JPS6161378B2 - - Google Patents

Info

Publication number
JPS6161378B2
JPS6161378B2 JP11934480A JP11934480A JPS6161378B2 JP S6161378 B2 JPS6161378 B2 JP S6161378B2 JP 11934480 A JP11934480 A JP 11934480A JP 11934480 A JP11934480 A JP 11934480A JP S6161378 B2 JPS6161378 B2 JP S6161378B2
Authority
JP
Japan
Prior art keywords
film
photoresist film
pinhole
metal
metal film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP11934480A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5744151A (en
Inventor
Fumio Hori
Kenichi Kobayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP11934480A priority Critical patent/JPS5744151A/ja
Publication of JPS5744151A publication Critical patent/JPS5744151A/ja
Publication of JPS6161378B2 publication Critical patent/JPS6161378B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/72—Repair or correction of mask defects

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP11934480A 1980-08-29 1980-08-29 Manufacture of photomask Granted JPS5744151A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11934480A JPS5744151A (en) 1980-08-29 1980-08-29 Manufacture of photomask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11934480A JPS5744151A (en) 1980-08-29 1980-08-29 Manufacture of photomask

Publications (2)

Publication Number Publication Date
JPS5744151A JPS5744151A (en) 1982-03-12
JPS6161378B2 true JPS6161378B2 (enExample) 1986-12-25

Family

ID=14759156

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11934480A Granted JPS5744151A (en) 1980-08-29 1980-08-29 Manufacture of photomask

Country Status (1)

Country Link
JP (1) JPS5744151A (enExample)

Also Published As

Publication number Publication date
JPS5744151A (en) 1982-03-12

Similar Documents

Publication Publication Date Title
JP3131765B2 (ja) 位相シフトマスクの製造方法
JPH0219970B2 (enExample)
US3673018A (en) Method of fabrication of photomasks
JPS6161378B2 (enExample)
JPS6161377B2 (enExample)
JPH07295204A (ja) 位相シフトマスクの修正方法
JPS602956A (ja) フオトマスクの製造方法
JPH07152145A (ja) ハーフトーン型位相シフトフオトマスク
JPS6053872B2 (ja) 遮光性マスクの修正方法
JP4806877B2 (ja) ハーフトーン型位相シフトマスクの修正方法
JPS63218959A (ja) ホトマスクパタ−ンの修正方法
JPH02115842A (ja) ホトマスク欠陥の修正方法
JPS59129423A (ja) イオン注入によるマスクリペア−方法
JPS6163029A (ja) クロムマスクの修正方法
JPH08257780A (ja) レーザ加工用マスク及びその製造方法
JPS6366556A (ja) フオトマスクの修正方法
JPS63256959A (ja) ホトマスクの作製方法
JPS6228463B2 (enExample)
JPH05152199A (ja) レジストパターン形成方法
JPS60235422A (ja) マスクパタ−ンの欠陥修正方法
JPS58111317A (ja) フオトマスクの修正方法
JPS63313158A (ja) レチクルの修正方法
JPH10115907A (ja) 位相反転マスクの製造方法
JPS63308918A (ja) Ｘ線露光用マスクパタ−ン修正方法
JPS61111526A (ja) マスクパタ−ンの欠陥修正方法