JPS5744151A - Manufacture of photomask - Google Patents

Manufacture of photomask

Info

Publication number
JPS5744151A
JPS5744151A JP11934480A JP11934480A JPS5744151A JP S5744151 A JPS5744151 A JP S5744151A JP 11934480 A JP11934480 A JP 11934480A JP 11934480 A JP11934480 A JP 11934480A JP S5744151 A JPS5744151 A JP S5744151A
Authority
JP
Japan
Prior art keywords
pinhole
film
photoresist film
metallic film
lift
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11934480A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6161378B2 (enExample
Inventor
Fumio Hori
Kenichi Kobayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP11934480A priority Critical patent/JPS5744151A/ja
Publication of JPS5744151A publication Critical patent/JPS5744151A/ja
Publication of JPS6161378B2 publication Critical patent/JPS6161378B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/72—Repair or correction of mask defects

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP11934480A 1980-08-29 1980-08-29 Manufacture of photomask Granted JPS5744151A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11934480A JPS5744151A (en) 1980-08-29 1980-08-29 Manufacture of photomask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11934480A JPS5744151A (en) 1980-08-29 1980-08-29 Manufacture of photomask

Publications (2)

Publication Number Publication Date
JPS5744151A true JPS5744151A (en) 1982-03-12
JPS6161378B2 JPS6161378B2 (enExample) 1986-12-25

Family

ID=14759156

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11934480A Granted JPS5744151A (en) 1980-08-29 1980-08-29 Manufacture of photomask

Country Status (1)

Country Link
JP (1) JPS5744151A (enExample)

Also Published As

Publication number Publication date
JPS6161378B2 (enExample) 1986-12-25

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