JPS5587148A - Correction method for light shielding mask - Google Patents

Correction method for light shielding mask

Info

Publication number
JPS5587148A
JPS5587148A JP15855578A JP15855578A JPS5587148A JP S5587148 A JPS5587148 A JP S5587148A JP 15855578 A JP15855578 A JP 15855578A JP 15855578 A JP15855578 A JP 15855578A JP S5587148 A JPS5587148 A JP S5587148A
Authority
JP
Japan
Prior art keywords
foil
defects
fused
light shielding
photomask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15855578A
Other languages
Japanese (ja)
Other versions
JPS6053872B2 (en
Inventor
Takao Kawanabe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP53158555A priority Critical patent/JPS6053872B2/en
Publication of JPS5587148A publication Critical patent/JPS5587148A/en
Publication of JPS6053872B2 publication Critical patent/JPS6053872B2/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/72—Repair or correction of mask defects

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Weting (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To correct the defects of a photomask in an extremely short time, by placing metallic foil on the surfaces of defects occurring on the predetermined pattern consisting of a light shielding material layer and irradiating the foil with high energy beams to locally fuse this. CONSTITUTION:When lack type defects 5 are present on metal thin film 2 (circuit pattern) formed on substrate 1 of a photomask, reticle, or the like, these parts are covered with metallic foil, e.g. gold foil 3, and defects 5 are irradiated by high energy beam 4, such as laser beam. Foil 3 is locally fused and attached to the glass underlayer, unnecessary foil (not fused foil) is stripped, and fused metal 6 added to defects 5 is left, thus completing correction operation.
JP53158555A 1978-12-25 1978-12-25 How to fix a light-blocking mask Expired JPS6053872B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP53158555A JPS6053872B2 (en) 1978-12-25 1978-12-25 How to fix a light-blocking mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP53158555A JPS6053872B2 (en) 1978-12-25 1978-12-25 How to fix a light-blocking mask

Publications (2)

Publication Number Publication Date
JPS5587148A true JPS5587148A (en) 1980-07-01
JPS6053872B2 JPS6053872B2 (en) 1985-11-27

Family

ID=15674256

Family Applications (1)

Application Number Title Priority Date Filing Date
JP53158555A Expired JPS6053872B2 (en) 1978-12-25 1978-12-25 How to fix a light-blocking mask

Country Status (1)

Country Link
JP (1) JPS6053872B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2547111A1 (en) * 1983-05-31 1984-12-07 American Telephone & Telegraph METHOD FOR CORRECTING LITHOGRAPHIC MASKS

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6281682U (en) * 1985-11-08 1987-05-25
JPS62159584U (en) * 1986-03-27 1987-10-09

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2547111A1 (en) * 1983-05-31 1984-12-07 American Telephone & Telegraph METHOD FOR CORRECTING LITHOGRAPHIC MASKS

Also Published As

Publication number Publication date
JPS6053872B2 (en) 1985-11-27

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