending
- 1987-05-18 GB GB8711657A patent/GB2192196B/en not_active Expired - Lifetime
- 1987-06-09 NL NL8701340A patent/NL194551C/nl not_active IP Right Cessation
- 1987-06-09 FR FR8707993A patent/FR2600082B1/fr not_active Expired - Lifetime
- 1987-06-10 SE SE8702410A patent/SE465578B/sv not_active IP Right Cessation
- 1987-06-12 US US07/062,226 patent/US4762756A/en not_active Expired - Lifetime
Patent Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5118944A (ja) * | 1974-08-07 | 1976-02-14 | Suwa Seikosha Kk | Kisohokaho |
| JPS5665975A (en) * | 1979-11-02 | 1981-06-04 | Akihiro Saito | Surface treatment of metal |
| JPS58174568A (ja) * | 1982-04-08 | 1983-10-13 | Toshiba Corp | 金属化合物被膜の形成方法 |
| JPS5968821A (ja) * | 1982-10-12 | 1984-04-18 | Tdk Corp | 磁気記録媒体 |
| JPS59205471A (ja) * | 1983-05-02 | 1984-11-21 | Kowa Eng Kk | 被処理物品の表面に黒色被膜を形成する方法 |
| JPS59205470A (ja) * | 1983-05-02 | 1984-11-21 | Kowa Eng Kk | 硬質被膜の形成装置及びその形成方法 |
| JPS61205146A (ja) * | 1985-03-08 | 1986-09-11 | Hitachi Koki Co Ltd | ドツトプリンタ用印字ヘツド |
| JPS6289858A (ja) * | 1985-09-10 | 1987-04-24 | 張 弋飛 | 金属表面に硫化物外皮を形成する方法およびその装置 |
| JPS62188771A (ja) * | 1986-02-14 | 1987-08-18 | Daido Steel Co Ltd | 構造用鋼の表面硬化方法 |
| JPS6320300A (ja) * | 1986-07-14 | 1988-01-27 | 三菱重工業株式会社 | 有翼回収飛行体の緊急脱出装置 |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011236507A (ja) * | 2003-09-19 | 2011-11-24 | Akzo Nobel Nv | 液体／蒸気堆積方法による基体の金属被覆 |
| JP2021025063A (ja) * | 2019-07-31 | 2021-02-22 | Ｄｏｗａサーモテック株式会社 | 珪窒化バナジウム膜被覆部材の製造方法および珪窒化バナジウム膜被覆部材 |
Also Published As
| Publication number | Publication date |
|---|---|
| US4762756A (en) | 1988-08-09 |
| DE3702984A1 (de) | 1987-12-17 |
| GB2192196A (en) | 1988-01-06 |
| NL8701340A (nl) | 1988-01-04 |
| FR2600082A1 (fr) | 1987-12-18 |
| NL194551C (nl) | 2002-07-02 |
| SE8702410D0 (sv) | 1987-06-10 |
| CH671407A5 (nl) | 1989-08-31 |
| SE465578B (sv) | 1991-09-30 |
| GB2192196B (en) | 1991-01-02 |
| NL194551B (nl) | 2002-03-01 |
| FR2600082B1 (fr) | 1993-04-09 |
| DE3702984C2 (nl) | 1993-02-25 |
| GB8711657D0 (en) | 1987-06-24 |
| SE8702410L (sv) | 1987-12-14 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS62294160A (ja) | 反応性気体プラズマ中での材料の熱化学的表面処理方法 | |
| Roliński | Plasma-assisted nitriding and nitrocarburizing of steel and other ferrous alloys | |
| JP4122387B2 (ja) | 複合硬質皮膜、その製造方法及び成膜装置 | |
| KR101849997B1 (ko) | 철계 합금의 코팅 방법 및 이에 의하여 제조된 고경도 및 저마찰 특성을 갖는 제품 | |
| JP3225576B2 (ja) | 自己修復性硬質固体潤滑膜で被覆した摺動機械部品 | |
| Rie et al. | Plasma surface engineering of metals | |
| US6723177B2 (en) | Life extension of chromium coating and chromium alloys | |
| GB2261227A (en) | Surface treatment of metals at low pressure | |
| JP2001192861A (ja) | 表面処理方法及び表面処理装置 | |
| JPH08296064A (ja) | 耐酸化性・耐摩耗性被膜付き物品 | |
| KR100594998B1 (ko) | 티타늄계 금속의 질화 방법 | |
| JP2773092B2 (ja) | 表面被覆鋼製品 | |
| US6602829B1 (en) | Method for applying a lubricating layer on an object and object with an adhesive lubricating layer | |
| JPH07300665A (ja) | 金属基材のホウ素拡散浸透層・ホウ素膜形成方法 | |
| Xu et al. | Plasma surface alloying | |
| US5217748A (en) | Method of hardening metal surfaces | |
| US7572345B2 (en) | Life extension of chromium coatings and chromium alloys | |
| JPS6342362A (ja) | 表面被覆鋼材の製造方法 | |
| US7291229B2 (en) | Method of surface treatment of titanium metal | |
| JPH03232957A (ja) | 耐摩耗部材の製造方法 | |
| Reynoldson | Advances in surface treatments using fluidised beds | |
| Spalvins | Advances and directions of ion nitriding/carburizing | |
| Manory | Some principles for understanding surface modification of metals by glow discharge processes | |
| KR100290975B1 (ko) | 플라즈마를 이용한 철강재료의 보로나이징 방법 | |
| JP3572240B2 (ja) | 導電部材の物理的表面改質方法および表面改質装置 |